Abstract: In order to secure a door in a locked position without a key, such as to resist a forced entry through the door, a removable, non-intrusive, remotely-controlled door locking apparatus is provided, which includes a rear plate for attachment against a surface of a door using an adhesive substance, a flange that extends from the rear plate under the door, and a cover for enclosing components on the rear plate. A DC-powered linear actuator connected to the rear plate and at least one electronics module configured to communicate wirelessly is within the cover. A foot of the actuator is configured to be extended in a lock state against a floor surface to secure the door or retracted in an unlock state, based on either a wireless signal received from a remote smart device or the state of a manual switch located on apparatus to control the actuator.

Abstract: In order to secure a door in a locked (or locked open) position without a key, such as to resist a forced entry through the door, a removable, remotely-controlled door locking apparatus is provided, which includes a rear plate for attachment against a surface of a door, a cover for enclosing components on the rear plate, and a telescoping arm assembly connected to the rear plate and extendible so that the other end attaches to a door knob. A DC-powered linear actuator connected to the rear plate and at least one electronics module configured to communicate wirelessly is within the cover. A foot of the actuator is configured to be extended in a lock state against a floor surface to secure the door or retracted in an unlock state, based on a wireless signal received from a remote smart device to control the actuator.

Abstract: In order to secure a door in a locked (or locked open) position without a key, such as to resist a forced entry through the door, a removable, remotely-controlled door locking apparatus is provided, which includes a rear plate for attachment against a surface of a door, a cover for enclosing components on the rear plate, and a telescoping arm assembly connected to the rear plate and extendible so that the other end attaches to a door knob. A DC-powered linear actuator connected to the rear plate and at least one electronics module configured to communicate wirelessly is within the cover. A foot of the actuator is configured to be extended in a lock state against a floor surface to secure the door or retracted in an unlock state, based on a wireless signal received from a remote smart device to control the actuator.

Abstract: In order to secure a door in a locked (or locked open) position without a key, such as to resist a forced entry through the door, a removable, remotely-controlled door locking apparatus is provided, which includes a housing configured for temporary fixed engagement to a portion of the door. The housing has a front facing surface sloped forward and downward at an angle from horizontal as taken from a top to a bottom of the apparatus, and an actuator arranged therein so as to be substantially parallel to the sloping front facing surface between upper and lower ends thereof. The apparatus may further include a movable foot attached to the actuator and configured, under actuator control, to be extended in a lock state against a floor surface to secure the door or retracted in an unlock state, based on a wireless signal received from a remote smart device.

Abstract: Methods and apparatus for applying pulsed DC power to a plasma processing chamber are disclosed. In some implementations, frequency of the applied power is varied to achieve desired processing effects such as deposition rate, arc rate, and film characteristics. In addition, a method and apparatus are disclosed that utilize a relatively high potential during a reverse-potential portion of a particular cycle to mitigate possible nodule formation on the target. The relative durations of the reverse-potential portion, a sputtering portion, and a recovery portion of the cycle are adjustable to effectuate desired processing effects.

Abstract: Methods and apparatus for applying pulsed DC power to a plasma processing chamber are disclosed. In some implementations, frequency of the applied power is varied to achieve desired processing effects such as deposition rate, arc rate, and film characteristics. In addition, a method and apparatus are disclosed that utilize a relatively high potential during a reverse-potential portion of a particular cycle to mitigate possible nodule formation on the target. The relative durations of the reverse-potential portion, a sputtering portion, and a recovery portion of the cycle are adjustable to effectuate desired processing effects.

Abstract: A process control apparatus including an actuator configured to effect changes in an industrial process, a power supply, a plurality of current switches coupled between the actuator and the power supply and a controller coupled to the plurality of current switches. The controller is configured to selectively close one or more of the plurality of current switches so as to provide a selectable level of current from the power supply to the actuator. In variations, a plurality of discharge switches are coupled to the actuator and the controller is configured to selectively close the discharge switches so as to provide a selectable level of charge to discharge from the actuator.

Abstract: A process control apparatus including an actuator configured to effect changes in an industrial process, a power supply, a plurality of current switches coupled between the actuator and the power supply and a controller coupled to the plurality of current switches. The controller is configured to selectively close one or more of the plurality of current switches so as to provide a selectable level of current from the power supply to the actuator. In variations, a plurality of discharge switches are coupled to the actuator and the controller is configured to selectively close the discharge switches so as to provide a selectable level of charge to discharge from the actuator.

Abstract: A process control apparatus including an actuator configured to effect changes in an industrial process, a power supply, a plurality of current switches coupled between the actuator and the power supply and a controller coupled to the plurality of current switches. The controller is configured to selectively close one or more of the plurality of current switches so as to provide a selectable level of current from the power supply to the actuator. In variations, a plurality of discharge switches are coupled to the actuator and the controller is configured to selectively close the discharge switches so as to provide a selectable level of charge to discharge from the actuator.

Abstract: A process control apparatus including an actuator configured to effect changes in an industrial process, a power supply, a plurality of current switches coupled between the actuator and the power supply and a controller coupled to the plurality of current switches. The controller is configured to selectively close one or more of the plurality of current switches so as to provide a selectable level of current from the power supply to the actuator. In variations, a plurality of discharge switches are coupled to the actuator and the controller is configured to selectively close the discharge switches so as to provide a selectable level of charge to discharge from the actuator.

Abstract: Energy efficient circuitry is provided for rapid transfer of charge to and from a reactive load while avoiding excessive peak currents and significant resistive energy dissipation. For example, circuitry of the invention provides for rapid actuation of a piezoelectric mass flow valve actuator while significantly reducing electrical input power and power dissipation requirements. The invention also features circuitry for recovering a substantial portion of the energy delivered to the reactive load while still permitting rapid cycling of the load drive circuit. Controlling the activation interval of the drive circuitry provides for incremental actuation or positioning of the reactive load.