Patents by Inventor Kenji Shimazaki

Kenji Shimazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9682046
    Abstract: The present invention aims to provide an adsorbent for oral administration comprising ACF that has high adsorption or removal performance by adsorbing or removing toxic substances in the living body greatly and rapidly. The present invention is an adsorbent for oral administration comprising activated carbon fibers for treating or preventing kidney diseases or dialysis complications.
    Type: Grant
    Filed: October 5, 2012
    Date of Patent: June 20, 2017
    Assignee: Teijin Pharma Limited
    Inventors: Yasumi Nishiwaki, Takashi Murakami, Nobuaki Eto, Keiichiro Imaizumi, Akihito Ohtaki, Kenji Shimazaki
  • Publication number: 20140242147
    Abstract: The present invention aims to provide an adsorbent for oral administration comprising ACF that has high adsorption or removal performance by adsorbing or removing toxic substances in the living body greatly and rapidly. The present invention is an adsorbent for oral administration comprising activated carbon fibers for treating or preventing kidney diseases or dialysis complications.
    Type: Application
    Filed: October 5, 2012
    Publication date: August 28, 2014
    Applicant: TEIJIN PHARMA LIMITED
    Inventors: Yasumi Nishiwaki, Takashi Murakami, Nobuaki Eto, Keiichiro Imaizumi, Akihito Ohtaki, Kenji Shimazaki
  • Patent number: 8525552
    Abstract: A semiconductor integrated circuit device includes cells A-1, B-1, and C-1 that have the same logic. Cell B-1 has cell width W2 larger than a cell width of cell A-1, but gate length L1 of a MOS transistor is equal to that of cell A-1. Cell C-1 has cell width W2 equal to a cell width of cell B-1, but has a MOS transistor having large gate length L2. A circuit delay of cell C-1 becomes large as compared with that of cells A-1 and B-1, but leak current becomes small. Therefore, by replacing cell A-1 adjacent to a space area with cell B-1, and by replacing cell B-1 in a path having room in timing with cell C-1, for example, leak current can be suppressed without increasing a chip area.
    Type: Grant
    Filed: July 30, 2012
    Date of Patent: September 3, 2013
    Assignee: Panasonic Corporation
    Inventors: Takashi Ando, Keiichi Kusumoto, Kenji Shimazaki, Kazuyuki Nakanishi, Tetsurou Toubou
  • Patent number: 8407312
    Abstract: The problem to be solved by the invention is to deliver the contents corresponding to the same master content to a plurality of terminals having different display functions, without beforehand preparing a plurality of contents of different protocols (formats) depending on the display functions, respectively. A data delivery apparatus according to the invention converts master content information into respective converted contents by using conversion parameter information selected based on information notified from respective terminals.
    Type: Grant
    Filed: February 4, 2011
    Date of Patent: March 26, 2013
    Assignee: Hitachi, Ltd.
    Inventor: Kenji Shimazaki
  • Publication number: 20130027083
    Abstract: A semiconductor integrated circuit device includes cells A-1, B-1, and C-1 that have the same logic. Cell B-1 has cell width W2 larger than a cell width of cell A-1, but gate length L1 of a MOS transistor is equal to that of cell A-1. Cell C-1 has cell width W2 equal to a cell width of cell B-1, but has a MOS transistor having large gate length L2. A circuit delay of cell C-1 becomes large as compared with that of cells A-1 and B-1, but leak current becomes small. Therefore, by replacing cell A-1 adjacent to a space area with cell B-1, and by replacing cell B-1 in a path having room in timing with cell C-1, for example, leak current can be suppressed without increasing a chip area.
    Type: Application
    Filed: July 30, 2012
    Publication date: January 31, 2013
    Inventors: Takashi Ando, Keiichi Kusumoto, Kenji Shimazaki, Kazuyuki Nakanishi, Tetsurou Toubou
  • Publication number: 20110302271
    Abstract: The problem to be solved by the invention is to deliver the contents corresponding to the same master content to a plurality of terminals having different display functions, without beforehand preparing a plurality of contents of different protocols (formats) depending on the display functions, respectively. A data delivery apparatus according to the invention converts master content information into respective converted contents by using conversion parameter information selected based on information notified from respective terminals.
    Type: Application
    Filed: February 4, 2011
    Publication date: December 8, 2011
    Inventor: Kenji Shimazaki
  • Patent number: 7911027
    Abstract: It is an object of the invention to effectively absorb a power noise and to implement the stable operation of a circuit. The invention provides a semiconductor device comprising a bypass capacitor including an MOS structure having a gate electrode formed to be extended from a power wiring region to a portion provided under an empty region which is adjacent to the power wiring region and has no other functional layer, and formed through a capacitive insulating film on a diffusion region having one conductivity type, and a substrate contact formed under a ground wiring region and fixing a substrate potential, wherein the bypass capacitor has a contact to come in contact with the power wiring which is formed on a surface of the gate electrode and has the diffusion region having the one conductivity type and a diffusion region of the substrate contact connected to each other.
    Type: Grant
    Filed: April 10, 2007
    Date of Patent: March 22, 2011
    Assignee: Panasonic Corporation
    Inventors: Mitsumi Itoh, Masatoshi Sawada, Junko Honma, Kenji Shimazaki, Hiroyuki Tsujikawa, Hiroshi Benno
  • Patent number: 7779376
    Abstract: Operation analysis is performed for a semiconductor integrated circuit designed by using substrate bias control technology. Power supply potential and substrate potential are analyzed by using circuit information of the semiconductor integrated circuit, and from obtained power supply potential waveform information and substrate potential waveform information, potential difference information indicating a difference value between the power supply potential and the substrate potential is obtained. On the basis of this potential difference information, effects on circuit delay due to substrate noise are analyzed using a delay library showing a relationship between the difference value and the effects on circuit delay. Further, a determination is performed as to whether the difference value exceeds a predetermined difference restriction value.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: August 17, 2010
    Assignee: Panasonic Corporation
    Inventors: Shingo Miyahara, Kenji Shimazaki
  • Patent number: 7480875
    Abstract: In optimizing a necessary capacitance of a semiconductor integrated circuit, the capacitance optimization can be achieved with higher precision by optimizing an IR drop (voltage drop) while considering dynamically a cell activation rate. In other words, in estimating a power-supply capacitance inserted to suppress a voltage fluctuation of the power supply, an areal demerit can be reduced by reducing a necessary capacitance component as a whole while considering a cell activation rate in the circuit or by selecting the capacitance required to supplement only temporal portions whose power-supply fluctuation is wide after the estimation of a cell operating timing. Also, the process can be conducted in a short time at the early stage of design by using a wiring load model at the time of capacitance estimate.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: January 20, 2009
    Assignee: Panasonic Corporation
    Inventors: Kazuhiro Satoh, Kenji Shimazaki, Takahiro Ichinomiya, Shouzou Hirano
  • Publication number: 20080092090
    Abstract: Operation analysis is performed for a semiconductor integrated circuit designed by using substrate bias control technology. Power supply potential and substrate potential are analyzed by using circuit information of the semiconductor integrated circuit, and from obtained power supply potential waveform information and substrate potential waveform information, potential difference information indicating a difference value between the power supply potential and the substrate potential is obtained. On the basis of this potential difference information, effects on circuit delay due to substrate noise are analyzed using a delay library showing a relationship between the difference value and the effects on circuit delay. Further, a determination is performed as to whether the difference value exceeds a predetermined difference restriction value.
    Type: Application
    Filed: October 10, 2007
    Publication date: April 17, 2008
    Inventors: Shingo Miyahara, Kenji Shimazaki
  • Patent number: 7307333
    Abstract: It is an object of the invention to effectively absorb a power noise and to implement the stable operation of a circuit. The invention provides a semiconductor device comprising a bypass capacitor including an MOS structure having a gate electrode formed to be extended from a power wiring region to a portion provided under an empty region which is adjacent to the power wiring region and has no other functional layer, and formed through a capacitive insulating film on a diffusion region having one conductivity type, and a substrate contact formed under a ground wiring region and fixing a substrate potential, wherein the bypass capacitor has a contact to come in contact with the power wiring which is formed on a surface of the gate electrode and has the diffusion region having the one conductivity type and a diffusion region of the substrate contact connected to each other.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: December 11, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Mitsumi Itoh, Masatoshi Sawada, Junko Honma, Kenji Shimazaki, Hiroyuki Tsujikawa, Hiroshi Benno
  • Patent number: 7278124
    Abstract: An impedance of a power supply wire is calculated based on design data of a semiconductor integrated circuit, a frequency characteristic of the calculated impedance is obtained, and a design of the semiconductor integrated circuit is changed based on the obtained frequency characteristic. As the above-described impedance, an impedance between power supplies that are different in potential such as a power supply and a ground may be calculated, or an impedance between power supplies that are substantially the same in potential such as a power supply and an N-well power supply may be calculated. By a design modification, a wiring method, the number of pads, separation of power supplies, a type of package, a characteristic of an inductance element, a substrate structure, a distance between wires, a decoupling capacitance, a length of a wire, and a characteristic of a resistance element, for example, are changed.
    Type: Grant
    Filed: December 30, 2004
    Date of Patent: October 2, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Shimazaki, Kazuhiro Sato, Takahiro Ichinomiya, Shozo Hirano, Masao Takahashi, Hiroyuki Tsujikawa, Seijiro Kojima
  • Publication number: 20070187777
    Abstract: It is an object of the invention to effectively absorb a power noise and to implement the stable operation of a circuit. The invention provides a semiconductor device comprising a bypass capacitor including an MOS structure having a gate electrode formed to be extended from a power wiring region to a portion provided under an empty region which is adjacent to the power wiring region and has no other functional layer, and formed through a capacitive insulating film on a diffusion region having one conductivity type, and a substrate contact formed under a ground wiring region and fixing a substrate potential, wherein the bypass capacitor has a contact to come in contact with the power wiring which is formed on a surface of the gate electrode and has the diffusion region having the one conductivity type and a diffusion region of the substrate contact connected to each other.
    Type: Application
    Filed: April 10, 2007
    Publication date: August 16, 2007
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Mitsumi Itoh, Masatoshi Sawada, Junko Honma, Kenji Shimazaki, Hiroyuki Tsujikawa, Hiroshi Benno
  • Patent number: 7225418
    Abstract: There are contained the step of forming voltage waveform information by calculating a voltage waveform of each instance of a semiconductor integrated circuit at a power-supply terminal based on circuit information and analyzing the voltage waveform of each instance, the step of forming voltage abstraction information by abstracting the voltage waveform information, and the step of calculating a delay value of the instance based on the voltage abstraction information.
    Type: Grant
    Filed: June 9, 2004
    Date of Patent: May 29, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Shimazaki, Kazuhiro Sato, Takahiro Ichinomiya, Nobufusa Iwanishi, Naoki Amekawa, Masaaki Hirata, Shouzou Hirano
  • Patent number: 7120551
    Abstract: The resistance value of a supply line (Rline), the resistance value of a decoupling capacitor (Rcap), and the resistance value of a transistor (Rmos) are separately calculated from mask layout information of a semiconductor integrated circuit. The resistance value between external terminals (Ri) is calculated from the resistance value Rline, the resistance value Rcap, and the resistance value Rmos.
    Type: Grant
    Filed: February 9, 2005
    Date of Patent: October 10, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shozo Hirano, Kenji Shimazaki
  • Publication number: 20060143585
    Abstract: In optimizing a necessary capacitance of a semiconductor integrated circuit, the capacitance optimization can be achieved with higher precision by optimizing an IR drop (voltage drop) while considering dynamically a cell activation rate. In other words, in estimating a power-supply capacitance inserted to suppress a voltage fluctuation of the power supply, an areal demerit can be reduced by reducing a necessary capacitance component as a whole while considering a cell activation rate in the circuit or by selecting the capacitance required to supplement only temporal portions whose power-supply fluctuation is wide after the estimation of a cell operating timing. Also, the process can be conducted in a short time at the early stage of design by using a wiring load model at the time of capacitance estimate.
    Type: Application
    Filed: December 21, 2005
    Publication date: June 29, 2006
    Inventors: Kazuhiro Satoh, Kenji Shimazaki, Takahiro Ichinomiya, Shouzou Hirano
  • Publication number: 20060091550
    Abstract: In a method of analyzing a power noise based on the circuit information of a semiconductor integrated circuit device, the power noise is analyzed in consideration of the influence of the impedance of a substrate. Consequently, the impedance of the substrate which has not been conventionally considered is taken into consideration. Thus, precision in the analysis can be enhanced more greatly.
    Type: Application
    Filed: September 22, 2005
    Publication date: May 4, 2006
    Inventors: Kenji Shimazaki, Kazuhiro Satoh, Hiroyuki Tsujikawa, Shouzou Hirano, Makoto Nagata
  • Patent number: 7039572
    Abstract: In a gate-level logic simulation, a change in electric current is calculated from event information 5 output from a logic simulator 4 through use of a current waveform calculation section 7. The thus-calculated change in current is subjected to FFT processing through use of an FFT processing section 9, thereby determining a frequency characteristic of EMI and enabling EMI analysis.
    Type: Grant
    Filed: July 7, 2000
    Date of Patent: May 2, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Hidetoshi Narahara, Seijirou Kojima, Hiroyuki Tsujikawa, Kenji Shimazaki, Kasumi Hamaguchi
  • Patent number: 6959250
    Abstract: In contrast with a known dynamic gate-level simulation method, a method of analyzing electromagnetic interference (an EMI analysis method) according to the present invention enables estimation of EMI noise, by means of calculating signal propagation of each node through use of the signal propagation probability technique, and calculating variation time of each node through use of “the Static timing analysis technique”. In short, the present invention is characterized in calculating a frequency characteristic from the relationship between toggle probability of each node and delay in each node.
    Type: Grant
    Filed: July 13, 2000
    Date of Patent: October 25, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Shimazaki, Hiroyuki Tsujikawa, Seijirou Kojima, Shouzou Hirano
  • Publication number: 20050177334
    Abstract: The resistance value of a supply line (Rline), the resistance value of a decoupling capacitor (Rcap), and the resistance value of a transistor (Rmos) are separately calculated from mask layout information 31 of a semiconductor integrated circuit. The resistance value between external terminals (Ri) is calculated from the resistance value Rline, the resistance value Rcap, and the resistance value Rmos.
    Type: Application
    Filed: February 9, 2005
    Publication date: August 11, 2005
    Inventors: Shozo Hirano, Kenji Shimazaki