Patents by Inventor Kevin M. Daniels

Kevin M. Daniels has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11361935
    Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.
    Type: Grant
    Filed: November 7, 2020
    Date of Patent: June 14, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Costel Biloiu, Jay R. Wallace, Kevin M. Daniels, Frank Sinclair, Christopher Campbell
  • Publication number: 20220148843
    Abstract: An extraction plate for an ion beam system. The extraction plate may include an insulator body that includes a peripheral portion, to connect to a first side of a plasma chamber, and further includes a central portion, defining a concave shape. As such, an extraction aperture may be arranged along a first surface of the central portion, where the first surface is oriented at a high angle with respect to the first side. The extraction plate may further include a patterned electrode, comprising a first portion and a second portion, affixed to an outer side of the insulator body, facing away from the plasma chamber, wherein the first portion is separated from the second portion by an insulating gap.
    Type: Application
    Filed: November 7, 2020
    Publication date: May 12, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Costel Biloiu, Jay R. Wallace, Kevin M. Daniels, Frank Sinclair, Christopher Campbell
  • Publication number: 20220020557
    Abstract: An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.
    Type: Application
    Filed: July 15, 2020
    Publication date: January 20, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Jay R. Wallace, Costel Biloiu, Kevin M. Daniels
  • Publication number: 20210391155
    Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.
    Type: Application
    Filed: January 27, 2021
    Publication date: December 16, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Christopher Campbell, Costel Biloiu, Peter F. Kurunczi, Jay R. Wallace, Kevin M. Daniels, Kevin T. Ryan, Minab B. Teferi, Frank Sinclair, Joseph C. Olson
  • Publication number: 20200000048
    Abstract: A kit for providing stem, branch and foliage support for a planting. The kit includes a plurality of hoop shaped bodies, each exhibiting an open interior adapted to encircle and support the planting. A plurality of vertically elongated portions secured about a perimeter of each of said bodies and include upper and lower inter-engaging ends for stacking the bodies in vertically spaced apart and tiered defining fashion. A plurality of elongated ground engagement stakes each include a flattened and intermediate located planar surface adapted for embedding the stakes in combination with an upper located pair of finger graspable retrieval tabs adapted for retracting the stakes. Each of the stakes further include an upper end securing the lower inter-engaging ends of a lower most hoop shaped body.
    Type: Application
    Filed: September 10, 2019
    Publication date: January 2, 2020
    Inventor: Kevin M. Daniel
  • Publication number: 20190272983
    Abstract: A substrate assembly may include an outer halo, the outer halo comprising a first material and defining a first aperture. The substrate assembly may also include a halo ring, comprising a second material and disposed at least partially within the first aperture. The halo ring may define a second aperture, concentrically positioned within the first aperture, wherein the halo ring is coupled to accommodate a substrate therein.
    Type: Application
    Filed: May 2, 2018
    Publication date: September 5, 2019
    Applicant: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Jay Wallace, Simon Ruffell, Kevin Anglin, Tyler Rockwell, Chris Campbell, Kevin M. Daniels, Richard J. Hertel
  • Patent number: 10224181
    Abstract: A processing apparatus may include a plasma chamber to house a plasma and having a main body portion comprising an electrical insulator; an extraction plate disposed along an extraction side of the plasma chamber, the extraction plate being electrically conductive and having an extraction aperture; a substrate stage disposed outside of the plasma chamber and adjacent the extraction aperture, the substrate stage being at ground potential; and an RF generator electrically coupled to the extraction plate, the RF generator establishing a positive dc self-bias voltage at the extraction plate with respect to ground potential when the plasma is present in the plasma chamber.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: March 5, 2019
    Assignee: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Costel Biloiu, Piotr Lubicki, Tyler Rockwell, Christopher Campbell, Vikram Singh, Kevin M. Daniels, Richard J. Hertel, Peter F. Kurunczi, Alexandre Likhanskii
  • Publication number: 20180220606
    Abstract: A kit for providing stem, branch and foliage support for a hydroponic planting, the kit being supported upon a rim of a bucket and including at least one hoop shaped component exhibiting an open interior. A basket is supported by the hook shaped component so that an apertured and depth extending portion of the basket extends downwardly past its open interior. A plurality of aggregate, along with a seedling, is placed within the basket aperture interior so that the same is immersed in a liquid filling an interior of the bucket. The hoop shaped components exhibit vertically extending and elongated tier defining portions arranged in perimeter defined fashion about the component. Each of the tier defining portions have upper and lower inter-engaging locations and allowing for stacking of any additional number of components in vertically spaced apart and tiered defining fashion.
    Type: Application
    Filed: April 9, 2018
    Publication date: August 9, 2018
    Inventor: Kevin M. Daniel
  • Patent number: 9863032
    Abstract: Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise one or more first apertures disposed in a first row; and one or more second apertures disposed in a second row, each row extending along a width direction of the mask, wherein the one or more first apertures and the one or more second apertures are non-uniform.
    Type: Grant
    Filed: November 24, 2014
    Date of Patent: January 9, 2018
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Kevin M. Daniels, Russell J. Low, Nicholas P. T. Bateman, Benjamin B. Riordon
  • Publication number: 20170309453
    Abstract: A processing apparatus may include a plasma chamber to house a plasma and having a main body portion comprising an electrical insulator; an extraction plate disposed along an extraction side of the plasma chamber, the extraction plate being electrically conductive and having an extraction aperture; a substrate stage disposed outside of the plasma chamber and adjacent the extraction aperture, the substrate stage being at ground potential; and an RF generator electrically coupled to the extraction plate, the RF generator establishing a positive dc self-bias voltage at the extraction plate with respect to ground potential when the plasma is present in the plasma chamber.
    Type: Application
    Filed: April 20, 2016
    Publication date: October 26, 2017
    Inventors: Costel Biloiu, Piotr Lubicki, Tyler Rockwell, Christopher Campbell, Vikram Singh, Kevin M. Daniels, Richard J. Hertel, Peter F. Kurunczi, Alexandre Likhanskii
  • Publication number: 20170181385
    Abstract: A kit for providing stem, branch and foliage support for a planting. The kit includes a plurality of hoop shaped components, each exhibiting an open interior adapted to support and constrain therebetween the planting. The components each further exhibit a plurality of vertically extending and elongated tier defining portions arranged in perimeter defined fashion about the component, with an intermediate location of each of an individual plurality of said tier defining portions being integrated into each of the hoop components. Each of the elongated tier defining portions further has upper and lower inter-engaging locations and, upon supporting a lower-most hoop shaped component proximate a base of the planting, allowing for stacking of any additional number of said hoop shaped components in vertically spaced apart and tiered defining fashion.
    Type: Application
    Filed: December 20, 2016
    Publication date: June 29, 2017
    Inventor: Kevin M. Daniel
  • Patent number: 9297063
    Abstract: An ion implantation system including a plasma source, a mask-slit, and a plasma chamber. The plasma source is configured to generate a plasma within the plasma chamber in response to the introduction of a gas therein. The mask-slit is electrically isolated from the plasma chamber. A positive voltage bias is applied to the plasma chamber above a bias potential used to generate the plasma. The positive voltage bias drives the plasma potential to accelerate the ions to a desired implant energy. The accelerated ions pass through an aperture in the mask-slit and are directed toward a substrate for implantation. The mask-slit is electrically isolated from the plasma chamber and is maintained at ground potential with respect to the plasma.
    Type: Grant
    Filed: April 26, 2012
    Date of Patent: March 29, 2016
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Svetlana B. Radovanov, Victor M. Benveniste, Bon-Woong Koo, Richard M. White, Kevin M. Daniels
  • Patent number: 9287085
    Abstract: A processing apparatus including a process chamber, a plasma source disposed within the process chamber, wherein the plasma source is movable in a first direction and is configured to emit an ion beam along a second direction that is orthogonal to the first direction. The apparatus may further include a platen disposed within the process chamber for supporting a substrate, and an ion beam current sensor that is disposed adjacent to the platen.
    Type: Grant
    Filed: May 12, 2014
    Date of Patent: March 15, 2016
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Ernest E. Allen, Jon Ballou, Kevin M. Daniels, James P. Buonodono, Joseph P. Dzengeleski
  • Publication number: 20150325405
    Abstract: A processing apparatus including a process chamber, a plasma source disposed within the process chamber, wherein the plasma source is movable in a first direction and is configured to emit an ion beam along a second direction that is orthogonal to the first direction. The apparatus may further include a platen disposed within the process chamber for supporting a substrate, and an ion beam current sensor that is disposed adjacent to the platen.
    Type: Application
    Filed: May 12, 2014
    Publication date: November 12, 2015
    Inventors: Ernest E. Allen, Jon Ballou, Kevin M. Daniels, James P. Buonodono, Joseph P. Dzengeleski
  • Patent number: 9093372
    Abstract: Techniques for processing a substrate are disclosed. In one exemplary embodiment, the technique may be realized with an ion implantation system for processing a substrate.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: July 28, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, Richard M. White, Svetlana B. Radovanov, Kevin M. Daniels, Eric R. Cobb, David W. Pitman
  • Patent number: 9076914
    Abstract: Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for processing a substrate. The method may comprise directing an ion beam comprising a plurality of ions along an ion beam path, from an ion source to the substrate; disposing at least a portion of a mask in the ion beam path, between the ion source and the substrate; and translating one of the substrate and the mask relative to other one of the substrate and the mask.
    Type: Grant
    Filed: April 7, 2010
    Date of Patent: July 7, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Kevin M. Daniels, Russell L. Low, Benjamin B. Riordon
  • Publication number: 20150179455
    Abstract: Techniques for processing a substrate are disclosed. In one exemplary embodiment, the technique may be realized as a method for processing a substrate, the method comprising: ionizing first material and second material in an ion source chamber of an ion source, the first material being boron (B) containing material, the second material being one of phosphorous (P) containing material and arsenic (As) containing material; generating first ions containing B and second ions containing one of P and As; and extracting the first and second ions from the ion source chamber and directing the first and second ions toward the substrate.
    Type: Application
    Filed: February 27, 2015
    Publication date: June 25, 2015
    Inventors: Bon-Woong Koo, Richard M. White, Svetlana B. Radovanov, Kevin M. Daniels, Eric R. Cobb, David W. Pitman
  • Patent number: 9064795
    Abstract: Techniques for processing a substrate are disclosed. In one exemplary embodiment, the technique may be realized as a method for processing a substrate, the method comprising: ionizing first material and second material in an ion source chamber of an ion source, the first material being boron (B) containing material, the second material being one of phosphorous (P) containing material and arsenic (As) containing material; generating first ions containing B and second ions containing one of P and As; and extracting the first and second ions from the ion source chamber and directing the first and second ions toward the substrate.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: June 23, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Bon-Woong Koo, Richard M. White, Svetlana B. Radovanov, Kevin M. Daniels, Eric R. Cobb, David W. Pitman
  • Publication number: 20150102237
    Abstract: Herein, an improved technique for processing a substrate is disclosed. In one particular exemplary embodiment, the technique may be achieved using a mask for processing the substrate. The mask may be incorporated into a substrate processing system such as, for example, an ion implantation system. The mask may comprise one or more first apertures disposed in a first row; and one or more second apertures disposed in a second row, each row extending along a width direction of the mask, wherein the one or more first apertures and the one or more second apertures are non-uniform.
    Type: Application
    Filed: November 24, 2014
    Publication date: April 16, 2015
    Inventors: Kevin M. Daniels, Russell J. Low, Nicholas P.T. Bateman, Benjamin B. Riordon
  • Patent number: D776952
    Type: Grant
    Filed: December 29, 2015
    Date of Patent: January 24, 2017
    Inventor: Kevin M. Daniel