Abstract: A lubricant supply apparatus for an internal combustion engine includes a lubricant shower and a baffle plate. The lubricant shower is disposed between a camshaft and a cylinder head cover attached to a cylinder head. The lubricant shower includes a supply port from which a lubricant is supplied to the camshaft. The baffle plate is disposed between the camshaft and the lubricant shower such that a clearance is provided between the baffle plate and the lubricant shower. The baffle plate includes a hole provided at a position at which the hole of the baffle plate overlaps with the supply port of the lubricant shower. The camshaft is provided with a cam. The supply port of the lubricant shower and the hole of the baffle plate are located above the cam.

Abstract: A lubricant supply apparatus for an internal combustion engine includes a lubricant shower and a baffle plate. The lubricant shower is disposed between a camshaft and a cylinder head cover attached to a cylinder head. The lubricant shower includes a supply port from which a lubricant is supplied to the camshaft. The baffle plate is disposed between the camshaft and the lubricant shower such that a clearance is provided between the baffle plate and the lubricant shower. The baffle plate includes a hole provided at a position at which the hole of the baffle plate overlaps with the supply port of the lubricant shower. The camshaft is provided with a cam. The supply port of the lubricant shower and the hole of the baffle plate are located above the cam.

Abstract: A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.

Abstract: A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.

Abstract: A gas treating device includes a mounting base to support a substrate, a treatment container, a post mix type shower head, and a gas supply mechanism having a source gas flow path to supply a source gas to the shower head and an oxidizing gas supply path to supply an oxidizing gas to the shower head. The shower head includes a bottom surface which faces the substrate on the mounting base via a predetermined space, a groove formed in the bottom surface, a plurality of source gas discharge ports communicated with the source gas flow path, and bored in the bottom surface except the groove to discharge the source gas, and a plurality of oxidizing gas discharge ports communicated with the oxidizing gas flow path, and bored in the groove to discharge the oxidizing gas.

Abstract: A shower head formed by stacking a shower base, a gas diffusion plate, and a shower plate and supplying material gas and oxidizer gas to a wafer on a loading table through a first gas diffusion part and a second gas diffusion part formed in both faces of the gas diffusion plate, first gas outlets formed in the shower plate and communicating with a first gas diffusion space, and second gas outlets formed in the shower plate and communicating with a second gas diffusion space. A plurality of heat transfer columns fitted closely to the lower surface of the shower base are installed in the first gas diffusion part so that portions therebetween can form the first gas diffusion space, and radiant heat from the loading table is transmitted by the heat transfer columns in the thickness direction of the shower head.

Abstract: A plating apparatus includes a plating solution tank which stores a plating solution, a holder including an inner space to house a wafer and an opening for the wafer to be in contact with the plating solution, and a nitrogen supplying mechanism to supply nitrogen to the inner space of the holder.

Abstract: A mist trap mechanism and method for a plating apparatus, which can provide an improved mist removing effect by a simple structure, are provided. A gas discharge passage is formed to connect the space in a plating chamber and space outside of the plating chamber and provided with a liquid spouting portion and a solid wall. The discharge gas collides with the liquid spouted from the liquid spouting portion, and the discharge gas collides with the solid wall which has its surface wetted with the liquid spouted from the liquid spouting portion. Such a two-staged collision of the discharge gas effectively takes the mist contained in the discharge gas into the liquid. A liquid recovery portion is disposed in connection with the gas discharge passage to collectively catch the mist in a state captured by the liquid.

Abstract: A mist trap mechanism and method for a plating apparatus, which can provide an improved mist removing effect by a simple structure, are provided. A gas discharge passage is formed to connect the space in a plating chamber and space outside of the plating chamber and provided with a liquid spouting portion and a solid wall. The discharge gas collides with the liquid spouted from the liquid spouting portion, and the discharge gas collides with the solid wall which has its surface wetted with the liquid spouted from the liquid spouting portion. Such a two-staged collision of the discharge gas effectively takes the mist contained in the discharge gas into the liquid. A liquid recovery portion is disposed in connection with the gas discharge passage to collectively catch the mist in a state captured by the liquid.

Abstract: A plating apparatus includes a plating solution tank which stores a plating solution, a holder including an inner space to house a wafer and an opening for the wafer to be in contact with the plating solution, and a nitrogen supplying mechanism to supply nitrogen to the inner space of the holder.

Abstract: Between a wafer and a holder holding a wafer, a seal member is disposed so that a contact surface is formed in an approximate plane, and an inner periphery surface is formed in an approximate plane and approximately vertical to a contact surface. The seal member, in a sealed state, has a brim portion of a radius of curvature of 0.5 mm or less at a boundary portion between an inner periphery surface of a seal member and a contact surface. Due to a brim portion, a gap between a contact surface of a seal member and a surface being plated of a wafer W can be made smaller, resulting in reducing bubbles entering in a gap.

Abstract: A disc player comprising a lift chassis 5 liftably supported on a main chassis 1 and having a signal reproduction unit 31 mounted thereon, and a drive slide 9 supported by the main chassis 1 and movable in a direction intersecting the direction of movement of the lift chassis 5. The drive slide 9 has a straight cam portion in engagement with a cam follower on the lift chassis 5 for reciprocatingly driving the lift chassis 5. An intermittent feed mechanism is provided between the drive slide 9 and a motor 23 for reciprocatingly moving the drive slide. The feed mechanism comprises a drive portion for receiving a torque directly from the motor, and a driven portion to be intermittently driven by the drive portion while the drive portion is in continuous rotation. The power given to the driven portion is delivered to the drive slide to thereby move the slide stepwise.