Abstract: Certain aspects of a method and system for RC-CR quadrature generation with wideband coverage and process compensation may include determining an amplitude mismatch between an in-phase (I) component and a quadrature (Q) component of a signal generated in a radio frequency (RF) transmitter or receiver. A variation in resistance of a quadrature network associated with the I component and Q component may be determined. The determined amplitude mismatch and the determined variation in the resistance of the quadrature network may be compensated by adjusting a resistance of a portion of the quadrature network associated with the I component and a resistance of a portion of the quadrature network associated with the Q component.

Abstract: An apparatus and method to use a single voltage controlled oscillator (VCO) to generate frequencies to cover multiple frequency bands. The single VCO generates local oscillator signals for more than one frequency band of a communication standard or protocol, such as the IEEE 802.11 standard.

Abstract: A Radio Frequency (RF) structure services an antenna having a characteristic impedance and includes a differential Power Amplifier (PA), a differential Low Noise Amplifier (LNA), and a balun transformer. The differential PA has a differential PA output with a PA differential output impedance. The differential LNA has a differential LNA input with an LNA differential input impedance. The balun transformer has a singled ended winding coupled to the antenna, a differential winding having a first pair of tap connections coupled to the differential PA output and a second pair of tap connections coupled to the differential LNA input, and a turns ratio of the single ended winding and the differential winding. The turns ratio and the first pair of tap connections impedance match the PA differential output impedance to the characteristic impedance of the antenna. The turns ratio and the second pair of tap connections impedance match the LNA differential input impedance to the characteristic impedance of the antenna.

Abstract: A Radio Frequency (RF) structure services an antenna having a characteristic impedance and includes a differential Power Amplifier (PA), a differential Low Noise Amplifier (LNA), and a balun transformer. The differential PA has a differential PA output with a PA differential output impedance. The differential LNA has a differential LNA input with an LNA differential input impedance. The balun transformer has a singled ended winding coupled to the antenna, a differential winding having a first pair of tap connections coupled to the differential PA output and a second pair of tap connections coupled to the differential LNA input, and a turns ratio of the single ended winding and the differential winding. The turns ratio and the first pair of tap connections impedance match the PA differential output impedance to the characteristic impedance of the antenna. The turns ratio and the second pair of tap connections impedance match the LNA differential input impedance to the characteristic impedance of the antenna.

Abstract: A fuse block which provides for holding a plurality of fuses in parallel in order to reduce fuse block size and to maximize the surface area of electrical contact in order to reduce electrical resistance in the electrical contact. The block holds the fuse electrical contacts clamped in trapezoidal cavities in terminals. A fuse block, comprising a first multi-fuse coupler to electrically and mechanically couple with one first electrical contact of each of a plurality of fuses, in a first single tightening operation; a second multi-fuse coupler to electrically and mechanically couple with one second electrical contact of each of such plurality of fuses, in a second single tightening operation; and a base sized, shaped, and arranged to maintain said a first multi-fuse coupler and said a second multi-fuse coupler in opposing, aligned, and spaced-apart relationship.

Abstract: A Radio Frequency (RF) transceiver Integrated Circuit (IC) includes a plurality -of RF transceivers, local oscillation generation circuitry that produces a local oscillation, and local oscillation distribution circuitry. The local oscillation distribution circuitry couples to the local oscillation generation circuitry and includes a plurality of local oscillation repeater circuits. Each local oscillation repeater circuit corresponds to a respective one of the plurality of RF transceivers (transmitter, receiver, or both) Each local oscillation repeater circuit includes a local oscillation repeater circuit input, a local oscillation repeater circuit interface driver output coupled to respective one of the plurality of RF transceivers, and a local oscillation repeater circuit output.

Abstract: A Radio Frequency (RF) structure services an antenna having a characteristic impedance and includes a differential Power Amplifier (PA), a differential Low Noise Amplifier (LNA), and a balun transformer. The differential PA has a differential PA output with a PA differential output impedance. The differential LNA has a differential LNA input with an LNA differential input impedance. The balun transformer has a singled ended winding coupled to the antenna, a differential winding having a first pair of tap connections coupled to the differential PA output and a second pair of tap connections coupled to the differential LNA input, and a turns ratio of the single ended winding and the differential winding. The turns ratio and the first pair of tap connections impedance match the PA differential output impedance to the characteristic impedance of the antenna. The turns ratio and the second pair of tap connections impedance match the LNA differential input impedance to the characteristic impedance of the antenna.

Abstract: A current mirror with selectable filter poles provides a selected low pass filtering function to a DC bias signal generated by the current mirror. Coupled between a first MOSFET and second MOSFET of the current mirror, a low pass filter with selectable filter poles comprises a plurality of resistor-configured MOSFETs coupled to at least one capacitor-configured MOSFET to provide one of a fast settle time and improved filtering for the current mirror in one embodiment of the invention. A first resistor-configured MOSFETs, biased by logic and bias circuitry, provides a low frequency filter pole that provides an improved filtering for the current mirror. A second resistor-configured MOSFET provides a high frequency filter pole that provides a fast charge time to meet a settle time requirement.

Abstract: A stake cover has been designed that consists of fabric that fits over the stake, with a slitted side opening that permits the rope to be secured to the stake while the covering is in place, and one or more VELCRO™ type fasteners to secure the stake covering to the stake without interference from the rope. In one embodiment, the stake covering is made of a reflective or fluorescent material, or incorporates a reflector, battery operated lights or flag(s) to further increase visibility. In another embodiment, the stake covering includes padding to further prevent injury in the event an individual trips over the covering. In one embodiment, the stake covering is formed of a waterproof, lightweight material that flattens for easy storage. A padded extender may also be used with the padded stake cover.

Abstract: The present invention relates to compositions for the chemical mechanical planarization (“CMP”) of barrier/adhesion layers, particularly Ta/TaN barrier/adhesion layers as occur in the manufacture of integrated circuits. CMP compositions comprise an aqueous solution of oxidizer and colloidal silica abrasive. Oxidizers include hydroxylamine nitrate, nitric acid, benzotriazole, ammonium nitrate, aluminum nitrate, hydrazine and mixtures thereof in aqueous solution.

Abstract: An apparatus and method to use a single voltage controlled oscillator (VCO) to generate frequencies to cover multiple frequency bands. The single VCO generates local oscillator signals for more than one frequency band of a communication standard or protocol, such as the IEEE 802.11 standard.

Abstract: A method for temperature compensation of transmit power of a wireless communication device begins by measuring transmit power of the wireless communication device at a first temperature-based biasing condition to produce a first measured transmit power. The method continues by measuring transmit power of the wireless communication device at a second temperature-based biasing condition to produce a second measured transmit power. The method continues by determining ambient temperature of at least a portion of the wireless communication device based on the first and second measured transmit powers and a relationship between the first and second temperature-based biasing conditions. The method continues by compensating transmit power level of the wireless communication device based on the ambient temperature.

Abstract: A current mirror with selectable filter poles provides a selected low pass filtering function to a DC bias signal generated by the current mirror. Coupled between a first MOSFET and second MOSFET of the current mirror, a low pass filter with selectable filter poles comprises a plurality of resistor-configured MOSFETs coupled to at least one capacitor-configured MOSFET to provide one of a fast settle time and improved filtering for the current mirror in one embodiment of the invention. A first resistor-configured MOSFETs, biased by logic and bias circuitry, provides a low frequency filter pole that provides an improved filtering for the current mirror. A second resistor-configured MOSFET provides a high frequency filter pole that provides a fast charge time to meet a settle time requirement.

Abstract: The present invention relates chemical mechanical planarization (“CMP”) of copper surfaces and describes copper CMP slurries including an oxidizer, one or more hydroxylamine compounds and at least one abrasive. The hydroxylamine compositions can include hydroxylamine nitrate, hydroxylamine, hydroxylamine sulfate, hydroxyl ammonium salts and mixtures thereof. The oxidizers may further include citric acid as a complexing agent for copper. Sulfuric acid and/or nitric acid provide means for modifying the pH of the oxidizer so that the hydroxylamine chemistries are acidic. Some embodiments include corrosion inhibitors such as benzotriazole, 2,4-pentadione dioxime and/or 1,6-dioxaspiro[4,4] nonane 2,7-dione. Some embodiments also include a free radical inhibitor, advantageously hydrazine. Colloidal silica and milled alumina are used as typical abrasive components.

Abstract: The present invention relates to compositions for the chemical mechanical planarization (“CMP”) of barrier/adhesion layers, particularly Ta/TaN barrier/adhesion layers as occur in the manufacture of integrated circuits. CMP compositions comprise an aqueous solution of oxidizer and colloidal silica abrasive. Oxidizers include hydroxylamine nitrate, nitric acid, benzotriazole, ammonium nitrate, aluminum nitrate, hydrazine and mixtures thereof in aqueous solution.

Abstract: The present invention relates chemical mechanical planarization (“CMP”) of copper surfaces and describes copper CMP slurries including an oxidizer, one or more hydroxylamine compounds and at least one abrasive. The hydroxylamine compositions can include hydroxylamine nitrate, hydroxylamine, hydroxylamine sulfate, hydroxyl ammonium salts and mixtures thereof. The oxidizers may further include citric acid as a complexing agent for copper. Sulfuric acid and/or nitric acid provide means for modifying the pH of the oxidizer so that the hydroxylamine chemistries are acidic. Some embodiments include corrosion inhibitors such as benzotriazole, 2,4-pentadione dioxime and/or 1,6-dioxaspiro[4,4]nonane 2,7-dione. Some embodiments also include a free radical inhibitor, advantageously hydrazine. Colloidal silica and milled alumina are used as typical abrasive components.

Abstract: The present invention relates to compositions for the chemical mechanical planarization (“CMP”) of barrier/adhesion layers, particularly Ta/TaN barrier/adhesion layers as occur in the manufacture of integrated circuits. CMP compositions comprise an aqueous solution of oxidizer and colloidal silica abrasive. Oxidizers include hydroxylamine nitrate, nitric acid, benzotriazole, ammonium nitrate, aluminum nitrate, hydrazine and mixtures thereof in aqueous solution.

Abstract: An imaging device is configured to translate text in an imaging job (e.g., a print job) from one language to another. The imaging job is received from an input device and can be processed upon receipt or stored on the imaging device for later processing. A variable data language translation module distinguishes textual data from graphical data within the imaging job and performs language translation only on the textual data. Performing language translation at the imaging device rather than at the input device permits the shared use of the language translation module between multiple users who already share the imaging device and reduces the need for language translation imaging software on individual personal computers.

Abstract: A battery for supplying power to an automotive electrical system. In accordance with one aspect of the invention, the battery includes a first terminal and second terminal connected across at least one power cell configured to generate an electrical potential between the first and second terminals. The battery, however, further includes a first electrical distribution block being electrically connected directly with the first battery terminal, and thus is at the same electrical potential. Similarly, the battery includes a second electrical distribution block that is electrically isolated from the second terminal. In accordance with the preferred embodiment, the second distribution block is electrically connected to the second battery terminal via a protection fuse. Typically, the protection fuse will range from 60 amperes to 300 amperes in its rating value.

Abstract: Measured sample quantities of sulfureous matter are introduced into a sealed chamber where the samples are pyrolyzed to form sulfur dioxide and sulfur trioxide gases and to oxidize organic substances to form carbon dioxide gas. The gases are then passed through a free sulfur-absorbing packing and into a scrubbing zone wherein transition metal amine complex is used to remove sulfureous compounds without reaction with the carbon dioxide gas. The scrubbed gases are then analyzed to determine the carbon dioxide content thereof.