Patents by Inventor Koichiro Inaba

Koichiro Inaba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11820871
    Abstract: A method for producing aluminum oxide is provided. The method uses an aluminum-oxide-forming agent containing a partially hydrolyzed aluminum alkyl compound containing an aluminum trialkyl or a mixture thereof, and a solvent. It is thus possible to produce an aluminum oxide thin film or aluminum oxide particles on or in a substrate that is not resistant to polar solvents. A method of producing a polyolefin-based polymer nanocomposite containing zinc oxide particles or aluminum oxide particles using a solution containing a partially hydrolyzed zinc alkyl or a solution containing a partially hydrolyzed aluminum alkyl is also provided. The polyolefin-based polymer nanocomposite contains a polyolefin substrate and zinc oxide particles or aluminum oxide particles, and does not contain a dispersant. The zinc oxide particles or aluminum oxide particles have an average particle size of less than 100 nm.
    Type: Grant
    Filed: January 25, 2022
    Date of Patent: November 21, 2023
    Assignee: TOSOH FINECHEM CORPORATION
    Inventors: Koichiro Inaba, Kouji Toyota, Kenichi Haga, Toshio Naka, Toshiaki Taniike
  • Patent number: 11795277
    Abstract: A method for producing aluminum oxide is provided. The method uses an aluminum-oxide-forming agent containing a partially hydrolyzed aluminum alkyl compound containing an aluminum trialkyl or a mixture thereof, and a solvent. It is thus possible to produce an aluminum oxide thin film or aluminum oxide particles on or in a substrate that is not resistant to polar solvents. A method of producing a polyolefin-based polymer nanocomposite containing zinc oxide particles or aluminum oxide particles using a solution containing a partially hydrolyzed zinc alkyl or a solution containing a partially hydrolyzed aluminum alkyl is also provided. The polyolefin-based polymer nanocomposite contains a polyolefin substrate and zinc oxide particles or aluminum oxide particles, and does not contain a dispersant. The zinc oxide particles or aluminum oxide particles have an average particle size of less than 100 nm.
    Type: Grant
    Filed: January 25, 2022
    Date of Patent: October 24, 2023
    Assignee: TOSOH FINECHEM CORPORATION
    Inventors: Koichiro Inaba, Kouji Toyota, Kenichi Haga, Toshio Naka, Toshiaki Taniike
  • Patent number: 11482709
    Abstract: An aluminum oxide article containing at least aluminum atoms and oxygen atoms is described. When observed under a transmission electron microscope, a cross section of the aluminum oxide article contains crystallized parts, in which a crystal lattice image is recognizable, and a non-crystallized part, in which no crystal lattice image is recognizable, and has an island-and-sea structure consisting of isolated parts containing the crystallized parts and the continuous non-crystallized part. The isolated parts correspond to island parts in the island-and-sea structure, the continuous non-crystallized part corresponds to a sea part, and a plurality of the island parts are uniformly distributed in the sea part. An aluminum oxide for improving the battery performance of a lithium ion secondary battery, the scratch resistance and hardness of a cured film, and the gas barrier properties of a gas barrier film is provided.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: October 25, 2022
    Assignee: TOSOH FINECHEM CORPORATION
    Inventors: Yujin Takemoto, Masahiro Aoki, Kouji Toyota, Koichiro Inaba, Kentaro Sakai
  • Publication number: 20220144657
    Abstract: A method for producing aluminum oxide is provided. The method uses an aluminum-oxide-forming agent containing a partially hydrolyzed aluminum alkyl compound containing an aluminum trialkyl or a mixture thereof, and a solvent. It is thus possible to produce an aluminum oxide thin film or aluminum oxide particles on or in a substrate that is not resistant to polar solvents. A method of producing a polyolefin-based polymer nanocomposite containing zinc oxide particles or aluminum oxide particles using a solution containing a partially hydrolyzed zinc alkyl or a solution containing a partially hydrolyzed aluminum alkyl is also provided. The polyolefin-based polymer nanocomposite contains a polyolefin substrate and zinc oxide particles or aluminum oxide particles, and does not contain a dispersant. The zinc oxide particles or aluminum oxide particles have an average particle size of less than 100 nm.
    Type: Application
    Filed: January 25, 2022
    Publication date: May 12, 2022
    Inventors: Koichiro INABA, Kouji TOYOTA, Kenichi HAGA, Toshio NAKA, Toshiaki TANIIKE
  • Publication number: 20220145042
    Abstract: A method for producing aluminum oxide is provided. The method uses an aluminum-oxide-forming agent containing a partially hydrolyzed aluminum alkyl compound containing an aluminum trialkyl or a mixture thereof, and a solvent. It is thus possible to produce an aluminum oxide thin film or aluminum oxide particles on or in a substrate that is not resistant to polar solvents. A method of producing a polyolefin-based polymer nanocomposite containing zinc oxide particles or aluminum oxide particles using a solution containing a partially hydrolyzed zinc alkyl or a solution containing a partially hydrolyzed aluminum alkyl is also provided. The polyolefin-based polymer nanocomposite contains a polyolefin substrate and zinc oxide particles or aluminum oxide particles, and does not contain a dispersant. The zinc oxide particles or aluminum oxide particles have an average particle size of less than 100 nm.
    Type: Application
    Filed: January 25, 2022
    Publication date: May 12, 2022
    Inventors: Koichiro INABA, Kouji TOYOTA, Kenichi HAGA, Toshio NAKA, Toshiaki TANIIKE
  • Patent number: 11267940
    Abstract: A method for producing aluminum oxide is provided. The method uses an aluminum-oxide-forming agent containing a partially hydrolyzed aluminum alkyl compound containing an aluminum trialkyl or a mixture thereof, and a solvent. It is thus possible to produce an aluminum oxide thin film or aluminum oxide particles on or in a substrate that is not resistant to polar solvents. A method of producing a polyolefin-based polymer nanocomposite containing zinc oxide particles or aluminum oxide particles using a solution containing a partially hydrolyzed zinc alkyl or a solution containing a partially hydrolyzed aluminum alkyl is also provided. The polyolefin-based polymer nanocomposite contains a polyolefin substrate and zinc oxide particles or aluminum oxide particles, and does not contain a dispersant. The zinc oxide particles or aluminum oxide particles have an average particle size of less than 100 nm.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: March 8, 2022
    Assignee: TOSOH FINECHEM CORPORATION
    Inventors: Koichiro Inaba, Kouji Toyota, Kenichi Haga, Toshio Naka, Toshiaki Taniike
  • Publication number: 20200144623
    Abstract: An aluminum oxide article containing at least aluminum atoms and oxygen atoms is described. When observed under a transmission electron microscope, a cross section of the aluminum oxide article contains crystallized parts, in which a crystal lattice image is recognizable, and a non-crystallized part, in which no crystal lattice image is recognizable, and has an island-and-sea structure consisting of isolated parts containing the crystallized parts and the continuous non-crystallized part. The isolated parts correspond to island parts in the island-and-sea structure, the continuous non-crystallized part corresponds to a sea part, and a plurality of the island parts are uniformly distributed in the sea part. An aluminum oxide for improving the battery performance of a lithium ion secondary battery, the scratch resistance and hardness of a cured film, and the gas barrier properties of a gas barrier film is provided.
    Type: Application
    Filed: March 14, 2018
    Publication date: May 7, 2020
    Applicant: Tosoh Finechem Corporation
    Inventors: Yujin TAKEMOTO, Masahiro AOKI, Kouji TOYOTA, Koichiro INABA, Kentaro SAKAI
  • Publication number: 20190276612
    Abstract: A method for producing aluminum oxide is provided. The method uses an aluminum-oxide-forming agent containing a partially hydrolyzed aluminum alkyl compound containing an aluminum trialkyl or a mixture thereof, and a solvent. It is thus possible to produce an aluminum oxide thin film or aluminum oxide particles on or in a substrate that is not resistant to polar solvents. A method of producing a polyolefin-based polymer nanocomposite containing zinc oxide particles or aluminum oxide particles using a solution containing a partially hydrolyzed zinc alkyl or a solution containing a partially hydrolyzed aluminum alkyl is also provided. The polyolefin-based polymer nanocomposite contains a polyolefin substrate and zinc oxide particles or aluminum oxide particles, and does not contain a dispersant. The zinc oxide particles or aluminum oxide particles have an average particle size of less than 100 nm.
    Type: Application
    Filed: May 12, 2017
    Publication date: September 12, 2019
    Inventors: Koichiro INABA, Kouji TOYOTA, Kenichi HAGA, Toshio NAKA, Toshiaki TANIIKE
  • Patent number: 10381488
    Abstract: A dialkylzinc partial hydrolysate-containing solution which can be handled in air and can form a zinc oxide thin film in air and a method for producing the zinc oxide thin film are provided. The dialkylzinc partial hydrolysate-containing solution contains a partial hydrolysate of dialkyl zinc represented by general formula (1) and a solvent which has a boiling point of 160° C. or higher, an amide structure represented by general formula (2), and which is an organic compound having a cyclic structure. The partial hydrolysate is the dialkylzinc hydrolyzed with water in a molar ratio in the range of 0.4 to 0.9 with respect to zinc in the dialkylzinc. A method for producing the zinc oxide thin film by applying the dialkylzinc partial hydrolysate-containing solution to a base material is also provided.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: August 13, 2019
    Assignee: Tosoh Finechem Corporation
    Inventors: Kouji Toyota, Koichiro Inaba, Toshio Naka
  • Publication number: 20180145179
    Abstract: A dialkylzinc partial hydrolysate-containing solution which can be handled in air and can form a zinc oxide thin film in air and a method for producing the zinc oxide thin film are provided. The dialkylzinc partial hydrolysate-containing solution contains a partial hydrolysate of dialkyl zinc represented by general formula (1) and a solvent which has a boiling point of 160° C. or higher, an amide structure represented by general formula (2), and which is an organic compound having a cyclic structure. The partial hydrolysate is the dialkylzinc hydrolyzed with water in a molar ratio in the range of 0.4 to 0.9 with respect to zinc in the dialkylzinc. A method for producing the zinc oxide thin film by applying the dialkylzinc partial hydrolysate-containing solution to a base material is also provided.
    Type: Application
    Filed: May 10, 2016
    Publication date: May 24, 2018
    Inventors: Kouji TOYOTA, Koichiro INABA, Toshio NAKA
  • Publication number: 20170334734
    Abstract: The present invention relates to a composition for producing a zinc oxide thin film containing a group 2 element, said composition being a solution in which a partial hydrolysate of an organic zinc compound represented by formula (1) and a group 2 element are dissolved in an organic solvent. The solution can additionally include a group 13 element. Formula (1): R1-Zn-R1 (in the formula, R1 is a straight-chain or branched alkyl group having 1-7 carbon atoms). Provided are: a composition for producing a zinc oxide thin film containing a group 2 element, said composition making it possible to form a zinc oxide thin film containing a group 2 element by performing coating and film formation with one solution; and a production method for the composition.
    Type: Application
    Filed: October 1, 2015
    Publication date: November 23, 2017
    Inventors: Kenichi HAGA, Kouji TOYOTA, Shizuo TOMIYASU, Koichiro INABA
  • Patent number: 9156857
    Abstract: [Object] To improve heat stability of diethylzinc which is used for a catalyst of polymerizing, an organic synthetic reaction reagent and a raw materials for providing a zinc film by MOCVD. And to offer the diethylzinc composition being superior in heat stability, even if it handles for a long term a metal zinc particle does not precipitate. [Means for Solving Problem] Use a diethylzinc composition added a compound which has particular carbon-carbon double bond to a diethylzinc.
    Type: Grant
    Filed: December 15, 2011
    Date of Patent: October 13, 2015
    Assignee: TOSOH FINECHEM CORPORATION
    Inventors: Kenichi Haga, Shizuo Tomiyasu, Kohichi Tokudome, Kouji Toyota, Koichiro Inaba
  • Patent number: 9096441
    Abstract: Disclosed is a composition for forming a zinc oxide thin film, which contains an organic zinc compound as a starting material, is not ignitable, and can be easily handled. The composition for forming a zinc oxide thin film is capable of forming a transparent zinc oxide thin film which is not doped or doped with a group 3B element by being heated at 300° C. or less. Also disclosed is a method for obtaining a transparent zinc oxide thin film, which is not doped or doped with a group 3B element, using the composition. Specifically, the composition for forming a zinc oxide thin film contains a product which is obtained by partially hydrolyzing an organic zinc compound by adding water to the organic zinc compound or a solution of the organic zinc compound and a group 3B element compound. In cases when a group 3B element compound is contained, the molar ratio of the group 3B element compound to the organic zinc compound is within the range of 0.005-0.3.
    Type: Grant
    Filed: April 21, 2010
    Date of Patent: August 4, 2015
    Assignee: TOSOH FINECHEM CORPORATION
    Inventors: Koichiro Inaba, Kouji Toyota, Kenichi Haga, Kouichi Tokudome
  • Publication number: 20130281724
    Abstract: [Object] To improve heat stability of diethylzinc which is used for a catalyst of polymerizing, an organic synthetic reaction reagent and a raw materials for providing a zinc film by MOCVD. And to offer the diethylzinc composition being superior in heat stability, even if it handles for a long term a metal zinc particle does not precipitate. [Means for solving problem] Use a diethylzinc composition added a compound which has particular carbon-carbon double bond to a diethylzinc.
    Type: Application
    Filed: December 15, 2011
    Publication date: October 24, 2013
    Applicant: TOSOH FINECHEM CORPORATION
    Inventors: Kenichi Haga, Shizuo Tomiyasu, Kohichi Tokudome, Kouji Toyota, Koichiro Inaba
  • Publication number: 20120094019
    Abstract: Disclosed is a composition for forming a zinc oxide thin film, which contains an organic zinc compound as a starting material, is not ignitable, and can be easily handled. The composition for forming a zinc oxide thin film is capable of forming a transparent zinc oxide thin film which is not doped or doped with a group 3B element by being heated at 300° C. or less. Also disclosed is a method for obtaining a transparent zinc oxide thin film, which is not doped or doped with a group 3B element, using the composition. Specifically, the composition for forming a zinc oxide thin film contains a product which is obtained by partially hydrolyzing an organic zinc compound by adding water to the organic zinc compound or a solution of the organic zinc compound and a group 3B element compound. In cases when a group 3B element compound is contained, the molar ratio of the group 3B element compound to the organic zinc compound is within the range of 0.005-0.3.
    Type: Application
    Filed: April 21, 2010
    Publication date: April 19, 2012
    Applicant: Tocoh Finefhem Corporation
    Inventors: Koichiro Inaba, Kouji Toyota, Kenichi Haga, Kouichi Tokudome
  • Publication number: 20110087039
    Abstract: Objects of the present invention are to provide a novel niobium or tantalum complex having good vapor pressure and becoming a raw material for producing a niobium- or tantalum-containing thin film by a method such as CVD method, ALD method or the like, a method for producing the same, a metal-containing thin film using the same, and a method for producing the same. The present invention relates to producing an imide complex represented by the general formula (1) by, for example, the reaction between M1(NR1)X3(L)r (2) and an alkali metal alkoxide (3): (wherein M1 represents niobium atom or tantalum atom, R1 represents an alkyl group having from 1 to 12 carbon atoms, R2 represents an alkyl group having from 2 to 13 carbon atoms, X represents halogen atom, r is 1 when L is 1,2-dimethoxyethane ligand, r is 2 when L is pyridine ligand, and M2 represents an alkali metal), and producing a niobium- or tantalum-containing thin film by using the imide complex (1) as a raw material.
    Type: Application
    Filed: August 20, 2007
    Publication date: April 14, 2011
    Applicants: TOSOH CORPORATION, SAGAMI CHEMICAL RESEARCH CENTER
    Inventors: Ken-ichi TADA, Taishi FURUKAWA, Koichiro INABA, Tadahiro YOTSUYA, Hirokazu CHIBA, Toshiki YAMAMOTO, Tetsu YAMAKAWA, Noriaki OSHIMA
  • Patent number: 7906668
    Abstract: Objects of the present invention are to provide a novel niobium or tantalum complex having good vapor pressure and becoming a raw material for producing a niobium- or tantalum-containing thin film by a method such as CVD method, ALD method or the like, a method for producing the same, a metal-containing thin film using the same, and a method for producing the same. The present invention relates to producing an imide complex represented by the general formula (1) by, for example, the reaction between M1(NR1)X3(L)r (2) and an alkali metal alkoxide (3): (wherein M1 represents niobium atom or tantalum atom, R1 represents an alkyl group having from 1 to 12 carbon atoms, R2 represents an alkyl group having from 2 to 13 carbon atoms, X represents halogen atom, r is 1 when L is 1,2-dimethoxyethane ligand, r is 2 when L is pyridine ligand, and M2 represents an alkali metal), and producing a niobium- or tantalum-containing thin film by using the imide complex (1) as a raw material.
    Type: Grant
    Filed: August 20, 2007
    Date of Patent: March 15, 2011
    Assignees: Tosoh Corporation, Sagami Chemical Research Center
    Inventors: Ken-ichi Tada, Taishi Furukawa, Koichiro Inaba, Tadahiro Yotsuya, Hirokazu Chiba, Toshiki Yamamoto, Tetsu Yamakawa, Noriaki Oshima
  • Patent number: 7816549
    Abstract: A compound which has thermal stability and moderate vaporizability and is satisfactory as a material for the CVD or ALD method; a process for producing the compound; a thin film formed from the compound as a raw material; and a method of forming the thin film. A compound represented by the general formula (1) is produced by reacting a compound represented by the general formula (2) with a compound represented by the general formula (3). The compound produced is used as a raw material to form a metal-containing thin film. [Chemical formula 1] (1) [Chemical formula 2] (2) [Chemical formula 3] Mp(NR4R5)q(3) (In the formulae, M represents a Group 4 element, aluminum, gallium, etc.; n is 2 or 3 according to cases; R1 and R3 each represents C1-6 alkyl, etc.; R2 represents C1-6 alkyl, etc.; R4 and R5 each represents C1-4 alkyl, etc.; X represents hydrogen, lithium, or sodium; p is 1 or 2 according to cases; and q is 4 or 6 according to cases).
    Type: Grant
    Filed: July 28, 2006
    Date of Patent: October 19, 2010
    Assignees: Tosoh Corporation, Sagami Chemical Research Center
    Inventors: Ken-ichi Tada, Koichiro Inaba, Taishi Furukawa, Tetsu Yamakawa, Noriaki Oshima
  • Publication number: 20100105936
    Abstract: A compound which has thermal stability and moderate vaporizability and is satisfactory as a material for the CVD or ALD method; a process for producing the compound; a thin film formed from the compound as a raw material; and a method of forming the thin film. A compound represented by the general formula (1) is produced by reacting a compound represented by the general formula (2) with a compound represented by the general formula (3). The compound produced is used as a raw material to form a metal-containing thin film. [Chemical formula 1] (1) [Chemical formula 2] (2) [Chemical formula 3] Mp(NR4R5)q(3) (In the formulae, M represents a Group 4 element, aluminum, gallium, etc.; n is 2 or 3 according to cases; R1 and R3 each represents C1-6 alkyl, etc.; R2 represents C1-6 alkyl, etc.; R4 and R5 each represents C1-4 alkyl, etc.; X represents hydrogen, lithium, or sodium; p is 1 or 2 according to cases; and q is 4 or 6 according to cases.
    Type: Application
    Filed: July 28, 2006
    Publication date: April 29, 2010
    Applicants: TOSOH CORPORATION, SAGAMI CHEMICAL RESEARCH CENTER
    Inventors: Ken-ichi Tada, Koichiro Inaba, Taishi Furukawa, Tetsu Yamakawa, Noriaki Oshima
  • Publication number: 20100010248
    Abstract: Objects of the present invention are to provide a novel niobium or tantalum complex having good vapor pressure and becoming a raw material for producing a niobium- or tantalum-containing thin film by a method such as CVD method, ALD method or the like, a method for producing the same, a metal-containing thin film using the same, and a method for producing the same. The present invention relates to producing an imide complex represented by the general formula (1) by, for example, the reaction between M1(NR1)X3(L)r (2) and an alkali metal alkoxide (3): (wherein M1 represents niobium atom or tantalum atom, R1 represents an alkyl group having from 1 to 12 carbon atoms, R2 represents an alkyl group having from 2 to 13 carbon atoms, X represents halogen atom, r is 1 when L is 1,2-dimethoxyethane ligand, r is 2 when L is pyridine ligand, and M2 represents an alkali metal), and producing a niobium- or tantalum-containing thin film by using the imide complex (1) as a raw material.
    Type: Application
    Filed: August 20, 2007
    Publication date: January 14, 2010
    Applicants: Tosoh Corporation, Sagami Chemical Research Center
    Inventors: Ken-ichi Tada, Taishi Furukawa, Koichiro Inaba, Tadahiro Yotsuya, Hirokazu Chiba, Toshiki Yamamoto, Tetsu Yamakawa, Noriaki Oshima