Patents by Inventor Ki-Jong Kim
Ki-Jong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11980063Abstract: A display device includes a substrate including a display area and a non-display area adjacent to the display area. The non-display area includes a blocking region. An organic layer is disposed on the substrate. An emission layer is disposed in the display area of the substrate. An auxiliary pattern is disposed in the blocking region of the non-display area of the substrate. A thin film encapsulation layer is disposed on the substrate and overlaps the emission layer and the blocking region. The organic layer has a groove penetrating an entire thickness of the organic layer in the blocking region. The auxiliary pattern overlaps the groove. The auxiliary pattern includes a same material as a gate electrode disposed in the display area of the substrate.Type: GrantFiled: April 27, 2021Date of Patent: May 7, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Ki Hoon Kim, Deuk Jong Kim, Jae Hak Lee
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Publication number: 20240136187Abstract: One embodiment of the present invention provides a method of manufacturing an electronic device using a cyclic doping process including i) an operation of forming a unit transfer thin film including a two-dimensional material on a transfer substrate, ii) an operation of doping the unit transfer thin film in a low-damage doping process, iii) an operation of transferring the unit transfer thin film doped according to the operation ii) on a transfer target substrate, and iv) an operation of repeatedly performing the operations i) to iii) several times to reach a target thickness.Type: ApplicationFiled: October 19, 2023Publication date: April 25, 2024Applicant: Research & Business Foundation SUNGKYUNKWAN UNIVERSITYInventors: Geun Young YEOM, Ki Hyun KIM, Ji Eun KANG, Seong Jae YU, You Jin JI, Doo San KIM, Hyun Woo TAK, Yun Jong JANG, Hee Ju KIM, Ki Seok KIM
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Publication number: 20240114709Abstract: The quantum dot comprises a ligand which is a copolymer comprising a first repeating unit comprising at least one or more hole transporting functional groups and a second repeating unit comprising at least one or more photocrosslinking functional groups.Type: ApplicationFiled: September 22, 2020Publication date: April 4, 2024Applicants: LG DISPLAY CO., LTD., KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATIONInventors: Joona BANG, Ki Seok CHANG, Jeong Min MOON, Soon Shin JUNG, Dong Hoon CHOI, Hyung Jong KIM, Jae Wan KO
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Patent number: 11947104Abstract: A spiral phase plate, according to one embodiment, for generating a Laguerre Gaussian beam by reflecting an incident beam emitted from a light source, may comprise: a first quadrant area in which the step height increase rate per unit angle decreases progressively in one direction from the point with the lowest step height to the point with the highest step height; and a second quadrant area in which the step height increase rate per unit angle increases progressively in the one direction.Type: GrantFiled: September 9, 2020Date of Patent: April 2, 2024Assignees: KOREA BASIC SCIENCE INSTITUTE, INSTITUTE FOR BASIC SCIENCE, GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: I Jong Kim, Ji Yong Bae, Hong Seung Kim, Geon Hee Kim, Ki Soo Chang, Cheonha Jeon, Il Woo Choi, Chang Hee Nam
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Publication number: 20240104195Abstract: Disclosed herein are an apparatus and method for updating an Internet-based malware detection engine using virtual machine scaling. The method may include creating a scaling group and an update group set based on a first virtual machine image, creating a second virtual machine image for a running virtual machine in response to occurrence of a snapshot event in the virtual update group run based on the first virtual machine image, modifying the scale-out image of the scaling group to the second virtual machine image, updating the scaling group by triggering a scale-out event and a scale-in event in the scaling group in response to occurrence of an update event, and modifying the scale-in image of the scaling group to the second virtual machine image.Type: ApplicationFiled: June 15, 2023Publication date: March 28, 2024Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Sang-Min LEE, Ki-Jong KOO, Jung-Tae KIM, Ji-Hyeon SONG, Jong-Hyun KIM, Dae-Sung MOON
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Publication number: 20240097126Abstract: A manufacturing method of a positive electrode for a lithium secondary battery includes: a step of preparing a positive electrode in which a positive electrode active material layer including a lithium iron phosphate formed on a current collector; and a step of adsorbing an organic solvent to the positive electrode active material layer, the organic solvent including one or more of N-methyl-2-pyrrolidone (NMP), acetone, ethanol, propylene carbonate, ethylmethyl carbonate, ethylene carbonate, and dimethyl carbonate.Type: ApplicationFiled: October 28, 2022Publication date: March 21, 2024Applicants: LG Energy Solution, Ltd., LG Energy Solution, Ltd.Inventors: O Jong Kwon, Ki Woong Kim, In Gu An, Min Hyun Kim, Youn Cheol Joe, Jeong Geun Jo
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Patent number: 10499508Abstract: A display device is provided. The display device includes: an input sensing member electrically connected to a first bonding pad unit having a first pad; a pressure sensing member electrically connected to a second bonding pad having a second pad; and a display panel disposed between the input sensing member and the pressure sensing member, wherein the first pad is electrically connected to the second pad, a first offset distance between the first and second pads is greater than zero, and the first offset distance is defined as a spacing distance, on a plane, between a side of the first pad and a side of the second pad when the first and second pads are yet to be electrically connected.Type: GrantFiled: January 3, 2018Date of Patent: December 3, 2019Assignee: Samsung Display Co., Ltd.Inventors: Seong Sik Ahn, Min Ki Kim, Ki Jong Kim, Seung Hwan Baek, In Su Baek
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Publication number: 20190014664Abstract: A display device is provided. The display device includes: an input sensing member electrically connected to a first bonding pad unit having a first pad; a pressure sensing member electrically connected to a second bonding pad having a second pad; and a display panel disposed between the input sensing member and the pressure sensing member, wherein the first pad is electrically connected to the second pad, a first offset distance between the first and second pads is greater than zero, and the first offset distance is defined as a spacing distance, on a plane, between a side of the first pad and a side of the second pad when the first and second pads are yet to be electrically connected.Type: ApplicationFiled: January 3, 2018Publication date: January 10, 2019Inventors: Seong Sik AHN, Min Ki KIM, Ki Jong KIM, Seung Hwan BAEK, In Su BAEK
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Publication number: 20180223424Abstract: A deposition apparatus is provided to eliminate unnecessary empty spaces that may form between a substrate and a substrate supporting pin, which may be formed within a substrate supporting pin hole, by covering the substrate supporting pin, inserted into the substrate supporting pin hole formed in the substrate support, by a substrate supporting pin cover loaded on the substrate support. Accordingly, the temperature under the substrate can be maintained constant, and generation of parasitic plasma or contaminating particles can be avoided.Type: ApplicationFiled: April 5, 2018Publication date: August 9, 2018Inventors: Young-Jae KIM, Ki Jong KIM, Dong-Rak JUNG, Hak Yong KWON, Seung Woo CHOI
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Patent number: 9963783Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.Type: GrantFiled: May 18, 2016Date of Patent: May 8, 2018Assignee: ASM GENITECH KOREA LTD.Inventors: Ki Jong Kim, Hyun Kyu Cho, Jin Su Lee, Se Yong Kim
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Publication number: 20160258062Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.Type: ApplicationFiled: May 18, 2016Publication date: September 8, 2016Inventors: Ki Jong KIM, Hyun Kyu CHO, Jin Su LEE, Se Yong KIM
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Patent number: 9371583Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.Type: GrantFiled: October 13, 2009Date of Patent: June 21, 2016Assignee: ASM GENITECH KOREA LTD.Inventors: Ki Jong Kim, Hyun Kyu Cho, Jin Su Lee, Se Yong Kim
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Patent number: 9085825Abstract: A deposition apparatus and a method of depositing a thin film using the same are provided. By maintaining pressure of an external chamber between a reaction space and an outer wall slightly lower than pressure of the reaction space by supplying a charge gas to an external chamber of a space between the reaction space and an outer wall, parasitic plasma can be prevented from being generated within the external chamber. When loading or unloading a substrate, a charge gas of the external chamber can be prevented from flowing backward to the reaction space, and by supplying nitrogen gas as a charge gas, even if high plasma power is supplied, parasitic plasma can be effectively prevented from being generated in the external chamber.Type: GrantFiled: September 9, 2013Date of Patent: July 21, 2015Assignee: ASM IP HOLDING B.V.Inventor: Ki Jong Kim
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Publication number: 20140202382Abstract: A deposition apparatus is provided to eliminate unnecessary empty spaces that may form between a substrate and a substrate supporting pin, which may be formed within a substrate supporting pin hole, by covering the substrate supporting pin, inserted into the substrate supporting pin hole formed in the substrate support, by a substrate supporting pin cover loaded on the substrate support. Accordingly, the temperature under the substrate can be maintained constant, and generation of parasitic plasma or contaminating particles can be avoided.Type: ApplicationFiled: January 17, 2014Publication date: July 24, 2014Applicant: ASM IP Holding B.V.Inventors: Young-Jae KIM, Ki Jong Kim, Dong-Rak Jung, Hak Yong Kwon, Seung Woo Choi
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Patent number: 8778083Abstract: A deposition apparatus according to an exemplary embodiment of the present invention is a lateral-flow deposition apparatus in which in which a process gas flows between a surface where a substrate is disposed and the opposite surface, substantially in parallel with the substrate. The lateral-flow deposition apparatus includes: a substrate support that moves up/down and rotates the substrate while supporting the substrate; a reactor cover that defines a reaction chamber by contacting the substrate support; and a substrate support lifter and a substrate support rotator that move the substrate support.Type: GrantFiled: July 21, 2010Date of Patent: July 15, 2014Assignee: ASM Genitech Korea Ltd.Inventors: Ki Jong Kim, Yong Min Yoo, Jung Soo Kim, Hyung Sang Park, Seung Woo Choi, Jeong Ho Lee, Dong Rak Jung
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Publication number: 20140109832Abstract: In a deposition apparatus, as a plurality of plasma connection terminals that transfer plasma power to a plasma electrode are coupled in parallel to the plasma electrode, resistance caused by the plurality of plasma connection terminals is reduced and a current is distributed such that heat generated in the plurality of plasma connection terminals can be distributed. Therefore, even if high RF power is used, by preventing the plurality of plasma connection terminals from being oxidized, plasma is stably supplied and thus, stability of a deposition apparatus and the accuracy of a process can be enhanced.Type: ApplicationFiled: October 18, 2013Publication date: April 24, 2014Applicant: ASM IP Holding B.V.Inventors: Ki Jong KIM, Dae Youn Kim, Hyun Soo Jang
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Publication number: 20140072726Abstract: A deposition apparatus and a method of depositing a thin film using the same are provided. By maintaining pressure of an external chamber between a reaction space and an outer wall slightly lower than pressure of the reaction space by supplying a charge gas to an external chamber of a space between the reaction space and an outer wall, parasitic plasma can be prevented from being generated within the external chamber. When loading or unloading a substrate, a charge gas of the external chamber can be prevented from flowing backward to the reaction space, and by supplying nitrogen gas as a charge gas, even if high plasma power is supplied, parasitic plasma can be effectively prevented from being generated in the external chamber.Type: ApplicationFiled: September 9, 2013Publication date: March 13, 2014Applicant: ASM IP Holding B.V.Inventor: Ki Jong KIM
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Patent number: 8347813Abstract: A thin film deposition apparatus including a substrate mounting error detector, a chamber and a substrate support positioned in the chamber. The substrate support is configured to support a substrate. The substrate mounting error detector includes: a light source configured to provide a light beam to the substrate, such that the substrate reflects the light beam; a collimator configured to selectively pass at least a portion of the light beam reflected by the substrate; and an optical sensor configured to detect the at least a portion of the reflected light beam passed by the collimator. The detector is positioned and oriented to detect substrate position on a lowered support prior to raising the support into contact with an upper cover of a clamshell reactor arrangement. This configuration allows a thin film deposition process only if the substrate is correctly mounted on the substrate support. Thus, abnormal deposition due to a substrate mounting error is prevented in advance.Type: GrantFiled: December 10, 2008Date of Patent: January 8, 2013Assignee: ASM Genitech Korea Ltd.Inventors: Ki Jong Kim, Dae Youn Kim
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Publication number: 20110020545Abstract: A deposition apparatus according to an exemplary embodiment of the present invention is a lateral-flow deposition apparatus in which in which a process gas flows between a surface where a substrate is disposed and the opposite surface, substantially in parallel with the substrate. The lateral-flow deposition apparatus includes: a substrate support that moves up/down and rotates the substrate while supporting the substrate; a reactor cover that defines a reaction chamber by contacting the substrate support; and a substrate support lifter and a substrate support rotator that move the substrate support.Type: ApplicationFiled: July 21, 2010Publication date: January 27, 2011Applicant: ASM GENITECH KOREA LTD.Inventors: Ki Jong Kim, Yong Min Yoo, Jung Soo Kim, Hyung Sang Park, Seung Woo Choi, Jeong Ho Lee, Dong Rak Jung
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Patent number: D785524Type: GrantFiled: July 29, 2015Date of Patent: May 2, 2017Assignee: GM GLOBAL TECHNOLOGY OPERATIONS LLCInventor: Ki Jong Kim