Patents by Inventor Kishio Hidaka

Kishio Hidaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8695110
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: April 8, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
  • Patent number: 8635710
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: January 21, 2014
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Publication number: 20130145507
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Application
    Filed: August 15, 2012
    Publication date: June 6, 2013
    Inventors: Toshihiko NAKATA, Masahiro WATANABE, Takashi INOUE, Kishio HIDAKA, Motoyuki HIROOKA
  • Patent number: 8407811
    Abstract: In a scanning probe microscope, a nanotube and metal nano-particles are combined together to configure a plasmon-enhanced near-field probe having an optical resolution on the order of nanometers as a measuring probe in which a metal structure is embedded, and this plasmon-enhanced near-field probe is installed in a highly-efficient plasmon exciting unit to repeat approaching to and retracting from each measuring point on a sample with a low contact force, so that optical information and profile information of the surface of the sample are measured with a resolution on the order of nanometers, a high S/N ratio, and high reproducibility without damaging both of the probe and the sample.
    Type: Grant
    Filed: February 25, 2010
    Date of Patent: March 26, 2013
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Motoyuki Hirooka
  • Patent number: 8272068
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: September 18, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
  • Publication number: 20120204297
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Application
    Filed: April 13, 2012
    Publication date: August 9, 2012
    Applicant: Hitachi, Ltd.
    Inventors: Toshihiko NAKATA, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Patent number: 8181268
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: May 15, 2012
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Publication number: 20110100773
    Abstract: A rotor main body 1 (disc brake), which is made of a C/SiC composite material and provided with a bolt joint around a center axis of the disc brake, of a brake rotor R1. The bolt joint is formed by embedding a block body 13, which is formed by winding carbon fibers into a cylindrical shape, in the disc brake. The strength of the bolt joint which fastens the rotor main body 1 to, for example, a hat portion can be increased.
    Type: Application
    Filed: October 28, 2010
    Publication date: May 5, 2011
    Inventors: Kishio Hidaka, Kazuya Baba, Makoto Ebihara
  • Publication number: 20100331166
    Abstract: An object of the present invention is to produce a heat-resistant carbon/silicon carbide system composite material having a high density without deteriorating the mechanical properties such as toughness of carbon fiber. The present invention is a carbon/silicon carbide system composite material comprising a matrix containing a silicon carbide phase; a carbon fiber dispersed in the matrix; and a eutectic alloy phase containing silicon and an element for lowering a melting point of the silicon, wherein the carbon fiber is covered with a cover layer formed of a composite carbide of the silicon and the element.
    Type: Application
    Filed: June 29, 2010
    Publication date: December 30, 2010
    Inventors: Kishio HIDAKA, Kazuya Baba, Makoto Ebihara
  • Publication number: 20100325761
    Abstract: Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.
    Type: Application
    Filed: December 18, 2008
    Publication date: December 23, 2010
    Applicant: Hitachi, Ltd.
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Toshiaki Morita, Motoyuki Hirooka
  • Publication number: 20100258724
    Abstract: An electron microscope comprising an electron emitting cathode equipped with a carbon nanotube and an extraction unit to field-emit electrons. The carbon nanotube contains a sharp portion which is approximately conical shape at tip thereof closed at the electron-emitting cathode. A method of manufacturing carbon nanotube having a sharp angle part at the tip thereof, comprising a step of placing and heat-treating a tip-sharpened carbon nanotube still at a lower temperature than a phase transition temperature and a step of placing and heat-treating a tip-sharpened carbon nanotube still at a higher temperature than a phase transition temperature.
    Type: Application
    Filed: December 27, 2006
    Publication date: October 14, 2010
    Inventors: Mitsuo Hayashibara, Tadashi Fujieda, Kishio Hidaka
  • Publication number: 20100218287
    Abstract: In a scanning probe microscope, a nanotube and metal nano-particles are combined together to configure a plasmon-enhanced near-field probe having an optical resolution on the order of nanometers as a measuring probe in which a metal structure is embedded, and this plasmon-enhanced near-field probe is installed in a highly-efficient plasmon exciting unit to repeat approaching to and retracting from each measuring point on a sample with a low contact force, so that optical information and profile information of the surface of the sample are measured with a resolution on the order of nanometers, a high S/N ratio, and high reproducibility without damaging both of the probe and the sample.
    Type: Application
    Filed: February 25, 2010
    Publication date: August 26, 2010
    Inventors: Toshihiko NAKATA, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Makoto Okai, Motoyuki Hirooka
  • Patent number: 7777404
    Abstract: Means for achieving the purpose of the present invention includes an field emission type cathode composed of a single fibrous carbon substance and a conductive substrate supporting the same; an extraction apparatus for causing field emission of electrons; and an accelerator for accelerating electrons, wherein the aforementioned field emission type electron gun is further contains means for heating the aforementioned field emission cathode, and means for applying the voltage of the polarity that does not allow the aforementioned field emission type cathode to field-emit electrons. Thereby, the amorphous carbon is removed from the tip end of the fibrous carbon substance of the field emission type electron gun, without the tip end thereof being damaged.
    Type: Grant
    Filed: September 19, 2006
    Date of Patent: August 17, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tadashi Fujieda, Kishio Hidaka, Mitsuo Hayashibara
  • Publication number: 20100193687
    Abstract: Means for achieving the purpose of the present invention includes an field emission type cathode composed of a single fibrous carbon substance and a conductive substrate supporting the same; an extraction apparatus for causing field emission of electrons; and an accelerator for accelerating electrons, wherein the aforementioned field emission type electron gun is further contains means for heating the aforementioned field emission cathode, and means for applying the voltage of the polarity that does not allow the aforementioned field emission type cathode to field-emit electrons. Thereby, the amorphous carbon is removed from the tip end of the fibrous carbon substance of the field emission type electron gun, without the tip end thereof being damaged.
    Type: Application
    Filed: September 19, 2006
    Publication date: August 5, 2010
    Inventors: Tadashi Fujieda, Kishio Hidaka, Mitsuo Hayashibara
  • Patent number: 7732764
    Abstract: The object of the present invention is to enable the optical axis of an electron beam of a field emission electron gun mounting thereon an electron gun composed of a fibrous carbon material to be adjusted easily. Moreover, it is also to obtain an electron beam whose energy spread is narrower than that of the electron gun. Further, it is also to provide a high resolution electron beam applied device mounting thereon the field emission electron gun. The means for achieving the objects of the present invention is in that the fibrous carbon material is coated with a material having a band gap, in the field emission electron gun including an electron source composed of a fibrous carbon material and an electrically conductive base material for supporting the fibrous carbon material, an extractor for field-emitting electrons, and an accelerator for accelerating the electrons. Moreover, it is also to apply the field emission electron gun to various kinds of electron beam applied devices.
    Type: Grant
    Filed: August 1, 2007
    Date of Patent: June 8, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Fujieda, Makoto Okai, Kishio Hidaka, Mitsuo Hayashibara, Shunichi Watanabe
  • Patent number: 7710012
    Abstract: An amorphous carbon layer sticking on a carbon nanotube surface is remarkably reduced when a carbon nanotube is joined to a conductive substrate by bringing a single fibrous carbonaceous material in contact with the tip of the conductive substrate and covering at least a part of the contact portion with a conductive material while at lest either of the fibrous carbonaceous material or the conductive substrate is heated in a vacuum.
    Type: Grant
    Filed: April 12, 2007
    Date of Patent: May 4, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tadashi Fujieda, Kishio Hidaka, Mitsuo Hayashibara
  • Publication number: 20100064396
    Abstract: In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
    Type: Application
    Filed: February 26, 2008
    Publication date: March 11, 2010
    Inventors: Toshihiko Nakata, Masahiro Watanabe, Takashi Inoue, Kishio Hidaka, Motoyuki Hirooka
  • Publication number: 20080315747
    Abstract: An electron emitting element having a cap portion 103 with a closed structure and a columnar axis portion 101a comprising a tubular material composed mostly of carbon and a conductive base material for immobilizing the tubular material, characterized in that; the cap portion 103 includes a plurality of five-membered ring structures 104 made by atoms which constitute the tubular material and the distance between the five-membered ring structures 104 is 30 nm or more.
    Type: Application
    Filed: March 25, 2008
    Publication date: December 25, 2008
    Inventors: Makoto Okai, Tadashi Fujieda, Kishio Hidaka, Mitsuo Hayashibara, Shun-ichi Watanabe
  • Publication number: 20080169743
    Abstract: The present invention provides a field emission electron gun and its operating method. The field emission electron gun includes: an electron source including a fibrous carbon substance and a conductive base material for supporting the substance; a drawer device for causing electrons to be emitted by field emission; an accelerator for accelerating the electrons; and a means for heating the electron source. In the electron gun, the electron source is heated and held at the heating temperature before field emission, and thereafter the lowest heating temperature causing a range of fluctuation in the field emission current to fall within a predetermined value is adjusted when needed. By employing the electron gun and its operating method of the present invention, provided are various electron beam applied apparatuses each capable of continuously operating for a long time while being low in noise and high in resolution.
    Type: Application
    Filed: August 2, 2007
    Publication date: July 17, 2008
    Inventors: Tadashi Fujieda, Kishio Hidaka, Mitsuo Hayashibara, Shun-ichi Watanabe
  • Patent number: 7388199
    Abstract: A probe is made by attaching a carbon nanotube 12 to a mounting base end 13, which eliminates the effects of a carbon contamination film, to increase the bonding strength, increase the conductivity of the probe, and strengthen the bonding performance thereof by coating the entire circumference of the nanotube and the base with a coating film, rather than coating just one side. The work of mounting the carbon nanotube and mounting base end are performed under observation by a microscope. Further, the carbon contamination film 14 formed by an electron microscope is stripped off at a stage before bonding by the coating film.
    Type: Grant
    Filed: September 3, 2004
    Date of Patent: June 17, 2008
    Assignee: Hitachi Kenki Fine Tech Co., Ltd.
    Inventors: Takafumi Morimoto, Tooru Shinaki, Yoshiyuki Nag'No, Yukio Kenbou, Yuuichi Kunitomo, Takenori Hiroki, Tooru Kurenuma, Hiroaki Yanagimoto, Hiroshi Kuroda, Shigeru Miwa, Ken Murayama, Mitsuo Hayashibara, Kishio Hidaka, Tadashi Fujieda