Abstract: A cross reality system that provides an immersive user experience by storing persistent spatial information about the physical world that one or multiple user devices can access to determine position within the physical world and that applications can access to specify the position of virtual objects within the physical world. Persistent spatial information enables users to have a shared virtual, as well as physical, experience when interacting with the cross reality system. Further, persistent spatial information may be used in maps of the physical world, enabling one or multiple devices to access and localize into previously stored maps, reducing the need to map a physical space before using the cross reality system in it. Persistent spatial information may be stored as persistent coordinate frames, which may include a transformation relative to a reference orientation and information derived from images in a location corresponding to the persistent coordinate frame.

Abstract: A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a nanosecond pulser having a nanosecond pulser input; a plurality of switches coupled with the nanosecond pulser input; one or more transformers coupled with the plurality of switches; and an output coupled with the one or more transformers and providing a high voltage waveform with a amplitude greater than 2 kV and a frequency greater than 1 kHz based on the nanosecond pulser input. The nanosecond pulser system may also include a control module coupled with the nanosecond pulser input; and an control system coupled with the nanosecond pulser at a point between the transformer and the output, the control system providing waveform data regarding an high voltage waveform produced at the point between the transformer and the output.

Abstract: The instant disclosure is directed to devices and methods for deploying a biased occlusion clamp. In addition, the present disclosure includes devices and methods for deploying a biased occlusion clamp using robotics. Moreover, the present disclosure includes devices and methods for reducing the force necessary to open an occlusion clamp without permanently compromising the clamping force of the clamp itself.

Abstract: A pulse generator is disclosed. The pulse generator includes a DC source; a plurality of switches, a transformer; and a pulsing output. The pulse generator can be coupled with a plasma chamber. The pulsing output outputs high voltage pulses having a peak-to-peak voltage greater than 1 kV and a voltage portion between consecutive high voltage bipolar pulses that has a negative slope that substantially offsets the voltage reduction on a wafer within a plasma chamber due to an ion current. The resulting voltage at the wafer may be substantially flat between consecutive pulses.

Abstract: A high voltage pulsing power system is disclosed that include a DC power supply, a switch circuit electrically coupled with the DC power supply, a droop control circuit coupled with the switch circuit, and/or an output. The switch circuit includes a plurality of switch modules and produces a plurality of pulses. The droop control circuit includes a droop diode, a droop inductor, and a droop element. The droop diode may be electrically coupled in series between the switch circuit and the transformer primary that allows the negative pulse portion of the pulses to pass from the switching circuit to the transformer primary. The droop inductor and he droop element may be arranged in series across the droop diode to allow the negative pulse portion of the pulses to pass from the switching circuit to the transformer primary and/or store energy from the negative pulse portion of the pulses.

Abstract: In some embodiments, a wireless MWD module is included in a MWD tool to enable communication between the MWD tool and a rig wireless module located at a rig surface. In some embodiments, a repeater is disposed at a drill collar to enable enhanced communication between the wireless MWD module in the MWD tool disposed within a borehole and the rig wireless module located at the rig surface.

Abstract: Methods and materials for modulating low light and/or shade tolerance, and red light specific responses in plants are disclosed. For example, nucleic acids encoding low light and/or SD+EODFR-tolerance polypeptides are disclosed as well as methods for using such nucleic acids to transform plant cells. Also disclosed are plants having increased low light and/or SD+EODFR tolerance. In addition, methods and materials involved in increasing UV-B tolerance in plants and methods and materials involved in modulating biomass levels in plants are provided.

Abstract: A bipolar high voltage bipolar pulsing power supply is disclosed that can produce high voltage bipolar pulses with a positive high voltage pulse greater than about 2 kV followed by a negative high voltage pulse less than about ?2 kV with a positive to negative dwell period between the positive high voltage pulse and the negative high voltage pulse. A high voltage bipolar pulsing power supply, for example, can reproduce high voltage pulses with a pulse repetition rate greater than about 10 kHz.

Abstract: Methods and materials for modulating low light and/or shade tolerance, and red light specific responses in plants are disclosed. For example, nucleic acids encoding low light and/or SD+EODFR-tolerance polypeptides are disclosed as well as methods for using such nucleic acids to transform plant cells. Also disclosed are plants having increased low light and/or SD+EODFR tolerance. In addition, methods and materials involved in increasing UV-B tolerance in plants and methods and materials involved in modulating biomass levels in plants are provided.

Abstract: Methods, devices, apparatuses and systems are disclosed for performing mammography, such as utilizing tomosynthesis in combination with breast biopsy.

Abstract: Some embodiments include methods and systems for wafer biasing in a plasma chamber. A method, for example, may include: generating a first high voltage by a first pulsed voltage source using DC voltages and coupling the first high voltage to a wafer in the plasma chamber via at least one direct connection, the at least one direct connection enabling ion energy control in the plasma chamber; generating one or more of low and medium voltages by a second pulsed voltage source; coupling, capacitively, the one or more of low and medium voltages to the wafer; and pulsing the first high voltage and the one or more of low and medium voltages to achieve a configurable ion energy distribution in the wafer.

Abstract: Some embodiments include a nanosecond pulser circuit. In some embodiments, a nanosecond pulser circuit may include: a high voltage power supply; a nanosecond pulser electrically coupled with the high voltage power supply and switches voltage from the high voltage power supply at high frequencies; a transformer having a primary side and a secondary side, the nanosecond pulser electrically coupled with the primary side of the transformer; and an energy recovery circuit electrically coupled with the secondary side of the transformer. In some embodiments, the energy recovery circuit comprises: an inductor electrically coupled with the high voltage power supply; a crowbar diode arranged in parallel with the secondary side of the transformer; and a second diode disposed in series with the inductor and arranged to conduct current from a load to the high voltage power supply.

Abstract: In some embodiments, a system including a tool drill string having a downhole device is disclosed. The downhole device includes a memory storing instructions and a downhole processor configured to execute the instructions to operate in a first transmission mode by default. The downhole processor is communicatively coupled to an uphole processor via the first transmission mode. The downhole processor is further to transmit, via a second transmission mode, a message to the uphole processor, determine whether a response is received, via the second transmission mode, from the uphole processor, and responsive to determining the response is received from the uphole processor, switch from the first transmission mode to the second transmission mode.

Abstract: A method is disclosed for receiving, from a downhole system, data at a transmitter module of an intra-bottom hole assembly (BHA), wherein the transmitter module comprises a magnetic transmission antenna; transmitting, via a wireless short-range communication using the magnetic transmission antenna, the data to a receiver module of the intra-BHA, wherein the transmitter module and the receiver module form an intra-BHA network using the wireless short-range communication; receiving, via the wireless short-range communication, the data at the receiver module; transmitting the data to a measurement while drilling (MWD) tool; receiving, at the MWD tool, the data; and transmitting, via a type of telemetry, the data from the MWD tool to a surface processor.

Abstract: In one embodiment, a computer-implemented method is disclosed. The method includes operating a downhole tool by transmitting first data to one or more surface processors in a telemetry sequence. The first data may include a flex word having a first identifier identifying a first payload, and the first data is transmitted using a synchronized time sequence. The method includes detecting, by the downhole tool, an operating condition that occurs while the downhole tool is downhole. Based on the operating condition, the method includes dynamically changing the flex word to comprise a second identifier identifying a second payload transmitted in second data in the telemetry sequence to the one or more surface processors, and the second data is transmitted in the telemetry sequence using the synchronized time sequence.

Abstract: Some embodiments include methods and systems for wafer biasing in a plasma chamber. A method, for example, may include: generating a first high voltage by a first pulsed voltage source using DC voltages and coupling the first high voltage to a wafer in the plasma chamber via at least one direct connection, the at least one direct connection enabling ion energy control in the plasma chamber; generating one or more of low and medium voltages by a second pulsed voltage source; coupling, capacitively, the one or more of low and medium voltages to the wafer; and pulsing the first high voltage and the one or more of low and medium voltages to achieve a configurable ion energy distribution in the wafer.

Abstract: A bipolar high voltage bipolar pulsing power supply is disclosed that can produce high voltage bipolar pulses with a positive high voltage pulse greater than about 2 kV followed by a negative high voltage pulse less than about ?2 kV with a positive to negative dwell period between the positive high voltage pulse and the negative high voltage pulse. A high voltage bipolar pulsing power supply, for example, can reproduce high voltage pulses with a pulse repetition rate greater than about 10 kHz.

Abstract: In some embodiments, a system includes an uphole processor and a tool drill string having a downhole device including a downhole processor. The uphole processor may include a memory storing instructions, the uphole processor may be communicatively coupled to the downhole processor, and the uphole processor may be configured to execute the instructions to determine a configuration setting of the system, determine whether the configuration setting indicates a trigger event has occurred, and responsive to determining the trigger event has occurred, transmit a downlink message to the downhole processor to modify an aspect of the downhole device.

Abstract: A nanosecond pulser system is disclosed. In some embodiments, the nanosecond pulser system may include a nanosecond pulser having a nanosecond pulser input; a plurality of switches coupled with the nanosecond pulser input; one or more transformers coupled with the plurality of switches; and an output coupled with the one or more transformers and providing a high voltage waveform with a amplitude greater than 2 kV and a frequency greater than 1 kHz based on the nanosecond pulser input. The nanosecond pulser system may also include a control module coupled with the nanosecond pulser input; and an control system coupled with the nanosecond pulser at a point between the transformer and the output, the control system providing waveform data regarding an high voltage waveform produced at the point between the transformer and the output.

Abstract: In one embodiment, a method is disclosed for using a trained machine learning model to classify mud pulse signals. The method may include receiving a mud pulse signal from a measurement while drilling (MVWD) tool, wherein the mud pulse signal includes data. The method may also include decoding, using the trained machine learning model, the data to determine a value of the data, and providing a user interface comprising the value of the data for presentation on a computing device of a user.