Patents by Inventor Koji Maeda

Koji Maeda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210324226
    Abstract: A protective composition contains a water-soluble polyester resin including a polyvalent carboxylic acid residue and a polyvalent alcohol residue. The polyvalent carboxylic acid residue includes: a polyvalent carboxylic acid residue having a metal sulfonate group; and a naphthalene dicarboxylic acid residue. The proportion of the polyvalent carboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 25 mol % to 70 mol %. The proportion of the naphthalene dicarboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 30 mol % to 75 mol %.
    Type: Application
    Filed: March 9, 2020
    Publication date: October 21, 2021
    Inventors: Teru SAKAKIBARA, Shinya KOMABIKI, Koji MAEDA, Hidehiko KARASAKI
  • Publication number: 20210280777
    Abstract: A substrate processing apparatus includes a processing chamber where a substrate support on which a substrate is placed and a target holder configured to hold a target are disposed, a freezing device disposed with a gap with respect to a bottom surface of the substrate support and having a chiller and a cold heat medium laminated on the chiller, and a rotating device configured to rotate the substrate support. The substrate processing apparatus further includes a first elevating device configured to raise and lower the substrate support, a coolant channel formed in the chiller to supply a coolant to the gap, and a cold heat transfer material disposed in the gap and being in contact with the substrate support and the cold heat medium so as to transfer heat therebetween.
    Type: Application
    Filed: March 5, 2021
    Publication date: September 9, 2021
    Inventors: Manabu NAKAGAWASAI, Koji MAEDA, Shinji ORIMOTO, Motoi YAMAGATA
  • Publication number: 20210269953
    Abstract: A sewing control device includes in a sewing machine having upper feed function a control device which controls feed of an object to be sewn. A lower feed amount setting motor sets a feed amount of a lower feed dog and an upper feed amount change motor changes a feed amount of an upper feed dog. A feed execution range, in which the feed of the object to be sewn is executed by an appropriate feed amount while the object to be sewn is sandwiched between the lower feed dog and the upper feed dog, and a feed non-execution range, in which the feed of the object to be sewn is not executed in a state in which the feed dogs do not act on the object to be sewn, are present. The feed amount of the upper feed dog can be changed only in the feed non-execution range during sewing.
    Type: Application
    Filed: December 3, 2020
    Publication date: September 2, 2021
    Inventors: Tatsuo Takei, Yoshitaka Bamba, Koji Maeda
  • Publication number: 20210210374
    Abstract: To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.
    Type: Application
    Filed: March 25, 2021
    Publication date: July 8, 2021
    Inventors: Haiyang Xu, Koji Maeda, Mitsuhiko Inaba
  • Publication number: 20210148027
    Abstract: [Purpose] To obtain a sewing machine comprising a device with which it is possible to easily perform a threading operation in which a needle thread is inserted into the needle hole of the sewing machine needle, wherein the sewing machine comprises a threading device configured so that the needle thread does not drop onto or coil around an operation part (operation part) of the operation lever of the threading device when a thread-hooking operation is completed before insertion of the needle thread. [Configuration] The present invention comprises: a needle bar 52; a threading shaft 53; a thread-holding tool 71; a threading tool 72 provided at the bottom end of the threading shaft 53; an operation lever 4 that has an operation part 41 and moves the threading shaft 53 up and down and rotates the threading shaft in the circumferential direction; and a cutting tool 93 for the needle thread n.
    Type: Application
    Filed: June 13, 2019
    Publication date: May 20, 2021
    Inventors: Toyohiro AZUMA, Takuya SAWADA, Koji MAEDA
  • Patent number: 10991615
    Abstract: To detach a substrate from a table without damaging the substrate. According to Embodiment 1, provided is a substrate processing apparatus including a table to hold a substrate, a plurality of lift pins that are arranged at periphery of the table and configured to arrange or separate the substrate on or from the table and to be movable in a direction perpendicular to a surface of the table, a drive mechanism that includes a motor to move the lift pins in the direction perpendicular to the surface of the table, and a control device that is configured to control the drive mechanism. The control device is configured to be capable of moving the lift pins at a first speed and at a second speed different from the first speed.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: April 27, 2021
    Assignee: EBARA CORPORATION
    Inventors: Haiyang Xu, Koji Maeda, Mitsuhiko Inaba
  • Patent number: 10903093
    Abstract: A heating device includes: a baseplate; a faceplate provided above the baseplate, the faceplate including a film heater configured to heat a wafer mounted on an upper surface of the faceplate; a sleeve provided between the baseplate and the faceplate, the sleeve including a sleeve body having a vertical through-hole; and a support bolt penetrating the through-hole in the sleeve to support the faceplate on the baseplate, in which a distance from a central axis of the through-hole in the sleeve to a flat surface of an outer portion of the sleeve is less than a distance from the central axis of the through-hole to a locking surface of an inner portion of the sleeve.
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: January 26, 2021
    Assignee: KELK Ltd.
    Inventors: Kazuhiko Kubota, Atsushi Kinoshita, Koji Maeda, Keisuke Ishii
  • Publication number: 20210005486
    Abstract: A substrate transfer apparatus for transferring a substrate includes a plurality of vacuum transfer chambers, each having therein a substrate transfer mechanism for holding and transferring the substrate, and an intermediate chamber disposed between the vacuum transfer chambers adjacent to each other. When one of the vacuum transfer chambers adjacent to each other is set as a first vacuum transfer chamber and the other is set as a second vacuum transfer chamber, a first substrate loading/unloading port is disposed between the intermediate chamber and the first vacuum transfer chamber and a second substrate loading/unloading port is disposed between the intermediate chamber and the second vacuum transfer chamber. A gate valve is provided only for the second substrate loading/unloading port. Further, the first and the second substrate loading/unloading port have different height positions.
    Type: Application
    Filed: July 2, 2020
    Publication date: January 7, 2021
    Inventors: Keita HORIUCHI, Koji MAEDA, Morihiro TAKANASHI
  • Patent number: 10868501
    Abstract: A wireless receiver and a wireless reception method provide: to determine a gain based on a first resistor having a first temperature characteristic and a second resistor having a second temperature characteristic different from the first resistance; to output an output of the first resistor and an output of the second resistor, or a ratio between the output of the first resistor and the output of the second resistor; and to switches the gain of the first circuit based on the outputs or the ratio between the outputs.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: December 15, 2020
    Assignee: DENSO CORPORATION
    Inventors: Takashi Matsumoto, Yusuke Wachi, Koji Maeda
  • Publication number: 20200388510
    Abstract: A substrate processing apparatus includes a first processing unit and a second processing unit placed in upper and lower two stages. Each processing unit has: a plurality of processing tanks arranged in series; a partition wall defining a conveyance space extending along an arrangement direction outside the plurality of processing tanks; a conveyance mechanism placed in the conveyance space and being configured to convey a substrate between the processing tanks along the arrangement direction; and an air guide duct provided to extend along the arrangement direction in the conveyance space. The air guide duct is connected with a fan filter unit. Each of the processing tanks is connected with an exhaust duct. An opening is formed in each of parts facing the processing tank in the air guide duct. The conveyance spaces of the first and second processing units are separated into upper and lower segments by the partition wall.
    Type: Application
    Filed: August 9, 2018
    Publication date: December 10, 2020
    Inventors: Koji MAEDA, Mitsuhiko INABA, Haiyang XU, Tetsuya YASHIMA
  • Publication number: 20200373133
    Abstract: A stage device for holding a substrate in a processing apparatus for processing the substrate includes a stage, a stage rotating mechanism, and a cold heat transfer mechanism. The stage is configured to hold the substrate in a processing chamber. The stage rotating mechanism includes a rotation shaft extending downward from a center of a bottom surface of the stage and a motor configured to rotate the stage via the rotation shaft. The cold heat transfer mechanism includes at least one cold heat transfer body that is fixedly disposed at a position spaced away from the rotation shaft below the stage and is configured to transfer cold heat of a chiller. The cold heat transfer mechanism is disposed with a gap between the cold heat transfer mechanism and the stage.
    Type: Application
    Filed: May 22, 2020
    Publication date: November 26, 2020
    Inventors: Tatsuo HATANO, Naoki WATANABE, Koji MAEDA
  • Patent number: 10818531
    Abstract: A substrate transport system includes a hand, a main positioning member permanently mounted on a base, where the main positioning member is engageable with the hand at a position offset by a first distance in the first axis direction and offset by a second distance in the second axis direction from a substrate transfer position, and a control unit that stores a position coordinate in the first axis direction and a position coordinate in the second axis direction of the hand in a state where the hand is positioned by being engaged with the main positioning member.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: October 27, 2020
    Assignee: EBARA CORPORATION
    Inventors: Kuniaki Yamaguchi, Haiyang Xu, Koji Maeda, Mitsuhiko Inaba
  • Patent number: 10787759
    Abstract: In order to improve detachability of a needle plate, a needle plate detachable mechanism has a needle plate which is provided on a bed part of the sewing machine and made of a magnetic body; a magnet which is provided below the needle plate for fixing the needle plate by magnetic force; and a magnetic force changing mechanism which is connected with the magnet for changing the magnetic force acting on the needle plate by relatively moving the magnet with respect to the needle plate.
    Type: Grant
    Filed: March 8, 2019
    Date of Patent: September 29, 2020
    Assignee: JANOME SEWING MACHINE CO., LTD.
    Inventors: Saki Ishikawa, Koji Maeda
  • Patent number: 10787758
    Abstract: In order to prevent a replacement of the needle plate in the situation not suitable for replacing the needle plate, a needle plate detachable mechanism has a needle plate fixing unit capable of being switched between a fixed state where a needle plate is fixed to a sewing machine body and an unfixed state where the fixed state is released; and a switching mechanism which is connected with the needle plate fixing unit for switching the needle plate fixing unit between the fixed state and the unfixed state, wherein the needle plate fixing unit is prevented from being switched when the needle is positioned below an upper surface of the needle plate or when the sewing machine motor is driven.
    Type: Grant
    Filed: March 8, 2019
    Date of Patent: September 29, 2020
    Assignee: JANOME SEWING MACHINE CO., LTD.
    Inventors: Saki Ishikawa, Koji Maeda
  • Patent number: 10688622
    Abstract: A substrate processing apparatus is provided with a polishing part that polishes a substrate, a transporting part that transports a substrate before polishing to the polishing part, and a cleaning part that cleans the polished substrate. The cleaning part has a first cleaning unit and a second cleaning unit that are vertically arranged in two stages. The first cleaning unit and the second cleaning unit each have a plurality of cleaning modules that are arranged in series. The transporting part has a slide stage that is disposed between the first cleaning unit and the second cleaning unit, and transports a substrate before polishing along an arrangement direction of the plurality of cleaning modules.
    Type: Grant
    Filed: June 6, 2017
    Date of Patent: June 23, 2020
    Assignee: Ebara Corporation
    Inventors: Hiroshi Aono, Kuniaki Yamaguchi, Hiroshi Shimomoto, Koji Maeda, Tetsuya Yashima, Kenji Shinkai, Koichi Hashimoto, Mitsuhiko Inaba, Hidetatsu Isokawa, Hidetaka Nakao, Soichi Isobe
  • Publication number: 20200176281
    Abstract: Various methods of cleaning a substrate are provided. In one aspect, method of cleaning a substrate, comprising: holding and rotating a substrate by a substrate holder; and supplying a chemical liquid to a chemical liquid nozzle and supplying two fluids to a two-fluid nozzle while moving the chemical-liquid nozzle and the two-fluid nozzle radially outwardly from the center to the periphery of the substrate, wherein the distance of the chemical-liquid nozzle from a rotating axis of the substrate holder is longer than the distance of the two-fluid nozzle from the rotating axis of the substrate holder while the chemical-liquid nozzle and the two-fluid nozzle are moved radially outwardly from the rotating axis of the substrate holder.
    Type: Application
    Filed: February 3, 2020
    Publication date: June 4, 2020
    Inventors: Koji MAEDA, Hiroshi SHIMOMOTO, Hisajiro NAKANO, Masayoshi IMAI, Yoichi SHIOKAWA
  • Patent number: 10666828
    Abstract: An image forming apparatus includes a display section, a display controller, a reading section, an image detector, and a determining section. The display controller controls the display section. The reading section reads multiple documents placed on a specific surface of the image forming apparatus in a batch and generates whole image data indicating a whole image as a result of reading. The image detector detects document images corresponding to the documents based on the whole image data. The determining section determines whether or not batch reading of the documents has succeeded based on a result of detection of the document images. The display controller controls the display section such that the display section displays the document images in a first display format when the determining section determines that the reading has not succeeded, or in a second display format when the determining section determines that the reading has succeeded.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: May 26, 2020
    Assignee: KYOCERA Document Solutions Inc.
    Inventor: Koji Maeda
  • Publication number: 20200135434
    Abstract: A stage device includes a stage configured to hold a target substrate in a vacuum chamber, a cold heat transfer body fixedly disposed below a bottom surface of the stage with a gap between the stage and the cold heat transfer body and cooled to an extremely low temperature by a chiller disposed below the cold heat transfer body, and cooling fluid supplied to the gap to transfer cold heat of the cold heat transfer body to the stage. The stage device further includes a stage support configured to rotatably support the stage and formed in a cylindrical shape to surround an upper part of the cold heat transfer body wherein the stage support has a vacuum insulation structure, and a rotation part configured to support the stage support and rotated by a driving mechanism while being sealed with magnetic fluid.
    Type: Application
    Filed: October 22, 2019
    Publication date: April 30, 2020
    Inventors: Manabu NAKAGAWASAI, Naoyuki SUZUKI, Shinji ORIMOTO, Hiroyuki YOKOHARA, Motoi YAMAGATA, Koji MAEDA
  • Patent number: 10587968
    Abstract: [Problem] In the case where an audio signal of the same source is output from a plurality of speakers, the speakers are adjusted so that the audio signals become optimal at a listening position. [Solution] Processing in which an audio signal output from a wireless speaker 1 is collected by a microphone of a controller 2 carried by a listener and a delay time is measured that is the difference between an output time of the audio signal from the wireless speaker 1 and an input time of the audio signal to the microphone of the controller 2 is performed on a plurality of the wireless speakers 1 that output an audio signal of the same source, and the delay times of the audio signals from these respective wireless speakers 1 are measured. Output timings of these respective wireless speakers 1 are adjusted on the basis of these delay times.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: March 10, 2020
    Assignee: D&M Holdings, Inc.
    Inventor: Koji Maeda
  • Publication number: 20200073858
    Abstract: A system is provided whereby a user can easily distinguish, in an editing history, an edit content being applied to an image and an edit content not being applied to the image. An image processing apparatus includes an editing unit configured to edit an image according to user's operation, a storage unit configured to store, in a storage medium, an editing history indicating an edit content executed by the editing unit by associating the editing history with the image. A display processing unit is configured to display each edit content on a screen in a different manner depending on being applied to the image or not being applied to the image.
    Type: Application
    Filed: August 23, 2019
    Publication date: March 5, 2020
    Inventors: Koji Maeda, Shigeyuki Mitani, Hiroyuki Owatari, Yumiko Kuno