Patents by Inventor Kil Sung Lee

Kil Sung Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120059127
    Abstract: An adhesive composition includes an acrylic copolymer having at least one alkyl group, at least one hydroxyl group, and at least one furyl based group; and a curing agent.
    Type: Application
    Filed: February 15, 2011
    Publication date: March 8, 2012
    Inventors: Kyoung Jin HA, Irina Nam, Lee Jun Kim, Kil Sung Lee, Eun Hwan Jeong, Woo Jin Jeong
  • Publication number: 20120007200
    Abstract: Disclosed is an image sensor including a photo-sensing device, a color filter positioned on the photo-sensing device, a microlens positioned on the color filter, and an insulation layer positioned between the photo-sensing device and the color filter, and including a trench exposing the photo-sensing device and a filler filled in the trench. The filler has light transmittance of about 85% or more at a visible ray region, and a higher refractive index than the insulation layer. A method of manufacturing the image sensor is also provided.
    Type: Application
    Filed: September 20, 2011
    Publication date: January 12, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Kil-Sung LEE, Jae-Hyun KIM, Chang-Min LEE, Eui-June JEONG, Min-Soo KIM, Hwan-Sung CHEON, Tu-Won CHANG
  • Publication number: 20110200921
    Abstract: The present invention related to a pigment dispersion composition, a color resist composition including the same, and a color filter fabricated by using the color resist composition. The pigment dispersion composition includes [A] a pigment, [B] a dispersing agent, [C] a cardo-based binder resin, and [D] a solvent.
    Type: Application
    Filed: April 27, 2011
    Publication date: August 18, 2011
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Jae-Hyun KIM, Eui-June JEONG, Kil-Sung LEE
  • Publication number: 20110171578
    Abstract: A positive photosensitive resin composition includes: (A) a polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a polyamic acid ester compound; and (E) a solvent. The positive photosensitive resin composition can reduce film shrinkage, can have high sensitivity, high resolution, and excellent residue removal properties, and can provide good pattern shapes.
    Type: Application
    Filed: March 28, 2011
    Publication date: July 14, 2011
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Hyun-Yong CHO, Doo-Young JUNG, Yong-Sik YOO, Ji-Young JEONG, Jong-Hwa LEE, Min-Kook CHUNG, Kil-Sung LEE, Myoung-Hwan CHA
  • Publication number: 20110159283
    Abstract: An adhesive binder, an adhesive composition including the same, an optical member, and associated methods, the adhesive binder including a (meth)acrylic copolymer having urethane, hydroxyl, aromatic, and vinyl groups in side chains thereof.
    Type: Application
    Filed: December 28, 2010
    Publication date: June 30, 2011
    Inventors: Kyoung Jin HA, Kil Sung Lee, Mi Sun Kim, Irina Nam, Chang Min Lee
  • Publication number: 20110037038
    Abstract: A thermosetting resin composition for producing a color filter for a CMOS image sensor is provided. The thermosetting resin composition comprises an organic solvent and a self-curing copolymer having structural units represented by Formulae 1, 2, 3 and 4, which are described in the specification.
    Type: Application
    Filed: October 29, 2010
    Publication date: February 17, 2011
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: O. Bum KWON, Kil Sung LEE, Jae Hyun KIM, Jung Hyun KIM
  • Publication number: 20110006386
    Abstract: Disclosed are an organic-inorganic hybrid composition including a fluorene-based monomer, an inorganic particle, an initiator, and a solvent, and an image sensor made using the same. The organic-inorganic hybrid composition can have a high refractive index and excellent transmittance to minimize light loss, and the image sensor produced using the same may transport a greater amount of light to a photodiode. Accordingly, it is possible to accomplish a high resolution image sensor having improved sensitivity.
    Type: Application
    Filed: April 30, 2010
    Publication date: January 13, 2011
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Jae-Hyun KIM, Eui-June JEONG, Kil-Sung LEE
  • Publication number: 20110003248
    Abstract: A positive photosensitive resin composition according to one embodiment of the present invention includes a polyamic acid or a polyamic acid ester compound including a repeating unit represented by Formula 1 defined in this specification, a photosensitive diazoquinone compound, a silane compound, a phenol compound, and a solvent. The positive photosensitive resin composition can be cured at a low temperature of 260° C. or less, and can have high sensitivity, resolution, residue removal, substrate adherence, and pattern-forming capabilities, and low film shrinkage.
    Type: Application
    Filed: September 17, 2010
    Publication date: January 6, 2011
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Doo-Young JUNG, Ji-Young JEONG, Hyun-Yong CHO, Yong-Sik YOO, Kil-Sung LEE, Myoung-Hwan CHA
  • Patent number: 7851789
    Abstract: The present invention provides a photosensitive resin composition for a pad protective layer that includes (A) an alkali soluble resin, (B) a reactive unsaturated compound, (C) a photoinitiator, and (D) a solvent. The (A) alkali soluble resin includes a copolymer including about 5 to about 50 wt % of a unit having the Chemical Formula 1, about 1 to about 25 wt % of a unit having the Chemical Formula 2, and about 45 to about 90 wt % of a unit having the Chemical Formula 3, and a method of making an image sensor using the photosensitive resin composition.
    Type: Grant
    Filed: December 8, 2008
    Date of Patent: December 14, 2010
    Assignee: Cheil Industries Inc.
    Inventors: Kil-Sung Lee, Jae-Hyun Kim, Chang-Min Lee, Eui-June Jeong, Kwen-Woo Han, O-Bum Kwon, Jung-Sik Choi, Jong-Seob Kim, Tu-Won Chang, Jung-Hyun Cho, Seul-Young Jeong
  • Patent number: 7847013
    Abstract: A thermosetting resin composition for producing a color filter for a CMOS image sensor is provided. The thermosetting resin composition comprises an organic solvent and a self-curing copolymer having structural units represented by Formulae 1, 2, 3 and 4, which are described in the specification.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: December 7, 2010
    Assignee: Cheil Industries Inc.
    Inventors: O Bum Kwon, Kil Sung Lee, Jae Hyun Kim, Jung Hyun Kim
  • Publication number: 20100167188
    Abstract: The present invention relates to a pigment dispersion composition that is capable of decreasing pattern residues and improving resolution, a resist composition for a color filter including the same, and a color filter fabricated using the same. More particularly, the pigment dispersion composition includes a pigment, a binder resin, a solvent, and a first dispersing agent and a second dispersing agent each represented by a predetermined chemical formula.
    Type: Application
    Filed: March 11, 2010
    Publication date: July 1, 2010
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Kil-Sung LEE, Jae-Hyun KIM, Eui-June JEONG
  • Publication number: 20100160474
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and a color filter fabricated using the same. The photosensitive resin composition includes (a) an acrylic-based resin, (b) a photopolymerizable monomer, (c) a photopolymerization initiator, (d) a pigment, and (e) a solvent. The acrylic-based resin is a copolymer including a repeating unit of an ethylenic unsaturated monomer including a carboxyl group and a repeating unit of an ethylenic unsaturated monomer including an alkoxy 4-oxo butanoic acid group. The photosensitive resin composition for a color filter can have residue removing characteristics, and is capable of forming fine pixels and providing a color filter having high resolution.
    Type: Application
    Filed: March 4, 2010
    Publication date: June 24, 2010
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Kil-Sung LEE, Jae-Hyun KIM, Chang-Min LEE, Eui-June JEONG
  • Patent number: 7722932
    Abstract: Provided herein are one-solution type thermosetting resin compositions that may be useful to form protective films for color filters used in liquid crystal displays or image sensors. According to some embodiments, the resin compositions may include a self-curable copolymer and an epoxy compound. The protective films may exhibit desirable flatness, adhesiveness, transmittance, heat resistance and chemical resistance. Also provided are methods of forming a film on a substrate, and substrates having a film formed thereon. In addition, provided herein are color filters including a film formed from a composition according to an embodiment of the invention, and liquid crystal displays and image sensors including such color filters.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: May 25, 2010
    Assignee: Cheil Industries, Inc.
    Inventors: O Bum Kwon, Hyun Moon Choi, Sun Yul Lee, Kil Sung Lee
  • Publication number: 20100104958
    Abstract: Disclosed is a color filter photosensitive resin composition that includes (A) an acryl-based binder resin having at least one carboxyl group, (B) an acryl-based photopolymerizable monomer, (C) a photopolymerization initiator, and (D) a solvent, where at least one of the acryl-based binder resin or the acryl-based photopolymerizable monomer includes a blue dye functional group. The color filter photosensitive resin composition can be prepared into a color filter having uniformity, almost no residue, and high resolution due to ultrafine pixels of 1.4 ?m or less.
    Type: Application
    Filed: October 20, 2009
    Publication date: April 29, 2010
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Eui-June JEONG, Kil-Sung LEE, Jae-Hyun KIM, Chang-Min LEE
  • Publication number: 20100099043
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) a first polybenzoxazole precursor that includes: a repeating unit of Chemical Formula 1 and a thermally polymerizable functional group at least one terminal end; (B) a second polybenzoxazole precursor that includes a repeating unit of Chemical Formula 3; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent.
    Type: Application
    Filed: October 20, 2009
    Publication date: April 22, 2010
    Inventors: Doo-Young JUNG, Ji-Young JEONG, Hyun-Yong CHO, Yong-Sik YOO, Min-Kook CHUNG, Jong-Hwa LEE, Kil-Sung LEE, Myoung-Hwan CHA
  • Patent number: 7691915
    Abstract: Disclosed is a photosensitive resin composition. The composition comprises [A] an alkali-soluble resin, [B] a photoactive compound and [C] a solvent. The alkali-soluble resin is a copolymer including at least one structural unit with an aziridine group. The composition exhibits good storage stability, high sensitivity, high UV transmittance, high residual film ratio, improved coating uniformity and excellent pattern-forming properties. Further disclosed is an organic insulating film formed using the composition. The organic insulating film has excellent resistance to solvents and chemicals.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: April 6, 2010
    Assignee: Cheil Industries Inc.
    Inventors: Min Sung Kim, Sang Won Cho, Dong Ju Shin, Kil Sung Lee
  • Patent number: 7662448
    Abstract: A photosensitive resin composition for forming column spacers for a liquid crystal display device is provided. The composition includes an alkali-soluble resin, a reactive unsaturated compound, a photoinitiator and a solvent. The alkali-soluble resin includes structural units represented by Formulae 1, 2 and 3, which are described in the specification. A pattern formed using the composition is also provided. The pattern shows improved thickness uniformity, good developability without leaving any residual image, superior solvent resistance and high recovery rate.
    Type: Grant
    Filed: December 10, 2007
    Date of Patent: February 16, 2010
    Assignee: Cheil Industries Inc.
    Inventors: Jae Sun Han, Jeong Min Hong, Jung Sik Choi, Kil Sung Lee
  • Patent number: 7625444
    Abstract: Disclosed herein are carbon black surface-modified with benzene compound of Formula 1 described in the specification and a carbon black dispersion composition for a black matrix using the carbon black. The carbon black dispersion composition uses carbon black surface-modified with the benzene compound of Formula 1, or about 0.1 to about 20% by weight of a cardo compound selected from cardo monomers, oligomers, polymers and mixtures thereof. The carbon black dispersion composition can provide improved adhesive properties, uniformity and resolution of black matrix patterns, and no undercut is formed on the black matrix patterns.
    Type: Grant
    Filed: June 23, 2006
    Date of Patent: December 1, 2009
    Assignee: Cheil Industries Inc.
    Inventors: Kil Sung Lee, Jae Hyun Kim, Eui June Jeong, Chun Woo Lee
  • Patent number: 7618486
    Abstract: Disclosed is a pigment dispersion composition for producing a color filter. The pigment dispersion composition comprises a pigment, a binder resin, a dispersant and a solvent. The pigment is a blue anthraquinone pigment and is pretreated with a water-soluble inorganic salt and a wetting agent. The pigment dispersion composition can be used to produce a color filter for a color imaging device with good color separation and high transmittance.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: November 17, 2009
    Assignee: Cheil Industries Inc.
    Inventors: Chang Min Lee, Kil Sung Lee, Jae Hyun Kim, Sung Hyok Kim, Eui June Jeong
  • Publication number: 20090208854
    Abstract: Disclosed is a photosensitive resin composition used to form spacers of a liquid crystal display device. The photosensitive resin composition comprises [A] an alkali-soluble resin, [B] a reactive unsaturated compound, [C] a photopolymerization initiator and [D] a solvent wherein the alkali-soluble resin [A] is a copolymer including structural units represented by Formulae 1 to 3, which are described in the specification. Column spacers formed using the photosensitive resin composition exhibit high compressive displacement, elastic recovery and residual film ratio.
    Type: Application
    Filed: April 27, 2009
    Publication date: August 20, 2009
    Applicant: Cheil Industries Inc.
    Inventors: Jung Sik CHOI, Jae Sun HAN, Jeong Min HONG, Kil Sung LEE