Abstract: A memory device includes a cell wafer including a memory cell array; a first logic wafer bonded to one surface of the cell wafer, and including a first logic circuit which controls the memory cell array; and a second logic wafer bonded to the other surface of the cell wafer which faces away from the one surface, and including a second logic circuit which controls the memory cell array.

Abstract: A memory device includes a first memory block defined in a first wafer; and a second memory block defined in a second wafer that is disposed in a vertical direction with respect to the first wafer. A size of the first memory block is smaller than a size of the second memory block.

Abstract: A memory device is disclosed. The disclosed memory device may include a first wafer, and a second wafer stacked on and bonded to the first wafer. The first wafer may include a cell structure including a memory cell array; and a first logic structure disposed under the cell structure, and including a column control circuit. The second wafer may include a second logic structure including a row control circuit.

Abstract: A method of displaying a function of a button of an ultrasound apparatus on the button includes displaying information about one or more functions provided by the ultrasound apparatus, selecting one from among the one or more functions which have been displayed, determining a button in which the selected function is to be set based on an external input signal for matching the selected function to the button in which the selected function is to be set; and displaying information about the selected function on the determined button.

Abstract: A method of displaying a function of a button of an ultrasound apparatus on the button includes displaying information about one or more functions provided by the ultrasound apparatus, selecting one from among the one or more functions which have been displayed, determining a button in which the selected function is to be set based on an external input signal for matching the selected function to the button in which the selected function is to be set; and displaying information about the selected function on the determined button.

Abstract: Disclosed are a matrix for restoring soft tissue and a method of producing the same, the method including: forming a sheet-type absorption layer (11) on one side of a double layer using biocompatible neutral collagen; forming a film-type support layer (12) on the remaining surface of the double layer by mixing collagen with a water-soluble polymer and a natural material; and forming a double layer-structured matrix (10) for restoring soft tissue by attaching the absorption layer (11) and the support layer (12) so as to treat damage to soft tissue of a mammal other than a human or restore damaged soft tissue. This invention pertains to the treatment of damage to soft tissue such as tendons, ligaments, and rotator cuffs or the restoration of damaged soft tissue, whereby the quality and reliability of products can be remarkably improved, thus satisfying various needs of consumers, who are the users thereof, and exhibiting a good effect.

Abstract: A method of manufacturing a semiconductor device includes performing extreme ultraviolet (EUV) lithography that uses a mask for the EUV lithography manufactured by using a design layout on which optical proximity correction (OPC) is performed, and performing the OPC includes dividing respective patterns included in the design layout into partial patterns, classifying the partial patterns into a plurality of partial pattern groups, performing a first OPC on the design layout, and performing a second OPC that is different from the first OPC on the design layout on which the first OPC is performed, wherein performing the first OPC is performed on representative patterns selected from the plurality of partial pattern groups.

Abstract: An optical proximity correction (OPC) method includes preparing basic data for OPC, measuring with a scanning electron microscope (SEM) an after development inspection (ADI) critical dimension (CD) of a photoresist (PR) pattern with respect to a sample, measuring with the SEM an after cleaning inspection (ACI) CD of a wafer pattern formed using the PR pattern, generating CD data of the sample reflecting PR shrinking caused by the SEM measurement by using the measured ADI CD of the PR pattern and the measured ACI CD of the wafer pattern; and generating an OPC model based on the basic data and the CD data of the sample.

Abstract: A method of manufacturing a semiconductor device includes performing extreme ultraviolet (EUV) lithography that uses a mask for the EUV lithography manufactured by using a design layout on which optical proximity correction (OPC) is performed, and performing the OPC includes dividing respective patterns included in the design layout into partial patterns, classifying the partial patterns into a plurality of partial pattern groups, performing a first OPC on the design layout, and performing a second OPC that is different from the first OPC on the design layout on which the first OPC is performed, wherein performing the first OPC is performed on representative patterns selected from the plurality of partial pattern groups.

Abstract: Provided are a deposition mask having a plurality of fine through-holes formed on a metal foil; a metal foil to be used therein; manufacturing methods therefor; and an organic EL device manufacturing method using the deposition mask, and an Fe—Ni alloy metal foil to be used as a deposition mask, including 34-46 wt % of Ni and the balance of Fe and inevitable impurities. The metal foil includes a pattern formation area and an uncoated area on at least one surface thereof, the pattern formation area is thinner than the uncoated area and has low surface roughness, and the uncoated area is positioned at the edge of the metal foil so as to surround the pattern formation area.

Abstract: An optical proximity correction (OPC) method includes preparing basic data for OPC, measuring with a scanning electron microscope (SEM) an after development inspection (ADI) critical dimension (CD) of a photoresist (PR) pattern with respect to a sample, measuring with the SEM an after cleaning inspection (ACI) CD of a wafer pattern formed using the PR pattern, generating CD data of the sample reflecting PR shrinking caused by the SEM measurement by using the measured ADI CD of the PR pattern and the measured ACI CD of the wafer pattern; and generating an OPC model based on the basic data and the CD data of the sample.

Abstract: A method of displaying a function of a button of an ultrasound apparatus on the button includes displaying information about one or more functions provided by the ultrasound apparatus, selecting one from among the one or more functions which have been displayed, determining a button in which the selected function is to be set based on an external input signal for matching the selected function to the button in which the selected function is to be set; and displaying information about the selected function on the determined button.

Abstract: A method of displaying a function of a button of an ultrasound apparatus on the button includes displaying information about one or more functions provided by the ultrasound apparatus, selecting one from among the one or more functions which have been displayed, determining a button in which the selected function is to be set based on an external input signal for matching the selected function to the button in which the selected function is to be set; and displaying information about the selected function on the determined button.

Abstract: An apparatus and method for simultaneously executing the same event in a plurality of mobile terminals are provided. The method includes transmitting a signal to the mobile terminals and checking a transmission time point of the signal; when a response signal for the signal is received, checking a reception time point of the response signal; calculating a signal delay time using the transmission time point of the predetermined signal, the reception time point of the response signal, and an offset time contained in the response signal; and transmitting an event execution signal to the mobile terminals and executing a corresponding event, considering the offset time and the signal delay time.

Abstract: A probe includes: a piezoelectric layer to generate ultrasonic waves, a backing layer to absorb ultrasonic waves generated at the piezoelectric layer and proceeding toward a rear, a reflective layer occupying an area smaller than an area of the piezoelectric layer and provided in between the piezoelectric layer and the backing layer to amplify the ultrasonic waves generated at the piezoelectric layer, and a lens layer to focus the ultrasonic waves proceeding toward a front of the piezoelectric layer at a certain point.