Patents by Inventor Kinya Miyashita
Kinya Miyashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8469342Abstract: Provided is a substrate suction apparatus which has a vacuum suction mechanism and an electrostatic attraction mechanism, and improves planarity of a subject to be processed by improving uniformity in vacuum suction power. A method for manufacturing such substrate suction apparatus is also provided. A substrate suction apparatus (1) is provided with a base board (2), a dielectric body (3), an electrostatic attraction mechanism (4) and a vacuum suction mechanism (5). Specifically, the dielectric body (3) is composed of a downmost dielectric layer (31), an intermediate dielectric layer (32) and a topmost dielectric layer (33). The electrostatic attraction mechanism (4) is composed of attraction electrodes (41, 42) and a direct current power supply. The vacuum suction mechanism (5) is composed of a groove (51), a suction channel (52), a porous dielectric body (3) and the porous attraction electrodes (41, 42).Type: GrantFiled: June 5, 2008Date of Patent: June 25, 2013Assignee: Creative Technology CorporationInventors: Yoshiaki Tatsumi, Kinya Miyashita
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Patent number: 8238072Abstract: A bipolar electrostatic chuck which has excellent dielectric breakdown strength and provides excellent attracting performance. The bipolar electrostatic chuck eliminates difficulty in dismounting a sample from a sample attracting plane as much as possible after application of a voltage to electrodes is finished. The bipolar electrostatic chuck is provided with a first electrode and a second electrode in an insulator and permits a surface of the insulator to be the sample attracting plane. The insulator has the first electrode, an interelectrode insulating layer and the second electrode in this order from the sample attracting plane in the depth direction. The second electrode has a region not overlapping with the first electrode in a normal line direction of the sample attracting plane.Type: GrantFiled: January 21, 2010Date of Patent: August 7, 2012Assignee: Creative Technology CorporationInventors: Hiroshi Fujisawa, Kinya Miyashita
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Patent number: 8196594Abstract: Provided are an apparatus for and a method of removing foreign materials from a substrate which reliably remove the foreign materials, eliminate a chance of redeposition of the foreign materials, and are applicable even to large-size substrates. The apparatus for removing foreign materials includes electrostatic chucks (2, 3) forming a substrate chucking surface (4) to which the substrate (1) is attracted; a resin sheet supplying means (9) for supplying a resin sheet (5) to the substrate chucking surface (4); resin sheet collecting means (13) for collecting the supplied resin sheet (5); and a substrate transfer means for transferring the substrate (1). The substrate (1) supplied to the electrostatic chucks (2, 3) by the substrate transfer means is attracted to the substrate chucking surface (4) through the resin sheet (5), and a foreign material (22) deposited on a side of the substrate chucking surface (4) of the substrate (1) is transferred onto the resin sheet (5) and removed.Type: GrantFiled: July 11, 2006Date of Patent: June 12, 2012Assignee: Creative Technology CorporationInventors: Riichiro Harano, Yoshiaki Tatsumi, Kinya Miyashita, Hiroshi Fujisawa
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Patent number: 8158238Abstract: An electrostatic chuck having excellent chucking force and holding force is provided. The electrostatic chuck includes a laminate structure in which a first insulating layer, a first electrode layer, an interelectrode insulating layer, a second electrode layer and a second insulating layer are successively laminated on a metal base in an order of increasing distance from the metal base. The second electrode layer includes a pattern electrode having a plurality of opening portions within a flat area, and a shortest distance X between mutually opening portions and a length L of a line segment formed by feet of perpendiculars when barycenters of the adjacent opening portions are projected to a virtual line which is a straight line parallel to the shortest distance X satisfy L/X?1.5 and L<2.6 mm.Type: GrantFiled: July 7, 2006Date of Patent: April 17, 2012Assignee: Creative Technology CorporationInventors: Kinya Miyashita, Hiroshi Fujisawa, Riichiro Harano
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Patent number: 8051548Abstract: Provided is a method of manufacturing a gas supply structure for use in an electrostatic chuck apparatus having an electrostatic chuck on the upper surface side of a metal base (1), the gas supply structure being capable of eliminating contamination due to nonuniform cooling gas jetting quantities and deposition of a thermally spraying material and the like.Type: GrantFiled: September 3, 2008Date of Patent: November 8, 2011Assignee: Creative Technology CorporationInventors: Kinya Miyashita, Yoshihiro Watanabe
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Patent number: 8027171Abstract: Provided is a power feeding structure of an electrostatic chuck including a lower insulation layer, an electrode layer and a surface insulation dielectric layer formed on an upper surface side of a metal substrate in order from the metal substrate, in which the lower insulation layer, the electrode layer and the surface insulation dielectric layer are not cracked easily.Type: GrantFiled: September 19, 2006Date of Patent: September 27, 2011Assignee: Creative Technology CorporationInventors: Kinya Miyashita, Yoshihiro Watanabe
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Patent number: 7881036Abstract: An electrostatic chuck electrode sheet which allows the difference in capacitance between electrodes due to the presence or absence of a substrate to be increased to a level which can be accurately detected using a known substrate detection device, and allows an electrostatic chuck to exhibit an excellent attraction force, and an electrostatic chuck using the electrode sheet, are disclosed.Type: GrantFiled: November 30, 2006Date of Patent: February 1, 2011Assignee: Creative Technology CorporationInventors: Hiroshi Fujisawa, Kinya Miyashita
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Publication number: 20100254064Abstract: Provided is a method of manufacturing a gas supply structure for use in an electrostatic chuck apparatus having an electrostatic chuck on the upper surface side of a metal base (1), the gas supply structure being capable of eliminating contamination due to nonuniform cooling gas jetting quantities and deposition of a thermally spraying material and the like.Type: ApplicationFiled: September 3, 2008Publication date: October 7, 2010Inventors: Kinya Miyashita, Yoshihiro Watanabe
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Publication number: 20100194012Abstract: Provided is a substrate suction apparatus which has a vacuum suction mechanism and an electrostatic attraction mechanism, and improves planarity of a subject to be processed by improving uniformity in vacuum suction power. A method for manufacturing such substrate suction apparatus is also provided. A substrate suction apparatus (1) is provided with a base board (2), a dielectric body (3), an electrostatic attraction mechanism (4) and a vacuum suction mechanism (5). Specifically, the dielectric body (3) is composed of a downmost dielectric layer (31), an intermediate dielectric layer (32) and a topmost dielectric layer (33). The electrostatic attraction mechanism (4) is composed of attraction electrodes (41, 42) and a direct current power supply. The vacuum suction mechanism (5) is composed of a groove (51), a suction channel (52), a porous dielectric body (3) and the porous attraction electrodes (41, 42).Type: ApplicationFiled: June 5, 2008Publication date: August 5, 2010Applicant: CREATIVE TECHNOLOGY CORPORATIONInventors: Yoshiaki Tatsumi, Kinya Miyashita
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Publication number: 20100149720Abstract: A bipolar electrostatic chuck which has excellent dielectric breakdown strength and provides excellent attracting performance. The bipolar electrostatic chuck eliminates difficulty in dismounting a sample from a sample attracting plane as much as possible after application of a voltage to electrodes is finished. The bipolar electrostatic chuck is provided with a first electrode and a second electrode in an insulator and permits a surface of the insulator to be the sample attracting plane. The insulator has the first electrode, an interelectrode insulating layer and the second electrode in this order from the sample attracting plane in the depth direction. The second electrode has a region not overlapping with the first electrode in a normal line direction of the sample attracting plane.Type: ApplicationFiled: January 21, 2010Publication date: June 17, 2010Inventors: Hiroshi Fujisawa, Kinya Miyashita
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Publication number: 20100065300Abstract: Provided is a power feeding structure of an electrostatic chuck including a lower insulation layer, an electrode layer and a surface insulation dielectric layer formed on an upper surface side of a metal substrate in order from the metal substrate, in which the lower insulation layer, the electrode layer and the surface insulation dielectric layer are not cracked easily.Type: ApplicationFiled: September 19, 2006Publication date: March 18, 2010Inventors: Kinya Miyashita, Yoshihiro Watanabe
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Publication number: 20090250077Abstract: Provided are an apparatus for and a method of removing foreign materials from a substrate which reliably remove the foreign materials, eliminate a chance of redeposition of the foreign materials, and are applicable even to large-size substrates. The apparatus for removing foreign materials includes electrostatic chucks (2, 3) forming a substrate chucking surface (4) to which the substrate (1) is attracted; a resin sheet supplying means (9) for supplying a resin sheet (5) to the substrate chucking surface (4); resin sheet collecting means (13) for collecting the supplied resin sheet (5); and a substrate transfer means for transferring the substrate (1). The substrate (1) supplied to the electrostatic chucks (2, 3) by the substrate transfer means is attracted to the substrate chucking surface (4) through the resin sheet (5), and a foreign material (22) deposited on a side of the substrate chucking surface (4) of the substrate (1) is transferred onto the resin sheet (5) and removed.Type: ApplicationFiled: July 11, 2006Publication date: October 8, 2009Inventors: Riichiro Harano, Yoshiaki Tatsumi, Kinya Miyashita, Hiroshi Fujisawa
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Patent number: 7567421Abstract: A bipolar electrostatic including a chuck main body having a mounting surface; an annular electrode member formed in an annular configuration wit a center opening and fixed onto the mounting surface of the chuck main body though an adhesive layer; an inner electrode member disposed at a given clearance from the annular electrode member within the center opening of the annular electrode member and fixed onto the mounting surface through the adhesive layer; and an outer electrode member disposed at a given clearance from the annular electrode member outside of the annular electrode member and fixed onto the mounting surface through the adhesive layer.Type: GrantFiled: June 15, 2004Date of Patent: July 28, 2009Assignee: Creative Technology CorporationInventor: Kinya Miyashita
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Publication number: 20090041980Abstract: An electrostatic chuck having excellent chucking force and holding force is provided. The electrostatic chuck includes a laminate structure in which a first insulating layer, a first electrode layer, an interelectrode insulating layer, a second electrode layer and a second insulating layer are successively laminated on a metal base in an order of increasing distance from the metal base. The second electrode layer includes a pattern electrode having a plurality of opening portions within a flat area, and a shortest distance X between mutually opening portions and a length L of a line segment formed by feet of perpendiculars when barycenters of the adjacent opening portions are projected to a virtual line which is a straight line parallel to the shortest distance X satisfy L/X?1.5 and L<2.6 mm.Type: ApplicationFiled: July 7, 2006Publication date: February 12, 2009Applicant: CREATIVE TECHNOLOGY CORPORATIONInventors: Kinya Miyashita, Hiroshi Fujisawa, Riichiro Harano
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Publication number: 20090040681Abstract: An electrostatic chuck electrode sheet which allows the difference in capacitance between electrodes due to the presence or absence of a substrate to be increased to a level which can be accurately detected using a known substrate detection device, and allows an electrostatic chuck to exhibit an excellent attraction force, and an electrostatic chuck using the electrode sheet, are disclosed.Type: ApplicationFiled: November 30, 2006Publication date: February 12, 2009Inventors: Hiroshi Fujisawa, Kinya Miyashita
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Patent number: 7411773Abstract: An electrostatic chucking device having a laminated structure formed by sequentially laminating a first insulation layer, an electrode layer, and a second insulation layer on a metal substrate. The first and second insulation layers are formed from polyimide films. At least one adhesion layer is provided between the metal substrate and the first insulation layer, and is a thermoplastic polyimide-based adhesive film having a film thickness of 5 to 50 ?m.Type: GrantFiled: February 10, 2004Date of Patent: August 12, 2008Assignees: Creative Technology Corporation, Kawamura Sangyo Co., Ltd.Inventors: Yoshiaki Tatsumi, Kinya Miyashita
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Patent number: 7300707Abstract: To provide an aluminium composite structure having a highly airtight channel therein, including: a core material having a concave groove on a surface; a covering material made up of aluminium or aluminium alloy which covers the surface of the core material other than an inner surface of the concave groove; and a lid which is firmly fixed to the covering material to close an opening of the concave groove of the core material, forms a channel for running a heat exchange medium therein, and is made up of the aluminium or aluminium alloy, and a method of manufacturing the same.Type: GrantFiled: October 25, 2004Date of Patent: November 27, 2007Assignee: Creative Technology CorporationInventors: Kinya Miyashita, Yoshiaki Tatsumi
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Publication number: 20070223173Abstract: A bipolar electrostatic chuck which has excellent dielectric breakdown strength and provides excellent attracting performance. The bipolar electrostatic chuck eliminates difficulty in dismounting a sample from a sample attracting plane as much as possible after application of a voltage to electrodes is finished. The bipolar electrostatic chuck is provided with a first electrode and a second electrode in an insulator and permits a surface of the insulator to be the sample attracting plane. The insulator has the first electrode, an interelectrode insulating layer and the second electrode in this order from the sample attracting plane in the depth direction. The second electrode has a region not overlapping with the first electrode in a normal line direction of the sample attracting plane.Type: ApplicationFiled: March 15, 2005Publication date: September 27, 2007Inventors: Hiroshi Fujisawa, Kinya Miyashita
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Publication number: 20060158821Abstract: A dipolar electrostatic chuck is characterized by including a chuck main body having amounting surface; an annular electrode member which is formed in an annular configuration with a center opening and is fixed onto the mounting surface of the chuck main body through an adhesive layer; an inner electrode member which is disposed at a given clearance from the annular electrode member within the center opening of the annular electrode member and is fixed onto the mounting surface through the adhesive layer; and an outer electrode member which is disposed at a given clearance from the annular electrode member outside of the annular electrode member and is fixed onto the mounting surface through the adhesive layer, in which the inner electrode member and the outer electrode member constitute a first electrode, and the annular electrode member constitutes a second electrode.Type: ApplicationFiled: June 15, 2004Publication date: July 20, 2006Inventor: Kinya Miyashita
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Publication number: 20060086475Abstract: To provide an aluminium composite structure having a highly airtight channel therein, including: a core material having a concave groove on a surface; a covering material made up of aluminium or aluminium alloy which covers the surface of the core material other than an inner surface of the concave groove; and a lid which is firmly fixed to the covering material to close an opening of the concave groove of the core material, forms a channel for running a heat exchange medium therein, and is made up of the aluminium or aluminium alloy, and a method of manufacturing the same.Type: ApplicationFiled: October 25, 2004Publication date: April 27, 2006Inventors: Kinya Miyashita, Yoshiaki Tatsumi