Patents by Inventor Ken Sawada

Ken Sawada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8193129
    Abstract: The present invention provides a refrigerating machine oil, a compressor oil composition, a hydraulic oil composition, a metalworking oil composition, a heat treating oil composition, a lubricating oil composition for machine tools and a lubricating oil composition which comprise a lubricating oil base oil having % CA of not more than 2, % CP/% CN of not less than 6 and an iodine value of not more than 2.5.
    Type: Grant
    Filed: July 3, 2007
    Date of Patent: June 5, 2012
    Assignee: Nippon Oil Corporation
    Inventors: Kazuo Tagawa, Yuji Shimomura, Ken Sawada, Katsuya Takigawa, Toshio Yoshida, Shinichi Mitsumoto, Eiji Akiyama, Junichi Shibata, Satoshi Suda, Hideo Yokota, Masahiro Hata, Hiroyuki Hoshino, Hajime Nakao, Shozaburo Konishi
  • Publication number: 20120132848
    Abstract: The present invention provides a working fluid composition for a refrigerator machine comprising a base oil comprising an ether-based compound, a carbodiimide compound, and an unsaturated fluorinated hydrocarbon refrigerant. The present invention also provides a refrigerating machine oil comprising a base oil containing an ether-based compound and a carbodiimide compound, the refrigerating machine oil being used together with an unsaturated fluorinated hydrocarbon refrigerant.
    Type: Application
    Filed: November 18, 2011
    Publication date: May 31, 2012
    Applicant: JX NIPPON OIL & ENERGY CORPORATION
    Inventors: Ken SAWADA, Kuniko TAKAHASHI, Hiroko SHIMPO, Katsuya TAKIGAWA
  • Publication number: 20120053094
    Abstract: The present invention provides a refrigerating machine oil, a compressor oil composition, a hydraulic oil composition, a metalworking oil composition, a heat treating oil composition, a lubricating oil composition for machine tools and a lubricating oil composition which comprise a lubricating oil base oil having % CA of not more than 2, % CP/% CN of not less than 6 and an iodine value of not more than 2.5.
    Type: Application
    Filed: November 1, 2011
    Publication date: March 1, 2012
    Inventors: Kazuo Tagawa, Yuji Shimomura, Ken Sawada, Katsuya Takigawa, Toshio Yoshida, Shinichi Mitsumoto, Eiji Akiyama, Junichi Shibata, Satoshi Suda, Hideo Yokota, Masahiro Hata, Hiroyuki Hoshino, Hajime Nakao, Shozaburo Konishi
  • Publication number: 20120053102
    Abstract: The present invention provides a refrigerating machine oil, a compressor oil composition, a hydraulic oil composition, a metalworking oil composition, a heat treating oil composition, a lubricating oil composition for machine tools and a lubricating oil composition which comprise a lubricating oil base oil having % CA of not more than 2, % CP/% CN of not less than 6 and an iodine value of not more than 2.5.
    Type: Application
    Filed: November 1, 2011
    Publication date: March 1, 2012
    Inventors: Kazuo Tagawa, Yuji Shimomura, Ken Sawada, Katsuya Takigawa, Toshio Yoshida, Shinichi Mitsumoto, Eiji Akiyama, Junichi Shibata, Satoshi Suda, Hideo Yokota, Masahiro Hata, Hiroyuki Hoshino, Hajime Nakao, Shozaburo Konishi
  • Publication number: 20120053096
    Abstract: The present invention provides a refrigerating machine oil, a compressor oil composition, a hydraulic oil composition, a metalworking oil composition, a heat treating oil composition, a lubricating oil composition for machine tools and a lubricating oil composition which comprise a lubricating oil base oil having % CA of not more than 2, % CP/% CN of not less than 6 and an iodine value of not more than 2.5.
    Type: Application
    Filed: November 1, 2011
    Publication date: March 1, 2012
    Inventors: Kazuo Tagawa, Yuji Shimomura, Ken Sawada, Katsuya Takigawa, Toshio Yoshida, Shinichi Mitsumoto, Eiji Akiyama, Junichi Shibata, Satoshi Suda, Hideo Yokota, Masahiro Hata, Hiroyuki Hoshino, Hajime Nakao, Shozaburo Konishi
  • Publication number: 20120053097
    Abstract: The present invention provides a refrigerating machine oil, a compressor oil composition, a hydraulic oil composition, a metalworking oil composition, a heat treating oil composition, a lubricating oil composition for machine tools and a lubricating oil composition which comprise a lubricating oil base oil having % CA of not more than 2, % CP/% CN of not less than 6 and an iodine value of not more than 2.5.
    Type: Application
    Filed: November 1, 2011
    Publication date: March 1, 2012
    Inventors: Kazuo Tagawa, Yuji Shimomura, Ken Sawada, Katsuya Takigawa, Toshio Yoshida, Shinichi Mitsumoto, Eiji Akiyama, Junichi Shibata, Satoshi Suda, Hideo Yokota, Masahiro Hata, Hiroyuki Hoshino, Hajime Nakao, Shozaburo Konishi
  • Publication number: 20120053375
    Abstract: The present invention provides a refrigerating machine oil, a compressor oil composition, a hydraulic oil composition, a metalworking oil composition, a heat treating oil composition, a lubricating oil composition for machine tools and a lubricating oil composition which comprise a lubricating oil base oil having % CA of not more than 2, % CP/% CN of not less than 6 and an iodine value of not more than 2.5.
    Type: Application
    Filed: November 1, 2011
    Publication date: March 1, 2012
    Inventors: Kazuo Tagawa, Yuji Shimomura, Ken Sawada, Katsuya Takigawa, Toshio Yoshida, Shinichi Mitsumoto, Eiji Akiyama, Junichi Shibata, Satoshi Suda, Hideo Yokota, Masahiro Hata, Hiroyuki Hoshino, Hajime Nakao, Shozaburo Konishi
  • Publication number: 20120046205
    Abstract: The present invention provides a refrigerating machine oil, a compressor oil composition, a hydraulic oil composition, a metalworking oil composition, a heat treating oil composition, a lubricating oil composition for machine tools and a lubricating oil composition which comprise a lubricating oil base oil having % CA of not more than 2, % CP/% CN of not less than 6 and an iodine value of not more than 2.5.
    Type: Application
    Filed: November 1, 2011
    Publication date: February 23, 2012
    Inventors: Kazuo Tagawa, Yuji Shimomura, Ken Sawada, Katsuya Takigawa, Toshio Yoshida, Shinichi Mitsumoto, Eiji Akiyama, Junichi Shibata, Satoshi Suda, Hideo Yokota, Masahiro Hata, Hiroyuki Hoshino, Hajime Nakao, Shozaburo Konishi
  • Publication number: 20120001290
    Abstract: A solid-state imaging device that includes: a semiconductor substrate having a recess portion formed on a top surface thereof; an impurity region of a first conductivity type formed in a portion of the semiconductor substrate disposed lower than a bottom surface of the recess portion; and a semiconductor layer of the first conductivity type formed in the recess portion, wherein the impurity region and the semiconductor layer form a photoelectric conversion.
    Type: Application
    Filed: September 13, 2011
    Publication date: January 5, 2012
    Applicant: SONY CORPORATION
    Inventor: Ken Sawada
  • Patent number: 7993543
    Abstract: The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant of the invention is characterized by comprising a complete ester of a fatty acid in which the proportion of C14-C22 branched fatty acid is 40-100% by mole and a polyhydric alcohol. The refrigerating machine oil used with a carbon dioxide refrigerant according to the invention is characterized by comprising the base oil for the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention. The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant and the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention, when used together with a carbon dioxide refrigerant, exhibit excellent stability and electrical insulating properties, and have suitable compatibility with refrigerants while allowing adequate lubricity to be exhibited without increasing the viscosity of the base oil.
    Type: Grant
    Filed: March 20, 2007
    Date of Patent: August 9, 2011
    Assignees: Nippon Oil Corporation, Kao Corporation
    Inventors: Kazuo Tagawa, Ken Sawada, Yuji Shimomura, Katsuya Takigawa, Jiro Hashimoto, Masataka Negishi
  • Patent number: 7923198
    Abstract: A method of manufacturing a fine T-shaped electrode includes a step of forming a laminated resist which includes at least a photoresist layer as an uppermost layer; a step of forming an uppermost layer opening by irradiating the laminated resist with light to pattern only the photo resist layer and form an uppermost layer opening; a step of reducing the diameter of the uppermost layer opening by coating a resist pattern thickening material on the photoresist layer; a step of forming a lowermost layer opening by transferring the uppermost layer opening formed in the photoresist layer to a lower layer of the photoresist, and penetrating the laminated resist; a step of reducing the size of the lowermost opening in the lowermost layer of the laminated resist; and a step of forming a T-shaped electrode in the opening part formed through the laminated resist.
    Type: Grant
    Filed: February 11, 2005
    Date of Patent: April 12, 2011
    Assignee: Fujitsu Limited
    Inventor: Ken Sawada
  • Patent number: 7888751
    Abstract: A semiconductor device includes a fin field effect transistor configured to include at least a first fin and a second fin. Threshold voltage of the first fin and threshold voltage of the second fin are different from each other in the fin field effect transistor.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: February 15, 2011
    Assignee: Sony Corporation
    Inventor: Ken Sawada
  • Publication number: 20100258893
    Abstract: A method of manufacturing a solid-state imaging device includes: a first step of forming a recess portion on a top surface of a semiconductor substrate; a second step of selectively forming an impurity region of a first conductivity type in a lower portion of the recess portion by introducing impurities from a bottom surface of the recess portion; and a third step of forming a semiconductor layer in the recess portion, thus forming a photoelectric conversion portion which includes the impurity region and the semiconductor layer.
    Type: Application
    Filed: April 6, 2010
    Publication date: October 14, 2010
    Applicant: SONY CORPORATION
    Inventor: Ken Sawada
  • Publication number: 20100190346
    Abstract: A surface component film (2) is etched using a resist (3) as a mask, and the surface component film (2) is patterned according to the shape of an aperture (3a). This results in a step portion (4) having the same shape as the aperture (3a), with the sidewall (4a) of the step portion (4) exposed through the aperture (3a). The aperture (3a) is spin-coated with a shrink agent, reacted at a first temperature, and developed to shrink the aperture (3a). To control the shrinkage with high accuracy, in the first round of reaction, the aperture is shrunk by, for example, about half of the desired shrinkage. The aperture (3a) is further spin-coated with a shrink agent, reacted at a second temperature, and developed to shrink the aperture (3a). In this embodiment, the second-round shrink process will result in the desired aperture length. The second temperature is adjusted based on the shrinkage in the first round.
    Type: Application
    Filed: March 26, 2010
    Publication date: July 29, 2010
    Applicant: FUJITSU LIMITED
    Inventors: Kozo Makiyama, Ken Sawada
  • Publication number: 20100187576
    Abstract: A surface component film (2) is etched using a resist (3) as a mask, and the surface component film (2) is patterned according to the shape of an aperture (3a). This results in a step portion (4) having the same shape as the aperture (3a), with the sidewall (4a) of the step portion (4) exposed through the aperture (3a). The aperture (3a) is spin-coated with a shrink agent, reacted at a first temperature, and developed to shrink the aperture (3a). To control the shrinkage with high accuracy, in the first round of reaction, the aperture is shrunk by, for example, about half of the desired shrinkage. The aperture (3a) is further spin-coated with a shrink agent, reacted at a second temperature, and developed to shrink the aperture (3a). In this embodiment, the second-round shrink process will result in the desired aperture length. The second temperature is adjusted based on the shrinkage in the first round.
    Type: Application
    Filed: March 26, 2010
    Publication date: July 29, 2010
    Applicant: FUJITSU LIMITED
    Inventors: Kozo Makiyama, Ken Sawada
  • Patent number: 7718541
    Abstract: A surface component film (2) is etched using a resist (3) as a mask, and the surface component film (2) is patterned according to the shape of an aperture (3a). This results in a step portion (4) having the same shape as the aperture (3a), with the sidewall (4a) of the step portion (4) exposed through the aperture (3a). The aperture (3a) is spin-coated with a shrink agent, reacted at a first temperature, and developed to shrink the aperture (3a). To control the shrinkage with high accuracy, in the first round of reaction, the aperture is shrunk by, for example, about half of the desired shrinkage. The aperture (3a) is further spin-coated with a shrink agent, reacted at a second temperature, and developed to shrink the aperture (3a). In this embodiment, the second-round shrink process will result in the desired aperture length. The second temperature is adjusted based on the shrinkage in the first round.
    Type: Grant
    Filed: July 21, 2005
    Date of Patent: May 18, 2010
    Assignee: Fujitsu Limited
    Inventors: Kozo Makiyama, Ken Sawada
  • Publication number: 20100093568
    Abstract: The present invention provides a refrigerating machine oil, a compressor oil composition, a hydraulic oil composition, a metalworking oil composition, a heat treating oil composition, a lubricating oil composition for machine tools and a lubricating oil composition which comprise a lubricating oil base oil having % CA of not more than 2, % CP/% CN of not less than 6 and an iodine value of not more than 2.5.
    Type: Application
    Filed: July 3, 2007
    Publication date: April 15, 2010
    Inventors: Kazuo Tagawa, Yuji Shimomura, Ken Sawada, Katsuya Takigawa, Toshio Yoshida, Shinichi Mitsimoto, Eiji Akiyama, Junichi Shibata, Satoshi Suda, Hideo Yokota, Masahiro Hata, Hiroyuki Hoshino, Hajime Nakao, Shozaburo Konishi
  • Publication number: 20100051854
    Abstract: The refrigerating machine oil of the invention is characterized by comprising an ester of a polyhydric alcohol and fatty acids with a content of a C10-C13 branched fatty acid of 50% by mole or greater. The working fluid composition for a refrigerating machine of the invention is characterized in that the working fluid composition comprises an ester of a polyhydric alcohol and fatty acids with a content of a C10-C13 branched fatty acid of 50% by mole or greater, and a refrigerant.
    Type: Application
    Filed: March 11, 2008
    Publication date: March 4, 2010
    Applicant: NIPPON OIL CORPORATION
    Inventors: Ken Sawada, Yuji Shimomura, Katsuya Takigawa
  • Publication number: 20090261423
    Abstract: A semiconductor device includes a fin field effect transistor configured to include at least a first fin and a second fin. Threshold voltage of the first fin and threshold voltage of the second fin are different from each other in the fin field effect transistor.
    Type: Application
    Filed: April 14, 2009
    Publication date: October 22, 2009
    Applicant: SONY CORPORATION
    Inventor: Ken Sawada
  • Publication number: 20090200507
    Abstract: The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant of the invention is characterized by comprising a complete ester of a fatty acid in which the proportion of C14-C22 branched fatty acid is 40-100% by mole and a polyhydric alcohol. The refrigerating machine oil used with a carbon dioxide refrigerant according to the invention is characterized by comprising the base oil for the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention. The base oil for the refrigerating machine oil used with a carbon dioxide refrigerant and the refrigerating machine oil used with a carbon dioxide refrigerant according to the invention, when used together with a carbon dioxide refrigerant, exhibit excellent stability and electrical insulating properties, and have suitable compatibility with refrigerants while allowing adequate lubricity to be exhibited without increasing the viscosity of the base oil.
    Type: Application
    Filed: March 20, 2007
    Publication date: August 13, 2009
    Inventors: Kazuo Tagawa, Ken Sawada, Yuji Shimomura, Katsuya Takigawa, Jiro Hashimoto, Masataka Negishi