Abstract: Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise one or more first apertures disposed in a first row; and one or more second apertures disposed in a second row, each row extending along a width direction of the mask, wherein the one or more first apertures and the one or more second apertures are non-uniform.

Abstract: Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise a first base; and a plurality of fingers spaced apart from one another to define one or more gaps.

Abstract: A workpiece handling system includes a process chamber configured to support a workpiece for ion implantation, a first mask stored outside the process chamber in a mask station, and a robot system configured to retrieve the first mask from the mask station, and position the first mask upstream of the workpiece so the workpiece receives a first selective implant through the first mask. A method includes storing a first mask outside a process chamber in a mask station, retrieving the first mask from the mask station, positioning the first mask upstream of a workpiece positioned in the process chamber for ion implantation, and performing a first selective implant through the first mask.

Abstract: Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized with a system for processing one or more substrates. The system may comprise an ion source for generating ions of desired species, the ions generated from the ion source being directed toward the one or more substrates along an ion beam path; a substrate support for supporting the one or more substrates; a mask disposed between the ion source and the substrate support, the mask comprising a finger defining one or more apertures through which a portion of the ions traveling along the ion beam path pass; and a first detector for detecting ions, the first detector being fixedly positioned relative to the one or more substrates.

Abstract: Techniques for manufacturing solar cells are disclosed. In one particular exemplary embodiment, the technique may comprise disposing a mask upstream of the solar cell, the mask comprising a plurality of filaments spaced apart from one another to define at least one aperture; directing a ribbon ion beam of desired species toward the solar cell to ion implant a portion of the solar cell defined by the at least one aperture of the mask; and orienting the ribbon ion beam such that longer cross-section dimension of the ribbon beam is perpendicular to the aperture in one plane.

Abstract: Techniques for manufacturing solar cells are disclosed. In one particular exemplary embodiment, the technique may comprise disposing a mask upstream of the solar cell, the mask comprising a plurality of filaments spaced apart from one another to define at least one aperture; directing a ribbon ion beam of desired species toward the solar cell to ion implant a portion of the solar cell defined by the at least one aperture of the mask; and orienting the ribbon ion beam such that longer cross-section dimension of the ribbon beam is perpendicular to the aperture in one plane.

Abstract: A method and system can align a robot arm with a payload station. A probe and a contact detector may be positioned on the robot arm and three pins may be placed on the payload station. A controller may move the robot arm in a pattern over the payload station until contact may be made between the probe and one of the pins. A search about the contact location may be performed to obtain additional contacts. The search may be interrupted when contact is made between the probe and one of the pins. The position of the pin may be calculated from three such contacts on the spherical portion of the pin. The location of the probe at the time of contact may be stored and a localized search about the pin location may be performed. If the position of the pin cannot be resolved from three contacts, additional contacts may be made until a combination of three contacts does provide a solution.

Abstract: A window structure which may be used as a rear window in a pick-up truck or the like. In certain example embodiments, the window structure includes a slidable window panel or sheet located between a pair of fixed window panels or sheets. The slidable window panel may be approximately flush with the fixed panels when in the closed position, but not in the opened position. A seal carrier may be supported by the sliding window, and a bulb seal may be supported by at least the seal carrier so as to cover gap(s) adjacent an edge of the sliding window panel. A latch assembly is provided including spring biased pins adapted to laterally slide in the tracks of upper and lower frame members, respectively, during opening and closing of the slidable window panel.