Patents by Inventor Kiyoshi Morimoto

Kiyoshi Morimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5614356
    Abstract: A method for forming a color image comprises the step of developing an image-wise exposed silver halide color photographic photosensitive material at the presence of the following color developing agent or its analogue. According to this method, the rapid process can be attained, causing only a slight deterioration of the developer with time and capable of sufficiently exhibiting high yellow and cyan densities to achieve an excellent color balance.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: March 25, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazumi Nii, Kiyoshi Morimoto
  • Patent number: 5562802
    Abstract: A quantum device including a plate-like conductor part having a necking portion and a method of producing the same are disclosed.
    Type: Grant
    Filed: April 10, 1995
    Date of Patent: October 8, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Okada, Kiyoshi Morimoto, Masaharu Udagawa, Koichiro Yuki, Masaaki Niwa, Yoshihiko Hirai, Juro Yasui
  • Patent number: 5557389
    Abstract: A device for separating a transfer paper, onto which a toner image has been electrostatically transferred from the surface of a photosensitive member, from the surface of the photosensitive member. A separator roller made of an electrically conducting material is disposed close to the photosensitive member. A spacer assures that an appropriate gap is maintained between the photosensitive member and the separator roller. A voltage source which applies an AC voltage or a pulse voltage to the separator roller. The frequency of the applied voltage is selected to be from 200 Hz to 1 KHz or at 20 KHz or higher, and the voltage level can be controlled as a function of the separator roller temperature and/or moisture level or humidity.
    Type: Grant
    Filed: October 17, 1994
    Date of Patent: September 17, 1996
    Assignee: Mita Industrial Co., Ltd.
    Inventors: Masaki Sato, Hiroshi Kubota, Kiyoshi Morimoto, Takatoshi Nishimura, Takashi Miyake, Hisaki Shimosaka
  • Patent number: 5543351
    Abstract: A silicon substrate comprises at least two surfaces extending substantially along respective crystal faces of (111) crystal orientation of the silicon, the crystal faces of (111) crystal orientation crossing with each other, an electrically insulating layer formed by oxidizing the silicon substrate from the surfaces, and an electrically conductive portion insulated electrically by the electrically insulating layer from an outside of the silicon substrate.
    Type: Grant
    Filed: October 31, 1994
    Date of Patent: August 6, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshihiko Hirai, Kiyoshi Morimoto, Yasuaki Terui, Masaaki Niwa, Juro Yasui, Kenji Okada, Masaharu Udagawa, Koichiro Yuki
  • Patent number: 5525015
    Abstract: A pneumatic transport system for powdered materials for quantifying and pneumatically transferring powdered materials. When materials are fed above an inclined guide plate in a material feeder with its bottom opening closed by a valve plug, a slide damper is slid to divide the materials in the feeder vertically. An open space is formed under the inclined guide plate so that the materials aren't damaged when the slide damper is moved. When the valve plug is retracted, the materials under the slide damper are fed into a transport plug housed in a plug setting portion. The transport plug is pneumatically transported into a material discharge port by compressed air supplied by an air supply. After the transportation is finished, the transport plug is returned into the plug setting portion.
    Type: Grant
    Filed: April 14, 1994
    Date of Patent: June 11, 1996
    Assignees: Kyowa Hakko Kogyo Co., Ltd., Kabushikikaisha Matsui Seisakusho
    Inventors: Kiyoshi Morimoto, Yoshika Sanada, Teiichi Miwa, Kazue Murata
  • Patent number: 5508152
    Abstract: A processing method is disclosed, comprising development-processing a photographic material comprising a support having thereon a silver halide emulsion layer or a constituent layer adjacent to the emulsion layer which contains (i) a silver halide composition comprising at least one of silver bromochloride, silver chloroiodide, or silver bromochloroiodide each having a silver chloride content of 90 mole % or more, or silver chloride, and (ii) a compound represented by the following Formula (I) ##STR1## wherein R.sub.1 represents a hydrogen atom, an ammonium group or an alkali metal atom; and R.sub.2 represents a hydrogen atom, an alkyl group or an aryl group, with a developing solution containing (1) a dihydroxybenzene compound, and (2) an ascorbic acid or a derivative thereof in an amount of at least 5 mole % based on the amount of the dihydroxybenzene compound.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: April 16, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Harumi Toyoda, deceased, Eiichi Okutsu, Tadashi Ito, Kiyoshi Morimoto
  • Patent number: 5504972
    Abstract: The present invention discloses a method and an apparatus for removing deposits from materials. By feeding unidirectional pulsating air pulsating while flowing in one direction, porous member (4), to materials (m) supplied from above the porous member (4) stretched laterally in a main body case (1A) of a removing apparatus main body (1), the deposits from the materials (m) are removed by the action of the unidirectional pulsating air. The apparatus comprises a removing apparatus main body (1) possessing a feed port (5) and a product outlet (11) disposed above a porous member (4) stretched laterally in a main body case (1A), and an air vibration generating device (30) for feeding unidirectional pulsating air pulsating while flowing in one direction, toward the porous member (4) from above the porous member (4).
    Type: Grant
    Filed: May 12, 1993
    Date of Patent: April 9, 1996
    Assignees: Matsui Manufacturing Co., Ltd., Kyowa Hakko Kogyo Co., Ltd.
    Inventors: Hiroshi Tada, Yoshitaka Koishi, Yorinobu Takino, Matsui Osamu, Kiyoshi Morimoto, Yoshika Sanada, Teiichi Miwa, Kazue Murata
  • Patent number: 5486706
    Abstract: By etching, a first groove and a second groove are formed in a silicon substrate. Surfaces of the side walls of these grooves have a surface orientation of (111). The first and second grooves sandwich a silicon thin plate therebetween, which is formed as a part of the silicon substrate. The silicon thin plate is sufficiently thin so as to act as a quantum well. Further, a pair of silicon oxide films acting as tunneling barriers are formed on the surfaces of the side walls of the silicon thin plate, thus forming a double barrier structure. In addition, a pair of polysilicon electrodes are formed and sandwich the double barrier structure. As a result, the structure of a resonance tunneling diode, which utilizes the resonance tunneling effect, is provided. Adding a third electrode to the above structure provides a hot electron transistor.
    Type: Grant
    Filed: May 26, 1994
    Date of Patent: January 23, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Koichiro Yuki, Yoshihiko Hirai, Kiyoshi Morimoto, Masaaki Niwa, Juro Yasui, Kenji Okada, Masaharu Udagawa
  • Patent number: 5480492
    Abstract: For removing an unnecessary substance on a silicon substrate surface, a temperature of the unnecessary substance on the silicon substrate surface is not less than 750.degree. C. when the unnecessary substance is exposed to a gas including ozone.
    Type: Grant
    Filed: October 15, 1993
    Date of Patent: January 2, 1996
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masaharu Udagawa, Juro Yasui, Masaaki Niwa, Yoshihiko Hirai, Kenji Okada, Kiyoshi Morimoto, Koichiro Yuki
  • Patent number: 5442826
    Abstract: The invention disclosed a method for cleaning a pipe in the inside comprising steps of inserting a pig into a pipe, and reciprocally moving the pig thereafter by aerial vibration to clean the inside of pipe. An apparatus for cleaning a pipe in the inside comprises a pig removably inserted into a pipe from an end side thereof and a vibration generating source for transferring the pig in reciprocal motion by means of aerial motion to clean the inside of pipe.
    Type: Grant
    Filed: July 6, 1993
    Date of Patent: August 22, 1995
    Assignees: Matsui Manufacturing Co., Ltd., Kyowa Hakko Kogyo Co., Ltd.
    Inventors: Kazue Murata, Hiroshi Tada, Yoshitaka Koishi, Osamu Matsui, Kiyoshi Morimoto, Yoshika Sanada, Teiichi Miwa
  • Patent number: 5444267
    Abstract: A quantum device including a plate-like conductor part having a necking portion made by forming a first mask layer having a first strip portion on a conductor substrate; forming a second mask layer having a second strip portion on the conductor substrate; etching a region of the conductor substrate which is not covered with the first and second mask layers, by using the first and second mask layers as an etching mask, to form a plurality of first recess portions on a surface of the conductor substrate; selectively covering side faces of the plurality of first recess portions, and side faces of the first and second mask layers with a side wall film; selectively removing only the second mask layer; etching another region of the conductor substrate which is not covered with the first mask layer and the side wall film, by using the first mask layer and the side wall film as an etching mask, to form a plurality of second recess portions on the surface of the conductor substrate; selectively removing part of anothe
    Type: Grant
    Filed: October 28, 1994
    Date of Patent: August 22, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kenji Okada, Kiyoshi Morimoto, Masaharu Udagawa, Koichiro Yuki, Masaaki Niwa, Yoshihiko Hirai, Juro Yasui
  • Patent number: 5405454
    Abstract: A silicon substrate comprises, at least two surfaces extending substantially along respective crystal faces of (111) crystal orientation of the silicon, the crystal faces of (111) crystal orientation crossing with each other, an electrically insulating layer formed by oxidizing the silicon substrate from the surfaces, and an electrically conductive portion insulated electrically by the electrically insulating layer from an outside of the silicon substrate.
    Type: Grant
    Filed: March 12, 1993
    Date of Patent: April 11, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshihiko Hirai, Kiyoshi Morimoto, Yasuaki Terui, Masaaki Niwa, Juro Yasui, Kenji Okada, Masaharu Udagawa, Koichiro Yuki
  • Patent number: 5382496
    Abstract: There is disclosed a silver halide light-sensitive material and a method for forming image using thereof, in which a high contrast negative image useful in a photographic plate making process can be obtained in a processing solution with a pH lower than 11.0. The silver halide light-sensitive material comprises a support having provided thereon at least one silver halide emulsion layer and containing a hydrazine derivative in the above emulsion layer and/or a layer adjacent thereto. At least one compound represented by the following Formula (I) or (II) is contained in the above emulsion layer and/or a layer adjacent thereto: ##STR1## wherein A represents an organic group necessary for completing a hereto ring; B and C each represents a group constituted of one or more members selected from the group consisting of an alkylene group, an arylene group, an alkenylene group, --SO.sub.2 --, --SO--, --O--, --S--, and --N(R.sub.5)--, where R.sub.5 represents an alkyl group, an aryl group, or a hydrogen atom; R.sub.
    Type: Grant
    Filed: December 7, 1993
    Date of Patent: January 17, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Minoru Sakai, Kazunobu Katoh, Kiyoshi Morimoto
  • Patent number: 5356761
    Abstract: Development of silver halide photosensitive material with a developer containing a developing agent and a free sulfite is accompanied by deposition of silver sludge. Silver sludge is effectively suppressed by adding to the developer (a) a six-membered heterocyclic compound which has a six-membered ring containing two nitrogen atoms and has a mercapto group, a hydroxyl group and one or two substituents having 2 to 20 carbon atoms in total or (a') a six-membered heterocyclic compound which has a six-membered ring containing three nitrogen atoms and has a mercapto group and a hydroxyl group.
    Type: Grant
    Filed: February 28, 1994
    Date of Patent: October 18, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kiyoshi Morimoto, Hiroshi Hayakawa, Takashi Toyoda, Mitsunori Hirano
  • Patent number: 5347140
    Abstract: A resonant electron transfer device includes a plurality of units each of which has of at least one one-dimensional quantum wire having a quantum well elongated in a direction, a zero-dimensional quantum dot having a base quantization level higher than that of the one-dimensional quantum wire an electrode for controlling respective internal levels of the quantum wire and dot wherein the quantum wire and dot forming one unit is connected via a potential barrier capable of exhibiting a tunnel effect therebetween.
    Type: Grant
    Filed: August 27, 1992
    Date of Patent: September 13, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshihiko Hirai, Kiyoshi Morimoto, Yasuaki Terui, Atsuo Wada, Kenji Okada, Juro Yasui, Masaaki Niwa
  • Patent number: 5342741
    Abstract: A developer composition having improved stability to aerial oxidation, which contains at least one compound represented by formulae (A) and (B): ##STR1## where R.sub.1 and R.sub.2 each represent a hydroxyl group, an amino group, an acylamino group, an alkylsulfonylamino group, an arylsulfonylamino group, an alkoxycarbonylamino group, a mercapto group or an alkylthio group; and X represents a group of atoms selected from carbon and nitrogen which forms a 5-membered or 6-membered ring together with the two vinyl carbons substituted by R.sub.1 and R.sub.2, respectively, and the carbonyl carbon of formula (A); ##STR2## where R.sub.3 and R.sub.
    Type: Grant
    Filed: July 9, 1993
    Date of Patent: August 30, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kiyoshi Morimoto, Shin-ichi Morishima, Hiroshi Hayakawa
  • Patent number: 5296719
    Abstract: A quantum wire is formed at the top of triangular protrusion of silicon substrate. A quantum wire is isolated from the substrate by silicon oxide layers. A quantum wire is isolated from the substrate by impurity layers of a conduction type different from that of the substrate. An insulator film and a gate electrode are formed at the edge of triangular protrusion of a silicon substrate, and a quantum wire is induced by applying a voltage to the gate electrode. A quantum wire structure is fabricated by forming saw-tooth-like protrusions having (111) side planes by performing anisotropic crystalline etching and by oxidizing the silicon substrate with use of the oxide protection film to remain only around the top of the protrusions unoxidized. In another method, an oxide film is formed except around the top of the protrusions whereby a quantum wire is formed at the unoxidized region. In a different method, impurity layers are formed except around the top of the protrusions by ion implantation.
    Type: Grant
    Filed: July 20, 1992
    Date of Patent: March 22, 1994
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yoshihiko Hirai, Juro Yasui, Yasuaki Terui, Kiyoshi Morimoto, Atsuo Wada, Kenji Okada, Shin Hashimoto, Shinji Odanaka, Masaaki Niwa, Kaoru Inoue
  • Patent number: 5262563
    Abstract: There is provided a process for producing sulfoalkyl-substituted hydroxylamines useful as preservatives to be added to a color developer for photosensitive materials. In this process, the sulfoalkyl-substituted hydroxylamines can be easily synthesized by reacting a specified alkylating agent, cyclic sulfonic ester, vinylsulfonic acid or sulfoalkyl-substituted acrylamide with a hydroxylamine.
    Type: Grant
    Filed: July 11, 1990
    Date of Patent: November 16, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kiyoshi Morimoto
  • Patent number: 5248811
    Abstract: There is provided a process for producing sulfoalkyl-substituted hydroxylamines useful as preservatives to be added to a color developer for photosensitive materials. In this process, the sulfoalkyl-substituted hydroxylamines can be easily synthesized by reacting a specified alkylating agent, cyclic sulfonic ester, vinylsulfonic acid or sulfoalkylsubstituted acrylamide with a hydroxylamine.
    Type: Grant
    Filed: August 14, 1992
    Date of Patent: September 28, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kiyoshi Morimoto
  • Patent number: H1700
    Abstract: A silver halide photographic material is processed with a developing solution containing at least one kind of developing agent represented by the following general formula (A): ##STR1## wherein R.sub.1 and R.sub.2 may be the same or different, and each represents a hydrogen atom or a substituent group, with the proviso that R.sub.1 and R.sub.2 are not methyl groups at the same time nor a combination of a hydrogen atom and a methyl group, thereby providing a novel method for forming an image by use of the developing solution not using a dihydroxybenzene compound as the developing agent, and more particularly a superhigh contrast negative image by use of the photographic material containing a hydrazine compound.
    Type: Grant
    Filed: November 12, 1996
    Date of Patent: December 2, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Shinnichi Morishima, Kiyoshi Morimoto