Abstract: Packages and methods of assembly are described in which barriers are utilized during overmolding to improve volumetric efficiency. In one embodiment, a barrier includes multiple variable height components located on an interior of the barrier, where the barrier prevents the variable height components from being overmolded during the encapsulation process. In one embodiment, a barrier includes a camera module mounted on an image sensor located on an interior of the barrier, where the barrier prevents the camera module and image sensor from being overmolded during the encapsulation process. In an embodiment, a barrier is mounted on a secondary tier with the secondary tier mounted on a primary tier, where the barrier prevents multiple connector components located on an interior of the barrier from being overmolded during the encapsulation process.

Abstract: Process condition management facilitates the combination of dry development and post-development treatment into a single process chamber, eliminating the necessity for a post-dry development bake step in a separate chamber during semiconductor manufacturing. Thermal dry development and plasma dry development may be performed in the same chamber. Thermal dry development, plasma dry development and passivation such as an O2 flash treatment; or thermal dry development, plasma dry development, passivation and hardening operations are enabled without wafer transfer.

Abstract: A screening device for screening a person includes a cabin including a wall at least partly enclosing an inner space, and a sensor on at least part of the surface of the wall facing the inner space, the sensor being configured to sense the person present in the inner space. The screening device includes a projector projecting an image into the inner space to be viewed by the person, and a control device connected to the sensor and the projector and configured to operate the sensor to sense the person residing in the inner space, and drive the projector to project instructions to the person, associated with the operating of the sensor. The screening system may further include a hand luggage screening apparatus.

Abstract: According to embodiments of the present invention, a sensor patch for detecting extravasation is provided. The sensor patch includes an elastic film, and at least one sensing electrode disposed on the elastic film, wherein an electrical resistance of the at least one sensing electrode is changeable in response to a force acting on the at least one sensing electrode. According to further embodiments of the present invention, a sensing device is also provided.

Abstract: According to embodiments of the present invention, a sensor patch for detecting extravasation is provided. The sensor patch includes an elastic film, and at least one sensing electrode disposed on the elastic film, wherein an electrical resistance of the at least one sensing electrode is changeable in response to a force acting on the at least one sensing electrode. According to further embodiments of the present invention, a sensing device is also provided.

Abstract: A pellicle is provided for use with a lithographic photomask during manufacture of semiconductor devices, printed circuit boards, liquid crystal displays, etc. The pellicle has a pellicle frame comprising four pellicle walls that define a trapezoidal area sized and shaped to correspond to a pattern area of a lithographic photomask; and a pellicle film extending across the trapezoidal area and affixed to a film-side edge of the pellicle frame; wherein any one of the four pellicle walls has a vent hole therethrough, the vent hole being located proximate a corner of the frame and if matter passes through the vent hole, the foreign matter will not obstruct the pattern area during use of the lithographic photomask.

Abstract: A pellicle is provided for use with a lithographic photomask during manufacture of semiconductor devices, printed circuit boards, liquid crystal displays, etc. The pellicle has a pellicle frame comprising four pellicle walls that define a trapezoidal area sized and shaped to correspond to a pattern area of a lithographic photomask; and a pellicle film extending across the trapezoidal area and affixed to a film-side edge of the pellicle frame; wherein any one of the four pellicle walls has a vent hole therethrough, the vent hole being located proximate a corner of the frame and if matter passes through the vent hole, the foreign matter will not obstruct the pattern area during use of the lithographic photomask.

Abstract: In a device (4) for receiving a piece of baggage (2) for transport, for example at an airport, the device comprises a receiving room (18A) with an infeed opening and a discharge opening. The receiving room is provided with a closing assembly, the closing assembly comprising a closing mechanism (22, 24). The device furthermore comprises a conveyor unit (16, 20) for discharging the piece of baggage from the receiving room through the discharge opening. The closing assembly is equipped at any time to keep at least one or other of the infeed opening and the discharge opening closed. In this way a device according to the invention is equipped to protect deposited baggage from third parties and to prevent persons from following the piece of baggage to the areas not accessible to the public. The present invention also provides a method for receiving a piece of baggage, which method is in accordance with the functioning of the above-mentioned device.

Abstract: A liquid immersion scanning exposure system utilizes an immersion liquid confined within a watertight lens hood having a base portion formed from a solid optical element. During operation, a bottom portion of a lens assembly is disposed within the immersion liquid and the solid optical element is placed upon a photoresist material or layer (to be patterned). The lens assembly moves laterally through the immersion liquid parallel to the photoresist material. Because the solid optical element separates the immersion liquid from the photoresist material and does not move relative to the photoresist material, the photoresist material does not contact with the immersion liquid and the solid optical element and is not susceptible to damage or scratching by the solid optical element.

Abstract: A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.

Abstract: A method of making a mask is disclosed. The method includes providing a first and a second mask layers and disposing a first phase shift region on the first mask layer. A second phase shift region is disposed on the second mask layer, wherein the first and second phase shift regions are out of phase. A continuous unit cell is formed in the first phase shift region. The unit cell comprises a center section and distinct extension sections. The extension sections are contiguous to and extend outwards from the center section. The distinct extension sections have a same width as the center section. The second phase shift region is adjacent to the unit cell in the first phase shift region.

Abstract: A method and structure for removing side lobes is provided by positioning first and second radiation transparent regions of respective first and second phases at a first plane with the first and second phases being substantially out of phase. Further, positioning the first and the second region to cause radiation at a second plane to be neutralized in a first region, not to be neutralized in a second region, and to have a side lobe in a third region. Further, positioning a non-transparent region at the first plane to assure radiation at the second plane to be neutralized in the first region and positioning a third radiation transparent region of the first or second phase at the first plane to neutralize the side lobes in the third region at the second plane.

Abstract: A method for forming a semiconductor device is presented. The method includes providing a substrate having a photoresist thereon and transmitting a light source through a mask having a pattern onto the photoresist. The mask comprises a mask substrate having first, second and third regions, the third region is disposed between the first and second regions. The mask also includes a light reducing layer over the mask substrate having a first opening over the first region and a second opening over the second region. The first and second openings have layer sidewalls. The sidewalls of the light reducing layer are slanted at an angle less than 90 degrees from the plane of a top surface of the mask substrate. The method also includes developing the photoresist to transfer the pattern of the mask to the photoresist.

Abstract: An integrated circuit system that includes: providing a substrate coated with a photoresist material; exposing the photoresist material to an energy source through a first mask to form a first substrate feature and a second substrate feature therein; and exposing the photoresist material to the energy source through a second mask to transform the second substrate feature into another one of the first substrate feature therein.

Abstract: A liquid immersion scanning exposure system utilizes an immersion liquid confined within a watertight lens hood having a base portion formed from a solid optical element. During operation, a bottom portion of a lens assembly is disposed within the immersion liquid and the solid optical element is placed upon a photoresist material or layer (to be patterned). The lens assembly moves laterally through the immersion liquid parallel to the photoresist material. Because the solid optical element separates the immersion liquid from the photoresist material and does not move relative to the photoresist material, the photoresist material does not contact with the immersion liquid and the solid optical element and is not susceptible to damage or scratching by the solid optical element.

Abstract: An integrated circuit system that includes: providing a first mask including a first feature; exposing the first mask to a radiation source to form an image of the first feature on a photoresist material that is larger than a structure to be formed, the photoresist material being formed over a substrate that includes the integrated circuit system; providing a second mask including a second feature; aligning the second mask over the image of the first mask to form an overlap region; and exposing the second mask to the radiation source to form an image of the second feature on the photoresist material that is larger than the structure to be formed.

Abstract: A method of fabricating a device is presented. The method includes forming a mask that includes multiple images. A substrate is patterned using the mask. An image of the multiple images corresponds to a respective patterning process. The substrate is processed further to complete the processing of the substrate to form the desired function of the device.

Abstract: A reticle system that includes: providing a reticle system; and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow.

Abstract: Apparatus is provided for determining presence of contamination on a lithography mask, including: a fluid trap having a base and at least one wall member extending substantially perpendicularly to the base for trapping fluid on a portion of the base when fluid introduced during a cleaning process of the mask is removed.

Abstract: A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.