Patents by Inventor Kiyoshi Nishioka
Kiyoshi Nishioka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20220098364Abstract: An object of this invention is to find a method for introducing a functional group into an aliphatic polycarbonate without impairing the excellent thermal decomposition property of the aliphatic polycarbonate.Type: ApplicationFiled: January 21, 2020Publication date: March 31, 2022Applicants: SUMITOMO SEIKA CHEMICALS CO., LTD., MURATA MANUFACTURING CO., LTD.Inventors: Kiyoshi NISHIOKA, Yusuke UEBA, Akemi KIRIHATA
-
Patent number: 11142611Abstract: An aliphatic polycarbonate resin for forming a partition containing a constituent unit represented by the formula (1): wherein R1, R2, R3, and R4 are each independently a hydrogen atom, an alkyl group having one or more carbon atoms, an alkoxyalkyl group having two or more carbon atoms, an aryl group, or an aryloxyalkyl group; at least one of R1, R2, R3, and R4 is an alkyl group having two or more carbon atoms, an alkoxyalkyl group having two or more carbon atoms, an aryl group, or an aryloxyalkyl group; and R1, R2, R3, and R4 may be the same or different; and the aliphatic polycarbonate resin has a contact angle against water of 75° or more. Also disclosed is a partition material including the aliphatic polycarbonate resin, a substrate, a method of producing the substrate, a method for producing a wiring substrate, and a wiring forming method.Type: GrantFiled: April 5, 2017Date of Patent: October 12, 2021Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Kiyoshi Nishioka, Hideyuki Takeda
-
Patent number: 11133191Abstract: The etching mask 80 for screen printing according to one embodiment of the present invention includes aliphatic polycarbonate. Further, the method of producing an oxide layer (the channel 44) according to one embodiment of the present invention includes: an etching-mask forming step of forming a pattern of the etching mask 80 including aliphatic polycarbonate; a contact step of, after the etching-mask forming step, contacting the oxide layer with a solution for dissolving a portion of the oxide layer (the channel 44) which is not protected by the etching mask 80; and a heating step of, after the contact step, heating the oxide layer (the channel 44) and the etching mask 80 to or above a temperature at which the etching mask 80 is decomposed.Type: GrantFiled: September 27, 2019Date of Patent: September 28, 2021Assignees: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Satoshi Inoue, Tatsuya Shimoda, Kazuhiro Fukada, Kiyoshi Nishioka, Nobutaka Fujimoto, Masahiro Suzuki
-
Patent number: 11084915Abstract: Provided is a means capable of realizing a surface-roughening method for modifying the surface of a resin molded article to form a surficial layer, such as a coating or plating, or to impart a function derived from the surface configuration. The method comprises adding a resin composition and performing a post-treatment and is thus simpler and easier than conventional methods. The resin composition is a composition for resin surface roughening that contains an aliphatic polycarbonate and an alkali metal salt.Type: GrantFiled: December 26, 2016Date of Patent: August 10, 2021Assignees: Sumitomo Seika Chemicals Co., Ltd., Osaka Research Institute of Industrial Science and TechnologyInventors: Kiyoshi Nishioka, Hiroki Maeda, Kei Ishikura, Kimihiro Matsukawa, Yukiyasu Kashiwagi, Masashi Saitoh
-
Patent number: 11084902Abstract: Provided is an aliphatic polycarbonate resin having excellent water repellency. Also provided are a partition material, a substrate and a method for producing the same, a method for producing a wiring substrate, and a wiring forming method. The aliphatic polycarbonate resin of the present invention comprises a structural unit represented by the following formula (1): wherein R1, R2, and R3 are each independently a hydrogen atom, a C1-C10 alkyl group, or a C6-C20 aryl group; X is a substituent having a fluorine atom; and R1, R2, and R3 may be the same or different; and the aliphatic polycarbonate resin has a contact angle against water of 90° or more.Type: GrantFiled: April 5, 2017Date of Patent: August 10, 2021Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Kiyoshi Nishioka, Hideyuki Takeda
-
Publication number: 20200407497Abstract: Provided is an aliphatic polycarbonate applicable to the production of a block copolymer by radical polymerization. The aliphatic polycarbonate is represented by formula (1): wherein R1, R2, R3, and R4 are identical or different, and each represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 15 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; A and B are identical or different, and each represents a substituent that serves as an initiating group for living radical polymerization, a hydroxy group, an alkoxy group, an acyloxy group, or a carboxy group, provided that at least one of A and B is a substituent that serves as an initiating group for living radical polymerization; and m is an integer of 10 to 2500.Type: ApplicationFiled: September 3, 2018Publication date: December 31, 2020Applicants: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Koji NAKANO, Kiyoshi NISHIOKA
-
Publication number: 20200308344Abstract: Provided is an aliphatic polycarbonate resin having excellent water repellency. Also provided are a partition material, a substrate and a method for producing the same, a method for producing a wiring substrate, and a wiring forming method. The aliphatic polycarbonate resin of the present invention comprises a structural unit represented by the following formula (1): wherein R1, R2, and R3 are each independently a hydrogen atom, a C1-C10 alkyl group, or a C6-C20 aryl group; X is a substituent having a fluorine atom; and R1, R2, and R3 may be the same or different; and the aliphatic polycarbonate resin has a contact angle against water of 90° or more.Type: ApplicationFiled: April 5, 2017Publication date: October 1, 2020Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Kiyoshi NISHIOKA, Hideyuki TAKEDA
-
Patent number: 10787540Abstract: The present invention provides a thermally decomposable binder that achieves a reduced residual carbon after sintering, and that can be subjected to a dewaxing treatment at a relatively low temperature in a non-oxidative atmosphere. More specifically, the present invention provides an aliphatic polycarbonate that has a structure obtained by neutralizing a Brønsted acid with an organic onium salt in a side chain.Type: GrantFiled: July 5, 2017Date of Patent: September 29, 2020Assignees: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTDInventors: Koji Nakano, Kiyoshi Nishioka, Shizuka Hachiken
-
Patent number: 10784120Abstract: A laminate by using a paste or solution containing aliphatic polycarbonates having an etching mask function is provided. A method of producing a laminate of the present invention includes a pattern forming step of forming a pattern 80 of a first oxide precursor layer in which a compound of metal to be oxidized into a metal oxide is dispersed in a solution containing a binder (possibly including inevitable impurities) made of aliphatic polycarbonates on an oxide layer 44 or on the second oxide precursor layer to be oxidized into the oxide layer 44; an etching step of, after the pattern forming step, etching the oxide layer 44 or the second oxide precursor layer that is not protected by the pattern 80; and a heating step of, after the etching step, heating the oxide layer 44 or the second oxide precursor layer, and the first oxide precursor layer to a temperature at which the binder is decomposed or higher.Type: GrantFiled: November 21, 2016Date of Patent: September 22, 2020Assignees: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Satoshi Inoue, Tatsuya Shimoda, Kazuhiro Fukada, Kiyoshi Nishioka
-
Patent number: 10759901Abstract: A thermally decomposable binder containing an aliphatic polycarbonate resin containing a constituting unit represented by the formula (1): wherein each of R1, R2 and R3, which may be identical or different, is a hydrogen atom, an alkyl group having from 1 to 10 carbon atoms, or an aryl group having from 6 to 20 carbon atoms; and n is 1 or 2. The thermally decomposable binder and the fine inorganic particle-dispersed paste composition, each containing an aliphatic polycarbonate resin of the present invention can be used in general molded articles, optical materials such as films, fibers, optical fibers, and optical disks, thermally decomposable materials such as ceramic binders, and lost foam casting, medicinal materials such as drug capsules, additives for biodegradable resins, main components for biodegradable resins, and the like.Type: GrantFiled: September 2, 2015Date of Patent: September 1, 2020Assignees: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Koji Nakano, Kiyoshi Nishioka, Masahiro Suzuki, Nobutaka Fujimoto
-
Patent number: 10756383Abstract: General Formula (I) Provided is an all solid state secondary-battery additive comprising a polyalkylene carbonate (I) represented by general formula (I), and by providing such additive, properties such as the charge-discharge capacity and interfacial resistance of an all-solid-state secondary battery are improved. (In general formula (I), R1 and R2 are each a C1-10 chain-like alkylene group or C3-10 cycloalkylene group, m is 0, 1, or 2 and n is an integer of 10 to 15000, and each R1, R2 and m in the polyalkylene carbonate (I) chain is independently the same or different.Type: GrantFiled: August 16, 2016Date of Patent: August 25, 2020Assignees: OSAKA RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Masanari Takahashi, Mari Yamamoto, Yasuyuki Kobayashi, Shingo Ikeda, Yukiyasu Kashiwagi, Masashi Saitoh, Shuichi Karashima, Kiyoshi Nishioka, Ryo Miyabara
-
Publication number: 20200263007Abstract: Provided are a polyolefin-based resin composition having excellent antistatic performance, and a polyolefin-based resin film formed using the composition. More specifically, a polyolefin-based resin composition comprising a polyolefin-based resin, a polyalkylene carbonate resin, and a metal salt having a melting point higher than 100° C. is provided. Also provided is a polyolefin-based resin film formed using the polyolefin-based resin composition, the film being stretched at least uniaxially.Type: ApplicationFiled: February 14, 2017Publication date: August 20, 2020Applicants: SUMITOMO SEIKA CHEMICALS CO., LTD., NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITYInventors: kIYOSHI NISHIOKA, Masahiro SUZUKI, Koh-hei NITTA, Miho MAE
-
Patent number: 10749034Abstract: It is an object of the invention to provide a thin film transistor and a method for producing the same, which will easily achieve self-aligned formation of a source/drain region without through processes under a vacuum or a low pressure or with no use of expensive equipment.Type: GrantFiled: April 25, 2018Date of Patent: August 18, 2020Assignees: Japan Advanced Institute of Science and Technology, Sumitomo Seika Chemicals Co., Ltd.Inventors: Satoshi Inoue, Tatsuya Shimoda, Nobutaka Fujimoto, Kiyoshi Nishioka, Shuichi Karashima
-
Publication number: 20200239630Abstract: The present invention provides an aliphatic polycarbonate that can be thermally decomposed (dewaxed) at a relatively low temperature. The aliphatic polycarbonate comprises a constituent unit represented by formula (1): wherein R1, R2, and R3 are identical or different, and each represent a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 15 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; R4 represents a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms; and n is an integer of 0 to 3.Type: ApplicationFiled: September 3, 2018Publication date: July 30, 2020Applicants: National University Corporation Tokyo University of Agriculture and Technology, Sumitomo Seika Chemicals Co., Ltd.Inventors: Koji NAKANO, Kiyoshi NISHIOKA
-
Patent number: 10640643Abstract: The present invention provides a thermally decomposable binder for which dewaxing can be performed at low temperatures, and an inorganic fine particle-dispersed paste composition comprising this binder. Specifically, the present invention provides a thermally decomposable binder comprising an aliphatic polycarbonate resin comprising a constituent unit represented by formula (1): wherein R1, R2, and R3 are identical or different, and each represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 20 carbon atoms, and n is 1 or 2, and provides an inorganic fine particle-dispersed paste composition comprising this binder.Type: GrantFiled: March 23, 2017Date of Patent: May 5, 2020Assignees: NATIONAL UNIVERSITY CORPORATION TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Koji Nakano, Kiyoshi Nishioka
-
Patent number: 10634996Abstract: [Problem] Provided is a composite member which can contribute to simple formation and/or increased quality of fine wiring. [Solution] A composite member 100 according to one embodiment of the present invention includes a base material, an aliphatic polycarbonate-containing layer with multiple island-shaped portions arranged on the base material, and a metal ink, wherein at least a surface of the aliphatic polycarbonate-containing layer with multiple island-shaped portions has a contact angle of 50° or more between pure water and the surface when exposed to ultraviolet light including a wavelength of 180 nm or more and 370 nm or less for 15 minutes, and the metal ink is arranged on the base material at at least a portion of a region sandwiched by the precursor layers.Type: GrantFiled: July 21, 2016Date of Patent: April 28, 2020Assignees: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Satoshi Inoue, Tatsuya Shimoda, Kazuhiro Fukada, Kiyoshi Nishioka, Masahiro Suzuki
-
Publication number: 20200095410Abstract: The present invention provides a polyolefin-based resin composition that has improved resilience while maintaining mechanical strength and stretching properties, as well as a molded article and a polyolefin-based resin film formed from this composition. The polyolefin-based resin composition comprises a polyolefin-based resin, a polyalkylene carbonate resin, and an ionic liquid. The polyolefin-based resin film of the present invention is formed by molding the polyolefin-based resin composition and is stretched at least in a monoaxial direction.Type: ApplicationFiled: November 26, 2019Publication date: March 26, 2020Applicants: NATIONAL UNIVERSITY CORPORATION KANAZAWA UNIVERSITY, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Koh-hei NITTA, Makiko NAKAHARA, Miho MAE, Kiyoshi NISHIOKA, Nobutaka FUJIMOTO, Masahiro SUZUKI
-
Publication number: 20200027743Abstract: The etching mask 80 for screen printing according to one embodiment of the present invention includes aliphatic polycarbonate. Further, the method of producing an oxide layer (the channel 44) according to one embodiment of the present invention includes: an etching-mask forming step of forming a pattern of the etching mask 80 including aliphatic polycarbonate; a contact step of, after the etching-mask forming step, contacting the oxide layer with a solution for dissolving a portion of the oxide layer (the channel 44) which is not protected by the etching mask 80; and a heating step of, after the contact step, heating the oxide layer (the channel 44) and the etching mask 80 to or above a temperature at which the etching mask 80 is decomposed.Type: ApplicationFiled: September 27, 2019Publication date: January 23, 2020Inventors: Satoshi INOUE, Tatsuya SHIMODA, Kazuhiro FUKADA, Kiyoshi NISHIOKA, Nobutaka FUJIMOTO, Masahiro SUZUKI
-
Patent number: 10457607Abstract: A binder resin composition comprising an aliphatic polycarbonate resin represented by the formula (1): and an end-capped aliphatic polycarbonate resin represented by the formula (2): wherein each of X and Y, which may be identical or different, is a group having at least one functional group selected from a carboxy group, an ester group, a carbamate group, a silicate group, an isocyanate group, an ether group, an acetal group, and a halogen atom at its end; and an inorganic particle-dispersed paste composition containing the resin composition. The binder resin composition of the present invention can be used in general molded articles, optical materials such as films, fibers, optical fibers, and optical disks, thermally decomposable materials such as ceramic binders, and lost foam casting, medicinal materials such as drug capsules, additives for biodegradable resins, main components for biodegradable resins, and the like.Type: GrantFiled: March 2, 2016Date of Patent: October 29, 2019Assignee: SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Kiyoshi Nishioka, Masahiro Suzuki
-
Patent number: 10450485Abstract: A pressure sensitive adhesive sheet is provided which comprises a pressure sensitive adhesive layer formed of a pressure sensitive adhesive composition. The pressure sensitive adhesive composition contains an aliphatic polycarbonate and a pressure sensitive adhesive resin other than the aliphatic polycarbonate. The pressure sensitive adhesive sheet can be reduced in the adhesive strength at desired timing by a novel mechanism of action so that the release of an adherend becomes easy. The above pressure sensitive adhesive composition preferably contains an acid/base generator that generates an acid or a base by applying energy.Type: GrantFiled: October 12, 2016Date of Patent: October 22, 2019Assignees: LINTEC CORPORATION, SUMITOMO SEIKA CHEMICALS CO., LTD.Inventors: Yosuke Koma, Yutaka Nanashima, Yoshitomo Ono, Kiyoshi Nishioka, Shizuka Hachiken