Abstract: In a method for calibrating a measuring device by using a case which includes a case main body configured to accommodate the measuring device, a restricting portion configured to restrict translation of the measuring device accommodated in the case main body and reference surfaces provided in the case main body to face the respective sensor electrodes, a plurality of detection values is acquired in a state where translation of the measuring device accommodated in the case is restricted by the restricting portion, the reference surfaces face respective sensor electrodes of the measuring device and a high frequency signal is applied to the sensor electrodes. Then, coefficients in functions used in calculating measurement values are calibrated such that the measurement values become a predetermined value.

Abstract: A transfer method according to an exemplary embodiment includes: transferring a focus ring onto a stage by a transfer unit; transferring a measuring instrument into an inner region of the transferred focus ring and onto an electrostatic chuck; acquiring a measurement value group by the transferred measuring instrument; and adjusting a transfer position of the focus ring by the transfer unit such that the central position of the electrostatic chuck and the central position of the focus ring coincide with each other based on the measurement value group.

Abstract: A transfer robot system includes a transfer robot configured to transfer a wafer under an operational instruction; a controller configured to output the operational instruction to the transfer robot; a wafer receptacle; and an interferometer. The wafer receptacle comprises a receptacle body having an open front through which an end effector and the wafer pass; a first reflector disposed under a support space; and a first optical element disposed above the support space to face the first reflector, configured to output the light toward the first reflector and receive received light therefrom. The interferometer calculates an optical interference peak, which is generated between the wafer and the first reflector, based on the received light. The controller determines a taught position of the transfer robot based on a variation of the optical interference peak during an operation of the transfer robot.

Abstract: Provided is a measuring instrument for measuring an electrostatic capacity. The measuring instrument includes a base substrate having a disk shape, a plurality of first sensors arranged along an edge of the base substrate and respectively provide a plurality of side electrodes, one or more second sensors each of which has a bottom electrode provided along a bottom surface of the base substrate, and a circuit board. The circuit board is configured to apply a high frequency signal to the plurality of side electrodes and the bottom electrode, to generate a plurality of first measurement values respectively indicating electrostatic capacities based on voltage amplitudes in the plurality of side electrodes, and to generate a second measurement value indicating an electrostatic capacity based on a voltage amplitude in the bottom electrode.

Abstract: A ranging apparatus for use in a plasma processing chamber having an internal space and a window is disclosed. The ranging apparatus includes at least one external light emitting device disposed external to the plasma processing chamber. The external light emitting device emits at least one source light beam to the internal space through the window. The ranging apparatus includes a base wafer disposed on a stage in the internal space. The ranging apparatus includes at least one optical circuit fixed to the base wafer. The optical circuit deflects the source light beam to a target in the internal space, and deflects a reflection light beam to the window. The ranging apparatus includes at least one external light receiving device disposed external to the plasma processing chamber. The external light receiving device receives the deflected reflection light beam through the window.

Abstract: A measuring device includes a disc-shaped base substrate, sensor electrodes arranged circumferentially along a periphery of the base substrate, a high frequency oscillator configured to apply a high frequency signal to the sensor electrodes, C/V conversion circuits, each being configured to convert a voltage amplitude at a corresponding sensor electrode among the sensor electrodes to a voltage signal indicating an electrostatic capacitance, an A/D converter configured to convert the voltage signal outputted from each of the C/V conversion circuits to a digital value, and a switching mechanism configured to switch each sensor electrode of the sensor electrodes between a first state in which the sensor electrodes are electrically connected to the C/V conversion circuits and a second state in which electrode pairs are connected to different C/V conversion circuits among the C/V conversion circuits. Each electrode pair includes circumferentially adjacent two sensor electrodes among the sensor electrodes.

Abstract: In a measuring device provided in a region surrounded by a focus ring and configured to measure an amount of consumption of the focus ring, the measuring device comprises: a disc-shaped base substrate; sensor electrodes provided on the base substrate; a high frequency oscillator configured to apply a high frequency signal to the sensor electrodes; and an operation unit configured to calculate measurement values indicating electrostatic capacitances of the sensor electrodes from detection values corresponding to potentials of the sensor electrodes. The operation unit calculates a representative value (average value) of the measurement values corresponding to the amount of consumption of the focus ring and derives the amount of consumption of the focus ring with reference to a table in which the amount of consumption of the focus ring is associated with the representative value (average value) of the measurement values corresponding to the amount of consumption.

Abstract: There is provided a position detection system for use in a processing apparatus including a mounting table configured to mount thereon a disc-shaped target object and a focus ring surrounding a periphery of the mounting table. The system includes a light source configured to generate measurement light, three or more optical elements configured to emit the measurement light as emission light and receive reflected light, a driving unit configured to move each of the optical elements such that a scanning range from the focus ring to the target object is scanned, and a control unit configured to obtain positional relation between the focus ring and the target object based on the reflected light in the scanning range of each of the optical elements.

Abstract: A measuring device includes sensor electrodes provided along a periphery of a base substrate such that a sum A of shortest distances from the sensor electrodes to an inner peripheral surface of a focus ring becomes a constant value, the sum A satisfying ? i = 1 N ? a C i = A ( N ? : the number of the sensor electrodes, Ci: measurement values and “a”: constant). A method of obtaining the amount of deviation of the central position of the measuring device in a region surrounded by the focus ring from the center of the region, includes: calculating the measurement values Ci using the measuring device; calculating the constant “a” using the measurement values Ci; calculating distances from the sensor electrodes to the inner peripheral surface of the focus ring using the constant “a” and the measurement values Ci; and calculating the amount of deviation of the central position of the measuring device based on the calculated distances.

Abstract: A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The optical element projects the measurement light, as projection light, generated by the light source and receives reflected light. The reflective member is disposed on the transport device. The reflective member reflects the projection light toward the placement table, and reflects the reflected light of the projection light, which is projected toward the placement table, toward the optical element. The drive unit operates the transport device so that the reflective member scans a plurality of linear scanning ranges. The controller calculates positional relationship between the focus ring and the object placed on the placement table based on the reflected light within the plurality of linear scanning ranges.

Abstract: In a method for calibrating a measuring device by using a case which includes a case main body configured to accommodate the measuring device, a restricting portion configured to restrict translation of the measuring device accommodated in the case main body and reference surfaces provided in the case main body to face the respective sensor electrodes, a plurality of detection values is acquired in a state where translation of the measuring device accommodated in the case is restricted by the restricting portion, the reference surfaces face respective sensor electrodes of the measuring device and a high frequency signal is applied to the sensor electrodes. Then, coefficients in functions used in calculating measurement values are calibrated such that the measurement values become a predetermined value.

Abstract: A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The optical element projects the measurement light, as projection light, generated by the light source and receives reflected light. The reflective member is disposed on the transport device. The reflective member reflects the projection light toward the placement table, and reflects the reflected light of the projection light, which is projected toward the placement table, toward the optical element. The drive unit operates the transport device so that the reflective member scans a plurality of linear scanning ranges. The controller calculates positional relationship between the focus ring and the object placed on the placement table based on the reflected light within the plurality of linear scanning ranges.

Abstract: An electrostatic capacitance measuring device includes: a base substrate; a first sensor having a first electrode, one or more second sensors each having a second electrode, and a circuit board mounted on the base substrate. The first sensor is provided along an edge of the base substrate. The second sensors are fixed on the base substrate. The circuit board is connected to the first sensor and the second sensors, and configured to output high frequency signals to the first electrode and the one or more second electrodes and obtain a first measurement value indicating an electrostatic capacitance from a voltage amplitude at the first electrode and one or more second measurement values indicating electrostatic capacitances obtained from voltage amplitudes at the one or more second electrodes. The measuring device has one or more reference surfaces fixed on the measuring device and facing the one or more second electrodes.

Abstract: In a method for acquiring data indicating an electrostatic capacitance between a focus ring and a measuring device includes a disc-shaped base substrate, sensor units arranged along an edge of the base substrate and a circuit substrate mounted on the base substrate, a processor acquires one or more first data sets respectively including a plurality of digital values indicating an electrostatic capacitance of a corresponding sensor unit. The measuring device is transferred to a region on the mounting table surrounded by the focus ring. The processor acquires second data sets when one or more digital values or an average of the digital values included in each of said one or more first data sets exceeds a first threshold. The processor stores measurement data including the respective second data sets or averages of the digital values of each of the second data sets. The measuring device is unloaded from the chamber.

Abstract: Electrostatic capacitance can be measured with high directivity in a specific direction. A sensor chip that measures the electrostatic capacitance includes a first electrode, a second electrode and a third electrode. The first electrode has a first portion. The second electrode has a second portion extended on the first portion of the first electrode, and is insulated from the first electrode within the sensor chip. The third electrode has a front face extended in a direction which intersects with the first portion of the first electrode and the second portion of the second electrode, and is provided on the first portion and the second portion. The third electrode is insulated from the first electrode and the second electrode within the sensor chip. No portion is extended from the first electrode to be positioned above the first portion.

Abstract: Electrostatic capacitance can be measured with high directivity in a specific direction. A sensor chip that measures the electrostatic capacitance includes a first electrode, a second electrode and a third electrode. The first electrode has a first portion. The second electrode has a second portion extended on the first portion of the first electrode, and is insulated from the first electrode within the sensor chip. The third electrode has a front face extended in a direction which intersects with the first portion of the first electrode and the second portion of the second electrode, and is provided on the first portion and the second portion. The third electrode is insulated from the first electrode and the second electrode within the sensor chip. No portion is extended from the first electrode to be positioned above the first portion.

Abstract: There is provided a position detection system for use in a processing apparatus including a mounting table configured to mount thereon a disc-shaped target object and a focus ring surrounding a periphery of the mounting table. The system includes a light source configured to generate measurement light, three or more optical elements configured to emit the measurement light as emission light and receive reflected light, a driving unit configured to move each of the optical elements such that a scanning range from the focus ring to the target object is scanned, and a control unit configured to obtain positional relation between the focus ring and the target object based on the reflected light in the scanning range of each of the optical elements.

Abstract: Electrostatic capacitance can be measured with high directivity in a specific direction. A sensor chip that measures the electrostatic capacitance includes a first electrode, a second electrode and a third electrode. The first electrode has a first portion. The second electrode has a second portion extended on the first portion of the first electrode, and is insulated from the first electrode within the sensor chip. The third electrode has a front face extended in a direction which intersects with the first portion of the first electrode and the second portion of the second electrode, and is provided on the first portion and the second portion. The third electrode is insulated from the first electrode and the second electrode within the sensor chip.

Abstract: Provided is a measuring instrument for measuring an electrostatic capacity. The measuring instrument includes a base substrate having a disk shape, a plurality of first sensors arranged along an edge of the base substrate and respectively provide a plurality of side electrodes, one or more second sensors each of which has a bottom electrode provided along a bottom surface of the base substrate, and a circuit board. The circuit board is configured to apply a high frequency signal to the plurality of side electrodes and the bottom electrode, to generate a plurality of first measurement values respectively indicating electrostatic capacities based on voltage amplitudes in the plurality of side electrodes, and to generate a second measurement value indicating an electrostatic capacity based on a voltage amplitude in the bottom electrode.

Abstract: A system of inspecting a focus ring is provided. The system includes a measuring device, a transfer device and an operation unit. The measuring device includes a base substrate, a sensor chip and a circuit board. The sensor chip has a sensor electrode and is provided along an edge of the base substrate. The circuit board is configured to output a high frequency signal to the sensor electrode and acquire a digital value indicating electrostatic capacitance based on a voltage amplitude in the sensor electrode. The transfer device is configured to scan the measuring device. The operation unit is configured to obtain difference values by performing a difference operation with respect to the digital values acquired by the measuring device at multiple positions along a direction which intersects with an inner periphery of the focus ring.