Patents by Inventor Keiji Matsumoto

Keiji Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ATTITUDE CHANGING APPARATUS, ALIGNING APPARATUS, ATTITUDE CHANGING METHOD AND ALIGNING METHOD
    Publication number: 20170011943
    Abstract: An attitude changing apparatus which can change an attitude of a component with certainty without damaging the component. The component has a rectangular parallelepiped shape where a pair of rectangular end surfaces opposite to each other are connected to each other by four side surfaces. The component is stored in a cavity which penetrates between main surfaces of a conveyance member, the conveyance member is moved relative to a base, and the component is made to pass through an engaging groove formed on a reference surface of the base.
    Type: Application
    Filed: September 21, 2016
    Publication date: January 12, 2017
    Applicant: MURATA MANUFACTURING CO., LTD.
    Inventors: Masatoshi HARADA, Atsushi KUDO, Keiji MATSUMOTO
  • CHIP MOUNTING STRUCTURE
    Publication number: 20170005053
    Abstract: Highly reliable chip mounting is accomplished by using a substrate having such a shape that a stress exerted on a flip-chip-connected chip can be reduced, so that the stress exerted on the chip is reduced and separation of an interlayer insulating layer having a low dielectric constant (low-k) is minimized. Specifically, in a chip mounting structure, a chip including an interlayer insulating layer having a low dielectric constant (low-k) is flip-chip connected to a substrate via bumps is shown. In the chip mounting structure, the substrate has such a shape that a mechanical stress exerted on the interlayer insulating layer at corner portions of the chip due to a thermal stress is reduced, the thermal stress occurring due to a difference in coefficient of thermal expansion between the chip and the substrate.
    Type: Application
    Filed: September 2, 2016
    Publication date: January 5, 2017
    Inventors: Akihiro HORIBE, Keiji MATSUMOTO, Keishi OKAMOTO, Kazushige TORIYAMA
  • Liquid ejecting apparatus
    Patent number: 9527301
    Abstract: A liquid ejecting apparatus comprises: a supply passage through which liquid is supplied from a liquid supply source to a liquid ejecting unit; a filter housing portion provided in the supply passage, a first filter being provided inside the filter housing portion; a circulation passage forming portion, one end of which is connected to a space portion located closer to the liquid supply source than the first filter is, the other end of which is connected on the supply passage to a position closer to the liquid supply source than the first filter is, thereby forming a circulation passage; a foreign object separation unit that works with a flow pump, which is a pump for circulation of the liquid through the circulation passage, to cause a foreign object to come off from the first filter; and a second filter that is detachably provided on the circulation passage.
    Type: Grant
    Filed: December 2, 2015
    Date of Patent: December 27, 2016
    Assignee: Seiko Epson Corporation
    Inventors: Shigenori Nakagawa, Keiji Matsumoto, Toshinobu Yamazaki, Masahiko Sato, Makoto Otsuki
  • GAS ENGINE
    Publication number: 20160369720
    Abstract: A gas engine is provided that suppresses fluctuation of the actual air-fuel ratio even when a load fluctuates. A gas engine (1) in which at least one opening degree (D) selected from the opening degree of an air supply valve (5a) and the opening degree of a bypass valve (5b) is corrected so that an adequate target air-fuel ratio (?t) is achieved. wherein a target gas pressure (Pgt) and a target gas-jetting time (Tt) of a fuel gas are calculated on the basis of fluctuations of an actual load (L), the gas pressure is corrected on the basis of the target gas pressure (Pgt), and at least one opening degree selected from the opening degree of the air supply valve and the opening degree of the bypass valve is corrected on the basis of the amounts of change in the target gas pressure (Pgt) and the target gas-jetting time.
    Type: Application
    Filed: January 15, 2015
    Publication date: December 22, 2016
    Applicants: YANMAR CO., LTD., JAPAN SHIP MACHINERY AND EQUIPMENT ASSOCIATION
    Inventors: Tatsuro OHSARA, Keiji MATSUMOTO, Osamu YAMAGISHI
  • SYSTEM AND APPARATUS FOR MONITORING AREAS
    Publication number: 20160370464
    Abstract: An area monitoring system is configured to include a monitoring apparatus and a reflector. The monitoring apparatus includes a time-based detecting unit (i.e., a first detecting unit) that detects an intruder at a scanning angle by measuring a distance to an object based on an elapsed time until reflected light is received, for a first detection area. The monitoring apparatus further includes a light reception amount-based detecting unit (i.e., a second detecting unit) that detects an intruder at a scanning angle by comparing an actual light reception amount at a timing at which reflected light is received when radiated laser light is reflected by a reflector, and a light reception threshold (i.e., a reference light reception amount) set in advance, with a second detection area set farther than the first detection area as an area subjected to detection.
    Type: Application
    Filed: June 15, 2016
    Publication date: December 22, 2016
    Applicants: DENSO WAVE INCORPORATED, DENSO CORPORATION
    Inventors: Shoji KATSURA, Tetsuya IWASAKI, Keiji MATSUMOTO
  • METHOD FOR MANUFACTURING LIQUID EJECTION HEAD
    Publication number: 20160347065
    Abstract: A method for manufacturing a liquid ejection head includes the steps of: preparing a substrate including an energy-generating element disposed on a first surface of the substrate and a supply path for liquid; disposing a dry film on the first surface of the substrate in such a manner that the dry film partially enters the supply path; etching the dry film from a side of the dry film facing the first surface of the substrate so that the dry film has an etched surface substantially in parallel with the first surface and covers the supply path; forming a resin layer to be a flow path member on the dry film covering the supply path; and removing the dry film covering the supply path.
    Type: Application
    Filed: May 25, 2016
    Publication date: December 1, 2016
    Inventors: Masahisa Watanabe, Jun Yamamuro, Kazuhiro Asai, Keiji Matsumoto, Koji Sasaki, Kunihito Uohashi, Ryotaro Murakami, Tomohiko Nakano, Keiji Edamatsu, Haruka Nakada, Kenji Fujii, Seiichiro Yaginuma
  • SUBSTRATE DEVICE AND ELECTRIC CIRCUIT ARRANGEMENT
    Publication number: 20160351485
    Abstract: An electronic circuit includes a substrate device which includes a first substrate section including a first plurality of layers attached to each other having a first orientation (x2) and a second substrate section including a second plurality of layers attached to each other. The second plurality of layers have a second orientation (x3). The first orientation (x2) and the second orientation (x3) are perpendicular with respect to one another.
    Type: Application
    Filed: June 24, 2016
    Publication date: December 1, 2016
    Inventors: Thomas J. Brunschwiler, Dominic Gschwend, Keiji Matsumoto, Stefano S. Oggioni, Gerd Schlottig, Timo J. Tick, Jonas Zuercher
  • OPERATING FLOOR CONFINEMENT AND NUCLEAR PLANT
    Publication number: 20160336081
    Abstract: An embodiment of an operating floor confinement has: an operating floor, a sidewall that surrounds the operating floor, a ceiling that is provided on an upper portion of the sidewall, a reactor well, a fuel pool, a dryer and separator pit, an equipment hatch that is provided on the sidewall, an air lock that is provided on the sidewall, and an isolation valve that is provided in a penetration. The operating floor confinement forms a pressure boundary having pressure resistance and a leakage protection function, is in contact with the containment vessel via a containment vessel head and separated from an equipment area of the reactor building, and has no blowout panel.
    Type: Application
    Filed: April 25, 2016
    Publication date: November 17, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Takashi SATO, Keiji MATSUMOTO, Keisuke TAGUCHI
  • LIQUID EJECTION HEAD AND METHOD OF MANUFACTURING THE SAME
    Publication number: 20160311222
    Abstract: A liquid ejection head includes a substrate having an energy generating element arranged therein and an ejection port forming member laid as superposed above the substrate. At least one ejection port is formed so as to run through the ejection port forming member. The ejection port forming member has a concave portion including the ejection port formed therein on the surface thereof opposite to the surface thereof facing the substrate, and has a convex portion on the surface of the ejection port forming member facing the substrate so as to correspond to the concave portion.
    Type: Application
    Filed: March 24, 2016
    Publication date: October 27, 2016
    Inventors: Koji Sasaki, Kenji Fujii, Jun Yamamuro, Kazuhiro Asai, Seiichiro Yaginuma, Keiji Matsumoto, Kunihito Uohashi, Masahisa Watanabe, Tomohiko Nakano, Keiji Edamatsu, Haruka Nakada
  • Forming a liquid ejection head with through holes and a depression
    Patent number: 9472639
    Abstract: A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a plurality of substrates of the liquid ejection head from the silicon wafer by dividing the silicon wafer on the basis of through holes.
    Type: Grant
    Filed: July 18, 2013
    Date of Patent: October 18, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroyuki Shimoyama, Taichi Yonemoto, Shuji Koyama, Masaki Ohsumi, Keiji Matsumoto, Seiichiro Yaginuma
  • PROCESS FOR PRODUCING LIQUID DISCHARGE HEAD
    Publication number: 20160271949
    Abstract: A process for producing a liquid discharge head including a substrate having a liquid supply path passing through from its first surface to second surface and an discharge port forming member having a discharge port communicating with the supply path through a flow path, the process including providing a first layer of photosensitive resin in a region covering an opening of the supply path in the first surface; forming a latent image of a pattern of the flow path in the first layer by exposure; providing a second layer of negative photosensitive resin on the first layer; curing a portion, opposing to the opening of the supply path in the first surface, of the second layer; forming a latent image of a pattern of the discharge port in the second layer by exposure; and developing latent images of patterns of the flow path and discharge port.
    Type: Application
    Filed: February 16, 2016
    Publication date: September 22, 2016
    Inventors: Jun Yamamuro, Kazuhiro Asai, Keiji Matsumoto, Koji Sasaki, Masahisa Watanabe, Kunihito Uohashi, Seiichiro Yaginuma, Ryotaro Murakami, Kenji Fujii
  • Substrate device and electric circuit arrangement having first substrate section perpendicular to second substrate section
    Patent number: 9433077
    Abstract: A substrate device for electronic circuits or devices includes a first substrate section including a first plurality of layers attached to each other having a first orientation (x2) and a second substrate section including a second plurality of layers attached to each other. The second plurality of layers have a second orientation (x3). The first orientation (x2) and the second orientation (x3) are angled (?) with respect to one another.
    Type: Grant
    Filed: January 19, 2015
    Date of Patent: August 30, 2016
    Assignee: International Business Machines Corporation
    Inventors: Thomas J. Brunschwiler, Dominic Gschwend, Keiji Matsumoto, Stefano S. Oggioni, Gerd Schlottig, Timo J. Tick, Jonas Zuercher
  • Process for producing liquid ejection head
    Patent number: 9421773
    Abstract: The invention provides a process for producing a liquid ejection head having an ejection orifice forming member in which an ejection orifice for ejecting a liquid has been formed, and a substrate having an energy-generating element for generating energy for ejecting a liquid from the ejection orifice on the side of a front surface thereof, the process includes the steps of providing a film having a support, a first layer and a second layer in this order, arranging the film on the substrate in such a manner that the second layer faces the front surface, detaching the support from the film arranged, forming the ejection orifice in the second layer, and removing at least a part of the first layer from the second layer.
    Type: Grant
    Filed: August 1, 2013
    Date of Patent: August 23, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kazuhiro Asai, Keiji Matsumoto, Kunihito Uohashi, Shuji Koyama
  • HIGH MOLECULAR WEIGHT PHA-PRODUCING MICROBE AND METHOD OF PRODUCING HIGH MOLECULAR WEIGHT PHA USING SAME
    Publication number: 20160237462
    Abstract: An object of the present invention is to provide a microorganism strain that accumulates a high molecular weight PHA, and a PHA production method using the microorganism. The present invention provides a method for producing a PHA copolymer, which includes culturing a microorganism, wherein at least a portion of either of the following genes (a) and (b) of the microorganism has been altered by substitution, deletion, insertion, and/or addition to reduce or eliminate the activity of a PHA degrading enzyme encoded by the gene: (a) a PHA degrading enzyme gene encoding the amino acid sequence of SEQ ID NO:2 in the sequence listing; and (b) a gene encoding a polypeptide having at least 85% sequence identity to the amino acid sequence of SEQ ID NO:2 in the sequence listing and having PHA degrading enzyme activity.
    Type: Application
    Filed: October 22, 2013
    Publication date: August 18, 2016
    Applicant: KANEKA CORPORATION
    Inventors: Hisashi ARIKAWA, Shunsuke SATO, Keiji MATSUMOTO
  • Maintenance unit and liquid ejecting apparatus
    Patent number: 9409398
    Abstract: Provided is a maintenance unit that is detachably attached to a liquid ejecting apparatus including a liquid ejecting section for ejecting liquid, the maintenance unit including: a maintenance section that is used for maintenance of the liquid ejecting section; and a recording target section in which information related to the maintenance section is recorded by the liquid that is ejected by the liquid ejecting section in a visibly recognizable manner.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: August 9, 2016
    Assignee: Seiko Epson Corporation
    Inventors: Shigenori Nakagawa, Keiji Matsumoto, Toshinobu Yamazaki, Masahiko Sato
  • REDUCTION OF WARPAGE OF MULTILAYERED SUBSTRATE OR PACKAGE
    Publication number: 20160217247
    Abstract: A method that minimizes adjustment of a wiring layer in reducing a warpage of a multilayered substrate and enables location of a part of a wiring layer that needs correction in order to reduce the warpage. The difference in average coefficient of thermal expansion, ??, varies in a substrate. The method focuses in on the difference in ?? with a great length scale (low frequency) having a relatively significant effect on the warpage compared to the difference in ?? with a smaller length scale (high frequency) and corrects only the difference in ?? with a greater length scale. The distribution of the difference in ?? in a plane of substrate is determined. Then digital filtering is performed to extract only the difference in ?? with a low frequency and the difference in ?? between before and after correction, thereby revealing a part that requires correction.
    Type: Application
    Filed: March 31, 2016
    Publication date: July 28, 2016
    Inventors: Sayuri Hada, Keiji Matsumoto
  • Liquid ejecting apparatus
    Patent number: 9393791
    Abstract: A liquid ejecting apparatus includes a liquid ejecting unit that has a plurality of nozzles that eject liquid drops, and performs a recording process on a recording medium; and an abnormal ejection detecting unit that detects whether abnormal ejection in the nozzles exists, in which when the abnormal ejection detecting unit detects that nozzles with abnormal ejection exist, if a time required for a maintenance operation in order to solve the abnormal ejection of the nozzles is equal to or shorter than a threshold value, the recording process is interrupted and the maintenance operation is performed, and if the time required for the maintenance operation is longer than the threshold value, the maintenance operation is reserved and the recording process is continued.
    Type: Grant
    Filed: January 7, 2015
    Date of Patent: July 19, 2016
    Assignee: Seiko Epson Corporation
    Inventors: Keiji Matsumoto, Hitotoshi Kimura, Takayuki Kawakami
  • Reduction of warpage of multilayered substrate or package
    Patent number: 9384314
    Abstract: A method that minimizes adjustment of a wiring layer in reducing a warpage of a multilayered substrate and enables location of a part of a wiring layer that needs correction in order to reduce the warpage. The difference in average coefficient of thermal expansion, ??, varies in a substrate. The method focuses in on the difference in ?? with a great length scale (low frequency) having a relatively significant effect on the warpage compared to the difference in ?? with a smaller length scale (high frequency) and corrects only the difference in ?? with a greater length scale. The distribution of the difference in ?? in a plane of substrate is determined. Then digital filtering is performed to extract only the difference in ?? with a low frequency and the difference in ?? between before and after correction, thereby revealing a part that requires correction.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: July 5, 2016
    Assignee: International Business Machines Corporation
    Inventors: Sayuri Hada, Keiji Matsumoto
  • LIQUID EJECTING APPARATUS
    Publication number: 20160167390
    Abstract: A liquid ejecting apparatus comprises: a supply passage through which liquid is supplied from a liquid supply source to a liquid ejecting unit; a filter housing portion provided in the supply passage, a first filter being provided inside the filter housing portion; a circulation passage forming portion, one end of which is connected to a space portion located closer to the liquid supply source than the first filter is, the other end of which is connected on the supply passage to a position closer to the liquid supply source than the first filter is, thereby forming a circulation passage; a foreign object separation unit that works with a flow pump, which is a pump for circulation of the liquid through the circulation passage, to cause a foreign object to come off from the first filter; and a second filter that is detachably provided on the circulation passage.
    Type: Application
    Filed: December 2, 2015
    Publication date: June 16, 2016
    Inventors: Shigenori NAKAGAWA, Keiji MATSUMOTO, Toshinobu YAMAZAKI, Masahiko SATO, Makoto OTSUKI
  • Liquid Ejecting Apparatus
    Publication number: 20160167364
    Abstract: A liquid ejecting apparatus includes: a liquid ejecting unit that ejects a liquid supplied through a liquid supply path from a nozzle; a maintenance unit that performs a maintenance operation of the liquid ejecting unit; and an ejection state detecting unit that is able to detect a state inside a pressure chamber communicating with the nozzle. The ejection state detecting unit detects a state inside the pressure chamber before the maintenance operation and at least one state inside the pressure chamber during the maintenance operation or after the maintenance operation, and is able to determine malfunction of at least one of the maintenance unit and function units arranged in the liquid supply path based on a change in a state inside the pressure chamber due to the maintenance operation.
    Type: Application
    Filed: December 7, 2015
    Publication date: June 16, 2016
    Inventors: Keiji Matsumoto, Shigenori Nakagawa, Masahiko Sato, Toshinobu Yamazaki, Toshiyuki Suzuki, Takeshi Yoshida