Abstract: A method and system for modifying a gate dielectric stack by exposure to a plasma. The method includes providing the gate dielectric stack having a high-k layer formed on a substrate, generating a plasma from a process gas containing an inert gas and one of an oxygen-containing gas or a nitrogen-containing gas, where the process gas pressure is selected to control the amount of neutral radicals relative to the amount of ionic radicals in the plasma, and modifying the gate dielectric stack by exposing the stack to the plasma.

Abstract: On a substrate provided with a transistor, an electrode pad for product connected electrically to the transistor is formed. A metal bump is provided on a surface of the electrode pad for product. An electrode pad for test to be used specifically for a wafer-level burn-in, which is connected electrically to the transistor, is further formed on the substrate.

Abstract: On a substrate provided with a transistor, an electrode pad for product connected electrically to the transistor is formed. A metal bump is provided on a surface of the electrode pad for product. An electrode pad for test to be used specifically for a wafer-level burn-in, which is connected electrically to the transistor, is further formed on the substrate.

Abstract: An ultrasonic lithotripter comprising a first transmission probe which has a hollow portion in the form of a through hole and transmits ultrasonic vibration and a superfine second transmission probe which can be passed through the hollow portion of the first transmission probe. An object of manipulation is held by means of the second transmission probe as it is manipulated by means of the first transmission probe.

Abstract: On a substrate provided with a transistor, an electrode pad for product connected electrically to the transistor is formed. A metal bump is provided on a surface of the electrode pad for product. An electrode pad for test to be used specifically for a wafer-level burn-in, which is connected electrically to the transistor, is further formed on the substrate.

Abstract: An electric operation apparatus includes a high-frequency generating device which generates high-frequency current for treating the body anatomy, an active electrode which supplies to the body anatomy, the high-frequency current generated by the high-frequency generating device, a solution supply device which supplies a conductive solution around the active electrode, a return electrode which returns, via the conductive solution supplied by the solution supply device, the high-frequency current supplied to the body anatomy from the active electrode in the conductive solution, a sensor which detects a conductive state of the high-frequency current that flows between the active electrode and the return electrode, and a control device which determines a state of bubbles generated around the active electrode and which changes an operation mode, based on the conductive state of the high-frequency current detected by the sensor.

Abstract: A combustion apparatus (1) is generally composed of a principal part (5), a supplementary part (6) and a burner port assembly (3). Four metal plates (7,8,10,11) constituting the principal and supplementary parts (5,6) are pressed to have in them several protuberances and recesses. These metal plates are laid one on another to form in them some hollow spaces and sealed regions. These hollow spaces communicate with each other to form a thin gas passage (22) together with a thick gas passage (73) in this combustion apparatus (1) in such a manner that its condition of thick and thin fuel combustion is rendered more stable.

Abstract: An endoscopic lithotripsy probe apparatus includes a probe, ultrasonic-vibration source, mechanical shock generation source, and switch-mechanism. The ultrasonic-vibration source is detachably attached to the probe to transmit an ultrasonic-vibration to the probe in a state in which the proximal end of the probe is connected to the ultrasonic-vibration source. The mechanical shock generation source, which is disposed on the side of the proximal end of the probe, applies a force to the ultrasonic-vibration source in a state in which the ultrasonic-vibration source is detached from the proximal end of the probe, and allows the ultrasonic-vibration source to collide with the proximal end of the probe so that a mechanical shock is applied to the probe. The switch-mechanism switches a state in which the ultrasonic-vibration from the ultrasonic-vibration source is transmitted to the probe and a state in which the mechanical shock from the mechanical shock generation source is transmitted.

Abstract: A combustion apparatus (1) with a burner port assembly (3) comprises an elongated first array of main burner ports (53) for jetting and burning a fuel gas mixture of a concentration to make main flames. The combustion apparatus (1) comprises at least one second arrays of auxiliary burner ports (63) for jetting and burning a further fuel gas mixture of a different concentration to make auxiliary flames, wherein the second arrays of said auxiliary burner ports (63) extend along the first array of said main burner ports (53). The burner port assembly (3) is constructed using inner and outer wall segments (52) together with outermost wall segments (52a,52f) or bands (58). One of the bands (58) faces the corresponding one of said outermost segments (52a,52f) so as to define between them collateral burner ports (61a,61b).

Abstract: Provided is a surgical observational system capable of effectively displaying, in the field of an operating microscope, a real-time image obtained by means of an ultrasonic probe, for example, and a slice image obtained by a preoperative diagnosis on the location of the distal end portion of the probe or a three-dimensional image of an affected region, in association with an actual observational image obtained by means of the microscope. The surgical operation observational system is provided with two monitors in the operating microscope for the observation of the affected region to be operated. Images on the two monitors are alternatively superposed on the optical path of the operating microscope.

Abstract: A calculus treatment apparatus includes first and second probe which transmit first and second mechanical energy to a distal end side thereof and pulverize a calculus by the first and second mechanical energy, and first and second mechanical energy generating devices which are arranged on a proximal end side of the first and second probes and generate the first and second mechanical energy. A probe arrangement structure is provided in which the first probe and the second probe are arranged substantially coaxially or concentrically.

Abstract: On a substrate provided with a transistor, an electrode pad for product connected electrically to the transistor is formed. A metal bump is provided on a surface of the electrode pad for product. An electrode pad for test to be used specifically for a wafer-level burn-in, which is connected electrically to the transistor, is further formed on the substrate.

Abstract: A combustion apparatus (1) is generally composed of principal part (5), a supplementary part (6) and a burner port assembly (3). Four metal plates (7,8,10,11) constituting the principal and supplementary parts (5,6) are pressed to have in them several protuberances and recesses. These metal plates are laid one on another to form in them some hollow spaces and sealed regions. These hollow spaces communicate with each other to form a thin gas passage (22) together with a thick gas passage (73) in this combustion apparatus (1) in such a manner that its condition of thick and thin fuel combustion is rendered more stable.

Abstract: A combustion apparatus (1) with a burner port assembly (3) comprises an elongated first array of main burner ports (53) for jetting and burning a fuel gas mixture of a concentration to make main flames. The combustion apparatus (1) comprises at least one second arrays of auxiliary burner ports (63) for jetting and burning a further fuel gas mixture of a different concentration to make auxiliary flames, wherein the second arrays of said auxiliary burner ports (63) extend along the first array of said main burner ports (53). The burner port assembly (3) is constructed using inner and outer wall segments (52) together with outermost wall segments (52a,52f) or bands (58). One of the bands (58) faces the corresponding one of said outermost segments (52a,52f) so as to define between them collateral burner ports (61a,61b).

Abstract: A method of forming a pattern in which production of reaction products in the interface between an organic anti-reflective coating and a radiation sensitive material coating is suppressed, the number of residues of an etchable layer formed after etching is decreased, and which provides a etched pattern having high resolution and good dimensional accuracy. According to the method, an etchable layer (11) composed of polysilicon coating an organic anti-reflective coating (12), and a radiation sensitive material coating (13) composed of a chemically amplified resist material containing as acid generators both (a) onium salt compound and (b) at least one of a sulfone compound and a sulfonate compound are formed on a semiconductor substrate (10), the radiation sensitive material coating (13) is imagewise exposed through the mask (14) and developed to form a patterned radiation sensitive material coating (13b).

Abstract: A photosensitive material film is formed by applying, on an etch target film deposited on a semiconductor substrate, a photosensitive material containing a hardly alkaline-soluble base polymer including a polymer in which a principal chain has cycloolefin and a saturated or non-saturated polycyclic alkyl group is bonded to the principal chain, and an acid generator including an onium salt compound. The photosensitive material film is irradiated with ArF excimer laser through a photomask so as to form a hole-patterned photosensitive material film. A hole pattern is formed in said etch target film by subjecting the etch target film to plasma etching using plasma at a plasma density of 1×1010/cm3 or more with the hole-patterned photosensitive material film used as an etching mask.

Abstract: A surgical microscope apparatus incorporating a frame portion placed on a floor, a microscope body for stereoscopically observing a portion to be operated, an arm portion supported by the frame portion and arranged to suspend the microscope body, and an endoscope for observing a blind spot for a stereoscopic observation field of view. The frame portion has a light source unit for generating light for illuminating a portion observed with the endoscope and a camera control unit for processing an observed image of an observed portion obtained by the endoscope. A light guide fiber extending from the light source unit to the microscope body and capable of supplying light to the endoscope, and a camera cable for transmitting the image observed with the endoscope to the camera control unit extend in the arm portion. The microscope body is provided with an end of the light guide fiber for connecting the endoscope and a camera head connected to the camera cable.

Abstract: After depositing an anti-reflection coating of an organic material for absorbing an energy beam on an etching target film formed on a semiconductor substrate, a photosensitive film of a photosensitive material including a sulfonyl compound is deposited on the anti-reflection coating. After selectively irradiating the photosensitive film with an energy beam, an exposed or unexposed portion of the photosensitive film is removed, thereby forming a patterned photosensitive film. By using the patterned photosensitive film as a mask, the etching target film is dry etched. Thus, a pattern of the etching target film is formed.

Abstract: According to the present invention, there is provided an etching method comprising the steps of forming a first thin film on a surface of a substrate to be processed, supporting the substrate to be processed, forming a second thin film serving to deactivate an active gas used for etching the first thin film, on a surface of a mask plate piece used as the first thin film mask, fixing the mask plate piece so that the first thin film and the second thin film oppose to each other with a predetermined distance therebetween, and etching the first thin film by supplying the active gas to the first thin film via the mask plate piece.

Abstract: On the surface of a protecting layer mounted on a solid state imaging devices substrate, transparent gap filler layers and a transparent flattening layer are formed to flatten a surface of overlying protecting layer. On a surface of the transparent flattening layer, color filters of red, blue and yellow are formed. The color filters are made of synthetic photosensitive material. By using the synthetic photosensitive material, the color filters are formed with good shape and precision. All of the color filter show good photo spectrography and uniform characteristics. For the reasons, excellent characteristics of the solid state imaging device are provided which are free form image inferiority caused by flicker, shading, dust and so forth.