Patents by Inventor Klaus Rief
Klaus Rief has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240111223Abstract: A projection exposure apparatus for semiconductor lithography includes component having a fluid channel and a device for providing a fluid for flowing through the fluid channel. The fluid channel is connected to the device via a supply line and an outgoing line. The supply line and the outgoing line are connected to one another in parallel with the fluid channel via a short circuit.Type: ApplicationFiled: December 1, 2023Publication date: April 4, 2024Inventor: Klaus Rief
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Patent number: 9513452Abstract: A damping device of an optical element of a projection exposure machine includes at least two mass dampers arranged spaced apart from one another, the vibration absorbers each having at least one damper mass and at least one damping element and the damper masses of the at least two mass dampers being interconnected by at least one connecting element. The optical element can be part of a projection exposure machine.Type: GrantFiled: July 18, 2011Date of Patent: December 6, 2016Assignee: Carl Zeiss SMT GmbHInventors: Alexander Vogler, Klaus Rief, Andreas Frommeyer, Alan L. Brydon
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Patent number: 8879046Abstract: A projection exposure apparatus for microlithography includes an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter is guaranteed at every point in time of the control.Type: GrantFiled: November 20, 2013Date of Patent: November 4, 2014Assignee: Carl Zeiss SMT GmbHInventors: Karl-Eugen Aubele, Sven Ulmer, Klaus Rief, Marco Jassmann
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Publication number: 20140078487Abstract: The invention relates to a projection exposure apparatus for microlithography comprising an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter ? is guaranteed at every point in time of the control.Type: ApplicationFiled: November 20, 2013Publication date: March 20, 2014Inventors: Karl-Eugen Aubele, Sven Ulmer, Klaus Rief, Marco Jassmann
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Patent number: 8514371Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: April 28, 2011Date of Patent: August 20, 2013Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20130038848Abstract: Optical devices that have at least one optical element and a plurality of kinematic components are disclosed. The number m of the kinematic components of one type exceed the number n of degrees of freedom in which the optical element can be manipulated. At least one of the n degrees of freedom can be x-displacement, y-displacement, z-displacement or tilt.Type: ApplicationFiled: September 12, 2012Publication date: February 14, 2013Applicant: CARL ZEISS SMT GMBHInventors: Jochen Weber, Klaus Rief, Claudia Matano, Benjamin Sigel, Joachim Siegel
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Patent number: 8199315Abstract: Objectives, such as projection objectives for semiconductor lithography, are disclosed. An objective generally has an optical axis and optical elements mounted in an objective housing. Projection exposure apparatuses having an objective are also disclosed. In addition, guides and adjusting systems for an optical element in an objective are disclosed. Further, related components and methods are disclosed.Type: GrantFiled: June 2, 2008Date of Patent: June 12, 2012Assignee: Carl Zeiss SMT GmbHInventor: Klaus Rief
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Publication number: 20120138401Abstract: A hexapod system for aligning an optical element in semiconductor clean rooms or in a vacuum, particularly in an illumination device for a microlithographic EUV projection exposure apparatus, comprises six hexapod supporting structures (42, 44, 46, 94; 42?, 44?, 46?, 94?, 106). Using a set of at least two replaceable spacer elements (94; 94?) having a different extent in at least one direction, at least one of the six supporting structures (42, 44, 46, 94; 42?, 44?, 46?, 94?, 106) can be adjusted. The latter is adapted so that a spacer element (94; 94?) can be removed or a spacer element (94; 94?) can be added while the coupling of the first coupling end (46; 46?) to the carrying structure (38; 38?) and the coupling of the second coupling end (54a; 54?) to the optical element (34; 34?) are maintained.Type: ApplicationFiled: July 18, 2011Publication date: June 7, 2012Applicant: CARL ZEISS SMT GMBHInventors: Alexander Vogler, Klaus Rief, Andreas Frommeyer, Alan L. Brydon
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Publication number: 20110199597Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: April 28, 2011Publication date: August 18, 2011Applicant: CARL ZEISS SMT GMBHInventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7961294Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: October 8, 2008Date of Patent: June 14, 2011Assignee: Carl Zeiss SMT GmbHInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20100128367Abstract: A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.Type: ApplicationFiled: March 13, 2009Publication date: May 27, 2010Applicant: CARL ZEISS SMT AGInventors: Mariella Beckenbach, Klaus Rief, Andreas Bertele, Benjamin Sigel, Sascha Bleidistel, Wolfgang Hummel, Andreas Frommeyer, Toralf Gruner, Jochen Schwaer, Baerbel Schwaer, Thomas Schletterer, Artur Hoegele, Armin Schoeppach
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Patent number: 7710542Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: GrantFiled: November 7, 2007Date of Patent: May 4, 2010Assignee: Carl Zeiss SMT AGInventors: Wolfgang Hummel, Jürgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schöngart, Markus Neumaier, Bärbel Trossbach, Ulrich Weber, Michael Mühlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7609464Abstract: Holding devices for optical elements, as well as related modules, systems and methods are disclosed. The devices, modules, systems and methods may, for example, be used in the context of microlithography used in manufacturing microelectronic circuits.Type: GrantFiled: August 17, 2007Date of Patent: October 27, 2009Assignee: Carl Zeiss SMT AGInventors: Klaus Rief, Yuanbo Kong
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Publication number: 20090141258Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: ApplicationFiled: January 30, 2009Publication date: June 4, 2009Applicant: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20090040487Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: October 8, 2008Publication date: February 12, 2009Applicant: CARL ZEISS SMT AGInventors: Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Patent number: 7486382Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.Type: GrantFiled: December 21, 2005Date of Patent: February 3, 2009Assignee: Carl Zeiss SMT AGInventors: Stephan Back, Wolfgang Hummel, Juergen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schoengart, Markus Neumaier, Baerbel Schwaer, Ulrich Weber, Michael Muehlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20080285002Abstract: Objectives, such as projection objectives for semiconductor lithography, are disclosed. An objective generally has an optical axis and optical elements mounted in an objective housing. Projection exposure apparatuses having an objective are also disclosed. In addition, guides and adjusting systems for an optical element in an objective are disclosed. Further, related components and methods are disclosed.Type: ApplicationFiled: June 2, 2008Publication date: November 20, 2008Applicant: CARL ZEISS SMT AGInventor: Klaus Rief
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Publication number: 20080174757Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.Type: ApplicationFiled: November 7, 2007Publication date: July 24, 2008Inventors: Wolfgang Hummel, Jurgen Fischer, Karl-Eugen Aubele, Erich Merz, Raoul Reiner, Klaus Rief, Stefan Schongart, Markus Neumaier, Barbel Trossbach, Ulrich Weber, Michael Muhlbeyer, Hubert Holderer, Alexander Kohl, Jochen Weber, Johannes Lippert, Thorsten Rassel
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Publication number: 20080117397Abstract: Optical devices that have at least one optical element and a plurality of kinematic components are disclosed. The number m of the kinematic components of one type exceed the number n of degrees of freedom in which the optical element can be manipulated. At least one of the n degrees of freedom can be x-displacement, y-displacement, z-displacement or tilt.Type: ApplicationFiled: November 6, 2007Publication date: May 22, 2008Applicant: CARL ZEISS SMT AGInventors: Jochen Weber, Klaus Rief, Claudia Matano, Benjamin Sigel, Joachim Siegel
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Publication number: 20080043349Abstract: Holding devices for optical elements, as well as related modules, systems and methods are disclosed. The devices, modules, systems and methods may, for example, be used in the context of microlithography used in manufacturing microelectronic circuits.Type: ApplicationFiled: August 17, 2007Publication date: February 21, 2008Applicant: CARL ZEISS SMT AGInventors: Klaus Rief, Yuanbo Kong