Abstract: A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, *-A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.

Abstract: Disclosed is a salt represented by formula (I): wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X1 represents *—CO—O— or the like, where * represents a bonding site to C(R1)(R2) or C(Q1)(Q2), L1 represents a single bond or a saturated hydrocarbon group, and —CH2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—, A1 represents a divalent alicyclic hydrocarbon group which may have a substituent, Ra represents a cyclic hydrocarbon group which may have a substituent, and Z+ represents an organic cation.

Abstract: A photoresist composition comprising an acid generator and a resin which comprises one or more structural units (a1) derived from a monomer (a1) having an acid-liable group, all of monomers (a1) showing a distance of Hansen solubility parameters between the monomer (a1) and butyl acetate in the range of 3 to 5, the distance being calculated from formula (1): R=(4×(?dm?15.8)2+(?pm?3.7)2+(?hm?6.3)2)1/2??(1) in which ?dm represents a dispersion parameter of a monomer, ?pm represents a polarity parameter of a monomer, ?hm represents a hydrogen bonding parameter of a monomer, and R represents a distance of Hansen solubility parameters, and at least one of the monomers (a1) showing a difference of R between the monomer (a1) and a compound in which an acid is removed from the monomer (a1) in the range of not less than 5.

Abstract: The invention of the present application provides a compound represented by Formula (I) or a salt thereof, which exhibits an inhibitory activity against at least one kinase selected from the group consisting of Akt kinase, Rsk kinase, and S6K kinase and/or a cell proliferation inhibiting effect and is useful as a prophylactic and/or therapeutic agent for diseases associated with the above-mentioned kinases, particularly cancer.

Abstract: Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I?) and a structural unit having an acid-labile group: wherein R1 and R2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, L1 represents a group represented by formula (X1-1), etc., L11, L13, L15 and L17 each independently represent an alkanediyl group, L12, L14, L16 and L18 each independently represent —O—, —CO—, CO—O—, —O—CO— or —O—CO—O—, and * and ** are bonds, and ** represents a bond to an iodine atom.

Abstract: A process for producing a photoresist pattern comprising steps (1) to (5); (1) applying a photoresist composition onto a substrate, said photoresist composition comprising an acid generator and a resin which comprises a structural unit having an acid-liable group; (2) drying the applied composition to form a composition layer; (3) exposing the composition layer; (4) heating the exposed composition layer; and (5) developing the heated composition layer with a developer which comprises butyl acetate, wherein a distance of Hansen solubility parameters between the resin and butyl acetate is from 3.3 to 4.3, the distance is calculated from formula (1): R=(4×(?dR?15.8)2+(?pR?3.7)2+(?hR?6.3)2)1/2??(1) in which ?dR represents a dispersion parameter of the resin, ?pR represents a polarity parameter of the resin, ?hR represents a hydrogen bonding parameter of the resin, and R represents the distance, and a film retention ratio of the photoresist pattern relative to the composition layer is adjusted to 65% or more.

Abstract: A resist composition which contains a resin (A1) which has a structural unit represented by formula (I), a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 and R2 independently represent a hydrogen atom, a halogen atom or a C1-6 alkyl group that may have a halogen atom, Ra25 represents a carboxy group, a cyano group or a C1-4 aliphatic hydrocarbon group, A1 represents a single bond, *-A2-O—, *-A2-CO—O—, etc., A2 and A3 independently represents a C1-6 alkanediyl group, and w1 represents an integer of 0 to 8, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g—, L2 and L3 independently represent a C1-12 divalent hydrocarbon group, g represent 0 or 1, R3 represents a C1-12 liner or branched alkyl group except for a tertiary alkyl group and * represents a binding position to an oxygen atom.

Abstract: A salt capable of producing a resist pattern with excellent line edge roughness is represented by formula (I): wherein, R1 represents —(X1—O)o—R5, and o represents an integer of 0 to 6, R5 represents a hydrocarbon group having 1 to 12 carbon atoms, X1 represents a divalent hydrocarbon group having 2 to 12 carbon atoms, R2 represents an alkyl group having 1 to 12 carbon atoms or the like, I represents an integer of 0 to 3, and when I is 2 or more, a plurality of R2 may be the same or different from each other, R3 and R4 each represent a hydrogen atom or the like, m and n each represent 1 or 2, X0 represents a single bond, —CH2—, —O— or —S—, and R6 and R7 each represent an alkyl group having 1 to 4 carbon atoms which has a fluorine atom or the like.

Abstract: A salt represented by formula (I) and a resist composition including the salt are described. wherein, in formula (I), Q1 and Q2 each independently represent a fluorine atom or the like, R1 and R2 each independently represent a hydrogen atom or the like, Z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O—, L1 represents a single bond or an alkanediyl group having 1 to 6 carbon atoms, A1 represents a divalent cyclic hydrocarbon group having 3 to 36 carbon atoms which may have a substituent, L2 represents a single bond, a carbonyl group or an alkanediyl group having 1 to 6 carbon atoms, A2 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, R3, R4 and R5 each independently represent a saturated hydrocarbon group having 1 to 6 carbon atoms, and Z+ represents an organic cation.

Abstract: In a power control device for a vehicle in which an electric motor for driving the vehicle to travel is supplied with power from a battery mounted on the vehicle and a fuel cell, a control unit sets a target charging rate (SOCt) of the battery in such a manner that the target charging rate decreases as a remaining fuel amount (Qf) of the fuel cell decreases after the power generation of the fuel cell is started during high-output/high-speed travelling and controls a power generation output (Pf) of the fuel cell based on a difference between the target charging rate (SOCt) and a current charging rate (SOC).

Abstract: A salt represented by formula (I): In formula (I), R1, R2, R3 and R4 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R5, R6 and R7 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—, m5 represents an integer of 0 to 3, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, R8 and R9 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—, and Al? represents an organic anion.

Abstract: Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I): In formula (I), R1, R2, R3, R4 and R5 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R6, R7 and R8 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—, m5 represents an integer of 1 to 5, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, m8 represents an integer of 0 to 4, and AI? represents an organic anion.

Abstract: An exhaust heat recovery structure includes a first pipe through which exhaust gas from an engine flows; a second pipe that branches from the first pipe, the second pipe including a heat exchanger that implements heat exchange with the exhaust gas; and an opening and closing valve provided at the first pipe, the opening and closing valve adjusting flow amounts of the exhaust gas flowing into the second pipe, wherein the first pipe includes a first pipe body and a second pipe body that, are adjacent in a flow direction of the exhaust gas, and a join portion between the first pipe body and the second pipe body is provided along a circumferential direction of the first pipe.

Abstract: The invention of the present application provides a compound represented by Formula (I) or a salt thereof, which exhibits an inhibitory activity against at least one kinase selected from the group consisting of Akt kinase, Rsk kinase, and S6K kinase and/or a cell proliferation inhibiting effect and is useful as a prophylactic and/or therapeutic agent for diseases associated with the above-mentioned kinases, particularly cancer.

Abstract: Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I) and a structural unit having an acid-labile group: wherein R1 represents a hydrocarbon group which may have a substituent, R2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, L1 represents a group represented by formula (L1-1), etc., L11, L13, L15 and L17 each independently represent an alkanediyl group, L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, etc., * and ** are bonds, and ** represents a bond to an iodine atom.

Abstract: An anti-counterfeiting medium includes a recording medium, a polarizer layer arranged on a part of the recording medium. The polarizer layer is formed thereon with a low extinction-ratio area that forms an image portion where a polarizer exhibits an extinction ratio lower than in a portion other than the low extinction-ratio area of the polarizer layer. The recording medium is formed thereon with an image portion that is a part of the recording medium and has a nature different from that of a portion other than the part of the recording medium.

Abstract: The present invention can provide a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition.

Abstract: A salt represented by formula (I): in which X represents an oxygen atom, a sulfur atom or —N(SO2R5)—; R5 represents a C1-C12 alkyl group which can have a fluorine atom and in which a methylene group can be replaced by an oxygen atom or a carbonyl group, a C3-C12 cycloalkyl group which can have a fluorine atom, or a C6-C12 aromatic hydrocarbon group which can have a fluorine atom; Ar represents a C6-C36 aromatic hydrocarbon group which can have a substituent or a C4-C36 heteroaromatic hydrocarbon group which can have a substituent; R1 and R2 each independently represent a hydrogen atom, a hydroxy group, or a C1-C12 hydrocarbon group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; “m” and “n” each independently represent 1 or 2; R3 and R4 each independently represent a hydrogen atom or a C1-C12 hydrocarbon group, R3 and R4 may be bonded to form a ring, or R3 or R4 may form a ring together with Ar; and A? represents an organic anion which has an acid-labile group, an orga

Abstract: The present invention can provide a salt and a resist composition including the salt, capable of producing a resist pattern with satisfactory line edge roughness (LER). A salt represented by formula (I): wherein R1 and R2 each represent a chain hydrocarbon group which may have a substituent, an alicyclic hydrocarbon group which may have a substituent or an aromatic hydrocarbon group which may have a substituent, or R1 and R2 are bonded each other to form a ring together with sulfur atoms to which they are bonded, R3, R4 and R5 each independently represent a hydrogen atom, a fluorine atom or a hydrocarbon group having 1 to 12 carbon atoms, —CH2— included in the hydrocarbon group may be replaced by —O— or —CO—, and A? represents a counter anion.

Abstract: An anti-counterfeiting medium includes a recording medium, a polarizer layer arranged on a part of the recording medium. The polarizer layer is formed thereon with a low extinction-ratio area that forms an image portion where a polarizer exhibits an extinction ratio lower than in a portion other than the low extinction-ratio area of the polarizer layer. The recording medium is formed thereon with an image portion that is a part of the recording medium and has a nature different from that of a portion other than the part of the recording medium.