Patents by Inventor Kohei Yamaguchi

Kohei Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8139847
    Abstract: An inspection method and an inspection tool are capable of detecting a defect on a specimen. More particularly, the examples relate to an inspection method and an inspection tool for easily setting an inspection condition to be used in a defect inspection of an inspected pattern such as a semiconductor wafer, a liquid crystal display, or a photomask.
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: March 20, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kohei Yamaguchi, Kenji Obara, Takehiro Hirai
  • Patent number: 8108172
    Abstract: A review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated, and a field of view necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.
    Type: Grant
    Filed: November 23, 2010
    Date of Patent: January 31, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takehiro Hirai, Kenji Obara, Kohei Yamaguchi
  • Patent number: 8013299
    Abstract: A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. The review method comprises the steps of: performing focal adjustment for a plurality of coordinate positions pre-registered on the coordinate on an object under observation; creating a criterion for focal adjustment based on a focal position at each of the plurality of coordinate positions; setting a focal probe range based on a deviation between the criterion and the focal position; and determining an automatic focal adjustment range for defect detection on the object under observation based on the set focal probe range.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: September 6, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kenji Obara, Takehiro Hirai, Kohei Yamaguchi, Naoma Ban
  • Publication number: 20110169952
    Abstract: When a main video data stream that is selected and decoded is changed, a video data processing device 101 instructs, via a network 110, a surveillance camera that encodes a newly-selected main video data stream to create a main video data stream with a smaller I-frame interval as of that point, and instructs, via a network 110, a surveillance camera that encodes a newly-deselected main video data stream to create a main video data stream with a larger I-frame interval as of that point.
    Type: Application
    Filed: July 27, 2010
    Publication date: July 14, 2011
    Inventors: Kohei Yamaguchi, Takahisa Fujita, Yasunori Satoh
  • Publication number: 20110062328
    Abstract: The present invention aims to provide a defect review apparatus capable of suppressing a reduction in throughput with a minimized deviation-amount measurement, and capable of optimizing an FOV of a monitoring image. To this end, the review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated. Thereby, the reduction in throughput is suppressed to the minimum level, and furthermore a FOV necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.
    Type: Application
    Filed: November 23, 2010
    Publication date: March 17, 2011
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Takehiro HIRAI, Kenji Obara, Kohei Yamaguchi
  • Patent number: 7881558
    Abstract: A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.
    Type: Grant
    Filed: April 8, 2009
    Date of Patent: February 1, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kohei Yamaguchi, Kazuo Aoki, Kenji Obara
  • Patent number: 7869969
    Abstract: A defect review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated, minimizing a reduction in throughput. field of view (FOV) necessary for the specimen to be within the FOV is set according to a convergence value of the calculated deviation amount.
    Type: Grant
    Filed: April 23, 2008
    Date of Patent: January 11, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takehiro Hirai, Kenji Obara, Kohei Yamaguchi
  • Publication number: 20100213371
    Abstract: A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.
    Type: Application
    Filed: April 29, 2010
    Publication date: August 26, 2010
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kohei Yamaguchi, Kenji Obara
  • Patent number: 7732765
    Abstract: A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.
    Type: Grant
    Filed: November 15, 2007
    Date of Patent: June 8, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kohei Yamaguchi, Kenji Obara
  • Publication number: 20100136493
    Abstract: Prvided is a catalyst degradation preventing apparatus of a catalyst device containing a catalyst component that comes into contact with gas to chemically change the gas, including a burner for burning a fuel by combustible air to generate a gas containing nitrogen oxides by combustion, an endothermic device for absorbing heat from gas, a catalyst device having a catalyst component for decreasing nitrogen oxides contained in the gas after passing through the endothermic device, and a first poisoning substance removing device for removing a poisoning substance containing at least sulfur, which is contained in the fuel and adsorbs to a catalyst component or reacts with the catalyst component to form a compound. According to the apparatus, the decrease in performance of the catalyst device is prevented, and the effect of decreasing pollution can be retained over a long period of time.
    Type: Application
    Filed: March 6, 2008
    Publication date: June 3, 2010
    Applicant: MIURA CO., LTD.
    Inventors: Osamu Tanaka, Kenji Yasui, Masashi Nakashima, Takashi Shindo, Kohei Yamaguchi, Motoshi Kohaku
  • Publication number: 20090325112
    Abstract: Provided is a catalyst degradation preventing apparatus, which is for a catalyst device containing a catalyst component that comes into contact with gas to chemically change the gas, in which the catalyst device is provided with a poisoning substance removing device on a primary side thereof, for removing a poisoning substance which is contained in the gas and adsorbs to the catalyst component or forms a compound with the catalyst component. Further, the poisoning substance removing device and the catalyst device are provided with an interval placed therebetween and to be exchangeable with each other, or a carrier of a component that adsorbs to the poisoning substance of the poisoning substance removing device or forms a compound with the poisoning substance and a carrier of a catalyst component of the catalyst device are integrally formed so as to be exchangeable.
    Type: Application
    Filed: March 6, 2008
    Publication date: December 31, 2009
    Applicant: MIURA CO., LTD.
    Inventors: Osamu Tanaka, Kenji Yasui, Masashi Nakashima, Takashi Shindo, Kohei Yamaguchi, Motoshi Kohaku
  • Patent number: 7638767
    Abstract: There is provided an electron microscope which can clearly detect a microscopic unevenness in a sample. According to a scanning electron microscope, when luminance signals from one pair of backscattered electron detectors are given by L and R, and when a luminance signal from a scattered electron detector is given by S, an adjustment value Lc of L and an adjustment value Rc of R are calculated by using primary homogeneous expressions of L, R, and S.
    Type: Grant
    Filed: January 19, 2007
    Date of Patent: December 29, 2009
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kohei Yamaguchi, Kenji Obara
  • Publication number: 20090222753
    Abstract: Setting of a parameter of a defect inspection tool is based on trial and error in which effects are confirmed one by one and set, and the setting requires a high technique and is significantly inefficient. The present invention is to provide an inspection method and an inspection tool capable of solving such a problem and of setting the parameter (hereinafter, referred to as an inspection parameter) required for detecting the defect easily.
    Type: Application
    Filed: February 13, 2009
    Publication date: September 3, 2009
    Inventors: Kohei YAMAGUCHI, Kenji Obara, Takehiro Hirai
  • Publication number: 20090206259
    Abstract: A defect review method and a defect review device using an electron microscope, reduce the number of user processes necessary to set automatic focal adjustment of an electron beam to provide easier sample observation. The review method comprises the steps of: performing focal adjustment for a plurality of coordinate positions pre-registered on the coordinate on an object under observation; creating a criterion for focal adjustment based on a focal position at each of the plurality of coordinate positions; setting a focal probe range based on a deviation between the criterion and the focal position; and determining an automatic focal adjustment range for defect detection on the object under observation based on the set focal probe range.
    Type: Application
    Filed: February 5, 2009
    Publication date: August 20, 2009
    Inventors: Kenji Obara, Takehiro Hirai, Kohei Yamaguchi, Naoma Ban
  • Publication number: 20090202166
    Abstract: A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.
    Type: Application
    Filed: April 8, 2009
    Publication date: August 13, 2009
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kohei YAMAGUCHI, Kazuo Aoki, Kenji Obara
  • Publication number: 20090183661
    Abstract: [Object] To provide a combustion device capable of suppressing poisoning and deterioration of a CO oxidation catalyst due to adhesion of S (sulfur) to the CO oxidation catalyst, which is provided in the combustion device such as a boiler for the purpose of reducing and removing the CO in the combustion gas. [Solving Means] Provided is a combustion device including at least one can body which has a gas flow passage R allowing passage of a combustion gas G1 generated at a burner 16 and which heats a heat medium through heat exchange with the combustion gas G1 passing through the gas flow passage R, in which, in the gas flow passage R, a CO oxidation catalyst C1 is arranged in a region corresponding to a temperature range at the time of passing of the combustion gas G1 where adhesion of S (sulfur) contained in the combustion gas G1 to the CO oxidation catalyst C1 is suppressed.
    Type: Application
    Filed: January 16, 2009
    Publication date: July 23, 2009
    Applicant: MIURA CO., LTD.
    Inventors: Hideo FURUKAWA, Kenji YASUI, Takashi SHINDO, Masashi NAKASHIMA, Kohei YAMAGUCHI
  • Patent number: 7526143
    Abstract: A method which, while displacing the field-of-view, allows the image in a target area to be acquired without degradations such as out-of-focus of the image. Plural pieces of images are acquired before and after a target area while displacing the field-of-view. Next, these images are grouped into groups each of which includes several pieces of images, and integrated images on each group basis are created. Moreover, a relational expression is calculated which holds between image displacement quantity calculated by comparing the integrated images with each other and the number of the photographed pieces of images. Furthermore, image displacement quantities between the acquired plural pieces of images are calculated from this relational expression. Finally, these images are corrected by the amounts of these displacement quantities, then being integrated. This process allows reconfiguration of the image in the target area.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: April 28, 2009
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kohei Yamaguchi, Kazuo Aoki, Kenji Obara
  • Publication number: 20080270044
    Abstract: The present invention aims to provide a defect review apparatus capable of suppressing a reduction in throughput with a minimized deviation-amount measurement, and capable of optimizing an FOV of a monitoring image. To this end, the review apparatus for reviewing a specimen by moving the specimen to pre-calculated coordinate includes: a function to measure a deviation amount between the pre-calculated coordinates and coordinates of an actual position of the specimen; a function to optimize a coordinate correcting expression to minimize the measured deviation amount; and a function to determine that the deviation amounts have converged. When the deviation amounts have converged, the measurement for the coordinate-correcting-expression optimization is terminated. Thereby, the reduction in throughput is suppressed to the minimum level, and furthermore a FOV necessary for the specimen to be within the field of view is set according to a convergence value of the calculated deviation amount.
    Type: Application
    Filed: April 23, 2008
    Publication date: October 30, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Takehiro Hirai, Kenji Obara, Kohei Yamaguchi
  • Publication number: 20080128617
    Abstract: A technique executes autofocus adjustment stably even when a plurality of patterns or foreign matter capable of being imaged only by a specific detector are included independently. Such an image as a concavo-convex image having a weak contrast can be picked up. The technique can automatically focus such an image even when it is difficult to find a focus position in the image. A scanning electron microscope includes a plurality of detectors for detecting secondary signals from a specimen when irradiated with an electron beam, and a calculation unit for combining the signals obtained from the detectors. At least two of the detectors are provided to be symmetric with respect to the electron beam. The focus of the electron beam is adjusted based on the signals of the detectors or on a signal corresponding to a combination of the signals.
    Type: Application
    Filed: November 15, 2007
    Publication date: June 5, 2008
    Inventors: Kohei Yamaguchi, Kenji Obara
  • Patent number: 7307254
    Abstract: This SEM has a capability of preventing shift of a view field of the foreign matters at a stage where no sufficient correction is carried out when obtaining the SEM coordinate values used for transforming the coordinate values of the foreign matters on the sample sent from another device into the SEM coordinate values. The SEM selects the foreign matters closer to the center of the sample at first and then the foreign matters spirally from the center of the sample to the outer periphery.
    Type: Grant
    Filed: April 12, 2005
    Date of Patent: December 11, 2007
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kohei Yamaguchi, Kazuo Aoki, Seiji Isogai, Masashi Sakamoto