Patents by Inventor Keiji Hashimoto
Keiji Hashimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090089989Abstract: A collector 12 which serves as a gas diffusion layer for a fuel cell; i.e., a metal lath MR, is formed by a method consisting of a first step and a second step. In the first step, while an upper blade UH is positioned at a first machining position along the width direction of a stainless steel sheet S, generally hexagonal through holes are formed in the stainless steel sheet S at two positions which are biased from each other by a machining pitch. In the second step, while the upper blade UH is positioned at a second machining position along the width direction of the stainless steel sheet S, generally hexagonal through holes are formed in the stainless steel sheet S at two positions which are biased from each other by the machining pitch. The first step and the second step are alternated repeatedly, thereby forming the metal lath MR having a uniform shape and a predetermined thickness.Type: ApplicationFiled: February 7, 2007Publication date: April 9, 2009Applicants: TOYOTA SHATAI KABUSHIKI KAISHA, TAMAGAWA HIGH TECH CO., LTD.Inventors: Keiji Hashimoto, Kazuhiko Kato
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Publication number: 20090075140Abstract: An MEA includes an electrolyte membrane permeable to hydroxide ions. A catalyst layer formed of a hydrogen storage alloy is provided on one surface of the membrane facing the anode electrode layer. Another catalyst layer formed of platinum-on carbon is provided on the opposite surface of the membrane facing the cathode electrode layer. The catalyst layer on the anode-electrode-layer side dissociates hydrogen gas into atomic hydrogen, diffuses the atomic hydrogen by way of solid phase diffusion, and absorbs/desorbs atomic hydrogen. The catalyst layer on the cathode-electrode-layer side forms hydroxide ions from air, humidifying water, and electrons. The membrane allows movement of the hydroxide ions to the catalyst layer on the anode-electrode-layer side. This leads to formation of water on the anode-electrode-layer side, whereby occurrence of dry-up can be prevented. Even when flooding arises from formed water, atomic hydrogen can smoothly move through solid-phase diffusion.Type: ApplicationFiled: July 20, 2006Publication date: March 19, 2009Applicant: TOYOTA SHATAI KABUSHIKI KAISHAInventors: Keiji Hashimoto, Eiichirou Morozumi, Michi Hashiba
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Patent number: 7341799Abstract: A separator 10 for a fuel cell is formed by bonding a first separator member 11 facing to an anode electrode AE and a second separator member 12 facing to a cathode electrode CE. A material for forming the first separator member 11 is a chrome alloy that has reduced elution of metal ion even under a power generating environment of the fuel cell, while a material for forming the second separator member is a nickel alloy that has a characteristic of being difficult to form a thick oxide coating layer on its surface. The separator 10 is manufactured in a low-cost and is capable of reducing a deterioration in performance of a fuel cell.Type: GrantFiled: July 31, 2003Date of Patent: March 11, 2008Assignee: Toyota Shatai Kabushiki KaishaInventors: Keiji Hashimoto, Yukihiro Suzuki
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Publication number: 20070007658Abstract: First wirings and first dummy wirings are formed in a p-SiOC film formed on a substrate. A p-SiOC film is formed, and a cap film is formed on the p-SiOC film. A dual damascene wiring, including vias connected to the first wirings and the second wirings, is formed in the cap film and the p-SiOC film 22. Dummy vias are formed on the periphery of isolated vias.Type: ApplicationFiled: September 18, 2006Publication date: January 11, 2007Applicants: RENESAS TECHNOLOGY CORP., MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.Inventors: Kazuo TOMITA, Keiji HASHIMOTO, Yasutaka NISHIOKA, Susumu MATSUMOTO, Mitsuru SEKIGUCHI, Akihisa IWASAKI
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Publication number: 20060163730Abstract: A first nitrogen-containing insulating film is formed under a low dielectric constant film, in which a via hole is formed, with a first nitrogen-non-containing insulating film interposed between the first nitrogen-containing insulating film and the low dielectric constant film. A second nitrogen-containing insulating film is formed over the low dielectric constant film with a second nitrogen-non-containing insulating film interposed therebetween.Type: ApplicationFiled: April 7, 2004Publication date: July 27, 2006Inventors: Susumu Matsumoto, Mitsuru Sekiguchi, Yasutaka Nishioka, Kazuo Tomita, Akihisa Iwasaki, Keiji Hashimoto
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Patent number: 6973639Abstract: The present invention provides automatic program generation technology that enables the generation of a diverse range of programs with fewer models. The automatic program generation device of the present invention, which automatically generates programs that will perform the predetermined processing, comprises a plurality of data structure resolution units that respectively include a model program for a corresponding data structure, wherein the model program includes resolution logic for performing a setting peculiar to the predetermined processing; and a resolution unit for generating a program for performing the predetermined processing by acquiring resolution information relating to the setting peculiar to the predetermined processing for resolution logic included in the model program in the data structure resolution unit corresponding to a selected data structure and by synthesizing the model program and the resolution information for the resolution logic.Type: GrantFiled: January 24, 2001Date of Patent: December 6, 2005Assignee: Fujitsu LimitedInventors: Keiji Hashimoto, Yuki Chujoh, Keisui Asai, Jun Ginbayashi, Hiroyuki Yoshida, Rieko Yamamoto, Emiko Hamamoto
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Publication number: 20050035457Abstract: First wirings and first dummy wirings are in a p-SiOC film on a substrate. A p-SiOC film is formed, and a cap film is formed on the p-SiOC film. A dual damascene wiring, including vias connected to the first wirings and the second wirings, is formed in the cap film and the p-SiOC film 22. Dummy vias are formed on the periphery of isolated vias.Type: ApplicationFiled: March 4, 2004Publication date: February 17, 2005Applicants: Renesas Technology Corp., Matsushita Electric Industrial Co., Ltd.Inventors: Kazuo Tomita, Keiji Hashimoto, Yasutaka Nishioka, Susumu Matsumoto, Mitsuru Sekiguchi, Akihisa Iwasaki
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Patent number: 6855446Abstract: A fuel cell composed of a plurality of cell function assemblies of each of which includes a set of spaced electrolytic membranes, two pairs of electrode plates in contact with opposite surfaces of each of the electrolytic membranes, a set of separators, and a set of six support frames assembled to retain the electrolytic membranes and separators in position. In the fuel cell, the separators each are in the form of a flat plate of synthetic resin integrally provided with a plurality of spaced projections made of pressed carbon powder and retained in contact with the electrode plates to form a pair of reaction chambers at opposite sides of each of the electrolytic membranes.Type: GrantFiled: December 17, 1999Date of Patent: February 15, 2005Assignee: Toyota Auto Body Co., Ltd.Inventors: Keiji Hashimoto, Masanao Shiomi, Hirotaka Fukatsu, Kousuke Kawajiri, Seiken Hashimoto, Hiroyuki Morita
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Patent number: 6737104Abstract: A manufacturing method of an anti-corrosive multi-layered structure material having an anti-corrosive non-metallic surface layer formed on a metallic substrate layer, wherein non-electrolytic plating of an anti-corrosive metal different in ionization property from the surface metal of the metallic substrate layer is carried out on the surface of the non-metallic surface layer so that the anti-corrosive metal is substituted for the surface metal of the metallic substrate layer through fine pores of the non-metallic surface layer and precipitated only in the fine pores of the non-metallic surface layer without causing useless precipitation of the anti-corrosive metal on the surface of the non-metallic surface layer.Type: GrantFiled: August 29, 2002Date of Patent: May 18, 2004Assignee: Araco Kabushiki KaishaInventors: Yukihiro Suzuki, Keiji Hashimoto, Yoshinari Minamihama
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Publication number: 20040028980Abstract: A separator 10 for a fuel cell is formed by bonding a first separator member 11 facing to an anode electrode AE and a second separator member 12 facing to a cathode electrode CE. A material for forming the first separator member 11 is a chrome alloy that has reduced elution of metal ion even under a power generating environment of the fuel cell, while a material for forming the second separator member is a nickel alloy that has a characteristic of being difficult to form a thick oxide coating layer on its surface. The separator 10 is manufactured in a low-cost and is capable of reducing a deterioration in performance of a fuel cell.Type: ApplicationFiled: July 31, 2003Publication date: February 12, 2004Inventors: Keiji Hashimoto, Yukihiro Suzuki
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Publication number: 20030044540Abstract: A manufacturing method of an anti-corrosive multi-layered structure material having an anti-corrosive non-metallic surface layer formed on a metallic substrate layer, wherein non-electrolytic plating of an anti-corrosive metal different in ionization property from the surface metal of the metallic substrate layer is carried out on the surface of the non-metallic surface layer so that the anti-corrosive metal is substituted for the surface metal of the metallic substrate layer through fine pores of the non-metallic surface layer and precipitated only in the fine pores of the non-metallic surface layer without causing useless precipitation of the anti-corrosive metal on the surface of the non-metallic surface layer.Type: ApplicationFiled: August 29, 2002Publication date: March 6, 2003Applicant: Araco Kabushiki KaishaInventors: Yukihiro Suzuki, Keiji Hashimoto, Yoshinari Minamihama
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Publication number: 20010044932Abstract: The present invention provides automatic program generation technology that enables the generation of a diverse range of programs with fewer models. The automatic program generation device of the present invention, which automatically generates programs that will perform the predetermined processing, comprises a plurality of data structure resolution units that respectively include a model program for a corresponding data structure, wherein the model program includes resolution logic for performing a setting peculiar to the predetermined processing; and a resolution unit for generating a program for performing the predetermined processing by acquiring resolution information relating to the setting peculiar to the predetermined processing for resolution logic included in the model program in the data structure resolution unit corresponding to a selected data structure and by synthesising the model program and the resolution information for the resolution logic.Type: ApplicationFiled: January 24, 2001Publication date: November 22, 2001Inventors: Keiji Hashimoto, Yuki Chujoh, Keisui Asai, Jun Ginbayashi, Hiroyuki Yoshida, Rieko Yamamoto, Emiko Hamamoto
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Patent number: 5745878Abstract: A business requirement handling apparatus is adapted to a data processing system which includes a central processing unit, a display unit and an input unit.Type: GrantFiled: April 10, 1995Date of Patent: April 28, 1998Assignee: Fujitsu LimitedInventors: Keiji Hashimoto, Yasuyuki Fujikawa, Akihiko Yoshioka, Jun Ginbayashi, Kazuo Yabuta, Yukio Imazu
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Patent number: 5721075Abstract: The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmittance of a halftone phase shift layer is arbitrarily variable within the range of 1% to 50%, inclusive, by exposing the blank or photomask to a high temperature elevated to at least 150.degree. C., to an oxidizing atmosphere, or to a reducing atmosphere at a step that can provided independent of the steps for film-forming or photomask fabrication step. This enables the exposure light transmittance of the halftone phase shift layer to be changed to any desired value after blank or photomask fabrication, and so an optimal halftone phase shift photomask to be obtained depending on the size, area, location, shape, and the like of the transferred pattern.Type: GrantFiled: January 13, 1997Date of Patent: February 24, 1998Assignee: Dai Nippon Printing Co., Ltd.Inventors: Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura
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Patent number: 5648695Abstract: A brush apparatus for a rotary electric machine has a brush with a pigtail, a brush holder and a spring. The brush holder is formed with a slit and a stopper piece. The pigtail is passed through the slit when the brush is inserted into the brush holder, and thereafter the stopper piece is bent to close an opening the slit. Thus, the brush apparatus simplifies an inserting operation of the brush to the brush holder and prevents the brush and the spring from coming off due to wear of the brush.Type: GrantFiled: May 22, 1995Date of Patent: July 15, 1997Assignee: Asmo Co., Ltd.Inventors: Mineo Yamaguchi, Keiji Hashimoto
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Patent number: 5614335Abstract: The invention relates a halftone phase shift photomask and a blank therefor, which enables the transmittance of a phase shift portion to be varied even after blank or photomask fabrication, can accommodate to a variety of patterns, and can be fabricated on a mass scale. The exposure light transmittance of a halftone phase shift layer is arbitrarily variable within the range of 1% to 50%, inclusive, by exposing the blank or photomask to a high temperature elevated to at least 150.degree. C., to an oxidizing atmosphere, or to a reducing atmosphere at a step that can provided independent of the steps for film-forming or photomask fabrication step. This enables the exposure light transmittance of the halftone phase shift layer to be changed to any desired value after blank or photomask fabrication, and so an optimal halftone phase shift photomask to be obtained depending on the size, area, location, shape, and the like of the transferred pattern.Type: GrantFiled: August 1, 1994Date of Patent: March 25, 1997Assignee: Dai Nippon Printing Co., Ltd.Inventors: Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura
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Patent number: 5538816Abstract: A halftone phase shift photomask designed so that it is possible to shorten the photoengraving process, use a production line for a conventional photomask, prevent lowering of the contract between the transparent and semitransparent regions at a long wavelength in the visible region, which is used for inspection and measurement, and also prevent charge-up during electron beam exposure, and that ordinary physical cleaning process can be used for the halftone phase shift photomask. The halftone phase shift photomask has on a transparent substrate (1) a region which is semitransparent to exposure light and a region which is transparent to the exposure light so that the phase difference between light passing through the transparent region and light passing through the semitransparent region is substantially .pi. radians. A semitransparent film that constitutes the semitransparent region is arranged in the form of a multilayer film including layers (3, 4) of chromium or a chromium compound.Type: GrantFiled: April 11, 1994Date of Patent: July 23, 1996Assignees: Dai Nippon Printing Co., Ltd., Mitsubishi Electric CorporationInventors: Keiji Hashimoto, Junji Fujikawa, Hiroshi Mohri, Masahiro Takahashi, Hiroyuki Miyashita, Yukio Iimura
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Patent number: 5419988Abstract: A phase shift photomask and a photomask blank used to produce the same. A dry etching stopper layer, which is disposed between a substrate and a light-shielding layer or between the substrate and a phase shifter layer, is made of either a film mainly composed of tin oxide nitride, which has high etching selectivity and high permeability, or an alumina film formed by sputtering, followed by heat treatment carried out in an oxidizing atmosphere, thereby enabling the required overetching to be satisfactorily performed during etching of the phase shifter layer, and thus making it possible to effect precise phase control. In addition, it is possible to eliminate the occurrence of an in-plane transmittance distribution.Type: GrantFiled: August 5, 1993Date of Patent: May 30, 1995Assignee: Dai Nippon Printing Co., Ltd.Inventors: Hiroshi Mohri, Keiji Hashimoto, Masahiro Takahashi, Wataru Goto, Yukio Iimura
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Patent number: D467292Type: GrantFiled: August 7, 2001Date of Patent: December 17, 2002Assignee: Mizuno CorporationInventors: Mamoru Saraie, Keiji Hashimoto, Koji Kawase