Abstract: A method of programming a non-volatile memory device includes applying a first pass voltage to word lines in a direction of a source select line based on a first word line selected for a program operation, wherein the word lines do not include a second word line adjacent to the first word line in a direction of the source select line; and applying a first voltage, a program voltage and a second pass voltage when the first pass voltage reaches a given level. The first voltage is applied to the second word line, the program voltage is provided to the first word line, and the second pass voltage is applied to word lines in a direction of a drain select line on the basis of the first word line.

Abstract: A non-volatile memory device includes a memory cell array at least one block having a plurality of memory cells, and at least one reference cell with respect to each block, an X decoder and a Y decoder for selecting a memory cell for an operation according to an input address, a page buffer for programming data into a memory cell selected by the X decoder and the Y decoder or reading programmed data, and a controller for controlling the memory cell array, the X decoder, the Y decoder and the page buffers to calculate a change in a threshold voltage of the memory cells and compensate for a changed threshold voltage of a memory cell based on a change in a threshold voltage of the reference cell.

Abstract: A flash memory device and a method of operating the same is disclosed, in which the conditions of voltage (or current) applied during the reading operation are differently adjusted according to an accumulated number of times of a programming operation, an erasing operation or a reading operation (an accumulated number of operation cycle). Even if a level of the threshold voltage is changed to a level which differs from that of the target voltage by an increase of the accumulated number of operation cycle regardless of the programming operation (or the erasing operation) being normally performed, the reliability of the reading operation can be enhanced to prevent a malfunction of the memory cell from being generated.

Abstract: The present invention relates to a flash memory device and a fabrication method thereof. A trench may be formed within a junction region between word lines by etching a semiconductor substrate between not only a word line and a select line, but also between adjacent word lines. Accordingly, the occurrence of a program disturbance phenomenon can be prevented as the injection of hot carriers into a program-inhibited cell is minimized in a program operation.

Abstract: A flash memory device includes trenches that are formed at regions on a semiconductor substrate spaced apart from one another at predetermined distances, buried floating gates buried into the trenches, a plurality of isolation structures formed between the buried floating gates, and a dielectric film and a control gate formed on the buried floating gates.

Abstract: A non-volatile memory device includes a memory cell array at least one block having a plurality of memory cells, and at least one reference cell with respect to each block, an X decoder and a Y decoder for selecting a memory cell for an operation according to an input address, a page buffer for programming data into a memory cell selected by the X decoder and the Y decoder or reading programmed data, and a controller for controlling the memory cell array, the X decoder, the Y decoder and the page buffers to calculate a change in a threshold voltage of the memory cells and compensate for a changed threshold voltage of a memory cell based on a change in a threshold voltage of the reference cell.

Abstract: The NROM includes a plurality of gate patterns, a plurality of junction regions, first contact plugs, second contact plugs, first metal lines and second metal lines. Each of the plurality of gate patterns has a dielectric layer and gate conductive layers sequentially stacked over a semiconductor substrate. The plurality of junction regions is isolated from the gate conductive layers in active regions between the plurality of gate patterns. The first contact plugs are respectively connected to first junction regions of a diagonal direction of the plurality of junction regions. The second contact plugs are respectively connected to second junction regions of a diagonal direction other than the first junction regions. The first metal lines connect the first contact plugs that are adjacent to each other in a diagonal direction. The second metal lines connect the second contact plugs that are adjacent to each other in a diagonal direction.

Abstract: A method for programming a flash memory device includes selecting bit lines connected to a plurality of memory strings and selecting a word line. A lower bit is programmed into the memory cells connected to the selected word line and programming a upper bit into the memory cells. The step of selecting the word line and the step of programming the upper bit are repeated.

Abstract: A flash memory device includes control gates that are formed to completely surround the top and sides of floating gates. The control gates are located between the floating gates that are adjacent in the word line direction as well as the floating gates that are adjacent in the bit line direction. The present flash memory device reduces a shift in a threshold voltage resulting from interference among floating gates and increases an overlapping area of the floating gate and the control gates. Thus, there is an effect in that the coupling ratio can be increased.

Abstract: A method of reading a flash memory cell, a NAND-type flash memory apparatus, and/or a NOR-type flash memory apparatus improves the resolution capability and reduces the determination time by using different voltages applied at the read operation of the flash device. As a result, it is possible to reduce sizes of circuits such as a page buffer as well as the memory cell of the flash device.

Abstract: A method of reading a flash memory cell, a NAND-type flash memory apparatus, and/or a NOR-type flash memory apparatus improves the resolution capability and reduces the determination time by using different voltages applied at the read operation of the flash device. As a result, it is possible to reduce sizes of circuits such as a page buffer as well as the memory cell of the flash device.

Abstract: A row decoder in a flash memory comprises a first switch to selectively couple a word line to a first voltage terminal, and a second switch to selectively couple the word line to a second voltage terminal. The row decoder also comprises a third switch to selectively couple the word line to a third voltage terminal.

Abstract: The present invention relates to a method of reading a flash memory cell, a NAND-type flash memory apparatus, and a NOR-type flash memory apparatus. According to the present invention, it is possible to improve the resolution capability and reduce the determination time by means of different voltages applied at the read operation of the flash device. As a result, it is possible to reduce sizes of circuits such as a page buffer as well as the memory cell of the flash device.

Abstract: The present invention relates to a method of reading a flash memory cell, a NAND-type flash memory apparatus, and a NOR-type flash memory apparatus. According to the present invention, it is possible to improve the resolution capability and reduce the determination time by means of different voltages applied at the read operation of the flash device. As a result, it is possible to reduce sizes of circuits such as a page buffer as well as the memory cell of the flash device.

Abstract: A multi-level EEPROM cell and a method of manufacture thereof are provided so as to improve a program characteristic of the multi-level cell. For the purpose, the multi-level flash EEPROM cell includes a floating gate formed as being electrically separated from a silicon substrate by an underlying tunnel oxide layer, a first dielectric layer formed over the top of the floating gate, a first control gate formed on the floating gate as being electrically separated from the floating gate by the first dielectric layer, a second dielectric layer formed on the sidewall and top of the first control gate, a second control gate formed on the sidewall and top of the first control gate as being electrically separated from the first control gate by the second dielectric layer, and a source and drain formed in the substrate as being self-aligned with both edges of the second control gate.

Abstract: Disclosed are a row decoder in a flash memory and erasing method in a flash memory cell using the same. The row decoder comprises a PMOS transistor having a gate electrode for receiving a first input signal as an input and connected between a first power supply terminal and a first node, a first NMOS transistor having a gate electrode for receiving the first input signal as an input and connected between the first node and a second node, a second NMOS transistor having a gate electrode for receiving the second input signal as an input and connected between the second node and a ground terminal, and a switching means having a gate electrode for receiving the third input signal as an input and connected between the second node and a second power supply terminal, wherein the first node is connected to word lines.

Abstract: The present invention relates to a method of forming a floating gate in a flash memory device. Upon formation of a device isolation film, a space of a lower polysilicon layer for a floating gate is defined, a bird's beak is formed on an internal surface of a trench by subsequent well sacrificial oxidization process and well oxidization process and an upper polysilicon layer for a floating gate is then formed, so that the space of the floating gate is formed. Therefore, the present invention can reduce the cost since a mask process is not required compared to an existing stepper method and the process cost since a planarization process using chemical mechanical polishing process (CMP) is not required compared to the self-aligned floating mode.

Abstract: The present invention relates to a test pattern for measuring a contact resistance and method of manufacturing the same. In order to confirm that a contact resistance suitable for a semiconductor device before an actual process for manufacturing the device is performed, the present invention designs a test pattern for measuring the contact resistance depending on a design rule of a line contact actually applied to an actual device.

Abstract: A multi-level EEPROM cell and a method of manufacture thereof are provided so as to improve a program characteristic of the multi-level cell. For the purpose, the multi-level flash EEPROM cell includes a floating gate formed as being electrically separated from a silicon substrate by an underlying tunnel oxide layer, a first dielectric layer formed over the top of the floating gate, a first control gate formed on the floating gate as being electrically separated from the floating gate by the first dielectric layer, a second dielectric layer formed on the sidewall and top of the first control gate, a second control gate formed on the sidewall and top of the first control gate as being electrically separated from the first control gate by the second dielectric layer, and a source and drain formed in the substrate as being self-aligned with both edges of the second control gate.

Abstract: The present invention relates to a sensing circuit in a multi-level flash memory cell capable of exactly sensing a state of the multi-level flash memory cell by sensing four states of the multi-level flash memory cell based on first through third reference cells. The first reference cell has a threshold voltage by which a program or erase state of a floating gate can be determined in a state that a capacitor of the multi-level flash memory cell is discharged, a second reference cell has a threshold voltage by which a charge or discharge state of the capacitor can be determined with the floating gate of the multi-level flash memory cell being at a discharge state, and a third reference cell has a threshold voltage by which a charge or discharge state of the capacitor can be determined with the floating gate of the multi-level flash memory cell being at a program state.