Patents by Inventor Koichiro Takeuchi

Koichiro Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240013586
    Abstract: By an in-vehicle device mounted on a vehicle or a data synchronization method, primary data is acquired from a control device of the vehicle or an expansion device, the primary data is stored, a first application program is executed, and a second application program is executed to utilize secondary data or request synchronization.
    Type: Application
    Filed: July 6, 2023
    Publication date: January 11, 2024
    Inventor: Koichiro TAKEUCHI
  • Publication number: 20240015560
    Abstract: By a management server, a vehicle network system, or a communication traffic collection method, multiple in-vehicle devices, which are respectively mounted on multiple different vehicles, are wirelessly communicated, each of the multiple in-vehicle devices executes multiple application programs, and each of the multiple application programs has application identification data for identifying each of the multiple application programs, a communication traffic according to execution of each of the plurality of application programs is acquired, the communication traffic is totaled, and an application communication traffic is calculated.
    Type: Application
    Filed: July 6, 2023
    Publication date: January 11, 2024
    Inventor: Koichiro TAKEUCHI
  • Publication number: 20240004636
    Abstract: A mobility service providing system includes an application database storing a hardware requirement required for executing an application program. A basic information obtainer obtains basic information that is hardware information regarding functions of a vehicle. An additional information obtainer obtains hardware information regarding a peripheral device group detachably attached to the vehicle. An information abstractor coverts obtained hardware information into information in a common format. An application provider compares hardware requirements associated with the application program with abstracted hardware information regarding the in-vehicle device to which the application program is downloaded, and determines usability of the application program in the in-vehicle device.
    Type: Application
    Filed: June 26, 2023
    Publication date: January 4, 2024
    Inventor: Koichiro TAKEUCHI
  • Patent number: 11772605
    Abstract: A sensor detects a target by transmitting and receiving an electromagnetic wave, and is arranged in a vehicle compartment. A user's mobile terminal is notified via a cloud system when a vehicle is parked, and a suspicious object around the vehicle is detected by monitoring a periphery of the vehicle using the sensor. An obstacle interfering with a periphery monitoring and disposed in the vehicle compartment is detected using the sensor prior to the periphery monitoring. A detected obstacle is moved so as not to interfere with the periphery monitoring.
    Type: Grant
    Filed: July 27, 2022
    Date of Patent: October 3, 2023
    Assignee: DENSO CORPORATION
    Inventors: Koichiro Takeuchi, Masaya Ito
  • Publication number: 20230054160
    Abstract: A sensor detects a target by transmitting and receiving an electromagnetic wave, and is arranged in a vehicle compartment. A user's mobile terminal is notified via a cloud system when a vehicle is parked, and a suspicious object around the vehicle is detected by monitoring a periphery of the vehicle using the sensor. An obstacle interfering with a periphery monitoring and disposed in the vehicle compartment is detected using the sensor prior to the periphery monitoring. A detected obstacle is moved so as not to interfere with the periphery monitoring.
    Type: Application
    Filed: July 27, 2022
    Publication date: February 23, 2023
    Inventors: Koichiro TAKEUCHI, Masaya ITO
  • Publication number: 20160187032
    Abstract: A steam injector including an introducing portion introducing a liquid flow of a refrigerant and a steam flow of the refrigerant; a mixing portion that has a shape with an internal cross-sectional area decreasing toward a moving direction of the liquid flow, and internally mixes the jet-like liquid flow with the steam flow to form a refrigerant flow; a throat portion formed on an outlet side of the mixing portion; and a diffuser portion that has a shape with an internal cross-sectional area increasing from the throat portion toward a moving direction of the refrigerant flow, and discharges the refrigerant flow at an increased pressure from a discharge portion. The throat portion has an internal cross-sectional area smaller than a critical cross-sectional area at which a discharge pressure of the refrigerant flow discharged from the discharge portion nonlinearly increases when the internal cross-sectional area of the throat portion is reduced.
    Type: Application
    Filed: May 7, 2014
    Publication date: June 30, 2016
    Applicants: University of Tsukuba, WELCON Inc.
    Inventors: Yutaka ABE, Koichiro TAKEUCHI, Yutaka SUZUKI
  • Patent number: 8638026
    Abstract: A stage comprises a linear guide rail (2) for guiding a movable table (4), a driven bar (12), a linear drive actuator in contact with the driven bar (12) to transmit driving force to the driven bar (12), and parallel plate springs (30) for holding opposite ends of the driven bar (12). A drive transmitting surface of the linear drive actuator is provided so as to be separated from the movable table (4), and this prevents the accuracy of positioning from being reduced. Also, the parallel springs (30) reduce deforming forces applied to sections supporting the driven bar (12), and this prevents the driven bar from being damaged. The configuration makes the stage highly accurate and highly reliable.
    Type: Grant
    Filed: October 6, 2009
    Date of Patent: January 28, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Masashi Shibahara, Mikio Tokuyama, Koichiro Takeuchi, Shigeru Haneda, Osamu Yamada, Naoki Sakamoto, Eiichi Hazaki, Akito Tanokuchi
  • Patent number: 8481935
    Abstract: A scanning electron microscope having a charged particle beam that when in a state being irradiated toward a sample, a voltage is applied to the sample so that the charged particle beam does not reach the sample. The scanning electron microscope also detects information on a potential of a sample using a signal obtained, and a device for automatically adjusting conditions based on the result of measuring.
    Type: Grant
    Filed: July 25, 2011
    Date of Patent: July 9, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Minoru Yamazaki, Hideyuki Kazumi, Koichiro Takeuchi, Hisaya Murakoshi
  • Patent number: 8274048
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Grant
    Filed: June 25, 2010
    Date of Patent: September 25, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideyuki Kazumi, Koichiro Takeuchi, Atsushi Kobaru, Seiko Oomori
  • Publication number: 20110278454
    Abstract: A scanning electron microscope having a charged particle beam that when in a state being irradiated toward a sample, a voltage is applied to the sample so that the charged particle beam does not reach the sample. The scanning electron microscope also detects information on a potential of a sample using a signal obtained, and a device for automatically adjusting conditions based on the result of measuring.
    Type: Application
    Filed: July 25, 2011
    Publication date: November 17, 2011
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Akira IKEGAMI, Minoru YAMAZAKI, Hideyuki KAZUMI, Koichiro TAKEUCHI, HIsaya Murakoshi
  • Publication number: 20110260558
    Abstract: A stage comprises a linear guide rail (2) for guiding a movable table (4), a driven bar (12), a linear drive actuator in contact with the driven bar (12) to transmit driving force to the driven bar (12), and parallel plate springs (30) for holding opposite ends of the driven bar (12). A drive transmitting surface of the linear drive actuator is provided so as to be separated from the movable table (4), and this prevents the accuracy of positioning from being reduced. Also, the parallel springs (30) reduce deforming forces applied to sections supporting the driven bar (12), and this prevents the driven bar from being damaged. The configuration makes the stage highly accurate and highly reliable.
    Type: Application
    Filed: October 6, 2009
    Publication date: October 27, 2011
    Inventors: Masashi Shibahara, Mikio Tokuyama, Koichiro Takeuchi, Shigeru Haneda, Osamu Yamada, Naoki Sakamoto, Eiichi Hazaki, Akito Tanokuchi
  • Patent number: 7989768
    Abstract: A scanning electron microscope having a charged particle beam that when in a state being irradiated toward a sample, a voltage is applied to the sample so that the charged particle beam does not reach the sample. The scanning electron microscope also detects information on a potential of a sample using a signal obtained, and a device for automatically adjusting conditions based on the result of measuring.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: August 2, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Minoru Yamazaki, Hideyuki Kazumi, Koichiro Takeuchi, Hisaya Murakoshi
  • Patent number: 7928377
    Abstract: It is possible to carry out a highly accurate thin film machining by irradiation of an ion beam to a sample and a high-resolution STEM observation of the sample by irradiating an electron beam with a high throughput almost without moving the sample. The FIB irradiation system has an irradiation axis almost orthogonally intersecting an irradiation axis of the STEM observation electron beam irradiation system. The sample is arranged at the intersection point of the irradiation axes. The FIB machining plane of the sample is extracted from the thin film plane of the STEM observation sample. The transmitting/scattered beam detector are arranged at backward of the sample on the electron beam irradiation axis viewed from the electron beam irradiation direction.
    Type: Grant
    Filed: October 26, 2005
    Date of Patent: April 19, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tohru Ishitani, Tsuyoshi Ohnishi, Mitsugu Sato, Koichiro Takeuchi
  • Publication number: 20100258723
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Application
    Filed: June 25, 2010
    Publication date: October 14, 2010
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Akira IKEGAMI, Hideyuki KAZUMI, Koichiro TAKEUCHI, Atsushi KOBARU, Seiko OOMORI
  • Patent number: 7763852
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: July 27, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideyuki Kazumi, Koichiro Takeuchi, Atsushi Kobaru, Seiko Oomori
  • Patent number: 7759652
    Abstract: The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: July 20, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Ohshima, Mitsugu Sato, Yutaka Kaneko, Souichi Katagiri, Koichiro Takeuchi
  • Patent number: 7550740
    Abstract: A focused ion beam apparatus enables an ion beam to be focused highly accurately on a sample at the beam spot position of the case of the absence of magnetic field without causing isotope separation of the ion beam on the sample, even when there is a magnetic field on the ion beam optical axis or the magnetic field fluctuates. The focused ion beam apparatus comprises a corrective magnetic field generating unit 10 disposed on the optical axis of the ion beam 3 for correcting the deflection of the ion beam 3 due to an external magnetic field. The corrective magnetic field generating unit 10 includes pole-piece pairs 26A and 26B, each of which having two pole pieces 26a and 26b or 26c and 26d that are adjacent to each other with a gap d. The pole-piece pairs 26A and 26B are disposed opposite to each other with a gap g (>d) across the optical axis of the ion beam 3.
    Type: Grant
    Filed: July 26, 2007
    Date of Patent: June 23, 2009
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Koichiro Takeuchi, Tohru Ishitani
  • Publication number: 20090039264
    Abstract: Disclosed herein are a method for applying, while a charged particle beam is in a state being irradiated toward the sample, a voltage to the sample so that the charged particle beam does not reach the sample (hereafter such state may be referred to as a mirror state) and detecting information on a potential of a sample using a signal obtained then, and a device for automatically adjusting conditions of the device based on the result of measuring.
    Type: Application
    Filed: August 8, 2008
    Publication date: February 12, 2009
    Inventors: Akira IKEGAMI, Minoru Yamazaki, Hideyuki Kazumi, Koichiro Takeuchi, Hisaya Murakoshi
  • Patent number: 7411192
    Abstract: A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic field undergoes a change, the ion beam is focused without separating the isotopes on the sample at the same ion beam spot position as if the magnetic field is not existent. A canceling magnetic field is generated on the optical axis of the ion beam from a canceling magnetic field generator thereby to offset the deflection of the ion beam due to the external magnetic field.
    Type: Grant
    Filed: July 27, 2005
    Date of Patent: August 12, 2008
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Koichiro Takeuchi, Tohru Ishitani, Yoichi Ose
  • Publication number: 20080116375
    Abstract: In a scanning electron microscope, an optimum scanning method for reducing the amount of deflection of a primary electron beam and secondary electrons is determined to acquire stable images. An energy filter is used to discriminate between energy levels. The change in yield of obtained electrons is used to measure the variation in specimen potential. The time constant of charging created during electron beam irradiation is extracted. The scanning method is optimized based on the extracted time constant to reduce the distortion and magnification variation that appear in a SEM image.
    Type: Application
    Filed: November 7, 2007
    Publication date: May 22, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Hideyuki Kazumi, Koichiro Takeuchi, Atsushi Kobaru, Seiko Oomori