Abstract: A transport car open at the top and supported on rollers moves a substrate from a first coating chamber to a second coating chamber separated by a gate 7 running transversely of the direction of movement of the transport car 5. The gate 7 is formed of an upper gate part 8 and a lower gate part 9 forming a slot 10 which is adaptable to the cross section of the car. A cover associated with the top gate part and parallel to the direction of movement has an area greater than the car in order to minimize gas transfer between chambers.

Abstract: Magnets are arranged inside a rotating tubular target to form a racetrack-shaped plasma having two straight stretches parallel to the target axis and two end stretches connecting the straight stretches. In order to achieve uniform target erosion, the magnets are arranged so that the plasma is wider and therefore less intense over the end stretches than it is over the straight stretches.

Abstract: Method and apparatus for the coating of substrates (1, 1', . . . ), preferably by cathode sputtering in a vacuum apparatus consisting of at least one sputtering chamber (6) in which different coating systems can be applied to the preferably curved substrates to be coated (1, 1', . . . ), the substrates (1, 1', . . . ) can be moved in a direction B through the vacuum apparatus and pass through the sputtering chamber (6) repeatedly in direction B as well as in the opposite direction in the so-called multipass mode, the uncoated substrates (1, 1', . . . ) or substrate carriers (12, 11', . . . ) being combined before entering the sputtering chamber into groups of several, preferably two substrates (1, 1', . . . ) each, and these run simultaneously through the sputtering chamber (6) in the so-called dual multipass mode.

Abstract: A transparent substrate, such as glass, having a solar control coating consisting of a CrN layer between two SnO, layers. The solar control coating is arranged on the back side of the substrate which will face away from an observer when in place. A sub-oxidic alloy, such as NiCrO is then applied to the solar control coating.

Abstract: A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).

Abstract: A coating, composed of an optically effective layer system for substrates, whereby the layer system has a high antireflective effect. On a front side of the substrate, facing the observer, in sequence from the front side to the observer, a first layer is arranged on the substrate, functioning as dielectric and comprising metal oxide. Thereupon follows a second layer comprising nitride, preferably TiN.sub.x (x is equal to or greater than 1, preferably x=1.05). A third layer follows functioning as dielectric and comprising metal oxide. Thereupon a fourth layer follows comprising nitride, preferably TiN.sub.x (x is equal to or greater than 1, preferably x=1.05). A fifth layer follows functioning as dielectric comprising metal oxide. On a backside of the substrate a TiN.sub.x -layer (x.gtoreq.1, preferably x=1.05) is arranged.

Abstract: An apparatus is presented, with a rotating target (18, 15), which is tubularly configured, with a stationary magnet unit (2) disposed within the tube, of a magnetron cathode, which produces a stationary plasma hose provided essentially with two long straight lines in front of the surface of the rotating target, which exercises an erosive action on the surface of the rotating target (18, 15), whereby the formation occurs of a narrowing of the diameter of the tubular rotating target (18, 15) in the middle portion of the tubular rotating target and the formation of margins at the two ends (14, 15) of the tubular rotating target be provided each with a dark-space shield (16, 17) which cover the margins of the tubular rotating target.

Abstract: Method for making glazing with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation as well as low surface resistance. On substrates of mineral glass a system of coatings is built up in the following order:Coating 1: oxide from the group, tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof,Coating 2: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 3: silver or a silver alloy with at least 50 weight-percent silver content,Coating 4: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 5: oxide from the group tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof.Thereafter the substrate with the entire packet of coatings is heated to the softening temperature of the glass and bent to the final shape.

Abstract: A coating for applying to a front side of a substrate, which side is facing an observer, comprises a four-layer system which is optically effective and has a high anti-reflective effect. A first layer of this system is applied onto the front side of the substrate and is, preferably, a highly-refracting TiO.sub.2 layer, the second layer is applied to the first layer and is a low-refracting Al.sub.2 O.sub.3 layer, a third layer of the system is applied to the second layer and is, preferably, a high-refracting TiO.sub.2, while the fourth layer applied to the third layer is, preferably, a low-refracting SiO.sub.2 layer. The layers can be formed by either a pyrolytic method, a plasma-supported chemical vapor deposition method, a sputtering method or a chemical vapor deposition method. Preferably, they are formed by a DC-reactive sputtering method with a magnetron.

Abstract: In a method for the production of sheets of mineral glass with high transmission in the visible spectral range and with low solar energy transmission, a coating is sputtered onto the sheet in a coating chamber by cathode sputtering with a target of an alloy of 65% tin and 35% nickel in an atmosphere with an oxygen content. The sheet and coating are then heated at 640.degree. C. and then bent in the heated state, thus producing an especially stable and electrically conductive combination.

Abstract: Cathode sputtering apparatus with a high sputtering rate, including a cathode having a cathode base 1 and a target 6 disposed parallel thereto and being provided with a channel 5 in the cathode base which is passed through by a cooling agent 12. With respect to the target 6, 10 to be cooled, this channel 5 is bounded by a thin wall 2 configured as a membrane. The wall 2 has large contact surfaces exhibiting a good heat transfer to the target surface. The contact surface between the target 6 and the wall 2 is coated with a material, e.g. a graphite layer, which has a low sputtering rate in order to delay a sputtering through as long as possible.

Abstract: In a high-rate sputtering apparatus including an anode and a cathode, the cathode having an upper sputtering surface upon which is a material to be sputtered onto a substrate, an improved cooling system. The cooling system includes a carrier plate in supporting contact with the cathode and having a lateral surface in which is formed a channel groove. Coolant tubes having outside walls in selective contact with the inside walls of the channel groove and with the lower, contact surface of the cathode are provided, with the coolant tubes further having cross-sectional profiles corresponding to those of the channel grooves. The coolant tubes may also include a plurality of longitudinally extending beads formed in the outside walls to facilitate expansion.

Abstract: Process for the production of contact strips on substrates, especially on plates of mineral glass. These substrates are provided with an electrically conductive surface coating which is coated on the side facing away from the substrate with at least one surface layer of a dielectric material. For the production of the contact strips, a noble metal suspension in a liquid is deposited according to the invention on the surface layer in the pattern of the contact strips. Then the substrate with the pack of layers is exposed to a heat treatment at at least 100.degree. C. until a lowered total resistance occurs through the conductive surface coating between the contact strips.

Abstract: Process for coating transparent substrates, for example float glass, with a transparent dielectric layer having a low refractive index (n<1.7) at a high layer growth rate (>6.0A cm.sup.2 /W sec) by means of reactive direct current cathode sputtering. A vacuum chamber includes a cathode 5 which is provided on one of its surfaces with the material (target) to be sputtered and deposited on the substrate 3. The material to be sputtered (target) is a silicide, preferably nickel disilicide (NiSi.sub.2), and the layer deposited on the substrate is the corresponding oxide, for example NiSi-oxide. The reactive gas introduced into the vacuum chamber is oxygen and the process gas is a noble gas.

Abstract: The invention concerns apparatus for the application of thin layers on a substrate by means of a cathode sputtering process. A mechanical shutter is provided between a cathode to be sputtered and an anode, which shutter divides the space between the cathode and the substrate to be coated. In addition, glow discharge means is provided both between the anode and the shutter.

Abstract: A system of layers is built up on substrates of mineral glass in the following order: first layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or their mixed oxides; second layer: a metal from the group, tantalum, tungsten, nickel, iron; third layer: silver or a silver alloy containing at least 50 weight-percent of silver; fourth layer: a metal from the group, tantalum, tungsten, nickel, iron or their alloys; fifth layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide or their mixed oxides. After that, the substrate with all the coating layers is heated to the softening temperature of the glass in an oxidizing atmosphere and bent to the final shape.

Abstract: An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.

Abstract: Method for coating continuously moving substrates by the deposition of compounds from the gas phase by means of plasma discharge, produced by an electrode, with a chemical reaction, a system of magnets for the generation of a magnetic trap to constrict the plasma being disposed on one side of the substrate. The objective is to be accomplished by limiting the action of the plasma and the chemical reaction to the immediate vicinity of the system of magnets. For this purpose, the surface of the substrate to be coated is held at a distance "S.sub.1 " from the electrode, which is less than the dark-space distance that arises under the specified process conditions. Moreover, the magnetic trap is adjusted so that it passes through the substrate and is closed over the surface of the substrate to be coated and moreover in such a manner, that the constricted plasma is maintained on the surface of the substrate that is to be coated.

Abstract: Process for the production of contact strips on substrates, especially on plates of mineral glass. These substrates are provided with an electrically conductive surface coating which is coated on the side facing away from the substrate with at least one surface layer of a dielectric material. For the production of the contact strips, a noble metal suspension in a liquid is deposited according to the invention on the surface layer in the pattern of the contact strips. Then the substrate with the pack of layers is exposed to a heat treatment at at least 100.degree. C. until a lowered total resistance occurs through the conductive surface coating between the contact strips.

Abstract: A method and apparatus is disclosed for the reactive deposition of vapors of metal compounds onto substrates by the evaporation of at least one metal by means of an electron beam in an atmosphere consisting of the reaction gas, at pressures of no more than 10.sup.-1 mbar. An electrode positively biased with respect to ground and having an acceleration voltage of at least 20 kV is disposed in the area of the vapor stream flowing to the substrate. The metal vapor is produced in an internal chamber which surrounds the evaporator and has a masked orifice opposite the substrate. The reaction gas is introduced into the internal chamber and the metal vapor and reaction gas are guided by the masked orifice toward the substrate.