Patents by Inventor Kenji Tanimoto
Kenji Tanimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20030201391Abstract: A circuit pattern inspecting instrument includes an electron-optical system for irradiating an electron beam on a sample, an electron beam deflector, a detector for detecting secondary charged particles from the sample, and a mode setting unit for switching between a first mode and a second mode. An electron beam current is larger in the first mode than in the second mode, and an electron beam scanning speed is higher in the first mode than in the second mode. The circuit pattern inspecting instrument is configured so that first the sample is observed in the first mode, then a particular position on the sample is selected based on image data produced by an output of the detector in the first mode, and then the particular position on the sample is observed in the second mode.Type: ApplicationFiled: April 2, 2003Publication date: October 30, 2003Inventors: Hiroyuki Shinada, Atsuko Takafuji, Takanori Ninomiya, Yuko Sasaki, Mari Nozoe, Hisaya Murakoshi, Taku Ninomiya, Yuji Kasai, Hiroshi Makino, Yutaka Kaneko, Kenji Tanimoto
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Patent number: 6583413Abstract: A circuit pattern inspecting instrument includes an electron-optical system for irradiating an electron beam on a sample, an electron beam deflector, a detector for detecting secondary charged particles from the sample, and a mode setting unit for switching between a first mode and a second mode. An electron beam current is larger in the first mode than in the second mode, and an electron beam scanning speed is higher in the first mode than in the second mode. The circuit pattern inspecting instrument is configured so that first the sample is observed in the first mode, then a particular position on the sample is selected based on image data produced by an output of the detector in the first mode, and then the particular position on the sample is observed in the second mode.Type: GrantFiled: August 30, 2000Date of Patent: June 24, 2003Assignee: Hitachi, Ltd.Inventors: Hiroyuki Shinada, Atsuko Takafuji, Takanori Ninomiya, Yuko Sasaki, Mari Nozoe, Hisaya Murakoshi, Taku Ninomiya, Yuji Kasai, Hiroshi Makino, Yutaka Kaneko, Kenji Tanimoto
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Publication number: 20030007920Abstract: There is provided a crystalline ceric oxide sol that is approximately monodisperse, and a process for producing the sol.Type: ApplicationFiled: February 19, 2002Publication date: January 9, 2003Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Isao Ota, Tohru Nishimura, Kenji Tanimoto
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Publication number: 20020086618Abstract: There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass.Type: ApplicationFiled: December 17, 2001Publication date: July 4, 2002Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Isao Ota, Kenji Tanimoto, Tohru Nishimura
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Patent number: 6372003Abstract: According to the present invention, a process is provided for producing crystalline ceric oxide particles having a particle diameter of 0.005 to 5 &mgr;m, which comprises the steps of reacting a cerium (III) salt with an alkaline substance in an (OH)/(Ce3+) molar ratio of 3 to 30 in an aqueous medium in an inert gas atmosphere to produce a suspension of cerium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension at a temperature of 10 to 95° C. and at an atmospheric pressure.Type: GrantFiled: July 9, 1999Date of Patent: April 16, 2002Assignee: Nissan Chemical Industries, Ltd.Inventors: Toshio Kasai, Isao Ota, Takao Kaga, Tohru Nishimura, Kenji Tanimoto
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Patent number: 6336775Abstract: A gas floating-transporting apparatus transports a material to be treated along a predetermined direction in a thermal space so as to thermally treat the material to be treated. The apparatus includes a gas floating mechanism and a transporting mechanism. The gas floating mechanism includes a gas ejection device which expels the gas toward a portion of the material to be treated on which a floating force is acted so as to float the material to be treated, and a gas supply device which supplies the gas to the gas ejection means. The transporting mechanism includes an abutting member which abuts a trailing end of the floated material to be treated and moves along the predetermined direction, and which pushes the material to be treated by the movement thereof, whereby the floated material to be treated is moved along the predetermined direction.Type: GrantFiled: August 12, 1999Date of Patent: January 8, 2002Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Makoto Morita, Yuji Tsutsui, Masaru Yoshida, Nobuhito Yokoyama, Kenji Tanimoto
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Patent number: 6119471Abstract: Cooling operation is performed so as to keep a freezer at a selected temperature. Moreover, if the cooling operation enters a phase where the freezer temperature is higher than the selected temperature by a predetermined deviation or more, not only the deviation temperature but also an accumulated time obtained by accumulating the time periods during which the cooling operation is performed at the deviation temperature or higher are stored. In addition, when an instruction signal to indicate an accumulation is input, the stored accumulated time and deviation temperature are read out and indicated on a segment indicating section (7S).Type: GrantFiled: March 26, 1998Date of Patent: September 19, 2000Assignee: Daikin Industries, Ltd.Inventors: Shigeto Tanaka, Akira Horikawa, Kenji Tanimoto, Hisaaki Takaoka
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Patent number: 5962343Abstract: According to the present invention, a process is provided for producing crystalline ceric oxide particles having a particle diameter of 0.005 to 5 .mu.m, which comprises the steps of reacting a cerium (III) salt with an alkaline substance in an (OH)/(Ce.sup.3+) molar ratio of 3 to 30 in an aqueous medium in an inert gas atmosphere to produce a suspension of cerium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension at a temperature of 10 to 95.degree. C. and at an atmospheric pressure.Type: GrantFiled: July 24, 1997Date of Patent: October 5, 1999Assignee: Nissan Chemical Industries, Ltd.Inventors: Toshio Kasai, Isao Ota, Takao Kaga, Tohru Nishimura, Kenji Tanimoto
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Patent number: 5458864Abstract: A process for producing a high-purity silica, which comprises the steps of reacting a crude silica with ammonium fluoride, acid ammonium fluoride or a mixture thereof in an aqueous medium to produce ammonium silicofluoride, separating the ammonium silicofluoride from an unreacted silica and impurities by the means of a solid/liquid separation, and reacting the thus-obtained ammonium silicofluoride with ammonia in an aqueous medium. This process is a low cost process, and enables to control properties of silica.Type: GrantFiled: May 28, 1993Date of Patent: October 17, 1995Assignee: Nissan Chemical Industries Ltd.Inventors: Makoto Tsugeno, Kenji Tanimoto, Masao Kubo
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Patent number: 5266289Abstract: A process for producing a high-purity silica, which comprises the steps of reacting a crude silica with ammonium fluoride, acid ammonium fluoride or a mixture thereof in an aqueous medium to produce ammonium silicofluoride, separating the ammonium silicofluoride from an unreacted silica and impurities by the means of a solid/liquid separation, and reacting the thus-obtained ammonium silicofluoride with ammonia in an aqueous medium. This process is a low cost process, and enables to control properties of silica.Type: GrantFiled: November 14, 1990Date of Patent: November 30, 1993Assignee: Nissan Chemical Industries Ltd.Inventors: Makoto Tsugeno, Kenji Tanimoto, Masao Kubo
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Patent number: 5221497Abstract: A method for preparing a stable silica sol having an SiO.sub.2 concentration of 40% or less, the colloidal particles of said silica having a particle size of 40 to 500 nm, as measured by dynamic light-scattering and having an elongated shape having a thickness of 5 to 40 nm and an elongation of 5 to 30 times the thickness in only one plane, the method comprising the steps (a), (b) and (c): (a) mixing an aqueous solution of Ca or Mg salt with an aqueous solution of active silicic acid having an SiO.sub.2 concentration of 1 to 6% and a pH value of 2 to 5, or with an aqueous acidic silica sol having a particle size of 3 to 30 nm, an SiO.sub.2 concentration of 0.5 to 25% and a pH value of 1 to 5 in a weight ratio of 1500 to 10000 ppm of (CaO or MgO)/SiO.sub.2 ; (b) mixing an alkali metal hydroxide with the solution obtained by step (a) in a molar ratio of 20 to 300 as SiO.sub.2 /M.sub.2 O, wherein M represents an alkali metal atom; and (c) heating the mixture obtained by step (b) at 60.degree. to 300.degree. C.Type: GrantFiled: August 19, 1991Date of Patent: June 22, 1993Assignee: Nissan Chemical Industries, Ltd.Inventors: Yoshitane Watanabe, Mikio Ando, Kenji Tanimoto, Tsutomu Kagamimiya, Makoto Kawashima
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Patent number: 5196177Abstract: A sol of flat silica particles (100-1000 nm in size) is produced by the following steps (a) to (d) from an acidic aqueous sol (S.sub.0) of negatively charged silica particles (7-30 nm in diameter) and an aqueous solution (B) of basic aluminum or zirconium salt.(a) mixing 100 parts by weight (as SiO.sub.2) of the sol (S.sub.0) with 0.2-10 parts by weight (as Al.sub.2 O.sub.3 or ZrO.sub.2) of the aqueous solution (B), and adjusting the resulting sol to pH 4-7, thereby yielding a sol (S.sub.1),(b) mixing 100 parts by weight (as SiO.sub.2) of the sol (S.sub.1) with 20-200 parts by weight (as SiO.sub.2) of the sol (S.sub.0), and adjusting the resulting sol to pH 4-7, thereby yielding a sol (S.sub.2),(c) mixing 100 parts by weight (as SiO.sub.2) of the sol (S.sub.2) with the aqueous solution (B) in an amount corresponding to 2-50% of the amount (as Al.sub.2 O.sub.3 or ZrO.sub.2 in parts by weight) added to 100 parts by weight (as SiO.sub.2) of the sol (S.sub.Type: GrantFiled: January 15, 1991Date of Patent: March 23, 1993Assignee: Nissan Chemical Industries, Ltd.Inventors: Yoshitane Watanabe, Yoshiyuki Kashima, Kenji Tanimoto
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Patent number: 4464682Abstract: An auxiliary scanning control system for facsimile is provided with a white line skip function to speed communication. A mechanism is provided whereby the data corresponding to the first line of information following the line skipping operation is added to that of the next line and stored in a memory unit, so that the information of the first line is not neglected in subsequent printing.Type: GrantFiled: May 13, 1982Date of Patent: August 7, 1984Assignee: Fuji Xerox Co., Ltd.Inventors: Satoshi Etoh, Junichi Kobayashi, Kenji Tanimoto
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Patent number: 4336109Abstract: Acetone having a markedly low content of aldehydes is recovered from an aqueous rectification residue brought about by rectification of crude acetone carried out after one crude acetone having been alkali-treated or while an alkali or an aqueous solution thereof being added to the crude acetone, by mixing the aqueous rectification residue with an alkali, neutralizing the mixture to a pH of 4 to 9, and then subjecting the resulting mixture to distillation to obtain acetone as a distillate.Type: GrantFiled: May 19, 1980Date of Patent: June 22, 1982Assignee: Sumitomo Chemical Company, LimitedInventors: Hirokazu Hosaka, Kenji Tanimoto, Kunihiko Tanaka, Toshiharu Morita, Katsuyuki Shiota, Yuji Ueda, Seiichi Kai
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Patent number: 4059637Abstract: A method for extracting a dihydroperoxide of a dialkylbenzene of the formula, ##STR1## wherein each R.sub.1, R.sub.2, R.sub.3 and R.sub.4 is independently a lower alkyl group, from an aqueous alkali solution of the said dihydroperoxide with at least one organic solvent selected from the group consisting of C.sub.4 -C.sub.10 ketones, C.sub.4 -C.sub.10 ethers and C.sub.4 -C.sub.8 alcohols, which comprises extracting the dihydroperoxide by a countercurrent multi-stage extraction at a temperature between 0.degree. and 85.degree. C with a temperature gradient, the aqueous alkali solution being fed to the lower temperature zone, the organic solvent being fed to the higher temperature zone, and each aqueous alkali solution and organic solvent being fed countercurrently, whereby the dihydroperoxide is obtained in the form of organic solvent solution from the lower temperature zone.Type: GrantFiled: August 22, 1975Date of Patent: November 22, 1977Assignee: Sumitomo Chemical Company, LimitedInventors: Hirokazu Hosaka, Kenji Tanimoto, Hiromichi Okabe, Kunthiko Tanaka, Yuji Ueda, Iwao Dohgane
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Patent number: 4049720Abstract: A process for the continuous production of .beta.-isopropylnaphthalene hydroperoxide comprising oxidizing an isopropylnaphthalene mixture containing .alpha.- and .beta.-isopropylnaphthalene isomers with molecular oxygen or a molecular oxygen containing gas in an oxidation zone and recycling unreacted ispropylnaphthalene recoverd after the oxidation to the oxidation zone, in which the oxidation is carried out by controlling the .alpha.-isopropylnaphthalene content in the isopropylnaphthalene mixture continuously fed to the oxidation zone to about 15% by weight or less.Type: GrantFiled: February 21, 1975Date of Patent: September 20, 1977Assignee: Sumitomo Chemical Company, LimitedInventors: Hirokazu Hosaka, Kenji Tanimoto, Hiroshi Yamachika
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Patent number: 4023080Abstract: A circuit for synchronizing a motor at the receiving end of a communication link with one at the transmitting end thereof, the circuit preventing an indication of synchronization until the receiving end motor reaches its rated speed.Type: GrantFiled: April 7, 1975Date of Patent: May 10, 1977Assignee: Fuji Xerox Co., Ltd.Inventor: Kenji Tanimoto
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Patent number: 3985819Abstract: A process for producing alkylnaphthalenes by alkylating naphthalene with an olefin having 2 to 4 carbon atoms, which comprises (1) introducing the olefin into a solution of crude naphthalene containing thianaphthene as an impurity in a solvent having a boiling point sufficiently different from the boiling point of the naphthalene and alkylnaphthalenes produced that the solvent is separable by distillation in the presence of (i) an aluminum chloride complex consisting of (a) aluminum chloride, (b) hydrogen chloride and (c) an alkylated benzene or naphthalene, or (ii) a solid aluminum chloride which is dissolved into the reaction solution by adding gaseous hydrogen chloride simultaneously with or prior to the introducing of the olefin, (2) aging the reaction solution, and (3) recovering the resulting alkylnaphthalenes, whereby alkylnaphthalenes, containing as monoalkylnaphthalenes a predominant amount of a .beta.-monoalkylnaphthalene, are obtained in a high yield.Type: GrantFiled: October 8, 1974Date of Patent: October 12, 1976Assignee: Sumitomo Chemical Company, LimitedInventors: Katsumi Kobayashi, Iwao Dohgane, Hiromichi Okabe, Kenji Tanimoto
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Patent number: 3969420Abstract: Resorcinol and hydroquinone are recovered in mixture at a high purity from a solution containing resorcinol and hydroquinone, especially, a solution resulting from cleavage of oxidation products of isopropylbenzene and successive distillation of the cleavage product thereby to remove lower and higher boiling components therefrom, by adding 0.Type: GrantFiled: July 2, 1973Date of Patent: July 13, 1976Assignee: Sumitomo Chemical Company, LimitedInventors: Hideaki Suda, Iwao Dohgane, Takashi Chinuki, Kenji Tanimoto, Hirokazu Hosaka, Yukimichi Nakao, Yuji Ueda, Seiya Imada, Hideki Yanagihara, Kunihiko Tanaka
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Patent number: 3953521Abstract: Meta-and/or paradiisopropylbenzene dihydroperoxides are continuously produced by oxidizing meta-and/or paradiisopropylbenzenes in liquid phase through contact with oxygen or a gas containing oxygen, while keeping the concentration of meta-and/or paradiisopropylbenzene monohydroperoxides of the oxidation product solution in a range of 20 to 40% by weight.Type: GrantFiled: June 27, 1975Date of Patent: April 27, 1976Assignee: Sumitomo Chemical Company, LimitedInventors: Hideaki Suda, Iwao Dohgane, Takashi Chinuki, Kenji Tanimoto, Hirokazu Hosaka, Yukimichi Nakao, Yuji Ueda, Seiya Imada, Hideki Yanagihara, Kunihiko Tanaka