Patents by Inventor Koki Tanaka

Koki Tanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11637020
    Abstract: An etching method includes: (a) providing a substrate that contains silicon, on a support; (b) etching the substrate with plasma generated from a first gas that includes a fluorine-containing gas, to form an etching shape having a bottom; (c) generating plasma from a second gas that includes a hydrogen fluoride (HF) gas, to selectively form a condensed or solidified layer of HF at the bottom of the etching shape; and (d) etching the bottom with the plasma generated from the second gas, by supplying a bias power to the support. During (c) and (d), a temperature of the substrate is maintained to be 0° C. or lower.
    Type: Grant
    Filed: August 10, 2021
    Date of Patent: April 25, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Koki Tanaka
  • Publication number: 20230115942
    Abstract: A substrate processing system includes: an acquiring unit that acquires a plurality of types of time-series data for each time when a plasma processing is performed on a substrate; a learning unit that generates a number of learned abnormal value detection models corresponding to a number of the plurality of types of the time-series data by calculating a data density of each of the plurality of types of time-series data acquired in a first phase; and a quantification unit that quantifies a state in a processing space in a second phase by inputting the plurality of types of time-series data acquired in the second phase into the corresponding learned abnormal value detection models, respectively, and calculating a divergence degree from the plurality of types of the time-series data acquired in the first phase.
    Type: Application
    Filed: October 7, 2022
    Publication date: April 13, 2023
    Applicant: Tokyo Electron Limited
    Inventors: Shuhei AKAHANE, Ryu NAGAI, Koki TANAKA
  • Publication number: 20230100292
    Abstract: A plasma processing method includes (a) forming a first protective film on a surface of an inner member of a chamber by a first processing gas including a precursor gas that does not contain halogen; and (b) performing plasma processing on a processing target that is carried in inside the chamber by a plasma of a second processing gas after the first protective film is formed on the surface of the member.
    Type: Application
    Filed: September 28, 2022
    Publication date: March 30, 2023
    Applicant: Tokyo Electron Limited
    Inventors: KYURI MOTOKAWA, Yuya Minoura, Muneyuki Omi, Koki Tanaka, Ryu Nagai, Nobuhiko Shirahama
  • Publication number: 20230069553
    Abstract: An etching method includes (a) providing a substrate including a carbon-containing film, the substrate being situated on a substrate support and (b) etching the substrate with a plasma to form an etching shape in the carbon-containing film, the plasma being configured to be formed from a gas containing H and O, the etching shape including a bottom. In (b), a temperature of the substrate support is adjusted to 0° C. or less.
    Type: Application
    Filed: August 25, 2022
    Publication date: March 2, 2023
    Inventor: Koki TANAKA
  • Publication number: 20230035021
    Abstract: The plasma processing method according to the present disclosure is performed in a plasma processing apparatus. The plasma processing method comprises preparing a substrate including a silicon-containing film and a carbon-containing film formed on the silicon-containing film; setting a temperature of the substrate to a first temperature of 0° C.
    Type: Application
    Filed: July 28, 2022
    Publication date: February 2, 2023
    Inventors: Masahiko YOKOI, Koki TANAKA
  • Patent number: 11505097
    Abstract: An occupant protection device, for a vehicle which protects an occupant seated on a seating surface of a seat, includes: a first push-up mechanism which pushes up a waist portion of the occupant by raising a rear portion of the seating surface; a second push-up mechanism which pushes up a thigh portion of the occupant by raising a front portion of the seating surface; and a control unit which controls operations of the first push-up mechanism and the second push-up mechanism. The control unit operates the first push-up mechanism and then operates the second push-up mechanism when an impact applied to the vehicle from the front of the seat is detected or predicted.
    Type: Grant
    Filed: October 1, 2019
    Date of Patent: November 22, 2022
    Assignee: TOYODA GOSEI CO., LTD.
    Inventors: Koki Tanaka, Takashi Iida, Shigeyuki Suzuki, Tadashi Yamada, Shigemi Mase
  • Patent number: 11383670
    Abstract: A side airbag apparatus includes an airbag that is configured to be deployed and inflated between a body side portion of a vehicle and an occupant seated in a seat in a passenger compartment by a pressure of gas supplied from an inflator. The airbag includes an outer bag and an inner bag, which is provided in the outer bag and accommodates the inflator. The inner bag includes an upper-side inflation portion, which projects forward when inflated to correspond to the shoulder of the occupant, a lower-side inflation portion, which projects forward when inflated to correspond to the lumbar region of the occupant, and a recessed portion, which is provided between the upper-side inflation portion and the lower-side inflation portion. The inner bag includes a connecting hole that connects the inside and the outside of the inner bag to each other.
    Type: Grant
    Filed: September 11, 2020
    Date of Patent: July 12, 2022
    Assignee: TOYODA GOSEI CO., LTD.
    Inventors: Shuji Yamamoto, Takashi Iida, Kenichi Fukurono, Koki Tanaka
  • Publication number: 20220093367
    Abstract: A disclosed etching method includes (a) forming a protective film on a surface in a chamber. The etching method further includes (b) etching an etch film of a substrate by using hydrogen fluoride within the chamber. The substrate includes the etch film and a mask provided on the etch film. The protective film is formed of the same type of material as a material of the mask.
    Type: Application
    Filed: September 9, 2021
    Publication date: March 24, 2022
    Applicant: Tokyo Electron Limited
    Inventors: Koki TANAKA, Ryu NAGAI, Takatoshi ORUI, Ryutaro SUDA
  • Publication number: 20220075358
    Abstract: An analysis device includes: a calculation part configured to calculate a degree of deviation of a processing space, in which a plasma process is performed, from a reference condition by inputting, among time-series data groups measured in the processing space, a time-series data group measured in a determination section, which is a predetermined period of time before a control section, into a time-series analysis model; and a specifying part configured to specify a characteristic value for determining control data at a time of the plasma process of a substrate in the control section based on the calculated degree of deviation.
    Type: Application
    Filed: September 8, 2021
    Publication date: March 10, 2022
    Inventors: Ryu NAGAI, Koki TANAKA, Shuhei AKAHANE
  • Publication number: 20220051902
    Abstract: An etching method includes: (a) providing a substrate that contains silicon, on a support; (b) etching the substrate with plasma generated from a first gas that includes a fluorine-containing gas, to form an etching shape having a bottom; (c) generating plasma from a second gas that includes a hydrogen fluoride (HF) gas, to selectively form a condensed or solidified layer of HF at the bottom of the etching shape; and (d) etching the bottom with the plasma generated from the second gas, by supplying a bias power to the support. During (c) and (d), a temperature of the substrate is maintained to be 0° C. or lower.
    Type: Application
    Filed: August 10, 2021
    Publication date: February 17, 2022
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Koki TANAKA
  • Patent number: 11230251
    Abstract: A side airbag device includes a main bag which is an airbag deployed between a passenger seated on a seat and a side wall portion of a vehicle. The airbag expands by gas supply when a vehicle side collision occurs. The side airbag device also includes a sub bag deployed between a side frame on a vehicle outer side in a seat back of the seat and the passenger. The sub bag expands by supplying gas and pushes a waist portion of the passenger forward from backward, prior to deployment of the main bag, when the vehicle side collision occurs.
    Type: Grant
    Filed: October 14, 2019
    Date of Patent: January 25, 2022
    Assignee: TOYODA GOSEI CO., LTD.
    Inventors: Koki Tanaka, Takashi Iida, Kenichi Fukurono, Yuji Sato
  • Publication number: 20210398819
    Abstract: An etching method includes: providing a substrate including a silicon oxide film on a stage; controlling a surface temperature of the substrate to be ?70° C. or lower; and etching the silicon oxide film with plasma generated by supplying a radio-frequency power to a gas containing fluorine and hydrogen, after the controlling the surface temperature of the substrate; and increasing the surface temperature of the substrate to volatilize a by-product generated by the etching.
    Type: Application
    Filed: September 2, 2021
    Publication date: December 23, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Koki TANAKA, Maju TOMURA
  • Patent number: 11198410
    Abstract: A side airbag device includes a main bag which is an airbag deployed between a passenger seated on a seat and a side wall portion of a vehicle. The airbag expands by gas supply when a vehicle side collision occurs. The side airbag device also includes a sub bag deployed between a side frame on a vehicle outer side in a seat back of the seat and the passenger. The sub bag expands by supplying gas and pushes a waist portion of the passenger forward from backward, prior to deployment of the main bag, when the vehicle side collision occurs.
    Type: Grant
    Filed: October 14, 2019
    Date of Patent: December 14, 2021
    Assignee: TOYODA GOSEI CO., LTD.
    Inventors: Koki Tanaka, Takashi Iida, Kenichi Fukurono, Yuji Sato
  • Patent number: 11148182
    Abstract: A cooling device cooling an undersurface of a hot rolled steel sheet that is being transported on transport rolls after finish rolling of a hot rolling step includes: width divided cooling zones that are a plurality of cooling zones into which a whole cooling zone is divided in a sheet width direction; divided cooling sections that are a plurality of cooling zones into which each of the width divided cooling zones is divided in the rolling direction; a water nozzle spraying cooling water over each of undersurfaces of the divided cooling sections; a switching mechanism switching the cooling water between impinging and not impinging on the divided cooling sections; a width direction thermometer measuring a temperature distribution in the sheet width direction; and a controller controlling operation of the switching mechanism.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: October 19, 2021
    Assignee: NIPPON STEEL CORPORATION
    Inventors: Yohichi Haraguchi, Yoshihiro Serizawa, Tatsuro Honda, Hisayoshi Tachibana, Susumu Nakagawa, Koki Tanaka, Shota Ishitsuka
  • Publication number: 20210312610
    Abstract: An analysis device includes learning circuitry configured to perform machine learning using a time series data group measured in association with a processing of an object in a processing space and to calculate a value indicating a relationship of time series data in a corresponding time range between respective measurement items and evaluation circuitry configured to evaluate an unknown condition of the processing space based on the value indicating the relationship calculated by performing machine learning by the learning circuitry using a time series data group measured in association with a processing of the object under a known condition of the processing space.
    Type: Application
    Filed: March 5, 2021
    Publication date: October 7, 2021
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Koki TANAKA, Ryu NAGAI
  • Patent number: 11127600
    Abstract: An etching method includes: providing a substrate including a silicon oxide film on a stage; controlling a surface temperature of the substrate to be ?70° C. or lower; and etching the silicon oxide film with plasma generated by supplying a radio-frequency power to a gas containing fluorine and hydrogen, after the controlling the surface temperature of the substrate; and increasing the surface temperature of the substrate to volatilize a by-product generated by the etching.
    Type: Grant
    Filed: February 18, 2020
    Date of Patent: September 21, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Koki Tanaka, Maju Tomura
  • Patent number: 11007964
    Abstract: A seat cushion airbag apparatus is applied to a vehicle seat in which a seat cushion includes a cushion part and a support portion. An airbag, including an inflatable portion, is disposed between the support portion and the cushion part. The inflatable portion includes: a rear inflatable portion that inflates on a lower side of buttocks of an occupant; a front inflatable portion that inflates on a lower side of a femur of the occupant; and a connection portion that connects the rear inflatable portion and the front inflatable portion. A tilting plate is disposed between the support portion and the cushion part and is supported to be tiltable in an upper-lower direction by a shaft provided rearward of the front inflatable portion, the tilting plate including a flat pressure receiving portion that receives pressure of inflation gas from a lower side through at least the front inflatable portion.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: May 18, 2021
    Assignee: TOYODA GOSEI CO., LTD.
    Inventors: Koki Tanaka, Takashi Iida, Shigeyuki Suzuki, Tadashi Yamada, Yasushi Masuda, Hajime Kitte, Motoyuki Tanaka
  • Publication number: 20210094505
    Abstract: A side airbag apparatus includes an airbag that is configured to be deployed and inflated between a body side portion of a vehicle and an occupant seated in a seat in a passenger compartment by a pressure of gas supplied from an inflator. The airbag includes an outer bag and an inner bag, which is provided in the outer bag and accommodates the inflator. The inner bag includes an upper-side inflation portion, which projects forward when inflated to correspond to the shoulder of the occupant, a lower-side inflation portion, which projects forward when inflated to correspond to the lumbar region of the occupant, and a recessed portion, which is provided between the upper-side inflation portion and the lower-side inflation portion. The inner bag includes a connecting hole that connects the inside and the outside of the inner bag to each other.
    Type: Application
    Filed: September 11, 2020
    Publication date: April 1, 2021
    Inventors: Shuji YAMAMOTO, Takashi IIDA, Kenichi FUKURONO, Koki TANAKA
  • Publication number: 20200263309
    Abstract: An etching method includes: providing a substrate including a silicon oxide film on a stage; controlling a surface temperature of the substrate to be ?70° C. or lower; and etching the silicon oxide film with plasma generated by supplying a radio-frequency power to a gas containing fluorine and hydrogen, after the controlling the surface temperature of the substrate; and increasing the surface temperature of the substrate to volatilize a by-product generated by the etching.
    Type: Application
    Filed: February 18, 2020
    Publication date: August 20, 2020
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Koki TANAKA, Maju TOMURA
  • Patent number: 10697098
    Abstract: A coating apparatus of an airbag reinforcing liquid is used in a sewing machine that includes: a sewing needle driving an upper thread by penetrating sewing target cloth through a vertical movement; and a presser foot disposed above the sewing target cloth, and feeding the sewing target cloth while moving vertically synchronously with the vertical movement of the sewing needle. The coating apparatus includes: a reinforcing liquid supplying part, supplying a reinforcing liquid for reinforcing a sewn part onto the sewing target cloth on a front side from the sewing needle in a feeding direction of the sewing target cloth; and a stamp part attached to the presser foot, and expand the reinforcing liquid supplied from the reinforcing liquid supplying part onto the sewing target cloth around the sewn part by being operated integrally with the presser foot above the sewing target cloth.
    Type: Grant
    Filed: February 28, 2018
    Date of Patent: June 30, 2020
    Assignee: TOYODA GOSEI CO., LTD.
    Inventor: Koki Tanaka