Abstract: A plasma processing system includes a control device. The control device executes raising a lifter to deliver a cover ring supporting an edge ring to the lifter; moving a jig supported by a holder to a space between the cover ring and a substrate support surface/an annular support surface; raising a different lifter to deliver the jig to the different lifter; extracting the holder, and then moving the lifter and the different lifter relatively to deliver the edge ring to the jig; lowering only the lifter to deliver the cover ring to the annular member support surface; moving the holder to a space between the cover ring and the jig, and then lowering the different lifter to deliver the jig to the holder; and extracting the holder from the processing chamber to transfer the jig supporting the edge ring from the processing chamber.

Abstract: An image forming apparatus includes a transport section that transports a recording material, a grasping section that grasps a remaining situation of a recording material remaining in a transport path through which the recording material is transported by the transport section, a reception section that receives, from a user, an input of the number of removed sheets of recording material removed from the transport path by the user in a case where the transport of the recording material by the transport section is stopped, and a start section that starts the stopped transport by the transport section based on the number of removed sheets input by the user.

Abstract: A display device with both high display quality and high resolution is provided. The display device includes a light-emitting element and a connection portion. The connection portion is provided along an outer periphery of a display region where the light-emitting element is provided. The light-emitting element includes a pixel electrode, a first EL layer over the pixel electrode, a second EL layer over the first EL layer, and a common electrode over the second EL layer. The connection portion includes a connection electrode, a second EL layer over the connection electrode, and the common electrode over the second EL layer. The second EL layer includes a first region in contact with the connection electrode and a second region in contact with the common electrode. The area of a region where the first region and the second region overlap with each other in a top view is greater than or equal to 40000 square micrometers.

Abstract: A gating camera divides a field of view in a depth direction into multiple ranges, and generates multiple slice images that correspond to the multiple ranges. A controller is configured to generate an emission control signal and an exposure control signal. An illumination apparatus emits probe light according to the emission control signal during normal imaging. An image sensor performs exposure according to the exposure control signal. A calibration light source emits calibration light to the image sensor according to the emission control signal during calibration. The controller sweeps a time difference between the emission control signal and the exposure control signal, and monitors a change in a pixel value of the image sensor during the calibration.

Abstract: A reflective mask blank includes a substrate; a multilayer reflective film that reflects EUV light; a protection film that protects the multilayer reflective film; and a phase shift film that shifts a phase of the EUV light, the substrate, the multilayer reflective film, the protection film, and the phase shift film being arranged in this order. The phase shift film contains at least one first element X1 selected from the first group consisting of ruthenium (Ru), iridium (Ir), platinum (Pt), palladium (Pd), and gold (Au), and at least one second element X2 selected from the second group consisting of oxygen (O), boron (B), carbon (C), and nitrogen (N). In the phase shift film, a chemical shift of a peak of 3d5/2 or a peak of 4f7/2 of the first element X1 observed by X-ray electron spectroscopy is less than 0.3 eV.

Abstract: A plasma processing system includes a control device. The control device executes raising a lifter to deliver a cover ring supporting an edge ring to the lifter; moving a jig supported by a holder to a space between the cover ring and a substrate support surface/an annular support surface; raising a different lifter to deliver the jig to the different lifter; extracting the holder, and then moving the lifter and the different lifter relatively to deliver the edge ring to the jig; lowering only the lifter to deliver the cover ring to the annular member support surface; moving the holder to a space between the cover ring and the jig, and then lowering the different lifter to deliver the jig to the holder; and extracting the holder from the processing chamber to transfer the jig supporting the edge ring from the processing chamber.

Abstract: A thermal head includes a substrate, an electrode, a bonding material, an electrically conductive member, and a sealing material. The electrode is located on the substrate. The bonding material is located on the substrate or the electrode. The electrically conductive member is located on the bonding material and is electrically connected to the electrode via the bonding material. The sealing material is located on the substrate and covers the bonding material and the electrically conductive member. The bonding material includes a protruding portion located at an outer circumferential edge of the electrically conductive member away from the substrate and the electrically conductive member.

Abstract: A thermal head includes a substrate, a bonding material, an electrically conductive member, and a gold electrode. The bonding material is located on the substrate and contains gold and tin. The electrically conductive member is located on the bonding material. The gold electrode is located on the substrate and electrically connected to the bonding material.

Abstract: Provided are a novel naphthalocyanine compound, which has strong absorption in a near-infrared range, extremely weak absorption in a visible range, and high resistance such as light resistance and heat resistance, and exhibits excellent solubility in an organic solvent or a resin, a heat ray shielding material, and uses of the naphthalocyanine compound such as a heat ray shielding material and the like. The naphthalocyanine compound is represented by General Formula (1).

Abstract: A plasma processing system includes a control device. The control device executes raising a lifter to deliver a cover ring supporting an edge ring to the lifter; moving a jig supported by a holder to a space between the cover ring and a substrate support surface/an annular support surface; raising a different lifter to deliver the jig to the different lifter; extracting the holder, and then moving the lifter and the different lifter relatively to deliver the edge ring to the jig; lowering only the lifter to deliver the cover ring to the annular member support surface; moving the holder to a space between the cover ring and the jig, and then lowering the different lifter to deliver the jig to the holder; and extracting the holder from the processing chamber to transfer the jig supporting the edge ring from the processing chamber.

Abstract: A substrate support includes a substrate support surface, an annular member support surface, three or more lifters configured to protrude from the annular member support surface and vertically moved to adjust an amount of protrusion, and an elevating mechanism for raising or lowering each lifter. A recess having an upwardly recessed concave surface is provided at a position corresponding to each lifter on a bottom surface of the annular member. In a plan view, the recess is larger in size than a transfer error of the annular member above the annular member support surface and larger in size than an upper end portion of the lifter. The upper end portion of each lifter is formed in a hemispherical shape that gradually tapers upward, and a curvature of the concave surface is smaller than a curvature of a convex surface.

Abstract: Provided are a novel naphthalocyanine compound, which has strong absorption in a near-infrared range, extremely weak absorption in a visible range, and high resistance such as light resistance and heat resistance, and exhibits excellent solubility in an organic solvent or a resin, a heat ray shielding material, and uses of the naphthalocyanine compound such as a heat ray shielding material and the like. The naphthalocyanine compound is represented by General Formula (1).

Abstract: A vibration damping device including: an inner member; an outer bracket including a tubular part having an inner hole, and an end wall covering an opening of the tubular part; an intermediate member having a bent part, and first and second attachments provided at opposite sides of the bent part, while being inserted in the inner hole such that the first attachment is superposed on an inner face of the tubular part while the second attachment is axially superposed on the end wall; a main rubber elastic body elastically connecting the tubular part and an end portion of the inner member inserted in the inner hole, and elastically connecting the inner member and the attachments of the intermediate member that are bonded thereto; first and second fixtures fixing the first and second attachments to the outer bracket, respectively.

Abstract: An object of this heat-resistant sintered material and a production method therefor is to obtain a heat-resistant sintered material having excellent oxidation resistance, high-temperature wear resistance and salt damage resistance. This heat-resistant sintered material has a composition containing, in mass % values, Cr: 25 to 50%, Ni: 2 to 25% and P: 0.2 to 1.2%, with the remainder being Fe and unavoidable impurities, and has a structure including an Fe—Cr matrix, and a hard phase composed of Cr—Fe alloy particles dispersed within the Fe—Cr matrix, wherein the Cr content of the Fe—Cr matrix is from 24 to 41 mass %, the Cr content of the hard phase is from 30 to 61 mass %, and the effective porosity is 2% or less.

Abstract: A method for performing a process on a target in a chamber. A gas discharge unit includes a first space having a discharge hole for discharging a first gas, a second space having a discharge hole for discharging a second gas and a third space having a discharge hole for discharging a gas generated between the first and second spaces. A distribution unit includes a first distribution pipe communicating with the first space, a second distribution pipe communicating with the second space and a third distribution pipe communicating with the third space. A valve group includes a first valve opened or closed to the first distribution pipe and a second valve opened or closed to the second distribution pipe. The method includes switching, without mixing the first gas and the second gas, the gas discharged from the discharge hole in the third space by opening or closing the valve group.

Abstract: A magnetic composite contains a ferrite composition and zinc silicate. The ferrite composition is composed of a spinel ferrite and bismuth oxide present in the spinel ferrite, and the percentage by weight of bismuth oxide to the whole magnetic composite is about 0.025% by weight or more and about 0.231% by weight or less (i.e., from about 0.025% by weight to about 0.231% by weight). The percentage by weight of zinc silicate based on the total weight of zinc silicate and the spinel ferrite is about 8% by weight or more and about 76% by weight or less (i.e., from about 8% by weight to about 76% by weight).