Patents by Inventor Keiji Hashimoto

Keiji Hashimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090089989
    Abstract: A collector 12 which serves as a gas diffusion layer for a fuel cell; i.e., a metal lath MR, is formed by a method consisting of a first step and a second step. In the first step, while an upper blade UH is positioned at a first machining position along the width direction of a stainless steel sheet S, generally hexagonal through holes are formed in the stainless steel sheet S at two positions which are biased from each other by a machining pitch. In the second step, while the upper blade UH is positioned at a second machining position along the width direction of the stainless steel sheet S, generally hexagonal through holes are formed in the stainless steel sheet S at two positions which are biased from each other by the machining pitch. The first step and the second step are alternated repeatedly, thereby forming the metal lath MR having a uniform shape and a predetermined thickness.
    Type: Application
    Filed: February 7, 2007
    Publication date: April 9, 2009
    Applicants: TOYOTA SHATAI KABUSHIKI KAISHA, TAMAGAWA HIGH TECH CO., LTD.
    Inventors: Keiji Hashimoto, Kazuhiko Kato
  • Publication number: 20090075140
    Abstract: An MEA includes an electrolyte membrane permeable to hydroxide ions. A catalyst layer formed of a hydrogen storage alloy is provided on one surface of the membrane facing the anode electrode layer. Another catalyst layer formed of platinum-on carbon is provided on the opposite surface of the membrane facing the cathode electrode layer. The catalyst layer on the anode-electrode-layer side dissociates hydrogen gas into atomic hydrogen, diffuses the atomic hydrogen by way of solid phase diffusion, and absorbs/desorbs atomic hydrogen. The catalyst layer on the cathode-electrode-layer side forms hydroxide ions from air, humidifying water, and electrons. The membrane allows movement of the hydroxide ions to the catalyst layer on the anode-electrode-layer side. This leads to formation of water on the anode-electrode-layer side, whereby occurrence of dry-up can be prevented. Even when flooding arises from formed water, atomic hydrogen can smoothly move through solid-phase diffusion.
    Type: Application
    Filed: July 20, 2006
    Publication date: March 19, 2009
    Applicant: TOYOTA SHATAI KABUSHIKI KAISHA
    Inventors: Keiji Hashimoto, Eiichirou Morozumi, Michi Hashiba
  • Patent number: 7341799
    Abstract: A separator 10 for a fuel cell is formed by bonding a first separator member 11 facing to an anode electrode AE and a second separator member 12 facing to a cathode electrode CE. A material for forming the first separator member 11 is a chrome alloy that has reduced elution of metal ion even under a power generating environment of the fuel cell, while a material for forming the second separator member is a nickel alloy that has a characteristic of being difficult to form a thick oxide coating layer on its surface. The separator 10 is manufactured in a low-cost and is capable of reducing a deterioration in performance of a fuel cell.
    Type: Grant
    Filed: July 31, 2003
    Date of Patent: March 11, 2008
    Assignee: Toyota Shatai Kabushiki Kaisha
    Inventors: Keiji Hashimoto, Yukihiro Suzuki
  • Publication number: 20070007658
    Abstract: First wirings and first dummy wirings are formed in a p-SiOC film formed on a substrate. A p-SiOC film is formed, and a cap film is formed on the p-SiOC film. A dual damascene wiring, including vias connected to the first wirings and the second wirings, is formed in the cap film and the p-SiOC film 22. Dummy vias are formed on the periphery of isolated vias.
    Type: Application
    Filed: September 18, 2006
    Publication date: January 11, 2007
    Applicants: RENESAS TECHNOLOGY CORP., MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Kazuo TOMITA, Keiji HASHIMOTO, Yasutaka NISHIOKA, Susumu MATSUMOTO, Mitsuru SEKIGUCHI, Akihisa IWASAKI
  • Publication number: 20060163730
    Abstract: A first nitrogen-containing insulating film is formed under a low dielectric constant film, in which a via hole is formed, with a first nitrogen-non-containing insulating film interposed between the first nitrogen-containing insulating film and the low dielectric constant film. A second nitrogen-containing insulating film is formed over the low dielectric constant film with a second nitrogen-non-containing insulating film interposed therebetween.
    Type: Application
    Filed: April 7, 2004
    Publication date: July 27, 2006
    Inventors: Susumu Matsumoto, Mitsuru Sekiguchi, Yasutaka Nishioka, Kazuo Tomita, Akihisa Iwasaki, Keiji Hashimoto
  • Patent number: 6973639
    Abstract: The present invention provides automatic program generation technology that enables the generation of a diverse range of programs with fewer models. The automatic program generation device of the present invention, which automatically generates programs that will perform the predetermined processing, comprises a plurality of data structure resolution units that respectively include a model program for a corresponding data structure, wherein the model program includes resolution logic for performing a setting peculiar to the predetermined processing; and a resolution unit for generating a program for performing the predetermined processing by acquiring resolution information relating to the setting peculiar to the predetermined processing for resolution logic included in the model program in the data structure resolution unit corresponding to a selected data structure and by synthesizing the model program and the resolution information for the resolution logic.
    Type: Grant
    Filed: January 24, 2001
    Date of Patent: December 6, 2005
    Assignee: Fujitsu Limited
    Inventors: Keiji Hashimoto, Yuki Chujoh, Keisui Asai, Jun Ginbayashi, Hiroyuki Yoshida, Rieko Yamamoto, Emiko Hamamoto
  • Publication number: 20050035457
    Abstract: First wirings and first dummy wirings are in a p-SiOC film on a substrate. A p-SiOC film is formed, and a cap film is formed on the p-SiOC film. A dual damascene wiring, including vias connected to the first wirings and the second wirings, is formed in the cap film and the p-SiOC film 22. Dummy vias are formed on the periphery of isolated vias.
    Type: Application
    Filed: March 4, 2004
    Publication date: February 17, 2005
    Applicants: Renesas Technology Corp., Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazuo Tomita, Keiji Hashimoto, Yasutaka Nishioka, Susumu Matsumoto, Mitsuru Sekiguchi, Akihisa Iwasaki
  • Patent number: 6855446
    Abstract: A fuel cell composed of a plurality of cell function assemblies of each of which includes a set of spaced electrolytic membranes, two pairs of electrode plates in contact with opposite surfaces of each of the electrolytic membranes, a set of separators, and a set of six support frames assembled to retain the electrolytic membranes and separators in position. In the fuel cell, the separators each are in the form of a flat plate of synthetic resin integrally provided with a plurality of spaced projections made of pressed carbon powder and retained in contact with the electrode plates to form a pair of reaction chambers at opposite sides of each of the electrolytic membranes.
    Type: Grant
    Filed: December 17, 1999
    Date of Patent: February 15, 2005
    Assignee: Toyota Auto Body Co., Ltd.
    Inventors: Keiji Hashimoto, Masanao Shiomi, Hirotaka Fukatsu, Kousuke Kawajiri, Seiken Hashimoto, Hiroyuki Morita
  • Patent number: 6737104
    Abstract: A manufacturing method of an anti-corrosive multi-layered structure material having an anti-corrosive non-metallic surface layer formed on a metallic substrate layer, wherein non-electrolytic plating of an anti-corrosive metal different in ionization property from the surface metal of the metallic substrate layer is carried out on the surface of the non-metallic surface layer so that the anti-corrosive metal is substituted for the surface metal of the metallic substrate layer through fine pores of the non-metallic surface layer and precipitated only in the fine pores of the non-metallic surface layer without causing useless precipitation of the anti-corrosive metal on the surface of the non-metallic surface layer.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: May 18, 2004
    Assignee: Araco Kabushiki Kaisha
    Inventors: Yukihiro Suzuki, Keiji Hashimoto, Yoshinari Minamihama
  • Publication number: 20040028980
    Abstract: A separator 10 for a fuel cell is formed by bonding a first separator member 11 facing to an anode electrode AE and a second separator member 12 facing to a cathode electrode CE. A material for forming the first separator member 11 is a chrome alloy that has reduced elution of metal ion even under a power generating environment of the fuel cell, while a material for forming the second separator member is a nickel alloy that has a characteristic of being difficult to form a thick oxide coating layer on its surface. The separator 10 is manufactured in a low-cost and is capable of reducing a deterioration in performance of a fuel cell.
    Type: Application
    Filed: July 31, 2003
    Publication date: February 12, 2004
    Inventors: Keiji Hashimoto, Yukihiro Suzuki
  • Publication number: 20030044540
    Abstract: A manufacturing method of an anti-corrosive multi-layered structure material having an anti-corrosive non-metallic surface layer formed on a metallic substrate layer, wherein non-electrolytic plating of an anti-corrosive metal different in ionization property from the surface metal of the metallic substrate layer is carried out on the surface of the non-metallic surface layer so that the anti-corrosive metal is substituted for the surface metal of the metallic substrate layer through fine pores of the non-metallic surface layer and precipitated only in the fine pores of the non-metallic surface layer without causing useless precipitation of the anti-corrosive metal on the surface of the non-metallic surface layer.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 6, 2003
    Applicant: Araco Kabushiki Kaisha
    Inventors: Yukihiro Suzuki, Keiji Hashimoto, Yoshinari Minamihama
  • Publication number: 20010044932
    Abstract: The present invention provides automatic program generation technology that enables the generation of a diverse range of programs with fewer models. The automatic program generation device of the present invention, which automatically generates programs that will perform the predetermined processing, comprises a plurality of data structure resolution units that respectively include a model program for a corresponding data structure, wherein the model program includes resolution logic for performing a setting peculiar to the predetermined processing; and a resolution unit for generating a program for performing the predetermined processing by acquiring resolution information relating to the setting peculiar to the predetermined processing for resolution logic included in the model program in the data structure resolution unit corresponding to a selected data structure and by synthesising the model program and the resolution information for the resolution logic.
    Type: Application
    Filed: January 24, 2001
    Publication date: November 22, 2001
    Inventors: Keiji Hashimoto, Yuki Chujoh, Keisui Asai, Jun Ginbayashi, Hiroyuki Yoshida, Rieko Yamamoto, Emiko Hamamoto
  • Patent number: 5745878
    Abstract: A business requirement handling apparatus is adapted to a data processing system which includes a central processing unit, a display unit and an input unit.
    Type: Grant
    Filed: April 10, 1995
    Date of Patent: April 28, 1998
    Assignee: Fujitsu Limited
    Inventors: Keiji Hashimoto, Yasuyuki Fujikawa, Akihiko Yoshioka, Jun Ginbayashi, Kazuo Yabuta, Yukio Imazu
  • Patent number: 5721075
    Abstract: The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmittance of a halftone phase shift layer is arbitrarily variable within the range of 1% to 50%, inclusive, by exposing the blank or photomask to a high temperature elevated to at least 150.degree. C., to an oxidizing atmosphere, or to a reducing atmosphere at a step that can provided independent of the steps for film-forming or photomask fabrication step. This enables the exposure light transmittance of the halftone phase shift layer to be changed to any desired value after blank or photomask fabrication, and so an optimal halftone phase shift photomask to be obtained depending on the size, area, location, shape, and the like of the transferred pattern.
    Type: Grant
    Filed: January 13, 1997
    Date of Patent: February 24, 1998
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura
  • Patent number: 5648695
    Abstract: A brush apparatus for a rotary electric machine has a brush with a pigtail, a brush holder and a spring. The brush holder is formed with a slit and a stopper piece. The pigtail is passed through the slit when the brush is inserted into the brush holder, and thereafter the stopper piece is bent to close an opening the slit. Thus, the brush apparatus simplifies an inserting operation of the brush to the brush holder and prevents the brush and the spring from coming off due to wear of the brush.
    Type: Grant
    Filed: May 22, 1995
    Date of Patent: July 15, 1997
    Assignee: Asmo Co., Ltd.
    Inventors: Mineo Yamaguchi, Keiji Hashimoto
  • Patent number: 5614335
    Abstract: The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmittance of a halftone phase shift layer is arbitrarily variable within the range of 1% to 50%, inclusive, by exposing the blank or photomask to a high temperature elevated to at least 150.degree. C., to an oxidizing atmosphere, or to a reducing atmosphere at a step that can provided independent of the steps for film-forming or photomask fabrication step. This enables the exposure light transmittance of the halftone phase shift layer to be changed to any desired value after blank or photomask fabrication, and so an optimal halftone phase shift photomask to be obtained depending on the size, area, location, shape, and the like of the transferred pattern.
    Type: Grant
    Filed: August 1, 1994
    Date of Patent: March 25, 1997
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura
  • Patent number: 5538816
    Abstract: A halftone phase shift photomask designed so that it is possible to shorten the photoengraving process, use a production line for a conventional photomask, prevent lowering of the contract between the transparent and semitransparent regions at a long wavelength in the visible region, which is used for inspection and measurement, and also prevent charge-up during electron beam exposure, and that ordinary physical cleaning process can be used for the halftone phase shift photomask. The halftone phase shift photomask has on a transparent substrate (1) a region which is semitransparent to exposure light and a region which is transparent to the exposure light so that the phase difference between light passing through the transparent region and light passing through the semitransparent region is substantially .pi. radians. A semitransparent film that constitutes the semitransparent region is arranged in the form of a multilayer film including layers (3, 4) of chromium or a chromium compound.
    Type: Grant
    Filed: April 11, 1994
    Date of Patent: July 23, 1996
    Assignees: Dai Nippon Printing Co., Ltd., Mitsubishi Electric Corporation
    Inventors: Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura
  • Patent number: 5419988
    Abstract: A phase shift photomask and a photomask blank used to produce the same. A dry etching stopper layer, which is disposed between a substrate and a light-shielding layer or between the substrate and a phase shifter layer, is made of either a film mainly composed of tin oxide nitride, which has high etching selectivity and high permeability, or an alumina film formed by sputtering, followed by heat treatment carried out in an oxidizing atmosphere, thereby enabling the required overetching to be satisfactorily performed during etching of the phase shifter layer, and thus making it possible to effect precise phase control. In addition, it is possible to eliminate the occurrence of an in-plane transmittance distribution.
    Type: Grant
    Filed: August 5, 1993
    Date of Patent: May 30, 1995
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hiroshi Mohri, Keiji Hashimoto, Masahiro Takahashi, Wataru Goto, Yukio Iimura
  • Patent number: D467292
    Type: Grant
    Filed: August 7, 2001
    Date of Patent: December 17, 2002
    Assignee: Mizuno Corporation
    Inventors: Mamoru Saraie, Keiji Hashimoto, Koji Kawase