Publication number: 20230266666
Abstract: Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, —CH2— included in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ? m1 + m7 ? 5, 0 ? m2 + m8 ? 4, 0 ? m3 + m9 ? 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X7 represents a single bond, —CH2—, —O—, —S—, etc., and Al— represents an organic anion.
Type:
Application
Filed:
August 26, 2022
Publication date:
August 24, 2023
Applicant:
SUMITOMO CHEMICAL COMPANY, LIMITED
Inventors:
Katsuhiro KOMURO, Saki KATO, Koji ICHIKAWA