Abstract: An exposure apparatus comprises an illumination optical system and a projection optical system. The illumination optical system includes an optical integrator configured to emit a plurality of light fluxes from an exit surface thereof, a diffraction optical element configured to form a predetermined light intensity distribution on an incident surface of the optical integrator, and a polarization optical element configured to adjust a polarization state of the incident light. The polarization optical element has a pattern with which the polarization optical element functions as a birefringent element, the pattern changing in density between a first direction and a second direction perpendicular to the first direction, and having a sub wavelength structure having a cycle not more than a wavelength of the light from the light source, and the polarization optical element is arranged near or on the incident surface on which the diffraction optical element forms the light intensity distribution.

Abstract: An illumination optical system for illuminating a target surface using light from a light source, said illumination optical system includes a polarizing element that is arranged in an optical path from the light source to the target surface, and adjusts a polarization ratio of the light, and an optical element that is arranged in an optical path from the polarizing element to the target surface, wherein the total birefringence of the optical element is m+2?<1.0 nm/cm, where an average of birefringence amount of a glass material of the optical element is m, and standard variation birefringence amount of a glass material of the optical element is ?.

Abstract: An exposure method for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes the steps of obtaining a relationship between an exposure parameter that determines a mode to expose a plate, and an electrical characteristic of a device derived from the device, determining whether the device obtained from the set exposure parameter has a predetermined electrical characteristic, and adjusting the set exposure parameter based on the relationship between the exposure parameter and the electrical characteristic, if the determining step determines that the device does not have the predetermined electrical characteristic.

Abstract: An exposure apparatus includes an illumination optical system for illuminating an reticle using light from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate, and a variable stop having an opening for regulating an illumination area on the substrate, said variable stop is arranged near a position conjugate with the substrate, wherein a position of the variable stop is variable along an optical axis of the illumination optical system or an optical axis of the projection optical system.

Abstract: An illumination optical system for illuminating a target surface using light from a light source, includes a sensor for detecting a light intensity of the light, a light splitter for splitting part of the light, and an optical element, arranged between the light source and the light splitter, for transmitting the light, and for reflecting the part of the light that has been split by the light splitter, towards the sensor.

Abstract: A method for forming a three-dimensional structure made of a photosensitive material on a substrate includes the steps of determining a film thickness of the photosensitive material necessary to form the desired three-dimensional structure, comparing a predetermined maximum film thickness with the film thickness determined by the determining step, and applying, when the film thickness determined by the determining step is greater than the predetermined maximum film thickness, the photosensitive material within the maximum film thickness plural times until the photosensitive material has the film thickness on the substrate.

Abstract: An illumination optical system for illuminating a target surface using light from a light source, said illumination optical system includes a polarizing element that is arranged in an optical path from the light source to the target surface, and adjusts a polarization ratio of the light, and an optical element that is arranged in an optical path from the polarizing element to the target surface, wherein the total birefringence of the optical element is m+2?<1.0 nm/cm, where an average of birefringence amount of a glass material of the optical element is m, and standard variation birefringence amount of a glass material of the optical element is ?.

Abstract: An illumination optical system for illuminating a target surface using light from a light source, includes a sensor for detecting a light intensity of the light, a light splitter for splitting part of the light, and an optical element, arranged between the light source and the light splitter, for transmitting the light, and for reflecting the part of the light that has been split by the light splitter, towards the sensor.

Abstract: Disclosed is an illumination optical system for illuminating a surface, to be illuminated, with use of light from a light source, which includes a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane, and an angular distribution transforming unit for transforming an angular distribution of light incident or to be incident on the diffractive optical element into a desired distribution.

Abstract: An exposure apparatus includes an illumination optical system for illuminating an reticle using light from a light source, a projection optical system for projecting a pattern of the reticle onto a substrate, and a variable stop having an opening for regulating an illumination area on the substrate, said variable stop is arranged near a position conjugate with the substrate, wherein a position of the variable stop is variable along an optical axis of the illumination optical system or an optical axis of the projection optical system.

Abstract: An exposure method illuminates a mask that forms a desired pattern and an auxiliary pattern smaller than the desired pattern, and projects light from the mask onto an object to be exposed via a projection optical system at a position offset from a focus position that provides the highest resolution so that the auxiliary pattern is not resolved.

Abstract: An exposure amount control method includes steps of illuminating an original with exposure light, emitted from a light source, through one or more light intensity uniforming optical systems, so that a pattern of the original illuminated is projected and printed on a substrate, measuring, by use of a first illuminance sensor, and illuminance of the exposure light as branched at a light source of the or one of the light intensity uniforming optical systems which is closest to the original, controlling an exposure amount of the substrate on the basis of a measurement output of the first illuminance sensor, measuring, by use of a second illuminance sensor, an illuminance at a position substantially conjugate with the substrate, and calibrating an output of the first illuminance sensor on the basis of a measurement output of the second illuminance sensor.

Abstract: A three-dimensional structure forming method that forms a three-dimensional structure made of a photosensitive material on a substrate includes the steps of determining a film thickness of the photosensitive material necessary to form the desired three-dimensional structure, comparing a predetermined maximum film thickness with the film thickness determined by the determining step, and applying, when the film thickness determined by the determining step is greater than the predetermined maximum film thickness, the photosensitive material within the maximum film thickness plural times until the photosensitive material has the film thickness on the substrate.

Abstract: An exposure method illuminates a mask that forms a desired pattern and an auxiliary pattern smaller than the desired pattern, and projects light from the mask onto an object to be exposed via a projection optical system at a position offset from a focus position that provides the highest resolution so that the auxiliary pattern is not resolved.

Abstract: An illumination system includes an optical system, an optical integrator and a condenser. The optical system collects light from a light source and includes a mirror for reflecting the light. The mirror has an ellipsoidal reflection surface of a shape being out of axial symmetry for defining an aperture of rectangular or semicircular shape as seen in an optical axis direction. The optical integrator produces plural light beams by use of light from the optical system and includes an array of condensing elements having a light entrance surface of rectangular shape as seen in the optical axis direction. A lengthwise direction of the rectangular-shaped or semicircular-shaped aperture of the ellipsoidal reflection surface corresponds to a lengthwise direction of the rectangular-shape light entrance surface of the condensing elements. The condenser illuminates a surface to be illuminated by use of the plural light beams.

Abstract: A method of controlling an amount of exposure, in which, when a pattern on a reticle is illuminated by illuminating light from a light source so as to be projected onto a substrate, an amount of light at a position substantially conjugate with a projected area on the substrate is measured and an amount of exposure applied to the substrate is controlled based upon a result of this measurement. The position at which the amount of light is measured is a position substantially conjugate with an off-optical-axis position in the projected area on the substrate.

Abstract: When a pattern on a reticle (8) is illuminated by illuminating light from a light source (1) so as to be projected onto a substrate (11) to expose the same, the illuminating light is diverted by a half-mirror (13), the amount of exposure is measured on the optical path of the diverted illuminating light and the amount of exposure of the substrate is controlled based upon the result of such measurement. The position of the half-mirror (13) is set in such a manner that the optical path of the diverted illuminating light passes through part of an optical element (5) situated on a side of the half-mirror (13) that faces the light source (1), and the amount of exposure is measured on the optical path of the diverted illuminating light following its passage through the optical element. This makes it possible to reduce the space for exposure measurement that is necessary to control the amount of exposure.

Abstract: Disclosed is an illumination optical system for illuminating a surface, to be illuminated, with use of light from a light source, which includes a diffractive optical element for forming a desired light intensity distribution upon a predetermined plane, and an angular distribution transforming unit for transforming an angular distribution of light incident or to be incident on the diffractive optical element into a desired distribution.

Abstract: Disclosed is an exposure amount control method wherein an original is illuminated with exposure light, emitted from an exposure light source, through one or more light intensity uniforming optical systems, so that a pattern of the original is illuminated is projected onto and printed on a substrate, wherein a first illuminance sensor is used to measure an illuminance of exposure light a branched at a light source side of the or one of the light intensity uniforming optical system which is closest to the original, wherein an exposure amount of the substrate is controlled on the basis of a measurement output of the first illuminance sensor, wherein a second illuminance sensor is used to measure an illuminance at a position substantially conjugate with the substrate, and wherein an output of the first illuminance sensor is calibrated on the basis of a measurement output of the second illuminance sensor.

Abstract: Paints of different color brightness not deposited on the work to be coated in a powder coating process are recovered as a mixture, and a fresh paint of high or low color brightness is added to the mixture to adjust its color brightness and thereby prepare a fresh mixture of medium color brightness which can be used as a paint of medium color brightness.