Patents by Inventor Keigo Obata

Keigo Obata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200407590
    Abstract: The present invention provides a cationic electrodeposition coating composition that has both good anti-cissing property and good coating film appearance. This is a cationic electrodeposition coating composition containing a silicone compound (A) having an SP value of more than 10.5 and 15.0 or less, and a film forming resin (B), wherein the silicone compound (A) is contained in an amount of 0.01 parts by mass or more and 4.5 parts by mass or less per 100 parts by mass of the resin solid content of the film forming resin (B). For example, the silicone compound (A) is at least one species selected from the group consisting of a polyether modified silicone compound (A-1), a polyester modified silicone compound (A-2), and a polyacrylic modified silicone compound (A-3).
    Type: Application
    Filed: December 12, 2019
    Publication date: December 31, 2020
    Applicant: NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD.
    Inventors: Masayuki KOTANI, Yuko HASEGAWA, Yasuyuki FURUYA, Keigo OBATA, Keisuke TSUTSUI, Hiroki ARAI, Hiroyoshi YAMAZAKI
  • Patent number: 7938948
    Abstract: To develop stable, non-cyanide silver and silver alloy plating baths. The present invention is a silver and silver alloy plating bath, comprises: (A) a soluble salt, comprising a silver salt or a mixture of a silver salt and a salt of a metal selected from the group consisting of tin, bismuth, cobalt, antimony, iridium, indium, lead, copper, iron, zinc, nickel, palladium, platinum, and gold; and (B) at least one aliphatic sulfide compound comprising a functionality selected from the group consisting of an ether oxygen atom, a 3-hydroxypropyl group, and a hydroxypropylene group, with the proviso that the aliphatic sulfide compound does not comprise a basic nitrogen atom.
    Type: Grant
    Filed: September 3, 2009
    Date of Patent: May 10, 2011
    Assignees: Ishihara Chemical Co., Ltd., Daiwa Fine Chemicals Co., Ltd.
    Inventors: Kiyotaka Tsuji, Tetsuji Nishikawa, Takao Takeuchi, Keigo Obata, Hidemi Nawafune
  • Patent number: 7669752
    Abstract: A flux contains resin having film forming ability, activator, solvent and at least one complex selected from silver complex and copper complex. The flux is used when soldering is performed onto a circuit having electroless nickel plating or further having gold plating on the electroless nickel plating. Allowing a barrier layer of silver or copper to deposit on the surfaces of lands suppresses the diffusion of nickel into the melted solder alloy during soldering, and also prevents phosphorous concentration. This improves the bonding strength of soldering and suppresses the reduction deposition of silver and/or copper to portions other than circuit patterns.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: March 2, 2010
    Assignee: Harima Chemicals, Inc.
    Inventors: Kazuki Ikeda, Shunsuke Ishikawa, Takaaki Anada, Keigo Obata, Takao Takeuchi, Naoya Inoue
  • Publication number: 20090321269
    Abstract: To develop stable, non-cyanide silver and silver alloy plating baths. The present invention is a silver and silver alloy plating bath, comprises: (A) a soluble salt, comprising a silver salt or a mixture of a silver salt and a salt of a metal selected from the group consisting of tin, bismuth, cobalt, antimony, iridium, indium, lead, copper, iron, zinc, nickel, palladium, platinum, and gold; and (B) at least one aliphatic sulfide compound comprising a functionality selected from the group consisting of an ether oxygen atom, a 3-hydroxypropyl group, and a hydroxypropylene group, with the proviso that the aliphatic sulfide compound does not comprise a basic nitrogen atom.
    Type: Application
    Filed: September 3, 2009
    Publication date: December 31, 2009
    Applicants: ISHIHARA CHEMICAL CO., LTD., DAIWA FINE CHEMICALS CO., LTD.
    Inventors: Kiyotaka TSUJI, Tetsuji NISHIKAWA, Takao TAKEUCHI, Keigo OBATA, Hidemi NAWAFUNE
  • Patent number: 7628903
    Abstract: A silver and silver alloy plating bath, includes (A) a soluble salt, having a silver salt or a mixture of a silver salt and a salt of a metal such as tin, bismuth, indium, lead, and the like; and (B) a particular aliphatic sulfide compound, such as thiobis(diethyleneglycol), dithiobis(triglycerol), 3,3?-thiodipropanol, thiodiglycerin, 3,6-dithiooctane-1,8-diol, and the like, which contain at least one or more of an ether oxygen atom, a 1-hydroxypropyl group, a hydroxypropylene group, or two or more of a sulfide bond in the molecule, and not containing a basic nitrogen atom.
    Type: Grant
    Filed: May 2, 2000
    Date of Patent: December 8, 2009
    Assignees: Ishihara Chemical Co., Ltd., Daiwa Fine Chemicals Co., Ltd.
    Inventors: Kiyotaka Tsuji, Tetsuji Nishikawa, Takao Takeuchi, Keigo Obata, Hidemi Nawafune
  • Publication number: 20070241170
    Abstract: A flux contains resin having film forming ability, activator, solvent and at least one complex selected from silver complex and copper complex. The flux is used when soldering is performed onto a circuit having electroless nickel plating or further having gold plating on the electroless nickel plating. Allowing a barrier layer of silver or copper to deposit on the surfaces of lands suppresses the diffusion of nickel into the melted solder alloy during soldering, and also prevents phosphorous concentration. This improves the bonding strength of soldering and suppresses the reduction deposition of silver and/or copper to portions other than circuit patterns.
    Type: Application
    Filed: June 22, 2007
    Publication date: October 18, 2007
    Inventors: Kazuki Ikeda, Shunsuke Ishikawa, Takaaki Anada, Keigo Obata, Takao Takeuchi, Naoya Inoue
  • Patent number: 7166152
    Abstract: A pretreatment solution for providing a catalyst for electroless plating and a pretreatment method using the solution are provided. The pretreatment solution comprises a silver colloidal solution containing, as essential components, at least the following components (I), (II) and (III): (I) silver colloidal particles, (II) one or more ions selected from an ion of a metal having an electric potential which can reduce a silver ion to metal silver in the solution and an ion oxidized at the time of reduction of the silver ion, and (III) one or more ions selected from a hydroxycarboxylate ion, a condensed phosphate ion and an amine carboxylate ion, the silver colloidal particles (I) being produced by the ion of the metal (II) having an electric potential which can reduce a silver ion to metal silver. When an object to be plated is pretreated by use of the pretreatment solution, provision of an effective catalyst for electroless plating is achieved.
    Type: Grant
    Filed: August 7, 2003
    Date of Patent: January 23, 2007
    Assignee: Daiwa Fine Chemicals Co., Ltd.
    Inventors: Yoshiaki Okuhama, Keigo Obata, Masakazu Yoshimoto, Kim Dong Hyun, Shingo Kitamura, Seiichiro Nakao, Hidenori Tsuji, Hidemi Nawafune
  • Publication number: 20060147683
    Abstract: A flux contains resin having film forming ability, activator, solvent, and at least one complex selected from silver complex and copper complex. The flux is used when soldering is performed onto a circuit having electroless nickel plating or further having gold plating on the electroless nickel plating. Allowing a barrier layer of silver or copper to deposit on the surfaces of lands suppresses the diffusion of nickel into the melted solder alloy during soldering, and also prevents phosphorous concentration. This improves the bonding strength of soldering and suppresses the reduction deposition of silver and/or copper to portions other than circuit patterns.
    Type: Application
    Filed: December 30, 2004
    Publication date: July 6, 2006
    Inventors: Kazuki Ikeda, Shunsuke Ishikawa, Takaaki Anada, Keigo Obata, Takao Takeuchi, Naoya Inoue
  • Patent number: 7056448
    Abstract: A method for forming a circuit pattern includes at least a step (a) of subjecting a non-conductor to electroless copper plating to form a copper film and a step (b) of etching the copper film so as to form a circuit pattern. As a catalyst for the electroless copper plating, a silver colloidal solution is used containing as essential components at least the following: (I) silver colloidal particles; (II) one or more of ions of metal having an electric potential which can reduce silver ions to metal silver in the solution and/or ions which result from oxidation of the ion at the time of reduction of the silver ions; and (III) one or more of hydroxycarboxylate, condensed phosphate and/or amine carboxylate ions. The silver colloidal particles (I) are produced by the ion (II) of the metal having an electric potential which can reduce silver ions to metal silver. The circuit pattern may be formed on a printed wiring board.
    Type: Grant
    Filed: May 20, 2003
    Date of Patent: June 6, 2006
    Assignee: Daiwa Fine Chemicals Co., Ltd.
    Inventors: Yoshiaki Okuhama, Keigo Obata, Masakazu Yoshimoto, Shingo Kitamura, Seiichiro Nakao, Osamu Masuyama, Hidenori Tsuji
  • Publication number: 20060113006
    Abstract: The present invention provides a tin-containing plating bath comprising: (a) a soluble stannous salt, or a mixture of a soluble stannous salt and at least one soluble salt selected from the group consisting of copper salts, bismuth salts, silver salts, indium salts, zinc salts, nickel salts, cobalt salts and antimony salts; and (b) at least one aliphatic sulfonic acid selected from the group consisting of alkanesulfonic acids and alkanolsulfonic acids, the aliphatic sulfonic acid being a purified aliphatic sulfonic acid in which the total amount of sulfur-containing compounds as impurities consisting of compound(s) containing one or more sulfur atoms with an oxidation number of +4 or less in the molecule and compound(s) containing one or more sulfur atoms and one or more chlorine atoms in the molecule is a minute amount or less. A tin or tin alloy plating film with excellent reflowability, film appearance, etc. can be formed by the use of this plating bath.
    Type: Application
    Filed: January 22, 2004
    Publication date: June 1, 2006
    Inventors: Akihiro Masuda, Masayoshi Kohinata, Keigo Obata, Masakazu Yoshimoto, Kiyotaka Tsuji, Ei Uchida, Keiji Ori, Masahiro Eikawa
  • Publication number: 20050258134
    Abstract: A method for forming a circuit pattern includes at least a step (a) of subjecting a non-conductor to electroless copper plating to form a copper film and a step (b) of etching the copper film so as to form a circuit pattern. As a catalyst for the electroless copper plating, a silver colloidal solution is used containing as essential components at least the following: (I) silver colloidal particles; (II) one or more of ions of metal having an electric potential which can reduce silver ions to metal silver in the solution and/or ions which result from oxidation of the ion at the time of reduction of the silver ions; and (III) one or more of hydroxycarboxylate, condensed phosphate and/or amine carboxylate ions. The silver colloidal particles (I) are produced by the ion (II) of the metal having an electric potential which can reduce silver ions to metal silver. The circuit pattern may be formed on a printed wiring board.
    Type: Application
    Filed: May 20, 2003
    Publication date: November 24, 2005
    Inventors: Yoshiaki Okuhama, Keigo Obata, Masakazu Yoshimoto, Shingo Kitamura, Seiichiro Nakao, Osamu Masuyama, Hidenori Tsuji
  • Patent number: 6923875
    Abstract: According to present invention, there is provided a lead-free solder precipitating composition comprising a tin powder, and a complex of silver ions and/or copper ions and aryl phosphines, alkyl phosphine, phosphines or azoles. The solder precipitating composition can form proper lead-free solder on lands of a circuit board, without forming silver and/or copper film on the circuit board.
    Type: Grant
    Filed: January 15, 2003
    Date of Patent: August 2, 2005
    Assignee: Harima Chemicals, Inc.
    Inventors: Kazuki Ikeda, Hiroshi Tanaka, Hisao Irie, Keigo Obata, Takao Takeuchi, Naoya Inoue
  • Patent number: 6852210
    Abstract: To provide a plating method, which enables wide industrial use of the redox system electroless plating method having excellent characteristics, and a plating bath precursor which is preferable for the plating method. The plating method comprises a process oxidizing first metal ions of a redox system of a plating bath from a lower oxidation state to a high oxidation state, and second metal ions of said redox system are reduced and deposited onto the surface of an object to be plated, wherein a process is provided in which by supplying the electrical current to the plating bath, the first metal ions are reduced from said lower oxidation state to thereby activate the plating bath. The plating bath precursor is formed stabilizing the plating bath so that reduction and deposition of the second metal ions substantially do not occur in order to improve its storing performance.
    Type: Grant
    Filed: January 7, 2002
    Date of Patent: February 8, 2005
    Assignees: Daiwa Fine Chemicals Co., Ltd., Sumitomo Electric Industries, Ltd.
    Inventors: Keigo Obata, Dong-Hyun Kim, Takao Takeuchi, Seiichiro Nakao, Shinji Inazawa, Ayao Kariya, Masatoshi Majima, Shigeyoshi Nakayama
  • Publication number: 20040043153
    Abstract: A pretreatment solution for providing a catalyst for electroless plating and a pretreatment method using the solution are provided.
    Type: Application
    Filed: August 7, 2003
    Publication date: March 4, 2004
    Applicant: Daiwa Fine Chemicals Co., Ltd.
    Inventors: Yoshiaki Okuhama, Keigo Obata, Masakazu Yoshimoto, Kim Dong Hyun, Shingo Kitamura, Seiichiro Nakao, Hidenori Tsuji, Hidemi Nawafune
  • Publication number: 20030159761
    Abstract: According to present invention, there is provided a lead-free solder precipitating composition comprising a tin powder, and a complex of silver ions and/or copper ions and aryl phosphines, alkyl phosphine, phosphines or azoles. The solder precipitating composition can form proper lead-free solder on lands of a circuit board, without forming silver and/or copper film on the circuit board.
    Type: Application
    Filed: January 15, 2003
    Publication date: August 28, 2003
    Applicant: HARIMA CHEMICALS, INC.
    Inventors: Kazuki Ikeda, Hiroshi Tanaka, Hisao Irie, Keigo Obata, Takao Takeuchi, Naoya Inoue
  • Patent number: 6607653
    Abstract: The present invention provides a tin-copper alloy plating bath, tin-copper-bismuth alloy plating bath or tin-copper-silver alloy plating bath containing a soluble metal compound and a specific sulfur-containing compound. The plating bath of the present invention is an alloy plating bath containing tin and copper, the bath being capable of preventing deposition of copper on a tin anode by substitution, having low dependence of plated coating composition on current density, high bath stability and resistance to turbidness.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: August 19, 2003
    Assignees: Daiwa Fine Chemicals Co., Ltd., Ishihara Chemical Co., Ltd.
    Inventors: Kiyotaka Tsuji, Keigo Obata, Takao Takeuchi, Hidemi Nawafune, Tetsuji Nishikawa
  • Publication number: 20030150743
    Abstract: There are provided a tin or tin-base alloy plating bath having significantly improved solderability, a tin salt solution and an acid or complexing agent solution for preparing or controlling and making up the plating bath, as well as electrical and electric components prepared by the use of the plating bath.
    Type: Application
    Filed: September 20, 2002
    Publication date: August 14, 2003
    Applicant: DAIWA FINE CHEMICALS CO., LTD.
    Inventors: Keigo Obata, Masakazu Yoshimoto, Kiyotaka Tsuji, Ei Uchida
  • Publication number: 20020079226
    Abstract: To provide a plating method, which enables wide industrial use of the redox system electroless plating method having excellent characteristics, and a plating bath precursor which is preferable for the plating method. The plating method comprises a process oxidizing first metal ions of a redox system of a plating bath from a lower oxidation state to a high oxidation state, and second metal ions of said redox system are reduced and deposited onto the surface of an object to be plated, wherein a process is provided in which by supplying the electrical current to the plating bath, the first metal ions are reduced from said lower oxidation state to thereby activate the plating bath. The plating bath precursor is formed stabilizing the plating bath so that reduction and deposition of the second metal ions substantially do not occur in order to improve its storing performance.
    Type: Application
    Filed: January 7, 2002
    Publication date: June 27, 2002
    Applicant: DAIWA FINE CHEMICALS CO., LTD.
    Inventors: Keigo Obata, Dong-Hyun Kim, Takao Takeuchi, Seiichiro Nakao, Shinji Inazawa, Ayao Kariya, Masatoshi Majima, Shigeyoshi Nakayama
  • Patent number: 6338787
    Abstract: To provide a plating method, which enables wide industrial use of the redox system electroless plating method having excellent characteristics, and a plating bath precursor which is preferable for the plating method. The plating method comprises a process oxidizing first metal ions of a redox system of a plating bath from a lower oxidation state to a high oxidation state, and second metal ions of said redox system are reduced and deposited onto the surface of an object to be plated, wherein a process is provided in which by supplying the electrical current to the plating bath, the first metal ions are reduced from said lower oxidation state to thereby activate the plating bath. The plating bath precursor is formed stabilizing the plating bath so that reduction and deposition of the second metal ions substantially do not occur in order to improve its storing performance.
    Type: Grant
    Filed: April 5, 2000
    Date of Patent: January 15, 2002
    Assignees: Daiwa Fine Chemicals Co., Ltd., Sumitomo Electric Industries, Ltd.
    Inventors: Keigo Obata, Dong-Hyun Kim, Takao Takeuchi, Seiichiro Nakao, Shinji Inazawa, Ayao Kariya, Masatoshi Majima, Shigeyoshi Nakayama
  • Patent number: 6235093
    Abstract: An aqueous solution for obtaining a noble metal by chemical reduction containing at least one water-soluble compound or complex of a metal selected from the group consisting of gold, platinum, silver, and palladium as a source of the metal to be deposited, and at least one mercapto compound or sulfide compound or a salt thereof as a reducing agent. The reducing agent is typically mercaptoacetic acid, 2-mercaptopropionic acid, 2-aminoethanethiol, 2-mercaptoethanol, glucose cysteine, 1-thioglycerol, sodium mercaptopropanesulfonate, N-acetylmethionine, thiosalicylic acid, 2-thiazoline-2-thiol, 2,5-dimercapto-1,3,4-thiadiazole, 2-benzothiazolethiol, or 2-benzimidazolethiol. They may be used singly or in combination.
    Type: Grant
    Filed: June 28, 1999
    Date of Patent: May 22, 2001
    Assignee: Daiwa Fine Chemicals Co., Ltd.
    Inventors: Yoshiaki Okuhama, Takao Takeuchi, Keigo Obata, Yasuhito Kohashi, Hidemi Nawafune