Patents by Inventor Konstantin Nikolaevich Koshelev

Konstantin Nikolaevich Koshelev has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10887973
    Abstract: Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: January 5, 2021
    Assignees: ISTEQ B.V., RnD-ISAN, Ltd
    Inventors: Vladimir Vitalievich Ivanov, Aleksandr Yurievich Vinokhodov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Krivokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Oleg Borisovich Khristoforov, Denis Aleksandrovich Glushkov, Samir Ellwi
  • Publication number: 20200163197
    Abstract: Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.
    Type: Application
    Filed: January 27, 2020
    Publication date: May 21, 2020
    Inventors: Vladimir Vitalievich IVANOV, Aleksandr Yurievich VINOKHODOV, Konstantin Nikolaevich KOSHELEV, Mikhail Sergeyevich KRIVOKORYTOV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH, Vyacheslav Valerievich MEDVEDEV, Yury Viktorovich SIDELNIKOV, Oleg Feliksovich YAKUSHEV, Oleg Borisovich KHRISTOFOROV, Denis Aleksandrovich GLUSHKOV, Samir ELLWI
  • Patent number: 10638588
    Abstract: High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber (1) with an input window (6) for a laser beam (7) focused into the interaction zone (5), an output window (8) for the exit of the short-wavelength radiation beam (9); the rotating target assembly (3), having an annular groove (11); the target (4) as a layer of a molten metal formed by centrifugal force on the surface of the distal wall (13) of the annular groove (11) while the proximal wall (14) of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.
    Type: Grant
    Filed: August 14, 2018
    Date of Patent: April 28, 2020
    Assignees: Isteq B.V., RnD-ISAN, Ltd
    Inventors: Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Krivokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev
  • Patent number: 10588210
    Abstract: High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: March 10, 2020
    Assignees: Isteq B.V., RnD-ISAN, Ltd
    Inventors: Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Krivokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Oleg Borisovich Khristoforov, Denis Aleksandrovich Glushkov, Samir Ellwi
  • Publication number: 20200060014
    Abstract: High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.
    Type: Application
    Filed: August 8, 2019
    Publication date: February 20, 2020
    Inventors: Aleksandr Yurievich VINOKHODOV, Vladimir Vitalievich IVANOV, Konstantin Nikolaevich KOSHELEV, Mikhail Sergeyevich KRYVOKORYTOV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH, Vyacheslav Valerievich MEDVEDEV, Yury Viktorovich SIDELNIKOV, Oleg Feliksovich YAKUSHEV, Oleg Borisovich KHRISTOFOROV, Denis Aleksandrovich GLUSHKOV, Samir ELLWI
  • Publication number: 20190166679
    Abstract: High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber (1) with an input window (6) for a laser beam (7) focused into the interaction zone (5), an output window (8) for the exit of the short-wavelength radiation beam (9); the rotating target assembly (3), having an annular groove (11); the target (4) as a layer of a molten metal formed by centrifugal force on the surface of the distal wall (13) of the annular groove (11) while the proximal wall (14) of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.
    Type: Application
    Filed: August 14, 2018
    Publication date: May 30, 2019
    Applicants: Isteq B.V., RnD-ISAN, Ltd
    Inventors: Aleksandr Yurievich VINOKHODOV, Vladimir Vitalievich IVANOV, Konstantin Nikolaevich KOSHELEV, Mikhail Sergeyevich KRYVOKORYTOV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH, Vyacheslav Valerievich MEDVEDEV, Yury Viktorovich SIDELNIKOV, Oleg Feliksovich YAKUSHEV
  • Patent number: 9476841
    Abstract: The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180° C. may be adjusted around the target jet.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: October 25, 2016
    Assignee: OOO “Isteq B.V.”
    Inventors: Pavel Stanislavovich Antsiferov, Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Kryvokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Denis Alexandrovich Glushkov, Samir Ellwi, Pavel Viktorovich Seroglazov
  • Patent number: 9368337
    Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber, and an optical system for collecting plasma radiation.
    Type: Grant
    Filed: August 23, 2013
    Date of Patent: June 14, 2016
    Assignee: OOO “RnD-ISAN”
    Inventors: Pavel Stanislavovich Antsiferov, Konstantin Nikolaevich Koshelev, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
  • Patent number: 9357627
    Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and determined radiation power is maintained via an automated control system.
    Type: Grant
    Filed: April 8, 2014
    Date of Patent: May 31, 2016
    Assignee: OOO “RnD-ISAN”
    Inventors: Pavel Stanislavovich Antsiferov, Konstantin Nikolaevich Koshelev, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash
  • Patent number: 9307624
    Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.
    Type: Grant
    Filed: June 15, 2009
    Date of Patent: April 5, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Denis Alexandrovich Glushkov, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevich Koshelev, Givi Georgievich Zukakishvili, Vladimir Mihailovitch Krivtsun, Yurii Victorovitch Sidelnikov, Kurt Gielissen, Oleg Yakushev
  • Publication number: 20160044774
    Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability, brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and predetermined radiation power is maintained via an automated control system.
    Type: Application
    Filed: April 8, 2014
    Publication date: February 11, 2016
    Inventors: Pavel Stanislavovich ANTSIFEROV, Konstantin Nikolaevich KOSHELEV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH
  • Publication number: 20150311058
    Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber and an optical system for collecting plasma radiation.
    Type: Application
    Filed: August 23, 2013
    Publication date: October 29, 2015
    Applicant: RND-ISAN, LTD
    Inventors: Pavel Stanislavovich ANTSIFEROV, Konstantin Nikolaevich KOSHELEV, Vladimir Mikhailovich KRIVTSUN, Aleksandr Andreevich LASH
  • Publication number: 20130287968
    Abstract: A method for generating radiation includes supplying a fuel to a discharge space, creating a discharge in the fuel to form a plasma, and reducing a volume defined by the plasma by controlling radiation emission by the plasma. The reducing includes supplying a substance including at least one of Ga, In, Bi, Pb or Al to the plasma to control the radiation emission.
    Type: Application
    Filed: June 25, 2013
    Publication date: October 31, 2013
    Applicant: ASML NETHERLAND B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevich Koshelev, Vladimir Mihailovitch Krivtsun
  • Patent number: 8493548
    Abstract: A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.
    Type: Grant
    Filed: August 6, 2007
    Date of Patent: July 23, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevich Koshelev, Vladimir Mihailovitch Krivtsun
  • Publication number: 20130015373
    Abstract: An EUV radiation source comprising a fuel supply (200) configured to deliver a droplet of fuel to a plasma generation location (201), a first laser beam source configured to provide a first beam of laser radiation (205) incident upon the fuel droplet at the plasma generation location and thereby vaporizes the fuel droplet, and a second laser beam source configured to subsequently provide a second beam of laser radiation (205) at the plasma generation location, the second beam of laser radiation being configured to vaporize debris particles (252) arising from incomplete vaporization of the fuel droplet.
    Type: Application
    Filed: March 8, 2011
    Publication date: January 17, 2013
    Inventors: Andrei Mikhailovich Yakunin, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevich Koshelev, Vladimir Mihailovitch Krivtsun, Denis Alexandrovich Glushkov
  • Patent number: 8294128
    Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.
    Type: Grant
    Filed: September 24, 2010
    Date of Patent: October 23, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Mihailovitch Krivtsun, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Evgeny Dmitrievich Korop, Konstantin Nikolaevich Koshelev, Yurii Victorovitch Sidelnikov, Oleg Yakushev
  • Publication number: 20110037960
    Abstract: A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.
    Type: Application
    Filed: April 16, 2009
    Publication date: February 17, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Luigi Scaccabarozzi, Vladimir Vitalevich Ivanov, Konstantin Nikolaevich Koshelev, Johannes Hubertus Josephina Moors, Lucas Henricus Johannes Stevens, Pavel Stanislavoich Antsiferov, Vladimir Mihailovitch Krivtsun, Leonid Alexandrovich Dorokhin, Maarten Van Kampen
  • Publication number: 20110020752
    Abstract: A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about 1 Pa and about 10 Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium.
    Type: Application
    Filed: December 19, 2008
    Publication date: January 27, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Yurii Victorovitch Sidelnikov, Vadim Yevgenyevich Banine, Konstantin Nikolaevich Koshelev, Vladimir Mihailovitch Krivtsun
  • Publication number: 20110013167
    Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.
    Type: Application
    Filed: September 24, 2010
    Publication date: January 20, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Vladimir Mihailovitch KRIVTSUN, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Evgeny Dmitrievich Korop, Konstantin Nikolaevich Koshelev, Yurii Victorovitch Sidelnikov, Oleg Yakushev
  • Patent number: 7872244
    Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.
    Type: Grant
    Filed: August 8, 2007
    Date of Patent: January 18, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Konstantin Nikolaevich Koshelev, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Dmitriy Victorovich Lopaev