Abstract: An imprint apparatus cures an imprint material by irradiating the imprint material with light while the imprint material on a substrate is in contact with a pattern region of a mold. The imprint apparatus includes a first supply unit configured to supply a first gas to a gap between the substrate and the mold, the first gas accelerating filling of recessed portions of the pattern region with the imprint material, and a second supply unit configured to supply a second gas to the gap, the second gas inhibiting curing of the imprint material.

Abstract: An imprint apparatus cures an imprint material on a shot region of a substrate by light irradiation and forms a pattern on the shot region in a state in which a mold is in contact with the imprint material. The apparatus includes a shutter mechanism including a shutter plate configured to control light irradiation to the imprint material on the shot region and an actuator configured to drive the shutter plate, and a driving mechanism configured to change relative positions of the substrate and the mold. The shutter plate includes a first passing portion configured to irradiate a part out of a whole of the imprint material on the shot region with light and a second passing portion configured to irradiate the whole of the imprint material on the shot region.

Abstract: The present invention provides a measurement apparatus that measures a position of an object, including an illumination system configured to illuminate the object with illumination light, an image forming system configured to form, on a photoelectric conversion device configured to detect an image of the object, an image of detected light from the object, and a separation system including a reflective polarizer and a ?/4 plate arranged between the illumination system and the image forming system, and configured to separate the illumination light and the detected light via the reflective polarizer and the ?/4 plate, wherein the separation system includes at least one optical member arranged between the reflective polarizer and the ?/4 plate, and each of the illumination system and the image forming system includes a transmission polarizer.

Abstract: The present invention provides a measurement apparatus that measures a position of an object, including an illumination system configured to illuminate the object with illumination light, an image forming system configured to form, on a photoelectric conversion device configured to detect an image of the object, an image of detected light from the object, and a separation system including a reflective polarizer and a ?/4 plate arranged between the illumination system and the image forming system, and configured to separate the illumination light and the detected light via the reflective polarizer and the ?/4 plate, wherein the separation system includes at least one optical member arranged between the reflective polarizer and the ?/4 plate, and each of the illumination system and the image forming system includes a transmission polarizer.

Abstract: A position detector includes a detection unit configured to detect light from a first diffraction grating including a first pattern disposed in a first direction, and light from a second diffraction grating including a second pattern disposed in the first direction, and a control unit configured to obtain a relative position between the first and the second diffraction gratings based on the light detected by the detection unit. The position detector has a third pattern formed in a second direction different from the first direction at edges of the first pattern of the first diffraction grating, the third pattern has a width smaller than a width of the first pattern of the first diffraction grating.

Abstract: A position detector includes a detection unit configured to detect light from a first diffraction grating including a first pattern disposed in a first direction, and light from a second diffraction grating including a second pattern disposed in the first direction, and a control unit configured to obtain a relative position between the first and the second diffraction gratings based on the light detected by the detection unit. The position detector has a third pattern formed in a second direction different from the first direction at edges of the first pattern of the first diffraction grating, the third pattern has a width smaller than a width of the first pattern of the first diffraction grating.

Abstract: An image pickup apparatus includes a receiver that receives, from an external apparatus, an instruction for changing a zoom position of a lens, a controller that performs control processing to change a zoom position of the lens based on a received instruction, and a determination unit that determines whether the external apparatus includes a function regarding zooming of the lens. While determining the external apparatus including the function, the controller controls a zoom adapter, which performs a zoom setting of the lens and is attached to the lens, to change a zoom position of the lens based on a zoom setting notified by the external apparatus. While determining the external apparatus not including the function, the controller controls the zoom adapter to change a zoom position of the lens based on a zoom setting performed in the zoom adapter.

Abstract: An imprint apparatus cures an imprint material by irradiating the imprint material with light while the imprint material on a substrate is in contact with a pattern region of a mold. The imprint apparatus includes a first supply unit configured to supply a first gas to a gap between the substrate and the mold, the first gas accelerating filling of recessed portions of the pattern region with the imprint material, and a second supply unit configured to supply a second gas to the gap, the second gas inhibiting curing of the imprint material.

Abstract: An imprint apparatus cures an imprint material on a shot region of a substrate by light irradiation and forms a pattern on the shot region in a state in which a mold is in contact with the imprint material. The apparatus includes a shutter mechanism including a shutter plate configured to control light irradiation to the imprint material on the shot region and an actuator configured to drive the shutter plate, and a driving mechanism configured to change relative positions of the substrate and the mold. The shutter plate includes a first passing portion configured to irradiate a part out of a whole of the imprint material on the shot region with light and a second passing portion configured to irradiate the whole of the imprint material on the shot region.

Abstract: A position detector includes a detection unit configured to detect light from a first diffraction grating including a first pattern disposed in a first direction, and light from a second diffraction grating including a second pattern disposed in the first direction, and a control unit configured to obtain a relative position between the first and the second diffraction gratings based on the light detected by the detection unit. The position detector has a third pattern formed in a second direction different from the first direction at edges of the first pattern of the first diffraction grating, the third pattern has a width smaller than a width of the first pattern of the first diffraction grating.

Abstract: An imprint lithography apparatus uses a mold having a pattern formed thereon and transfers the pattern to an imprint material fed to a substrate. The apparatus includes a light-receiving element; a detection system that irradiates a mark formed on the substrate and a mark formed on the mold with light which is reflected therefrom, and guides the light reflected from the mark formed on the substrate and from the mark formed on the mold to the light-receiving element; a relay optical system that causes the light reflected to focus between the mold and the detection system; an illumination system that emits illumination light for curing the imprint material; an optical element having a surface that transmits one of the illumination light and the light from the detection system and reflects the other; and a plate-shaped optical member that corrects aberration of the relay optical system.

Abstract: An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.

Abstract: An object of the present disclosure is to provide an imprinting apparatus capable of detecting a surface state of a substrate with accuracy even when the surface state of the substrate changes. An imprinting apparatus of the present disclosure is one for contacting an imprint material on a substrate with a mold, and forming a pattern of the imprint material on the substrate. The imprinting apparatus includes a detector configured to irradiate the substrate with light, optically detect reflected light from the substrate to detect a state of the imprint material on the substrate, and switch a detection condition during an imprinting process.

Abstract: A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.

Abstract: An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.

Abstract: An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.

Abstract: An measuring apparatus includes: a storage unit configured to store a relationship, regarding an irradiation condition predetermined based on a correlation between a characteristic of each of beams of reflected light obtained from a plurality of patterns different from one another in a thickness of a residual layer in a recessed portion and the thickness of the residual layer of each of the plurality of patterns, between the characteristic of the reflected light from each pattern and the thickness of the residual layer of the pattern; and a processing unit configured to, based on a characteristic of reflected light from a pattern formed on a substrate irradiated with light under the irradiation condition and the relationship stored in the storage unit, obtain a thickness of a residual layer in a recessed portion of the pattern formed on the substrate.

Abstract: A detector includes an illumination optical system that illuminates a first diffraction grating having a period in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period in the second direction different from the period of the first diffraction grating in the second direction. A detection optical system detects diffracted light diffracted by the first diffraction grating and the second diffraction grating. The detection optical system includes a photoelectric conversion element and a guide portion arranged on a pupil plane of the detection optical system. The guide portion guides, to the photoelectric conversion element, the light diffracted by the first diffracting grating and the second diffraction grating. The diffracted light diffracted by the second diffraction grating enters a position different from the guide portion on the pupil plane of the detection optical system.

Abstract: A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.

Abstract: The present invention provides an illumination optical system which illuminates an illumination target surface with a light beam from a light source, the system including a plurality of adjustment units each having one of a reflectance distribution and a transmittance distribution to adjust an incident angle distribution of the light beam which impinges on the illumination target surface, the plurality of adjustment units including an adjustment unit which adjusts differences between light amounts, in a first direction, of incident angle distributions of light beams at a plurality of points on the illumination target surface, and light amounts, in a second direction, thereof, and an adjustment unit which adjusts at least one of light amount differences, in the first direction, of the incident angle distributions of the light beams at the plurality of points on the illumination target surface, and light amount differences, in the second direction, thereof.