Patents by Inventor Keith Frank

Keith Frank has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090128792
    Abstract: A method is disclosed that includes introducing a substrate into a pre-aligner of a lithographic apparatus, using a detector to measure the location of an alignment mark provided on a side of the substrate which is opposite to the location of the detector, and after measurement, putting the substrate onto a substrate table of the lithographic apparatus, the substrate being positioned on the substrate table such that the alignment mark provided on the opposite side of the substrate is visible through a window of the substrate table.
    Type: Application
    Filed: October 9, 2008
    Publication date: May 21, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rudy Jan, Maria Pellens, Keith Frank Best, Richard Joseph Travers, Frederick William Hafner, Vinyu Greenlee
  • Patent number: 7516558
    Abstract: A spacer providing a substantially uniform space between adjacent tiles includes spacer legs extending radially from a common junction. The spacer legs, made from a porous material, are permanently adherable to a tile bonding material utilized to adhere the tiles to an underlying surface, and/or a grout material filling a gap between tiles. A process for making a tile spacer includes providing thinset material to which a liquid latex admix material is added. The materials are distributed evenly to a consistency of a damp fluffy sand-like mixture which is then placed into a mold of a desired shape and packed into the mold to bond the materials while still damp to form the tile spacer. The spacer is extracted from the mold and placed on a flat rigid sheet. The spacer is moist cured and dried at room temperature environment with 40-99% humidity.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: April 14, 2009
    Inventors: Keith Frank, Scott Gerling
  • Patent number: 7501215
    Abstract: The present invention relates to a device manufacturing method wherein a plurality of front side marks are manufactured on the front side of the substrate. These marks are used to locally align the substrate when exposing. After certain processing steps, the positions of the front side marks are measured and compared with respect to their original positions. The measured position changes of the front side marks, i.e. their behaviour, can then be analyzed. The original positions and actual positions are defined with respect to a nominal grid which is defined using global alignment marks which are positioned at the back side of the substrate. Because the global alignment marks are positioned at the back side, they are not affected by any processing step.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: March 10, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Joseph J. Consolini, Alexander Friz
  • Patent number: 7494828
    Abstract: A second substrate, e.g. a III/V compound semiconductor, is placed on a first substrate, e.g. a wafer, in the vicinity of placement marks on the first substrate. The second substrate is exposed to patterned radiation, e.g. for the manufacture of integrated circuits.
    Type: Grant
    Filed: August 3, 2005
    Date of Patent: February 24, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Johannes Wilhelmus Maria Krikhaar, Rudy Jan Maria Pellens
  • Patent number: 7442476
    Abstract: A substrate bonding system has a first and a second substrate table for holding a first substrate and a second substrate, respectively, and a controller. The first substrate includes a first device having first contact pads and the second substrate a second device having second contact pads. The wafer bonding system is arranged to bond the first and second device in such a way that a circuit may be formed by the first and second device. The first and second substrate tables each include a position sensor arranged to measure an optical signal generated on an alignment marker of the first and second substrate, respectively. The first and second substrate tables include a first and second actuator respectively that is arranged to alter a position and orientation of the respective substrate table.
    Type: Grant
    Filed: December 27, 2004
    Date of Patent: October 28, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Joseph J. Consolini
  • Publication number: 20080249173
    Abstract: A method is provided for treating a patient suffering from apoptosis of tissue comprising administering to that subject a therapeutically effective amount of one or more ketogenic compounds such that a physiological ketosis is produced sufficient to arrest said apoptosis. Preferably the apoptosis is of cerebral tissue such as that associated with acute intractible seizures, particularly with status epilepticus. The method is also applicable to apoptosis associated with administration of topic stuimuli for treatment of cancer, that produced by viral infections, autoimmune diseases or Aquired Immuno Defficiency Syndrome. The ketosis produced is a state in which levels of one or both of acetoacetate and (R)-3-hydroxybutyrate concentrations in the mood of the subject such that their total concentration in the blood is elevated above the normal fed levels to between 0.1 and 30 mM.
    Type: Application
    Filed: May 4, 2005
    Publication date: October 9, 2008
    Inventors: Keith Frank Martin, David John Heal, Elizabeth Jagger
  • Patent number: 7410880
    Abstract: In a method for measuring the bonding quality of bonded substrates, such as bonded SOI wafers, a plurality of marks are created at a first side of a top substrate after, or before, the bonding of the top substrate onto a bottom substrate. Then, the positions of the plurality of marks are measured using a metrology tool. Next, for each of the marks, a difference between a measured position and an expected position is calculated. These differences can be used to determine delamination between the top substrate and the bottom substrate. By displaying a vector field representing the differences, and by not showing vectors that exceed a certain threshold, the delamination areas can be made visible.
    Type: Grant
    Filed: December 27, 2004
    Date of Patent: August 12, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Joseph J. Consolini, Alexander Friz
  • Publication number: 20080117402
    Abstract: In an embodiment, a ring seal forming apparatus is disclosed, the apparatus including a substrate holder arranged to hold a substrate coated at least in part with resist, and a heating device configured to heat an area of the resist, relative movement between the substrate holder and heating device being possible, the movement being arranged such that, in use of the apparatus, the area of resist heated by the heating device is ring-shaped.
    Type: Application
    Filed: December 21, 2006
    Publication date: May 22, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Keith Frank Best, Cheng-Qun Gui, David Christopher Ockwell, Peter Ten Berge
  • Publication number: 20080085462
    Abstract: A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 10, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Keith Frank Best, Enno Van Den Brink, Cheng-Qun Gui, Budiman Sutedja, Peter Ten Berge
  • Publication number: 20080083818
    Abstract: A method of measuring bonding quality of a bonded substrate having an upper substrate on top of a lower substrate, the method comprising etching one or more windows in the upper substrate such that overlay measurement alignment marks on the upper substrate may be seen by a measurement system and overlay measurement alignment marks on the lower substrate may be seen by the measurement system, using the measurement system to measure the positions of the overlay measurement alignment marks, determining the distance between corresponding overlay measurement alignment marks on the upper and lower substrates, and adjusting the determined distance to take into account an offset between the overlay measurement alignment marks on the upper substrate and the overlay measurement alignment marks on the lower substrate.
    Type: Application
    Filed: October 6, 2006
    Publication date: April 10, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Cheng-Qun Gui, Budiman Sutedja, Wilhelmus Johannes Maria De Laat
  • Patent number: 7320847
    Abstract: A device manufacturing method capable of imaging structures on one side of a substrate aligned to markers on the other side, is presented herein. One embodiment of the present invention comprises providing a first substrate having first and second surfaces, patterning the first surface of the substrate with at least one reversed alignment marker, providing a protective layer over the alignment marker, and bonding the first surface of the first substrate to a second substrate. The embodiment further includes locally etching the first substrate as far as the protective layer to form a trench around the reversed alignment marker, and forming at least one patterned layer on the second surface using a lithographic projection apparatus having a front-to-backside alignment system while aligning the substrate to the alignment markers revealed in each trench.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: January 22, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Joseph J. Consolini, Alexander Friz
  • Publication number: 20070011898
    Abstract: A spacer providing a substantially uniform space between adjacent tiles includes spacer legs extending radially from a common junction. The spacer legs, made from a porous material, are permanently adherable to a tile bonding material utilized to adhere the tiles to an underlying surface, and/or a grout material filling a gap between tiles. A process for making a tile spacer includes providing thinset material to which a liquid latex admix material is added. The materials are distributed evenly to a consistency of a damp fluffy sand-like mixture which is then placed into a mold of a desired shape and packed into the mold to bond the materials while still damp to form the tile spacer. The spacer is extracted from the mold and placed on a flat rigid sheet. The spacer is moist cured and dried at room temperature environment with 40-99% humidity.
    Type: Application
    Filed: July 11, 2006
    Publication date: January 18, 2007
    Inventors: Keith Frank, Scott Gerling
  • Patent number: 7133117
    Abstract: A device manufacturing method capable of imaging structures on both sides of a substrate, is presented herein. One embodiment of the present invention comprises a device manufacturing method that etches reversed alignment markers on a first side of a substrate to a depth of 10 ?m, the substrate is flipped over, and bonded to a carrier wafer and then lapped or ground to a thickness of 10 ?m to reveal the reversed alignment markers as normal alignment markers. The reversed alignment markers may comprise normal alignment patterns overlaid with mirror imaged alignment patterns.
    Type: Grant
    Filed: November 24, 2004
    Date of Patent: November 7, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Joseph J. Consolini, Shyam Shinde
  • Patent number: 7130049
    Abstract: In a method of measurement according to one embodiment of the invention, a relative position of a temporary alignment mark on one side of a substrate and an alignment mark on the other side of the substrate is determined, and the temporary alignment mark is removed. Before removal of the temporary alignment mark, a relative position of that mark and another mark on the same side of the substrate may be determined. The temporary alignment mark may be formed in, e.g., an oxide layer.
    Type: Grant
    Filed: December 24, 2003
    Date of Patent: October 31, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Joseph J. Consolini, Keith Frank Best, Alexander Friz
  • Patent number: 7113258
    Abstract: A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system. The lithographic projection apparatus is further provided with immersion system for providing a fluid between the lens and the substrate.
    Type: Grant
    Filed: September 14, 2004
    Date of Patent: September 26, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Henricus Wilhelmus Maria Van Buel, Keith Frank Best, Joseph J. Consolini, Joeri Lof, Edwin Ross Shafer
  • Patent number: 7045116
    Abstract: This invention relates to medical uses of radiopharmaceuticals. Specifically, the present invention relates to the use of radiopharmaceuticals to treat osteomyelitis. The present invention provides improved system and methods of for the direct delivery of radiopharmaceuticals to the site of osteomyelitis.
    Type: Grant
    Filed: December 11, 2002
    Date of Patent: May 16, 2006
    Assignee: Dow Global Technologies Inc.
    Inventors: Dana W. Simon, Alan D. Strickland, Jaime Simon, Daniel J. Macey, R. Keith Frank, Kenneth McMillan
  • Patent number: 7041996
    Abstract: While the alignment beam is focused on a mark on the substrate table, the substrate table is moved substantially perpendicularly to the alignment beam. If the image of the mark moves relative to a reference mark, then the substrate and the alignment beam are not perpendicular. The mark on the substrate table is aligned to a plurality of reference marks. At least two substrate marks are then aligned with a single reference mark. Errors due to the inclination of the alignment beam are eliminated from the expansion and rotation values calculated for the substrate.
    Type: Grant
    Filed: September 11, 2003
    Date of Patent: May 9, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Joseph Consolini, Alexander Friz, Henricus Wilhelmus Maria Van Buel
  • Patent number: 7019814
    Abstract: A method according to one embodiment of the invention may be used in determining relative positions of developed patterns on a substrate (exposed e.g. using the step mode). Such a method uses reference marks which are located within or even superimposed on device patterns. Also disclosed is a mask of a lithographic projection apparatus including reference marks that may be used in such a method.
    Type: Grant
    Filed: December 19, 2003
    Date of Patent: March 28, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Joseph J. Consolini, Alexander Friz
  • Patent number: 6914664
    Abstract: To align between layers having a large Z separation, an alignment system which illuminates reference markers with normally incident radiation is used. The alignment system has an illumination system that is telecentric on the substrate side.
    Type: Grant
    Filed: February 13, 2003
    Date of Patent: July 5, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Keith Frank Best, Alexander Friz, Joseph J. Consolini, Henricus Wilhelmus Maria Van Buel, Cheng-Qun Gui
  • Patent number: 6861044
    Abstract: The present invention concerns the use of a radioiodinated phenolic compound of the formula wherein: m and n are independently 0, 1, 2 or 3, X is a group that is negatively or positively charged at physiological pH, R, R1, R2 and R3 are independently hydrogen, C1-C4 alkyl, or a carboxyl group, and I* is 123I, 131I or 125I, and its pharmaceutically-acceptable salts. The compound is formulated and used in vivo in an animal in brachytherapy in an implantable catheter. In addition, due to the rapid renal clearance of these compounds, they may be used to study renal function. A process to prepare these compounds is also disclosed.
    Type: Grant
    Filed: December 18, 2001
    Date of Patent: March 1, 2005
    Assignee: The Dow Chemical Company
    Inventors: Jaime Simon, R. Keith Frank, Alan D. Strickland