Patents by Inventor Kensuke Takano

Kensuke Takano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7615500
    Abstract: A method for depositing a film includes: (a) processing a wafer, including forming a high dielectric constant film on a first wafer; and achieving nitridation of the high dielectric constant film formed on the first wafer; and (b) performing coating process including forming a high dielectric constant film on a second wafer; and achieving nitridation of the high dielectric constant film formed on the second wafer. The processing the wafer and the performing the coating process are carried out in the same reaction chamber. The coating process is carried out before the processing the wafer.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: November 10, 2009
    Assignees: NEC Electronics Corporation, NEC Corporation
    Inventors: Kensuke Takano, Ichiro Yamamoto, Koji Watanabe
  • Publication number: 20070212898
    Abstract: A method for depositing a film includes: (a) processing a wafer, including forming a high dielectric constant film on a first wafer; and achieving nitridation of the high dielectric constant film formed on the first wafer; and (b) performing coating process including forming a high dielectric constant film on a second wafer; and achieving nitridation of the high dielectric constant film formed on the second wafer. The processing the wafer and the performing the coating process are carried out in the same reaction chamber. The coating process is carried out before the processing the wafer.
    Type: Application
    Filed: March 9, 2007
    Publication date: September 13, 2007
    Applicants: NEC ELECTRONICS CORPORATION, NEC CORPORATION
    Inventors: Kensuke Takano, Ichiro Yamamoto, Koji Watanabe