Patents by Inventor Kenichi Umeda

Kenichi Umeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090032096
    Abstract: In a process for producing a thin-film device having an inorganic film formed over a resin-based substrate, a thermal-buffer layer is formed over a substrate which contains a resin material as a main component, and a light-cutting layer is formed over the thermal-buffer layer, where the light-cutting layer prevents damage from short-wavelength light to the substrate by reducing the proportion of the short-wavelength light which reaches the substrate. Thereafter, a non-monocrystalline film which is to be annealed is formed over the light-cutting layer, where the non-monocrystalline film transmits the short-wavelength light to such a degree that the short-wavelength light can damage the substrate. Then, an inorganic film is formed by irradiating the non-monocrystalline film with the short-wavelength light so as to anneal the non-monocrystalline film.
    Type: Application
    Filed: July 30, 2008
    Publication date: February 5, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Atsushi TANAKA, Kenichi UMEDA, Kohei HIGASHI, Hiroshi SUNAGAWA, Katsuhiro KOHDA
  • Patent number: 6203853
    Abstract: The material for inverting static electricity (or static electricity inverting material) of the present invention contains Si or SiOx (0<x<2) on the surfaces or inside of a base material. The Si or SiOx may be directly vapor-deposited on the base material. Or a silicon sheet prepared from a raw material of Si or SiOx may be attached to the base material. Furthermore, in the case where the static electricity inverting material contains the Si or SiOx thereinside, the Si or SiOx may be sandwiched or mixed in the base material. Moreover, the base material may be singly composed of the Si or SiOx. The invention provides also a method for removing static electricity by covering the surface of a static electricity producing body partly or totally with the static electricity inverting material, alternately, by covering a space accommodating a static electricity receiving body which is electrically charged through connection with the external space with the static electricity inverting material.
    Type: Grant
    Filed: August 20, 1999
    Date of Patent: March 20, 2001
    Assignees: Nariko Ohara, Yoshiaki Ito
    Inventors: Kuniaki Takamatsu, Toyoko Ohara, Hideaki Kikuchi, Kenichi Umeda, Kennosuke Tanaka, Taichiro Nakayama
  • Patent number: 5950361
    Abstract: A plant activator which is strip-shaped, and includes a silicon layer provided on one or both surfaces of the base sheet or within a base sheet and containing Si or SiO.sub.X (0<X <2) as a main component, wherein the silicon layer is provided by vapor-deposition or bonded by an adhesive. The plant activator is hung on or near the plants.
    Type: Grant
    Filed: January 16, 1998
    Date of Patent: September 14, 1999
    Assignees: Kuniaki Takamatsu, Nariko Ohara, Yoshiaki Ito
    Inventors: Kuniaki Takamatsu, Toyoko Ohara, Hideaki Kikuchi, Kenichi Umeda
  • Patent number: 4447549
    Abstract: A D-E hysteresis loop of ferroelectrics known in the art has a square shape when the ferroelectrics are a BaTiO.sub.3 single crystal. Such ferroelectrics are used as a non-linear dielectric element of, for example a pulse generating device. The non-linear dielectric element according to the present invention consists of a polycrystal, which is mainly composed of BaTiO.sub.3 and has the chemical composition expressed by the formula A.sub.y B.sub.z O.sub.3, wherein the molar ratio of y/z ranges from 0.92 to 0.99. The non-linearity is excellent and the temperature dependence of the A.sub.y B.sub.z O.sub.3 composition is considerably low.
    Type: Grant
    Filed: March 22, 1983
    Date of Patent: May 8, 1984
    Assignee: TDK Kabushiki Kaisha
    Inventors: Sho Masujima, Masahide Shibuya, Iwaya Shoichi, Kenichi Umeda, Yasunobu Oikawa, Hisao Abe, Yoshifumi Midori, Shinobu Fujiwara, Nobuaki Kikuchi