Patents by Inventor Keigo Matsuura

Keigo Matsuura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200231747
    Abstract: To provide a fluorinated ether compound capable of forming a surface layer excellent in fingerprint stain removability and abrasion resistance as before and more excellent in light resistance than ever. A fluorinated ether compound represented by A1—O—(Rf1O)m—A2, wherein A1 is a perfluoroalkyl group or the like, A2 is —Q1[—C(R11)b(R12)3?b]a or the like, Rf1 is a fluoroalkylene group, m is from 2 to 500, Q1 is a a+1 valent organic group, R11 is —Q2—Si(R21)c(R22)d(R23)e, R12 is a hydrogen atom, a halogen atom or the like, a is an integer of from 1 to 3, b is 2 or 3, Q2 is a single bond or a bivalent organic group, R21 is —Q3—Si(R31)3?g(R32)g, R22 is an alkyl group, R23 is a hydrolyzable group or a hydroxy group, c, d and e are from 0 to 3, c+d+e is 3, c in at last one R11 among a plurality of R11 is 2 or 3, Q3 is a bivalent organic group, R31 is an alkyl group, R32 is a hydrolyzable group or a hydroxy group, and g is from 1 to 3.
    Type: Application
    Filed: April 2, 2020
    Publication date: July 23, 2020
    Applicant: AGC Inc.
    Inventors: Yutaka Furukawa, Taiki Hoshino, Keigo Matsuura, Makoto Uno, Eiichiro Anraku
  • Publication number: 20200200956
    Abstract: An optical filter includes: an absorption layer including a first near-infrared absorbing dye (D1), a second near-infrared absorbing dye (D2), and a transparent resin; and a reflection layer including a dielectric multilayer film. The dye (D1) and the dye (D2) are squarylium compounds satisfying following (1) to (3). (1) The dye (D1) has a maximum absorption wavelength ?max(D1) within a range of 680 to 730 nm, and the difference between a wavelength at which a transmittance is 80% on the shorter wavelength side than ?max(D1) when the concentration is adjusted such that a transmittance at ?max(D1) is 10%, and ?max(D1) is 100 nm or less. (2) The dye (D2) has a maximum absorption wavelength ?max(D2) within a range of 720 to 770 nm. (3) A value obtained by subtracting ?max(D1) from ?max(D2) is 30 nm or more and 85 nm or less.
    Type: Application
    Filed: March 4, 2020
    Publication date: June 25, 2020
    Applicant: AGC Inc.
    Inventors: Kazuhiko Shiono, Nanako Nishimoto, Sayuri Yamada, Hiroki Hotaka, Satoshi Okada, Keigo Matsuura
  • Publication number: 20200165273
    Abstract: To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer, and a method for producing it. A fluorinated ether compound represented by A-O—(Rf1O)m—Rf2—SO2N(R1)(R2), wherein A is a C1-20 perfluoroalkyl group, Rf1 is a fluoroalkylene group, m is an integer of from 2 to 500, Rf2 is a fluoroalkylene group, R1 is a monovalent organic group having at least one hydrolyzable silyl group, R2 is a hydrogen atom, a monovalent organic group or a monovalent organic group having at least one hydrolyzable group, and the total number of the hydrolyzable silyl group(s) in R1 and the hydrolyzable group(s) in R2 is at least 2.
    Type: Application
    Filed: January 30, 2020
    Publication date: May 28, 2020
    Applicant: AGC Inc.
    Inventors: Taiki HOSHINO, Eisuke MUROTANI, Keigo MATSUURA, Makoto UNO
  • Publication number: 20200165385
    Abstract: To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer and a method for producing it. A fluorinated ether compound represented by A-O—(Rf1O)m-Q1(R1)b, wherein A is a C1-20 perfluoroalkyl group, Rf1 is a perfluoroalkylene group, m is an integer of from 2 to 500, (Rf1O)m may consist of two or more types of Rf1O differing in the number of carbon atoms, Q1 is a (b+1) valent perfluorohydrocarbon group which may have a hydroxy group, R1 is a monovalent organic group having at least one hydrolyzable silyl group, b is an integer of at least 2, and the b R1 may be the same or different.
    Type: Application
    Filed: January 30, 2020
    Publication date: May 28, 2020
    Applicant: AGC Inc
    Inventors: Makoto UNO, Hiromasa YAMAMOTO, Taiki HOSHINO, Keigo MATSUURA, Eiichiro ANRAKU
  • Publication number: 20200165384
    Abstract: To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer, and a method for producing it. A fluorinated ether compound represented by A-O—(Rf1O)m—Rf2—[C(O)N(R1)]p-Q1-C(R2)[-Q2-SiR3nL3-n]2, wherein A is a C1-20 perfluoroalkyl group, Rf1 is a linear fluoroalkylene group, m is an integer of from 2 to 500, Rf2 is a linear fluoroalkylene group, R1 is a hydrogen atom or an alkyl group, p is 0 or 1, Q1 is a single bond or an alkylene group, R2 is a hydrogen atom, a monovalent hydrocarbon group or the like, Q2 is an alkylene group, R3 is a hydrogen atom or a monovalent hydrocarbon group, L is a hydrolyzable group, and n is an integer of from 0 to 2.
    Type: Application
    Filed: January 28, 2020
    Publication date: May 28, 2020
    Applicant: AGC Inc.
    Inventors: Taiki Hoshino, Keigo Matsuura, Makoto Uno, Masahiro Ito, Kenji Ishizeki, Lilin Zhou, Daisuke Kobayashi
  • Publication number: 20200157376
    Abstract: To provide a fluorinated ether compound, a fluorinated ether composition and a coating liquid capable of forming a surface layer excellent in initial water/oil repellency, fingerprint stain removability, abrasion resistance, light resistance and chemical resistance, an article having a surface layer, and a method for producing it. A fluorinated ether compound represented by A-O—(Rf1O)m—Rf2—Z1-Q1 (R1)b, wherein A is a C1-20 perfluoroalkyl group, Rf1 is a linear fluoroalkylene group, m is an integer of from 2 to 500, Rf2 is a linear fluoroalkylene group, Z1 is a single bond, —(CR2R3)c— (wherein R2 and R3 are a hydrogen atom, a C1-6 monovalent organic group or the like, and c is an integer of from 1 to 10), a specific bond or a bivalent organic group having a specific bond, Q1 is a group having a (b+1) valent ring, R1 is a monovalent organic group having at least one hydrolyzable silyl group, and b is an integer of at least 2.
    Type: Application
    Filed: January 28, 2020
    Publication date: May 21, 2020
    Applicant: AGC Inc.
    Inventors: Taiki HOSHINO, Keigo Matsuura, Eiichiro Anraku, Masahiro Ito, Hiromasa Yamamoto, Motoshi Aoyama, Yusuke Tomiyori, Yutaka Furukawa
  • Patent number: 10598834
    Abstract: An optical filter whose transmitting characteristics for visible light are favorably maintained and at the same time, whose blocking characteristics for near-infrared light, in particular, with a large incident angle deteriorates less. The optical filter includes an absorption layer and a reflection layer, and satisfies the requirements: in a spectral transmittance curve for a 0° incident angle, an average transmittance for 430 to 620 nm wavelength light is 65% or more, and a wavelength exhibiting a 50% transmittance is in a 600 to 700 nm wavelength; in a 615 to 725 nm wavelength, an average value of absolute values of differences in transmittance between the spectral transmittance curve for the 0° incident angle and 30° incident angle is 8%/nm or less; and in a spectral transmittance curve for a 60° incident angle, the maximum transmittance for 730 to 1000 nm wavelength light is 15% or less.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: March 24, 2020
    Assignee: AGC Inc.
    Inventors: Kazuhiko Shiono, Keigo Matsuura, Hiroki Hotaka
  • Patent number: 10351718
    Abstract: An optical filter includes an absorption layer containing a near-infrared absorbing dye with an absorption characteristic in dichloromethane satisfying (i-1) to (i-3). (i-1) In an absorption spectrum of a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in 670 to 730 nm. (i-2) Between a maximum absorption coefficient ?A of light with a wavelength of 430 to 550 nm and a maximum absorption coefficient ?B of light with a wavelength of 670 to 730 nm, the following relational expression: ?B/?A?65 is established. (i-3) In a spectral transmittance curve, the difference between a wavelength ?80 with which the transmittance becomes 80% on a shorter wavelength side than the maximum absorption wavelength with the transmittance at the maximum absorption wavelength ?max set to 10% and the maximum absorption wavelength ?max is 65 nm or less.
    Type: Grant
    Filed: November 18, 2016
    Date of Patent: July 16, 2019
    Assignee: AGC Inc.
    Inventors: Kazuhiko Shiono, Keigo Matsuura, Hiroki Hotaka
  • Publication number: 20190161629
    Abstract: An optical filter includes an absorption layer containing a near-infrared absorbing dye with an absorption characteristic in dichloromethane satisfying (i-1) to (i-3). (i-1) In an absorption spectrum of a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in 670 to 730 nm. (i-2) Between a maximum absorption coefficient ?A of light with a wavelength of 430 to 550 nm and a maximum absorption coefficient ?B of light with a wavelength of 670 to 730 nm, the following relational expression: ?B/?A?65 is established. (i-3) In a spectral transmittance curve, the difference between a wavelength ?80 with which the transmittance becomes 80% on a shorter wavelength side than the maximum absorption wavelength with the transmittance at the maximum absorption wavelength ?max set to 10% and the maximum absorption wavelength ?max is 65 nm or less.
    Type: Application
    Filed: January 31, 2019
    Publication date: May 30, 2019
    Applicant: AGC Inc.
    Inventors: Kazuhiko SHIONO, Keigo MATSUURA, Hiroki HOTAKA
  • Publication number: 20180346729
    Abstract: Provided is a near-infrared-absorbing dye increasing a visible light transmittance and having a near-infrared blocking characteristic. The near-infrared-absorbing dye has an absorption characteristic measured by dissolving the dye in dichloromethane satisfying the following requirements. ?In an absorption spectrum at a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in a wavelength region of 670 nm or more. ?The following relational expression is established between a maximum absorption constant ?A with respect to light with a wavelength of 430 to 550 nm and a maximum absorption constant ?B with respect to light with a wavelength of 670 nm or more, where ?B/?A?65. ?In a spectral transmittance curve, an average transmittance of light with a wavelength of 430 to 460 nm is 94.0% or more when a transmittance at the maximum absorption wavelength ?max is set to 1%.
    Type: Application
    Filed: August 2, 2018
    Publication date: December 6, 2018
    Applicant: AGC Inc.
    Inventors: Noriaki MIYAKE, Satoshi Okada, Jun Irisawa, Teppei Konishi, Keigo Matsuura
  • Patent number: 10067421
    Abstract: A negative photosensitive resin composition comprising an alkali-soluble resin or alkali-soluble monomer which has a photo-curability, a photopolymerization initiator, and an ink repellent agent which has a fluorine atom content of from 1 to 45 mass % and which is a partially hydrolyzed condensate of a hydrolyzable silane compound mixture containing a hydrolyzable silane compound having a hydrolyzable group and an organic group having a polyfluoroalkyl group which has an etheric oxygen atom; a cured resin film and partition walls formed by using the negative photosensitive resin composition; and an optical element having the partition walls located between a plurality of dots and their adjacent dots on a substrate surface.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: September 4, 2018
    Assignee: Asahi Glass Company, Limited
    Inventors: Kotaro Yamada, Keigo Matsuura
  • Publication number: 20180067243
    Abstract: An optical filter includes an absorption layer which increases a visible light transmittance while having a good near-infrared blocking characteristic, and which is excellent in not only adhesiveness with respect to a layer to be abutted, but also light resistance. The optical filter includes: an absorption layer containing a near-infrared absorbing dye containing a squarylium-based dye and a transparent resin; and an inorganic or organic material in contact with the absorption layer. The squarylium-based dye has a squarylium skeleton and condensed ring structures bonded thereto respectively on both sides thereof, the condensed ring structures each including a benzene ring and a nitrogen atom as an annular atom, each benzene ring having an urethane structure in the second position.
    Type: Application
    Filed: November 8, 2017
    Publication date: March 8, 2018
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Kazuhiko SHIONO, Keigo Matsuura, Sayuri Higashitamori, Hiroki Hotaka
  • Patent number: 9841677
    Abstract: To provide a negative photosensitive resin composition which may be sufficiently cured even at a low exposure amount and which can impart good ink repellency to the upper surface of partition walls, a cured resin film and partition walls which have good ink repellency on the upper surface, and an optical element which has dots formed with good precision, having opening sections partitioned by partition walls uniformly coated with an ink. A negative photosensitive resin composition comprising an alkali-soluble resin or alkali-soluble monomer (A) having an ethylenic double bond, a photopolymerization initiator (B), a thiol compound (C) having at least 3 mercapto groups in one molecule, and an ink repellent agent (D), a cured resin film and partition walls formed by using the negative photosensitive resin composition, and an optical element having the partition walls located between a plurality of dots and their adjacent dots on a substrate surface.
    Type: Grant
    Filed: May 4, 2015
    Date of Patent: December 12, 2017
    Assignee: Asahi Glass Company, Limited
    Inventors: Keigo Matsuura, Masayuki Kawashima, Hideyuki Takahashi, Daisuke Kobayashi
  • Publication number: 20170343710
    Abstract: There is provided an optical filter whose transmitting characteristics for visible light are favorably maintained and at the same time, whose blocking characteristics for near-infrared light, in particular, with a large incident angle deteriorates less. The optical filter includes an absorption layer and a reflection layer, and satisfies the requirements: in a spectral transmittance curve for a 0° incident angle, an average transmittance for 430 to 620 nm wavelength light is 65% or more, and a wavelength exhibiting a 50% transmittance is in a 600 to 700 nm wavelength; in a 615 to 725 nm wavelength, an average value of absolute values of differences in transmittance between the spectral transmittance curve for the 0° incident angle and 30° incident angle is 8%/nm or less; and in a spectral transmittance curve for a 60° incident angle, the maximum transmittance for 730 to 1000 nm wavelength light is 15% or less.
    Type: Application
    Filed: July 28, 2017
    Publication date: November 30, 2017
    Applicant: Asahi Glass Company, Limited
    Inventors: Kazuhiko Shiono, Keigo Matsuura, Hiroki Hotaka
  • Publication number: 20170066933
    Abstract: An optical filter includes an absorption layer containing a near-infrared absorbing dye with an absorption characteristic in dichloromethane satisfying (i-1) to (i-3). (i-1) In an absorption spectrum of a wavelength of 400 to 800 nm, there is a maximum absorption wavelength ?max in 670 to 730 nm. (i-2) Between a maximum absorption coefficient ?A of light with a wavelength of 430 to 550 nm and a maximum absorption coefficient ?B of light with a wavelength of 670 to 730 nm, the following relational expression: ?B/?A?65 is established. (i-3) In a spectral transmittance curve, the difference between a wavelength ?80 with which the transmittance becomes 80% on a shorter wavelength side than the maximum absorption wavelength with the transmittance at the maximum absorption wavelength ?max set to 10% and the maximum absorption wavelength ?max is 65 nm or less.
    Type: Application
    Filed: November 18, 2016
    Publication date: March 9, 2017
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Kazuhiko SHIONO, Keigo MATSUURA, Hiroki HOTAKA
  • Patent number: 9459529
    Abstract: To provide a negative photosensitive resin composition which is capable of imparting good ink repellency to a cured film, particularly to the upper surface of partition walls, and which has characteristics such that an ink repellent agent is less likely to remain in opening sections defined by the partition walls even without UV/O3 irradiation treatment, and the ink is permitted to uniformly wet-spread without unevenness. A negative photosensitive resin composition characterized by comprising (A) an alkali-soluble resin or alkali-soluble monomer, which has a photo-curability, (B) a photopolymerization initiator, (C) an ink repellent agent having fluorine atoms, and (D) a compound which is a partially hydrolyzed condensate of a hydrolysable silane compound mixture containing a hydrolysable silane compound having a mercapto group and a hydrolysable group and/or a hydrolysable silane compound having a group with an ethylenic double bond and a hydrolysable group, and which has no fluorine atom.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: October 4, 2016
    Assignee: Asahi Glass Company, Limited
    Inventors: Keigo Matsuura, Hideyuki Takahashi, Masayuki Kawashima, Daisuke Kobayashi
  • Publication number: 20160252812
    Abstract: A negative photosensitive resin composition comprising an alkali-soluble resin or alkali-soluble monomer which has a photo-curability, a photopolymerization initiator, and an ink repellent agent which has a fluorine atom content of from 1 to 45 mass % and which is a partially hydrolyzed condensate of a hydrolyzable silane compound mixture containing a hydrolyzable silane compound having a hydrolyzable group and an organic group having a polyfluoroalkyl group which has an etheric oxygen atom; a cured resin film and partition walls formed by using the negative photosensitive resin composition; and an optical element having the partition walls located between a plurality of dots and their adjacent dots on a substrate surface.
    Type: Application
    Filed: May 13, 2016
    Publication date: September 1, 2016
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Kotaro YAMADA, Keigo MATSUURA
  • Publication number: 20150234273
    Abstract: To provide a negative photosensitive resin composition which may be sufficiently cured even at a low exposure amount and which can impart good ink repellency to the upper surface of partition walls, a cured resin film and partition walls which have good ink repellency on the upper surface, and an optical element which has dots formed with good precision, having opening sections partitioned by partition walls uniformly coated with an ink. A negative photosensitive resin composition comprising an alkali-soluble resin or alkali-soluble monomer (A) having an ethylenic double bond, a photopolymerization initiator (B), a thiol compound (C) having at least 3 mercapto groups in one molecule, and an ink repellent agent (D), a cured resin film and partition walls formed by using the negative photosensitive resin composition, and an optical element having the partition walls located between a plurality of dots and their adjacent dots on a substrate surface.
    Type: Application
    Filed: May 4, 2015
    Publication date: August 20, 2015
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Keigo MATSUURA, Masayuki KAWASHIMA, Hideyuki TAKAHASHI, Daisuke KOBAYASHI
  • Publication number: 20150219992
    Abstract: To provide a negative photosensitive resin composition which is capable of imparting good ink repellency to a cured film, particularly to the upper surface of partition walls, and which has characteristics such that an ink repellent agent is less likely to remain in opening sections defined by the partition walls even without UV/O3 irradiation treatment, and the ink is permitted to uniformly wet-spread without unevenness. A negative photosensitive resin composition characterized by comprising (A) an alkali-soluble resin or alkali-soluble monomer, which has a photo-curability, (B) a photopolymerization initiator, (C) an ink repellent agent having fluorine atoms, and (D) a compound which is a partially hydrolyzed condensate of a hydrolysable silane compound mixture containing a hydrolysable silane compound having a mercapto group and a hydrolysable group and/or a hydrolysable silane compound having a group with an ethylenic double bond and a hydrolysable group, and which has no fluorine atom.
    Type: Application
    Filed: April 16, 2015
    Publication date: August 6, 2015
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Keigo MATSUURA, Hideyuki Takahashi, Masayuki Kawashima, Daisuke Kobayashi
  • Patent number: 8877870
    Abstract: A fluorinated elastic copolymer which has iodine atoms, bromine atoms, or both iodine and bromine atoms, at its molecular terminals and which includes repeating units (a) based on tetrafluoroethylene, repeating units (b) based on a fluorinated monomer having one polymerizable unsaturated bond (provided that tetrafluoroethylene is excluded), and repeating units (c) based on a fluorinated monomer having at least two polymerizable unsaturated bonds, wherein the ratio (molar ratio) of the repeating units (a) to the repeating units (b) is (a)/(b)=40/60 to 90/10, and the proportion of the repeating units (c) based on the total amount of the repeating units (a) and the repeating units (b) is from 0.01 to 1 mol %.
    Type: Grant
    Filed: July 15, 2011
    Date of Patent: November 4, 2014
    Assignee: Asahi Glass Company, Limited
    Inventors: Hiroshi Funaki, Kunio Watanabe, Keigo Matsuura, Ng Soon Yeng