Patents by Inventor Koji Ichikawa

Koji Ichikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20220146930
    Abstract: Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X0 represents *—CO—O—, *—O—CO—, etc.; L1 represents a single bond or a hydrocarbon group which may have a substituent; Ar represents an aromatic hydrocarbon group which may have a substituent; X1 represents an oxygen atom or a sulfur atom; R1 represents a halogen atom or a haloalkyl group; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m1 represents an integer of 1 to 6; m2 represents an integer of 0 to 4; and Z+ represents an organic cation.
    Type: Application
    Filed: November 2, 2021
    Publication date: May 12, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20220146931
    Abstract: Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X1 and X2 each represent *—CO—O—, *—O—CO—, etc.; L1 represents a single bond or a hydrocarbon group which may have a substituent; A1 represents a group having a lactone structure which may have a substituent; L2 and L3 each represent a single bond or an alkanediyl group; R1 represents an iodine atom or a haloalkyl group; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z+ represents an organic cation.
    Type: Application
    Filed: November 8, 2021
    Publication date: May 12, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • CARBOXYLATE, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20220146935
    Abstract: Provided are a carboxylate capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition. Disclosed are a carboxylate represented by formula (I) and a resist composition: wherein Ar represents an aromatic hydrocarbon group having 6 to 18 carbon atoms which may have a substituent, X1 represents an oxygen atom or a sulfur atom, R1 represents a halogen atom or a haloalkyl group having 1 to 12 carbon atoms, R2 represents a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH2— included in the haloalkyl group and the alkyl group may be replaced by —O— or —CO—, m1 represents an integer of 1 to 6, m2 represents an integer of 0 to 4, and Z+ represents an organic cation.
    Type: Application
    Filed: November 8, 2021
    Publication date: May 12, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko SHIMADA, Koji ICHIKAWA
  • Photoresist composition and process for producing photoresist pattern
    Patent number: 11327399
    Abstract: A photoresist composition comprising a resin which comprises a structural unit represented by the formula (I): and a salt represented by the formula (B1):
    Type: Grant
    Filed: May 30, 2018
    Date of Patent: May 10, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Masahiko Shimada, Koji Ichikawa
  • Resin, resist composition and method for producing resist pattern
    Patent number: 11261273
    Abstract: Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I?) and a structural unit having an acid-labile group: wherein R1 and R2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, L1 represents a group represented by formula (X1-1), etc., L11, L13, L15 and L17 each independently represent an alkanediyl group, L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, —O—CO— or —O—CO—O—, and * and ** are bonds, and ** represents a bond to an iodine atom.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: March 1, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Satoshi Yamaguchi, Koji Ichikawa
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20220011667
    Abstract: Disclosed are a salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent I or F, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, a haloalkyl group or a hydrocarbon group, X1, X2 and X3 each represent O or S, m1 and m7 represent an integer of 0 to 5, m2, m3, m4, m5, m6, m8 and m9 represent an integer of 0 to 4, in which 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, at least one of m1, m2, m3 represents an integer of 1 or more, X4 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—, and AI? represents an organic anion.
    Type: Application
    Filed: June 22, 2021
    Publication date: January 13, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20220011668
    Abstract: A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10, —O-L1-CO—O—R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, etc.; and AI? represents an organic anion.
    Type: Application
    Filed: June 28, 2021
    Publication date: January 13, 2022
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • ENGINE DEVICE
    Publication number: 20220010749
    Abstract: An engine device includes an engine including an in-cylinder injection valve and a spark plug, an exhaust gas control device, and a controller. The controller is configured to perform a last fuel injection from the in-cylinder injection valve in an expansion stroke and to set a fuel injection amount for the last fuel injection in expansion stroke injection driving, based on a coolant start temperature, post-start time, and volumetric efficiency. The expansion stroke injection driving is a control that is performed by performing the ignition by the spark plug in synchronization with the fuel injection in the expansion stroke.
    Type: Application
    Filed: June 24, 2021
    Publication date: January 13, 2022
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Masanao IDOGAWA, Takahiro UCHIDA, Koji ICHIKAWA, Hiroaki MIZOGUCHI, Takuya OKUBO, Sohichi IMAI, Hirokazu ANDOH
  • Compound, resin, resist composition and method for producing resist pattern
    Patent number: 11214635
    Abstract: Disclosed is a compound represented by formula (I): in formula (I), R1 and R2 each independently represent a hydrogen atom or a methyl group, X1 and X2 each independently represent a group represented by any one of formula (X1?1) to formula (X1?8): A1 and A2 each independently represent an aliphatic hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the aliphatic hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—, and R3 represents a hydrocarbon group having 1 to 24 carbon atoms which may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —S(O)2—.
    Type: Grant
    Filed: January 26, 2018
    Date of Patent: January 4, 2022
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Satoshi Yamaguchi, Koji Ichikawa
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210387944
    Abstract: A salt represented by formula (I), a generator and a resist composition: wherein R1 and R2 each independently represent an iodine atom, a fluorine atom or an alkyl fluoride group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, a hydroxy group, a haloalkyl group having 1 to 12 carbon atoms or an alkyl group having 1 to 12 carbon atoms, —CH2— included in the haloalkyl group and the alkyl group may be replaced by —O—, —CO—, —S— or —SO2?; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents 1 to 5, m2 and m8 represent 0 to 5, and m4, m5 and m7 represent an integer of 0 to 4, in which 1?m1+m7?5, 0?m2+m8?5; and AI? represents an organic anion.
    Type: Application
    Filed: May 3, 2021
    Publication date: December 16, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210389672
    Abstract: Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein R1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; L1 represents a single bond or —CO—O*; R3 represents an alkyl group, and —CH2— included in the group may be replaced by —O— or —CO; R4 represents a fluorine atom, an alkyl fluoride group or an alkyl group, and —CH2—included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—; R5 represents a hydrogen atom, an alkylcarbonyl group or an acid-labile group; m2 and m3 represent an integer of 1 to 3, m4 represents an integer of 0 to 2, and m5 represents 1 or 2, in which 3?m2+m3+m4+m5?5.
    Type: Application
    Filed: May 26, 2021
    Publication date: December 16, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro MASUYAMA, Takuya NAKAGAWA, Koji ICHIKAWA
  • COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210389669
    Abstract: Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein R1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, R2 and R3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—, R5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2?m2+m4+m5?5.
    Type: Application
    Filed: May 27, 2021
    Publication date: December 16, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro MASUYAMA, Takuya NAKAGAWA, Koji ICHIKAWA
  • Resin, resist composition and method for producing resist pattern
    Patent number: 11198748
    Abstract: Disclosed is a resin comprising a structural unit derived from a compound represented by formula (I) and a structural unit having an acid-labile group: wherein R1 represents a hydrocarbon group which may have a substituent, R2 each independently represent an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom, Ar represents an aromatic hydrocarbon group which may have a substituent, L1 represents a group represented by formula (L1-1), etc., L11, L13, L15 and L17 each independently represent an alkanediyl group, L12, L14, L16 and L18 each independently represent —O—, —CO—, —CO—O—, etc., * and ** are bonds, and ** represents a bond to an iodine atom.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: December 14, 2021
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Satoshi Yamaguchi, Koji Ichikawa
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210371376
    Abstract: A salt represented by formula (I): wherein R1 and R2 each independently represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10; L1 represents an alkanediyl group having 1 to 6 carbon atoms; R4, R5, R7 and R8 each independently represent a halogen atom, an alkyl fluoride group having 1 to 12 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, the hydrocarbon group may have a substituent, and —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—; R10 represents an acid-labile group; X1 and X2 each independently represent an oxygen atom or a sulfur atom; m1 represents an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4, m5 and m7 represent an integer of 0 to 4; and AI? represents an organic anion.
    Type: Application
    Filed: May 18, 2021
    Publication date: December 2, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Jun OGUMA, Koji ICHIKAWA
  • CARBOXYLATE, QUENCHER, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210371377
    Abstract: A carboxylate represented by formula (I), a quencher and a resist composition including the same: wherein R1, R2 and R3 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group which may have a substituent, —CH2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO2—, m1 represents an integer of 0 to 5, m2 represents an integer of 0 to 4, m3 represents an integer of 0 to 3, and X1 represents a single bond, —CH2—, —O—, —S—, —CO—, —SO— or —SO2—.
    Type: Application
    Filed: May 3, 2021
    Publication date: December 2, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Koji ICHIKAWA
  • SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210341836
    Abstract: A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10, L1 represents an alkanediyl group, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R10 represents an acid-labile group, X1, X2 and X3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1?m1+m7?5, 0?m2+m8?5, 0?m3+m9?5, and AI? represents an organic anion.
    Type: Application
    Filed: April 16, 2021
    Publication date: November 4, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro KOMURO, Takashi NAKAKOJI, Koji ICHIKAWA
  • RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210311392
    Abstract: Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):
    Type: Application
    Filed: February 26, 2021
    Publication date: October 7, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuji KITA, Nobuhiko NISHITANI, Koji ICHIKAWA
  • RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210286261
    Abstract: Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):
    Type: Application
    Filed: February 15, 2021
    Publication date: September 16, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yukako ANRYU, Satoshi YAMAGUCHI, Koji ICHIKAWA
  • RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    Publication number: 20210286260
    Abstract: Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator: wherein, in formula (I), R1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms, m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R1 may be the same or different from each other.
    Type: Application
    Filed: February 15, 2021
    Publication date: September 16, 2021
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yukako ANRYU, Satoshi YAMAGUCHI, Koji ICHIKAWA
  • Compound, resin and photoresist composition
    Patent number: 11119408
    Abstract: A resin comprising a structural unit represented by formula (I0): wherein A1, A2 and A3 each independently represent a C2-C18 divalent hydrocarbon group, R1, R2, R3 and R4 each independently represent a hydrogen atom or a C1-C6 saturated hydrocarbon group, X1 and X2 each independently represent *—O—CO—, —O—CO—O— or —O—, and * represents a binding site to A2 or A3.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: September 14, 2021
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hiromu Sakamoto, Koji Ichikawa