Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.

Abstract: There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).

Abstract: An exposure apparatus EXS forms an immersion area AR2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure apparatus EXS has an optical cleaning unit (80) which irradiates a predetermined irradiation light Lu, having an optical cleaning effect, onto, for example, the upper surface (31) of the substrate stage PST which makes contact with the liquid LQ for forming the immersion area AR2. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).

Abstract: A site diversity method, a digital satellite broadcast receiving method and a digital satellite broadcast receiver are provided which can make a difference of data output timing between a main station and a subsidiary station at the time of site exchange as small as possible and can perform re-synchronization as soon as possible. In the site diversity method for digital satellite broadcast, when a site exchange execution designation signal is received, the site is exchanged during a period of a TMCC information field of a predetermined specific frame of a super frame determined when the execution designation signal is received. On the receiver side, information of broadcast is continuously received by detecting a TMCC information field in a specific frame during a period of which field the site was exchanged and by establishing re-synchronization by using a super frame sync pattern W2 or W3 after the detected TMCC information field.

Abstract: An image forming apparatus which is small in size and can be assembled in a shorter time is provided. The image formimg apparatus includes a support section for supporting a carriage and a common frame including a support section for supporting an image sensor. The common frame is realized by integral molding with resin, whereby it is possible to form the common frame in one process, compared with when a frame for the carriage and a frame for the image sensor are individually formed. Further, using the common frame eliminates need to assemble frames with different functions into one piece. As a result, the common frame can be formed at low cost and in a small size, and time spent for assemble of the image forming apparatus can be shortened.

Abstract: A digital broadcast receiver capable of adequately receiving a higher-level layer service along with a lower-level layer service even if the reception CNR degrades. A demodulation decoding section (2) of the receiver judges on the basis of transport and multiplexing configuration control information whether the TS packet allocated to each slot is adapted to a higher-level layer service or a lower-level layer service and informs a code writing section (3) of the result. The code writing section (3) writes, in each TS packet, a layer identification code for judging whether the TS packet is adapted to a higher-level layer service or a lower-layer service and synthesizes a resultant TS packet. A stream separating section (4) reads the layer identification code along with the PID in the packet header included in the TS packet and finds and extracts a desired TS packet.

Abstract: An exposure apparatus is provided in which, even when a projection optical system and substrate are in close proximity, collisions between the projection optical system and the substrate or the substrate stage can be easily avoided. An exposure apparatus EX having a projection optical system (30) which projects and transfers a pattern (PA) formed on a mask (R) onto a substrate (W), and a substrate stage (42), positioned below the projection optical system (30), which moves in directions substantially perpendicular to the direction of the optical axis (AX) of the projection optical system (30) while supporting the substrate (W), comprises a detector (81), positioned on the outer periphery of the projection optical system (30), and which detects the position of the substrate stage (42) or substrate W along the direction of the optical axis (AX), and a control device (70), which based on the detection results of the detector (81), stops or reverses the movement of the substrate stage (42).

Abstract: A low cost printing device where a document sheet and a recording paper sheet are transferred by a single drive motor. A facsimile device as a printing device with an inkjet printer section has a single drive motor for producing a driving force for transferring a document sheet or a recording paper sheet. Transmission means for transmitting a rotational force of drive motor is switched by controlling the movement of an ink carriage. This enables the single drive motor to alternatively transfer a document sheet or a recording paper sheet.

Abstract: An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (LQ), and includes a liquid supply mechanism (10) for supplying the liquid (LQ), and a measuring device (60) which measures a time during which the supply of the liquid from the liquid supply mechanism is stopped (10).

Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.

Abstract: A lens cleaning module is provided for a lithography system having an exposure apparatus including an objective lens. The system includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module coupling with the lithography system is provided for cleaning the objective lens in a non-manual cleaning process.

Abstract: An improved apparatus for receiving BS digital broadcast is disclosed. The apparatus for receiving BS digital broadcast of the present invention has first to third filters and a selective complex calculator circuit. Each of the first to third filters 18 to 20 identifies the modulation technique applied to the received signal, by the modulation identification signals A0, A1 received from a timing generator circuit 25, and filters a phase error signal PED according to the identified modulation technique. The selective complex calculator circuit 21 shifts the phase of a signal point indicated by an I signal ADI1 and a Q signal ADQ1 absolute-phased by an absolute-phasing section 14, by a phase corresponding to the phase error signal filtered by the first to third filters 18 to 20.

Abstract: A stage apparatus PST is provided with a holder PH, which has a substrate holding surface 33A that holds a substrate P; a stage 52, which supports and moves the holder PH; and a recovery apparatus 60, which is disposed in the vicinity of the holder PH and has lyophilic parts 3, 5 of which at least a part of each is lyophilic, that uses the lyophilic parts 3, 5 to recover a liquid 1. As a result, the infiltration of liquid into the space between the substrate and the holder is prevented, even if performing an exposure treatment by filling the space between a projection optical system and the substrate with the liquid.

Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

Abstract: A bracket that rotatably supports a shaft provided along the axis of a back roller for feeding and thereby transporting a document pinched between the back roller and a close-contact-type image sensor elastically supported on a cabinet and that is fitted to the cabinet so as to be rotatable about the shaft is formed integrally with a release lever for releasing the back roller and the close-contact-type image sensor from a state in which they are pressed against each other.

Abstract: An object of the invention is to provide a sheet member processing apparatus by which a necessary working space is secured and a workability can be enhanced in doing maintenance. A housing space (32) in which processing means (26) is housed can be opened and closed by displacing a front cover potion (31) relative to a casing (30) of a casing (21). In the casing (21), a document discharge port (35) is formed upper than the front cover section (31). On the front cover section (31) is provided a document discharge tray (24) which receives a discharged document. When the cover section (31) is made to be displaced relative to the casing main body (30), the document discharge tray (24) is displaced together with the front cover section (31). This makes it possible to secure the large working space and enhance the workability, for instance, when an operator replaces consumable articles such as an ink cartridge (53).

Abstract: In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.