Patents by Inventor Koichiro Inaba

Koichiro Inaba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Titanium complexes, their production methods, titanium-containing thin films, and their formation methods
    Patent number: 7632958
    Abstract: Objects of the present invention are to provide a novel titanium complex that has good vaporization characteristics and an excellent thermal stability, and becomes a raw material for forming a titanium-containing thin film by methods such as CVD method or ALD method, its production method, a titanium-containing thin film formed using the same, and its formation method. In the invention, a titanium complex represented by the general formula (1) is produced by reacting a diimine represented by the general formula (2) and metallic lithium, and then reacting a tetrakisamide complex represented by the general formula (3). (In the formulae, R1 and R4 represent an alkyl group having from 1 to 6 carbon atoms. R2 and R3 each independently represents a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms. R5 and R6 each independently represents an alkyl group having from 1 to 4 carbon atoms.).
    Type: Grant
    Filed: November 1, 2006
    Date of Patent: December 15, 2009
    Assignees: Tosoh Corporation, Sagami Chemical Research Center
    Inventors: Ken-ichi Tada, Koichiro Inaba, Taishi Furukawa, Hirokazu Chiba, Tetsu Yamakawa, Noriaki Oshima
  • TITANIUM COMPLEXES, THEIR PRODUCTION METHODS, TITANIUM-CONTAINING THIN FILMS, AND THEIR FORMATION METHODS
    Publication number: 20090036697
    Abstract: Objects of the present invention are to provide a novel titanium complex that has good vaporization characteristics and an excellent thermal stability, and becomes a raw material for forming a titanium-containing thin film by methods such as CVD method or ALD method, its production method, a titanium-containing thin film formed using the same, and its formation method. In the invention, a titanium complex represented by the general formula (1) is produced by reacting a diimine represented by the general formula (2) and metallic lithium, and then reacting a tetrakisamide complex represented by the general formula (3). (In the formulae, R1 and R4 represent an alkyl group having from 1 to 6 carbon atoms. R2 and R3 each independently represents a hydrogen atom or an alkyl group having from 1 to 3 carbon atoms. R5 and R6 each independently represents an alkyl group having from 1 to 4 carbon atoms.).
    Type: Application
    Filed: November 1, 2006
    Publication date: February 5, 2009
    Applicants: TOSOH CORPORATION, SAGAMI CHEMICAL RESEARCH CENTER
    Inventors: Ken-ichi Tada, Koichiro Inaba, Taishi Furukawa, Hirokazu Chiba, Tetsu Yamakawa, Noriaki Oshima