Patents by Inventor Koji Shirakawa

Koji Shirakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200045968
    Abstract: Pyridine compounds of Formula (1) are provided: wherein R1, R2, X, Y and Het are defined. The pyridine compounds can be used to treat or prevent plant diseases.
    Type: Application
    Filed: April 10, 2018
    Publication date: February 13, 2020
    Applicant: MITSUI CHEMICALS AGRO, INC.
    Inventors: Hideki UMETANI, Shun OKAYA, Hideaki IKISHIMA, Takeshi FUKUMOTO, Akihiro NISHIDA, Masanori YANAGI, Ryohei NAITO, Koji MASUTOMI, Tomomi SHIRAKAWA, Akane SAKURADA, Satoshi YUTANI
  • Patent number: 10315716
    Abstract: A fuel cell vehicle includes a high voltage apparatus for a fuel cell, a compressor for an air conditioner disposed under the high voltage apparatus for the fuel cell and constituting a module integrated with the high voltage apparatus for the fuel cell, and a power control unit separated from the high voltage apparatus for the fuel cell, disposed at a vehicle body over the compressor and configured to control an operation of a motor. The compressor and the high voltage apparatus for the fuel cell are connected by a single power wiring.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: June 11, 2019
    Assignee: Toyota Jidosha Kabushiki Kaisha
    Inventors: Koji Katano, Tsutomu Shirakawa
  • Patent number: 9090722
    Abstract: A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.
    Type: Grant
    Filed: June 23, 2010
    Date of Patent: July 28, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Toru Fujimori, Koji Shirakawa, Toshihiro Usa, Kenji Sugiyama, Takayuki Ito, Hideaki Tsubaki, Katsuhiro Nishimaki, Shuji Hirano, Hidenori Takahashi
  • Patent number: 9034560
    Abstract: A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: May 19, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Koji Shirakawa, Tadateru Yatsuo
  • Patent number: 8900791
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(?O)—, —S(?O)—, —S(?O)2— and —OS(?O)2—, provided that —C(?O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
    Type: Grant
    Filed: March 24, 2011
    Date of Patent: December 2, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Tomotaka Tsuchimura, Koji Shirakawa, Toru Tsuchihashi, Hideaki Tsubaki
  • Publication number: 20140227642
    Abstract: A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 14, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Koji SHIRAKAWA, Tadateru YATSUO
  • Patent number: 8637222
    Abstract: A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: January 28, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Toru Tsuchihashi, Tadateru Yatsuo, Koji Shirakawa, Hideaki Tsubaki, Akira Asano
  • Patent number: 8546063
    Abstract: Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
    Type: Grant
    Filed: February 19, 2010
    Date of Patent: October 1, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Koji Shirakawa, Toru Tsuchihashi
  • Publication number: 20120094235
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (A) whose solubility in an alkali developer is increased by the action of an acid, the resin containing any of the units of general formula (AI) below and any of the units of general formula (AII) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid with any of the structures of general formula (BI) below.
    Type: Application
    Filed: May 20, 2010
    Publication date: April 19, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Toru Tsuchihashi, Hideaki Tsubaki, Koji Shirakawa, Hidenori Takahashi, Tomotaka Tsuchimura
  • Publication number: 20120006788
    Abstract: A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.
    Type: Application
    Filed: June 23, 2010
    Publication date: January 12, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Toru Fujimori, Koji Shirakawa, Toshihiro USA, Kenji Sugiyama, Takayuki Ito, Hideaki Tsubaki, Katsuhiro Nishimaki, Shuji Hirano, Hidenori Takahashi
  • Publication number: 20120003585
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises (A) any of the compounds of General Formula (I) below and (B) a resin that contains the residue (c) of a compound having an ionization potential value lower than that of phenol and when acted on by an acid, exhibits an increased solubility in an alkali developer, wherein Ar represents an aromatic ring having Cy groups and optionally further other substituents, n is an integer of 2 or greater, Cy represents a group having a substituted or unsubstituted alkyl group or a group having a substituted or unsubstituted cycloaliphatic group, provided that a plurality of Cy groups may be identical with or different from each other, and M+ represents an organic onium ion.
    Type: Application
    Filed: March 12, 2010
    Publication date: January 5, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Hideaki Tsubaki, Koji Shirakawa, Tadateru Yatsuo, Toru Tsuchihashi, Tomotaka Tsuchimura
  • Patent number: 8080362
    Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
    Type: Grant
    Filed: October 29, 2007
    Date of Patent: December 20, 2011
    Assignee: Fujifilm Corporation
    Inventors: Koji Shirakawa, Toru Fujimori, Shoichiro Yasunami
  • Publication number: 20110300485
    Abstract: Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
    Type: Application
    Filed: February 19, 2010
    Publication date: December 8, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Hideaki Tsubaki, Koji Shirakawa, Toru Tsuchihashi
  • Publication number: 20110287234
    Abstract: A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method.
    Type: Application
    Filed: January 29, 2010
    Publication date: November 24, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Toru Tsuchihashi, Tadateru Yatsuo, Koji Shirakawa, Hideaki Tsubaki, Akira Asano
  • Publication number: 20110171577
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(?O)—, —S(?O)—, —S(?O)2— and —OS(?O)2—, provided that —C(?O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
    Type: Application
    Filed: March 24, 2011
    Publication date: July 14, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Tomotaka TSUCHIMURA, Koji SHIRAKAWA, Toru TSUCHIHASHI, Hideaki TSUBAKI
  • Publication number: 20100224207
    Abstract: [Subject] To provide an eyelash curler capable of curling the entire eyelashes easily and beautifully in an ideally radial state by using the eyelash curler once. [Solving Means] An eyelash curler according to the present invention is provided with a pair of supporting columns 10, a movable member 14 in a curved shape capable of moving in the up and down direction along supporting column upper parts 10a in a linear shape of a pair of the supporting columns, an elastic body 16 attached to the movable member, a fixing member 12 in a curved shape fixed to the upper parts 10a of a pair of the supporting column and handles 18 and 22 for moving the movable member 14 in the up and down direction, a curvature radius R3 of a lower edge 12a of the fixing member 12 (excluding the vicinities of both ends) in a front view is set to 16.5 to 22.5 mm, and a curvature radius R1 of the lower edge 12a of the fixing member 12 (excluding the vicinities of the both ends) in a plan view is set to 18.5 to 24.5 mm.
    Type: Application
    Filed: March 14, 2008
    Publication date: September 9, 2010
    Applicant: KOJI HONPO CO., LTD.
    Inventors: Koji Otsuka, Koji Shirakawa
  • Patent number: 7432034
    Abstract: A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound containing: in the molecule one or more benzene rings; and at least two cross-linking groups bonded to any of the benzene rings, the cross-linking group being a group selected from the group consisting of a hydroxymethyl group, an alkoxymethyl group and an acyloxymethyl group; (B-2) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent contains at least two specific groups; and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation.
    Type: Grant
    Filed: August 18, 2003
    Date of Patent: October 7, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Shoichiro Yasunami, Koji Shirakawa
  • Publication number: 20080241745
    Abstract: A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.
    Type: Application
    Filed: March 28, 2008
    Publication date: October 2, 2008
    Applicant: FUJIFILM CORPORATION
    Inventors: Koji Shirakawa, Tadateru Yatsuo
  • Publication number: 20080096130
    Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
    Type: Application
    Filed: October 29, 2007
    Publication date: April 24, 2008
    Inventors: Koji Shirakawa, Toru Fujimori, Shoichiro Yasunami
  • Patent number: 7361446
    Abstract: A positive resist composition comprising (a) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, contains a structural unit having a group represented by formula (X) defined in the specification, has a weight average molecular weight of not more than 5,000, and contains an acid decomposable group in an amount of not more than 40% based on the sum total of a number of the acid decomposable group and a number of an alkali-soluble group not protected with the acid decomposable group, and (b) a compound that generates an acid upon irradiation of an actinic ray or radiation.
    Type: Grant
    Filed: March 30, 2004
    Date of Patent: April 22, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Koji Shirakawa, Toru Fujimori, Shoichiro Yasunami