Abstract: A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R1 represents a hydrogen atom or a methyl group, and L1 represents a single bond or a C1 to C18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R2 represents a C3 to C18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C1 to C8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L1 has no aliphatic hydrocarbon group by

Abstract: A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having an adamantane lactone group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. In the formula (a4), R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group of the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.

Abstract: A compound represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C5 to C18 hydrocarbon group consisting of the following groups (a) and (b): (a) a liner or branched divalent hydrocarbon group and (b) an alicyclic hydrocarbon group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A2-X1-(A3-X2)a-(A4)b-, * represents a binding site to an oxygen atom, A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, a represents 0 or 1, and b represents 0 or 1.

Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.

Abstract: A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C1 to C6 perfluoroalkyl group or *—CHRf1Rf2, * represents a binding site to a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group or Rf1 and Rf2 may be bonded together with a carbon atom bonded thereto to form a ring, A1 represents a single bond, a C1 to C6 alkanediyl group or **-A3-X1-(A4-X2)a-(A5)b-, ** represents a binding site to an oxygen atom, A2, A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, a and b each represent 0 or 1, and W1 represents a C5 to C18 divalent alicyclic hydrocarbon group.

Abstract: A salt represented by formula (I): wherein R1 and R2 independently each represent a C6-C18 unsubstituted or substituted aromatic hydrocarbon group, X1 represents a C1-C12 divalent aliphatic saturated hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group, and A? represents an organic anion.

Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 and R2 independently each represent a hydrogen atom, a fluorine atom or a C1-C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—C(?O)—O—, *—O—C(?O)—, *—O—C(?O)—O— or —O—, where * represents a binding site to —C(R1)(R2)— or —C(Q1)(Q2)-, A1 represents a C2-C36 divalent hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a substituent, R3 represents a hydrogen atom or a methyl group, and Z+ represents an organic cation.

Abstract: A resin comprising a structural unit represented by formula (I0): wherein A1, A2 and A3 each independently represent a C2-C18 divalent hydrocarbon group, R1, R2, R3 and R4 each independently represent a hydrogen atom or a C1-C6 saturated hydrocarbon group, X1 and X2 each independently represent *—O—CO—, —O—CO—O— or —O—, and * represents a binding site to A2 or A3.

Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.

Abstract: A compound represented by formula (I), a resin including a structural unit derived from the compound and a resist composition including the resin: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom may be replaced by a halogen atom, R2 represents a C1 to C12 fluorinated saturated hydrocarbon group, A1 represents a single bond, a C1 to C6 alkanediyl group or *-A3-X1-(A4-X2)a-(A5)b-, * represents a binding site to an oxygen atom, A2, A3, A4 and A5 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, W1 represents a C5 to C18 divalent alicyclic hydrocarbon group, a represents 0 or 1, and b represents 0 or 1.

Abstract: A resist composition include (A1) a resin which includes a structural unit represented by formula (a4), and which resin has neither an acid-labile group nor an aromatic ring, (A2) a resin having an acid-labile group, and an acid generator, wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group; and a structural unit having a ketone group.

Abstract: A resist composition includes (A1) a resin having an acid-labile group, (A2) a resin which includes a structural unit represented by formula (I), and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group in which a hydrogen atom can be replaced by a halogen atom, R2 represents a C1 to C12 fluorinated saturated hydrocarbon group, A1 represents a C2 to C6 alkanediyl group or *-A2-X1-(A3-X2)a-A4b-, * represents a binding site to an oxygen atom in —O—CO—, A2, A3 and A4 each independently represent a C1 to C6 alkanediyl group, X1 and X2 each independently represent —O—, —CO—O— or —O—CO—, and “a” represents 0 or 1.

Abstract: A compound having a group represented by the formula (Ia): wherein R1 represents a C1 to C8 fluorinated alkyl group, R2 represents a group having an optionally substituted C5 to C18 alicyclic hydrocarbon group, and * represents a binding site.

Abstract: A photoresist composition comprising an acid generator and a resin which comprises a structural unit having an acid-liable group, the acid generator generating an acid (I) or an acid (II): the acid (I) showing a hydrogen bonding parameter in the range of 12 (MPa)1/2 to 15 (MPa)1/2 and a polarity parameter in the range of 15 (MPa)1/2 or more; the acid (II) showing a hydrogen bonding parameter in the range of 12 (MPa)1/2 to 15 (MPa)1/2, and a distance of Hansen solubility parameters between the acid (II) and ?-butyrolactone being 7.5 or less, and the distance being calculated from formula (1): R=(4×(?dA?18)2+(?pA?16.6)2+(?hA?7.4)2)1/2??(1) in which ?dA represents a dispersion parameter of an acid, ?pA represents a polarity parameter of an acid, ?hA represents a hydrogen bonding parameter of an acid, and R represents a distance of Hansen solubility parameters between an acid and ?-butyrolactone.

Abstract: A process for producing a photoresist pattern comprising steps (1) to (5); (1) applying a photoresist composition onto a substrate, said photoresist composition comprising an acid generator and a resin which comprises a structural unit having an acid-liable group; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; (4) heating the exposed composition layer; and (5) developing the heated composition layer with a developer which comprises butyl acetate, wherein a distance of Hansen solubility parameters between the resin and butyl acetate is from 3.3 to 4.3, the distance is calculated from formula (1): R=(4×(?dR?15.8)2+(?pR?3.7)2+(?hR?6.

Abstract: A photoresist composition comprising an acid generator and a resin which comprises one or more structural units (a1) derived from a monomer (a1) having an acid-liable group, all of monomers (a1) showing a distance of Hansen solubility parameters between the monomer (a1) and butyl acetate in the range of 3 to 5, the distance being calculated from formula (1): R=(4×(?dm?15.8)2+(?pm?3.7)2+(?hm?6.3)2)1/2??(1) in which ?dm represents a dispersion parameter of a monomer, ?pm represents a polarity parameter of a monomer, ?hm represents a hydrogen bonding parameter of a monomer, and R represents a distance of Hansen solubility parameters, and at least one of the monomers (a1) showing a difference of R between the monomer (a1) and a compound in which an acid is removed from the monomer (a1) in the range of not less than 5.

Abstract: A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 each independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, R3 represents a hydrogen atom, a fluorine atom, a C1 to C12 alkyl group or a C1 to C12 fluorinated alkyl group, R4 represents a C1 to C12 fluorinated alkyl group, L2 represents a single bond, a C1 to C12 divalent saturated hydrocarbon group, etc., R5 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a group represented by formula (b1-1), etc., * represents a bonding site to —CR3R4; Lb2 and Lb3 each independently represent a single bond or a C1 to C22 divalent saturated hydrocarbon group; Z+ represents an organic cation.

Abstract: A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1 and R2, m and n, R3 and R4, X1, R5 and Z1+ are defined in the specification.

Abstract: A salt represented by formula (I): wherein R1 and R2 independently represent a hydrogen atom, a hydroxy group or a C1 to C12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, A1 represents a single bond, a C1 to C24 alkanediyl group or the like, and Y represents an optionally substituted C1 to C18 alkyl group or monovalent C3 to C18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO2—, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO2—.

Abstract: A compound having a group represented by formula (Ia): wherein R1 and R2 each independently represent a C1 to C8 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group that may have a substituent, and * represents a binding site.