Patents by Inventor Kohei Yamaguchi
Kohei Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8139847Abstract: An inspection method and an inspection tool are capable of detecting a defect on a specimen. More particularly, the examples relate to an inspection method and an inspection tool for easily setting an inspection condition to be used in a defect inspection of an inspected pattern such as a semiconductor wafer, a liquid crystal display, or a photomask.Type: GrantFiled: February 13, 2009Date of Patent: March 20, 2012Assignee: Hitachi High-Technologies CorporationInventors: Kohei Yamaguchi, Kenji Obara, Takehiro Hirai
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Patent number: 8108172Abstract: A review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated, and a field of view necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.Type: GrantFiled: November 23, 2010Date of Patent: January 31, 2012Assignee: Hitachi High-Technologies CorporationInventors: Takehiro Hirai, Kenji Obara, Kohei Yamaguchi
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Patent number: 8013299Abstract: A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. The review method comprises the steps of: performing focal adjustment for a plurality of coordinate positions pre-registered on the coordinate on an object under observation; creating a criterion for focal adjustment based on a focal position at each of the plurality of coordinate positions; setting a focal probe range based on a deviation between the criterion and the focal position; and determining an automatic focal adjustment range for defect detection on the object under observation based on the set focal probe range.Type: GrantFiled: February 5, 2009Date of Patent: September 6, 2011Assignee: Hitachi High-Technologies CorporationInventors: Kenji Obara, Takehiro Hirai, Kohei Yamaguchi, Naoma Ban
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Publication number: 20110169952Abstract: When a main video data stream that is selected and decoded is changed, a video data processing device 101 instructs, via a network 110, a surveillance camera that encodes a newly-selected main video data stream to create a main video data stream with a smaller I-frame interval as of that point, and instructs, via a network 110, a surveillance camera that encodes a newly-deselected main video data stream to create a main video data stream with a larger I-frame interval as of that point.Type: ApplicationFiled: July 27, 2010Publication date: July 14, 2011Inventors: Kohei Yamaguchi, Takahisa Fujita, Yasunori Satoh
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Publication number: 20110062328Abstract: The present invention aims to provide a defect review apparatus capable of suppressing a reduction in throughput with a minimized deviation-amount measurement, and capable of optimizing an FOV of a monitoring image. To this end, the review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated. Thereby, the reduction in throughput is suppressed to the minimum level, and furthermore a FOV necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.Type: ApplicationFiled: November 23, 2010Publication date: March 17, 2011Applicant: Hitachi High-Technologies CorporationInventors: Takehiro HIRAI, Kenji Obara, Kohei Yamaguchi
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Patent number: 7881558Abstract: A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.Type: GrantFiled: April 8, 2009Date of Patent: February 1, 2011Assignee: Hitachi High-Technologies CorporationInventors: Kohei Yamaguchi, Kazuo Aoki, Kenji Obara
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Patent number: 7869969Abstract: A defect review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated, minimizing a reduction in throughput. field of view (FOV) necessary for the specimen to be within the FOV is set according to a convergence value of the calculated deviation amount.Type: GrantFiled: April 23, 2008Date of Patent: January 11, 2011Assignee: Hitachi High-Technologies CorporationInventors: Takehiro Hirai, Kenji Obara, Kohei Yamaguchi
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Publication number: 20100213371Abstract: A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.Type: ApplicationFiled: April 29, 2010Publication date: August 26, 2010Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kohei Yamaguchi, Kenji Obara
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Patent number: 7732765Abstract: A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.Type: GrantFiled: November 15, 2007Date of Patent: June 8, 2010Assignee: Hitachi High-Technologies CorporationInventors: Kohei Yamaguchi, Kenji Obara
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Publication number: 20100136493Abstract: Prvided is a catalyst degradation preventing apparatus of a catalyst device containing a catalyst component that comes into contact with gas to chemically change the gas, including a burner for burning a fuel by combustible air to generate a gas containing nitrogen oxides by combustion, an endothermic device for absorbing heat from gas, a catalyst device having a catalyst component for decreasing nitrogen oxides contained in the gas after passing through the endothermic device, and a first poisoning substance removing device for removing a poisoning substance containing at least sulfur, which is contained in the fuel and adsorbs to a catalyst component or reacts with the catalyst component to form a compound. According to the apparatus, the decrease in performance of the catalyst device is prevented, and the effect of decreasing pollution can be retained over a long period of time.Type: ApplicationFiled: March 6, 2008Publication date: June 3, 2010Applicant: MIURA CO., LTD.Inventors: Osamu Tanaka, Kenji Yasui, Masashi Nakashima, Takashi Shindo, Kohei Yamaguchi, Motoshi Kohaku
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Publication number: 20090325112Abstract: Provided is a catalyst degradation preventing apparatus, which is for a catalyst device containing a catalyst component that comes into contact with gas to chemically change the gas, in which the catalyst device is provided with a poisoning substance removing device on a primary side thereof, for removing a poisoning substance which is contained in the gas and adsorbs to the catalyst component or forms a compound with the catalyst component. Further, the poisoning substance removing device and the catalyst device are provided with an interval placed therebetween and to be exchangeable with each other, or a carrier of a component that adsorbs to the poisoning substance of the poisoning substance removing device or forms a compound with the poisoning substance and a carrier of a catalyst component of the catalyst device are integrally formed so as to be exchangeable.Type: ApplicationFiled: March 6, 2008Publication date: December 31, 2009Applicant: MIURA CO., LTD.Inventors: Osamu Tanaka, Kenji Yasui, Masashi Nakashima, Takashi Shindo, Kohei Yamaguchi, Motoshi Kohaku
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Patent number: 7638767Abstract: There is provided an electron microscope which can clearly detect a microscopic unevenness in a sample. According to a scanning electron microscope, when luminance signals from one pair of backscattered electron detectors are given by L and R, and when a luminance signal from a scattered electron detector is given by S, an adjustment value Lc of L and an adjustment value Rc of R are calculated by using primary homogeneous expressions of L, R, and S.Type: GrantFiled: January 19, 2007Date of Patent: December 29, 2009Assignee: Hitachi High-Technologies CorporationInventors: Kohei Yamaguchi, Kenji Obara
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Publication number: 20090222753Abstract: Setting of a parameter of a defect inspection tool is based on trial and error in which effects are confirmed one by one and set, and the setting requires a high technique and is significantly inefficient. The present invention is to provide an inspection method and an inspection tool capable of solving such a problem and of setting the parameter (hereinafter, referred to as an inspection parameter) required for detecting the defect easily.Type: ApplicationFiled: February 13, 2009Publication date: September 3, 2009Inventors: Kohei YAMAGUCHI, Kenji Obara, Takehiro Hirai
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Publication number: 20090206259Abstract: A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. The review method comprises the steps of: performing focal adjustment for a plurality of coordinate positions pre-registered on the coordinate on an object under observation; creating a criterion for focal adjustment based on a focal position at each of the plurality of coordinate positions; setting a focal probe range based on a deviation between the criterion and the focal position; and determining an automatic focal adjustment range for defect detection on the object under observation based on the set focal probe range.Type: ApplicationFiled: February 5, 2009Publication date: August 20, 2009Inventors: Kenji Obara, Takehiro Hirai, Kohei Yamaguchi, Naoma Ban
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Publication number: 20090202166Abstract: A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.Type: ApplicationFiled: April 8, 2009Publication date: August 13, 2009Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Kohei YAMAGUCHI, Kazuo Aoki, Kenji Obara
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Publication number: 20090183661Abstract: [Object] To provide a combustion device capable of suppressing poisoning and deterioration of a CO oxidation catalyst due to adhesion of S (sulfur) to the CO oxidation catalyst, which is provided in the combustion device such as a boiler for the purpose of reducing and removing the CO in the combustion gas. [Solving Means] Provided is a combustion device including at least one can body which has a gas flow passage R allowing passage of a combustion gas G1 generated at a burner 16 and which heats a heat medium through heat exchange with the combustion gas G1 passing through the gas flow passage R, in which, in the gas flow passage R, a CO oxidation catalyst C1 is arranged in a region corresponding to a temperature range at the time of passing of the combustion gas G1 where adhesion of S (sulfur) contained in the combustion gas G1 to the CO oxidation catalyst C1 is suppressed.Type: ApplicationFiled: January 16, 2009Publication date: July 23, 2009Applicant: MIURA CO., LTD.Inventors: Hideo FURUKAWA, Kenji YASUI, Takashi SHINDO, Masashi NAKASHIMA, Kohei YAMAGUCHI
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Patent number: 7526143Abstract: A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.Type: GrantFiled: April 26, 2006Date of Patent: April 28, 2009Assignee: Hitachi High-Technologies CorporationInventors: Kohei Yamaguchi, Kazuo Aoki, Kenji Obara
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Publication number: 20080270044Abstract: The present invention aims to provide a defect review apparatus capable of suppressing a reduction in throughput with a minimized deviation-amount measurement, and capable of optimizing an FOV of a monitoring image. To this end, the review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated. Thereby, the reduction in throughput is suppressed to the minimum level, and furthermore a FOV necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.Type: ApplicationFiled: April 23, 2008Publication date: October 30, 2008Applicant: Hitachi High-Technologies CorporationInventors: Takehiro Hirai, Kenji Obara, Kohei Yamaguchi
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Publication number: 20080128617Abstract: A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.Type: ApplicationFiled: November 15, 2007Publication date: June 5, 2008Inventors: Kohei Yamaguchi, Kenji Obara
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Patent number: 7307254Abstract: This SEM has a capability of preventing shift of a view field of the foreign matters at a stage where no sufficient correction is carried out when obtaining the SEM coordinate values used for transforming the coordinate values of the foreign matters on the sample sent from another device into the SEM coordinate values. The SEM selects the foreign matters closer to the center of the sample at first and then the foreign matters spirally from the center of the sample to the outer periphery.Type: GrantFiled: April 12, 2005Date of Patent: December 11, 2007Assignee: Hitachi High-Technologies CorporationInventors: Kohei Yamaguchi, Kazuo Aoki, Seiji Isogai, Masashi Sakamoto