Abstract: The present invention provides a forming method of forming a through electrode, in a second substrate joined on a first substrate having an electrode pad, to electrically connect a pattern to be formed on the second substrate to the electrode pad, the method comprising steps of detecting a position of a first mark formed on the first substrate and a position of a second mark formed on the second substrate in a state in which the first substrate and the second substrate are joined, determining, based on the position of the first mark and the position of the second mark detected in the detecting, a point to form the through electrode in the second substrate so as to electrically connect the pattern to the electrode pad, and forming the through electrode at the determined point.

Abstract: A lithography apparatus includes: a shield including a shield member having an aperture formed therein and having a first edge and a second edge defining the aperture; a driving mechanism including a rotation mechanism configured to rotate the shield member and a translation mechanism configured to translate the shield member; and a controller configured to control the driving mechanism so as to sequentially perform patterning.

Abstract: There is provided a display device which can make the user understand a motion of a control target device without preparing a three-dimensional model faithfully reproducing an outer view of each control target device. A PC (10) as the display device presents options of a virtual mechanism, and accepts a selection thereof. The virtual mechanism has a structure in which a plurality of mechanism elements are combined having interlocking relationships, and includes an abstracted mode not imitating a mode of a specific control target device. The options of the virtual mechanism include a plurality of virtual mechanisms which are mutually different in kind of the mechanism element or in form of the interlocking relationship among the mechanism elements.

Abstract: Sand for a casting mold including sand, a binder, and an inorganic compound particle having poor water solubility and generating a gas, which is at least one of water vapor or carbon dioxide gas, by heat from a molten metal.

Abstract: To provide a display device capable of displaying a trajectory of a specific portion of a program controlled control target device regardless of whether the control program is a simple sequential execution type or a situation adaptive type.

Abstract: The present invention provides a forming method of forming a through electrode, in a second substrate joined on a first substrate having an electrode pad, to electrically connect a pattern to be formed on the second substrate to the electrode pad, the method comprising steps of detecting a position of a first mark formed on the first substrate and a position of a second mark formed on the second substrate in a state in which the first substrate and the second substrate are joined, determining, based on the position of the first mark and the position of the second mark detected in the detecting, a point to form the through electrode in the second substrate so as to electrically connect the pattern to the electrode pad, and forming the through electrode at the determined point.

Abstract: A lithography apparatus includes: a shield including a shield member having an aperture formed therein and having a first edge and a second edge defining the aperture; a driving mechanism including a rotation mechanism configured to rotate the shield member and a translation mechanism configured to translate the shield member; and a controller configured to control the driving mechanism so as to sequentially perform patterning.

Abstract: A lithographic apparatus includes: a light-shielding plate which includes, on an edge thereof, an arc overlapping with a circular boundary line that defines a region onto which the pattern is transferred and is located inside an outer periphery of a substrate, and blocks the light to prevent the light from being incident on an outer peripheral region located outside the circular boundary line; a first driving unit which rotates the light-shielding plate about an axis parallel to an optical axis of the irradiation system; and a second driving unit which linearly drives the light-shielding plate within a plane perpendicular to the optical axis.

Abstract: An illumination optical system comprises a first polarization control unit which is located between a light source and a pupil of an illumination optical system, and a second polarization control unit which is located between the first polarization control unit and the pupil, wherein a region on the pupil includes a plurality of partial regions which are classified into a first group including a partial region having a largest area, and a second group including a partial region different from the partial region having the largest area, and the second polarization control unit controls a polarization state in the partial region which belongs to only the second group.

Abstract: A sequence control portion of a control program is configured to execute simulation for one period to generate an execution result related to the sequence control portion. A motion control portion is configured to execute simulation for one period to generate an execution result related to the motion control portion. A control period number is then increment updated. Whether or not a resumable control period is determined, and if determined as the resumable control period, content of a resuming data buffer (828) updated in the previous control period is saved in a resuming data storage section (826).

Abstract: There is provided a display device which can make the user understand a motion of a control target device without preparing a three-dimensional model faithfully reproducing an outer view of each control target device. A PC (10) as the display device presents options of a virtual mechanism, and accepts a selection thereof. The virtual mechanism has a structure in which a plurality of mechanism elements are combined having interlocking relationships, and includes an abstracted mode not imitating a mode of a specific control target device. The options of the virtual mechanism include a plurality of virtual mechanisms which are mutually different in kind of the mechanism element or in form of the interlocking relationship among the mechanism elements.

Abstract: To provide a display device capable of displaying a trajectory of a specific portion of a program controlled control target device regardless of whether the control program is a simple sequential execution type or a situation adaptive type.

Abstract: A lithographic apparatus includes: a light-shielding plate which includes, on an edge thereof, an arc overlapping with a circular boundary line that defines a region onto which the pattern is transferred and is located inside an outer periphery of a substrate, and blocks the light to prevent the light from being incident on an outer peripheral region located outside the circular boundary line; a first driving unit which rotates the light-shielding plate about an axis parallel to an optical axis of the irradiation system; and a second driving unit which linearly drives the light-shielding plate within a plane perpendicular to the optical axis.

Abstract: An exposure apparatus comprises an illumination optical system configured to illuminate a reticle with a light beam from a light source, a projection optical system configured to project a pattern of the reticle onto a substrate, a measurement unit configured to measure a light quantity distribution in an exposure area on an image plane of the projection optical system, and a detection unit configured to detect an existence of a foreign particle in the illumination optical system and the projection optical system based on the light quantity distribution measured by the measurement unit.

Abstract: An exposure method for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes the steps of obtaining a relationship between an exposure parameter that determines a mode to expose a plate, and an electrical characteristic of a device derived from the device, determining whether the device obtained from the set exposure parameter has a predetermined electrical characteristic, and adjusting the set exposure parameter based on the relationship between the exposure parameter and the electrical characteristic, if the determining step determines that the device does not have the predetermined electrical characteristic.

Abstract: An exposure apparatus which exposes a substrate to light. An illumination optical system illuminates a mask with illumination light, and a projection optical system projects a pattern of the mask onto the substrate. The illumination light contains a primary component of polarized light and a secondary component of the polarized light, which are perpendicular to each other, and the illumination optical system includes a phase difference adjusting unit configured to adjust a phase difference between the primary component of the polarized light and the secondary component of the polarized light, without changing a direction of the primary component of the polarized light.

Abstract: An exposure method for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes the steps of obtaining a relationship between an exposure parameter that determines a mode to expose a plate, and an electrical characteristic of a device derived from the device, determining whether the device obtained from the set exposure parameter has a predetermined electrical characteristic, and adjusting the set exposure parameter based on the relationship between the exposure parameter and the electrical characteristic, if the determining step determines that the device does not have the predetermined electrical characteristic.

Abstract: An illumination optical system comprises a first polarization control unit which is located between a light source and a pupil of an illumination optical system, and a second polarization control unit which is located between the first polarization control unit and the pupil, wherein a region on the pupil includes a plurality of partial regions which are classified into a first group including a partial region having a largest area, and a second group including a partial region different from the partial region having the largest area, and the second polarization control unit controls a polarization state in the partial region which belongs to only the second group.

Abstract: An exposure apparatus comprises an illumination optical system configured to illuminate a reticle with a light beam from a light source, a projection optical system configured to project a pattern of the reticle onto a substrate, a measurement unit configured to measure a light quantity distribution in an exposure area on an image plane of the projection optical system, and a detection unit configured to detect an existence of a foreign particle in the illumination optical system and the projection optical system based on the light quantity distribution measured by the measurement unit.

Abstract: An exposure apparatus which exposes a substrate to light includes an illumination optical system which illuminates a mask with illumination light, and a projection optical system which projects the pattern of the mask onto the substrate. The illumination light contains the primary component of polarized light and the secondary component of the polarized light, which are perpendicular to each other. The illumination optical system includes a phase difference adjusting unit including a function of continuously adjusting the phase difference between the primary component of the polarized light and the secondary component of the polarized light without changing the direction of the primary component of the polarized light.