Abstract: An article of footwear can include an upper and a sole member coupled to the upper, where the sole member comprises a plurality of spaced apart apertures extending through the sole member. The article of footwear can further include a plurality of individual sensory nodes, where each sensory node has a first end coupled directly to the upper and an opposite, second end configured to engage with a ground surface. Each sensory node is configured to translate freely within a respective aperture of the sole member.

Abstract: Provided is a water purifier comprising: a filter unit which has a reverse osmosis membrane filter; a supply valve; an instantaneous heating device which is provided with an inflow port, and an outflow port, and which heats and purified water entering through the inflow port and flowing to the outflow port, so that hot water is discharged through the outflow port; an extraction member; a supply pump; a domestic water drain line; a hot water drain line; a hot water drain valve; and a control unit which controls the opening/closing of respective flow channels of the hot water drain line and the domestic water drain line so that, among a hot water draining process through the hot water drain line, and a domestic water draining process through the domestic water drain line, the hot water draining process is carried out first.

Abstract: A variable coherence illumination device is disclosed. The variable coherence illumination device includes a light source generator configured to emit a beam and configured to control a wavelength of the beam, a focusing lens configured to focus the beam, a first diffuser on which a beam passing through the focusing lens is incident, a second diffuser facing the first diffuser and rotatable around a rotation axis of the second diffuser, in which a focusing region on which the beam passing through the first diffuser is focused by the focusing lens is formed on the second diffuser, in which the focusing region of the second diffuser is spaced apart from the rotation axis of the second diffuser.

Abstract: A substrate processing apparatus is provided and includes: a support unit including a spin chuck and a centering jig that is on the spin chuck, the spin chuck configured to support and rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a swing arm including a correction unit that includes a sensor and an emitter, the swing arm configured to move such that the correction unit moves to a target point on the substrate, and the emitter configured to irradiate a beam towards the substrate; and a controller configured to: control the spin chuck and the swing arm; and determine whether a movement trajectory of the swing arm is aligned with a rotation center of the spin chuck based on information acquired by the sensor about the centering jig.

Abstract: Provided is a control device and a substrate processing apparatus including the same. The substrate processing apparatus includes a support unit configured to support and rotate a first substrate, the support unit including a spin chuck, a spray unit configured to spray a processing fluid on the first substrate, a correction unit on a swing arm and configured to irradiate a beam onto the first substrate when the processing fluid is provided on the first substrate, wherein the swing arm is adjacent to the spin chuck and is configured to move the correction unit to a target point on the first substrate, and a controller configured to control the spin chuck and the swing arm, and correct a position error of the swing arm using a second substrate, wherein a plurality of anchor patterns are on the second substrate.

Abstract: Disclosed is a method of processing cyber threat information including disassembling an input file to acquire analysis target functions in assembly code, calculating a function hash value for each of quantized function vectors of the analysis target functions, determining at least one candidate function from pre-stored comparison target functions based on the calculated function hash value, and classifying cyber threat information for the analysis target functions based on similarity for the at least one candidate function.

Abstract: A control device and a substrate processing apparatus including the same are provided. The substrate processing apparatus includes: a support unit including a spin head and configured to support and to rotate a substrate; a spraying unit configured to spray processing liquid onto the substrate; a correction unit in a swing arm, the correction unit configured to move to a target point on the substrate and to irradiate a beam when the processing liquid is sprayed onto the substrate; and a control unit configured to calculate the target point, wherein the control unit is configured to convert image coordinates associated with a first coordinate system and then to calculate the target point by converting the image coordinates associated with the first coordinate system into image coordinates associated with a second coordinate system, and the second coordinate system is based on rotation angles of the spin head and the swing arm.

Abstract: A cyber threat information processing method including receiving a CTI analysis request for a document script from a client; analyzing the document script to obtain analysis information of the CTI for the script; generating a CTI query related to the document script based on the analysis information of the CTI and delivering the CTI query to a natural language model; and providing natural language description information according to the CTI query from the analysis information of the CTI and the natural language model to the client.

Abstract: Provided is a cyber threat information processing method including receiving a CTI analysis request for assembly code from a client; analyzing the assembly code to obtain analysis information of the CTI for the assembly code; generating a CTI query related to a file based on the analyzed CTI and delivering the CTI query to a natural language model; and providing natural language description information according to the CTI query obtained from the CTI for the assembly code and the natural language model.

Abstract: Provided is a cyber threat information processing method including receiving a CTI analysis request for a file from a client; analyzing the file to obtain analysis information of the CTI for the file; generating a CTI query related to the file based on the analyzed CTI and delivering the CTI query to a natural language model; and providing natural language description information according to the CTI query obtained from the CTI for the analyzed file and the natural language model.

Abstract: A display device is provided. The display device includes: an input sensing member electrically connected to a first bonding pad unit having a first pad; a pressure sensing member electrically connected to a second bonding pad having a second pad; and a display panel disposed between the input sensing member and the pressure sensing member, wherein the first pad is electrically connected to the second pad, a first offset distance between the first and second pads is greater than zero, and the first offset distance is defined as a spacing distance, on a plane, between a side of the first pad and a side of the second pad when the first and second pads are yet to be electrically connected.

Abstract: A display device is provided. The display device includes: an input sensing member electrically connected to a first bonding pad unit having a first pad; a pressure sensing member electrically connected to a second bonding pad having a second pad; and a display panel disposed between the input sensing member and the pressure sensing member, wherein the first pad is electrically connected to the second pad, a first offset distance between the first and second pads is greater than zero, and the first offset distance is defined as a spacing distance, on a plane, between a side of the first pad and a side of the second pad when the first and second pads are yet to be electrically connected.

Abstract: A deposition apparatus is provided to eliminate unnecessary empty spaces that may form between a substrate and a substrate supporting pin, which may be formed within a substrate supporting pin hole, by covering the substrate supporting pin, inserted into the substrate supporting pin hole formed in the substrate support, by a substrate supporting pin cover loaded on the substrate support. Accordingly, the temperature under the substrate can be maintained constant, and generation of parasitic plasma or contaminating particles can be avoided.

Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.

Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.

Abstract: A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.

Abstract: A deposition apparatus and a method of depositing a thin film using the same are provided. By maintaining pressure of an external chamber between a reaction space and an outer wall slightly lower than pressure of the reaction space by supplying a charge gas to an external chamber of a space between the reaction space and an outer wall, parasitic plasma can be prevented from being generated within the external chamber. When loading or unloading a substrate, a charge gas of the external chamber can be prevented from flowing backward to the reaction space, and by supplying nitrogen gas as a charge gas, even if high plasma power is supplied, parasitic plasma can be effectively prevented from being generated in the external chamber.

Abstract: A deposition apparatus is provided to eliminate unnecessary empty spaces that may form between a substrate and a substrate supporting pin, which may be formed within a substrate supporting pin hole, by covering the substrate supporting pin, inserted into the substrate supporting pin hole formed in the substrate support, by a substrate supporting pin cover loaded on the substrate support. Accordingly, the temperature under the substrate can be maintained constant, and generation of parasitic plasma or contaminating particles can be avoided.

Abstract: A deposition apparatus according to an exemplary embodiment of the present invention is a lateral-flow deposition apparatus in which in which a process gas flows between a surface where a substrate is disposed and the opposite surface, substantially in parallel with the substrate. The lateral-flow deposition apparatus includes: a substrate support that moves up/down and rotates the substrate while supporting the substrate; a reactor cover that defines a reaction chamber by contacting the substrate support; and a substrate support lifter and a substrate support rotator that move the substrate support.