Abstract: A laser produced plasma (LPP) light source comprises a rotating target assembly supplying a target into an interaction zone with a focused beam of a high-repetition-rate pulsed laser. High effective cooling of the light source is provided by thermal radiation of a peripheral part of the rotating target assembly and through a meander-shaped gap between the rotating target assembly and a fixed heat exchanger with a gas blowing through the slit gap. In an embodiment, a sealing between the vacuum chamber and a shaft of rotating drive unit is provided by a magnetic fluid seal (MFS) with an additional heat exchanger. A heat transfer from the rotating target assembly is provided through the shaft and MFS to additional heat exchanger and by convection air cooling of a counterweight of the rotating target assembly fixed on the shaft. High brightness and high output power of LPP light source are provided.

Abstract: An X-ray beam is generated in an interaction zone of an electron beam and a target, the zone being an annular layer of a molten fusible metal in an annular channel of a rotating anode assembly. The channel has a surface profile which prevents slopping of the molten metal in the radial direction and in both directions along the rotation axis. The liquid-metal target forms a circular cylindrical surface due to the centrifugal force acting thereupon. The linear velocity of the target is preferably higher than 80 m/s; in a vacuum chamber, a changeable membrane made of carbon nanotubes is installed in the X-ray beam path and a protective screen with apertures for electron beam entry and X-ray beam exit is arranged around the interaction zone. The technical result consists in an X-ray source with increased power, brightness, lifetime and ease of use.

Abstract: An X-ray beam is generated in an interaction zone of an electron beam and a target, the zone being an annular layer of a molten fusible metal in an annular channel of a rotating anode assembly. The channel has a surface profile which prevents slopping of the molten metal in the radial direction and in both directions along the rotation axis. The liquid-metal target forms a circular cylindrical surface due to the centrifugal force acting thereupon. The linear velocity of the target is preferably higher than 80 m/s; in a vacuum chamber, a changeable membrane made of carbon nanotubes is installed in the X-ray beam path and a protective screen with apertures for electron beam entry and X-ray beam exit is arranged around the interaction zone. The technical result consists in an X-ray source with increased power, brightness, lifetime and ease of use.

Abstract: A laser produced plasma light source comprises a vacuum chamber with a rotating target assembly supplying a target into an interaction zone with focused laser beam. The target is layer of a fluid and/or free-flowing target material on a surface of annular groove in the rotating target assembly. An output beam of short-wavelength radiation exits the interaction zone to an optical collector through the means for debris mitigation. A linear velocity of the target is not less than 100 m/s and a vector of the linear velocity of the target in the interaction zone is directed on one side of a plane passing through the interaction zone and the rotation axis while the focused laser beam and the output beam are located on another side of said plane. The optical collector comprises two ellipsoidal mirror units arranged in a tandem.

Abstract: A radiation source contains a collector module comprising an optical collector, positioned in a vacuum chamber with an emitting plasma, further comprising a means for debris mitigation which include at least two casings arranged to output debris-free homocentric beams of the short-wavelength radiation, coming to the optical collector preferably consisting of several identical mirrors. Outside each casing there are permanent magnets that create a magnetic field inside the casings to mitigate charged fraction of debris particles and provide the debris-free homocentric beams of short-wavelength radiation. Other debris mitigating techniques are additionally used. Preferably the plasma is laser-produced plasma of a liquid metal target supplied by a rotating target assembly to a focus area of a laser beam. The technical result of the invention is the creation of high-powerful high-brightness debris-free sources of short-wavelength radiation with large, preferably more than 0.25 sr, collection solid angle.

Abstract: A radiation source contains a collector module comprising an optical collector, positioned in a vacuum chamber with an emitting plasma, further comprising a means for debris mitigation which include at least two casings arranged to output debris-free homocentric beams of the short-wavelength radiation, coming to the optical collector preferably consisting of several identical mirrors. Outside each casing there are permanent magnets that create a magnetic field inside the casings to mitigate charged fraction of debris particles and provide the debris-free homocentric beams of short-wavelength radiation. Other debris mitigating techniques are additionally used. Preferably the plasma is laser-produced plasma of a liquid metal target supplied by a rotating target assembly to a focus area of a laser beam. The technical result of the invention is the creation of high-powerful high-brightness debris-free sources of short-wavelength radiation with large, preferably more than 0.25 sr, collection solid angle.

Abstract: Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.

Abstract: Laser-produced plasma light source contains a vacuum chamber with a rotating target assembly providing a target in an interaction zone with a laser beam focused on the said target, which is a molten metal layer. A debris shield is rigidly mounted to surround the interaction zone, said shield comprising only two opening forming an entrance for the laser beam and an exit for a short-wavelength radiation beam. The means for debris mitigation can additionally include: the rotation of target with high linear velocity exciding 80 m/s; the orientation of the short-wavelength radiation beam and/or of the laser beam at an angle of less than 45° to the target surface, a nozzle supplying a high-speed gas flow to the interaction zone, etc. The technical result is the creation of the high-brightness low-debris sources of soft X-ray, EUV and VUV light at wavelengths of 0.4 to 200 nm.

Abstract: High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber (1) with an input window (6) for a laser beam (7) focused into the interaction zone (5), an output window (8) for the exit of the short-wavelength radiation beam (9); the rotating target assembly (3), having an annular groove (11); the target (4) as a layer of a molten metal formed by centrifugal force on the surface of the distal wall (13) of the annular groove (11) while the proximal wall (14) of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.

Abstract: High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.

Abstract: High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.

Abstract: High-brightness LPP source and method for generating short-wavelength radiation which include a vacuum chamber (1) with an input window (6) for a laser beam (7) focused into the interaction zone (5), an output window (8) for the exit of the short-wavelength radiation beam (9); the rotating target assembly (3), having an annular groove (11); the target (4) as a layer of a molten metal formed by centrifugal force on the surface of the distal wall (13) of the annular groove (11) while the proximal wall (14) of the annular groove is designed to provide a line of sight between the interaction zone and both the input and output windows particularly during laser pulses. A method for mitigating debris particles comprises using an target orbital velocity high enough for the droplet fractions of the debris particles exiting the rotating target assembly not to be directed towards the input and output windows.

Abstract: The invention provides a method and apparatus for a commercially viable EUV light source for EUV metrology and actinic inspection of EUV lithography masks. The invention is carried out using a laser target in the form of a continuous jet of liquid Lithium, circulated in a closed loop system by means of a high temperature pump. The collector mirror is placed outside the vacuum chamber in an environment filled with an inert gas and EUV output to a collector mirror is provided through the spectral purity filter, configured as an EUV exit window for the vacuum chamber. In the vacuum chamber, the input window for the laser beam is coated with a screening optical element. Evaporative cleaning of the EUV spectral purity filter and the screening optical element is provided. The protective shield with a temperature higher than 180° C. may be adjusted around the target jet.

Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber, and an optical system for collecting plasma radiation.

Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and determined radiation power is maintained via an automated control system.

Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.

Abstract: Invention provides extending the functional possibilities of a light source with laser pumping due to increasing its spatial and energy stability, brightness and the reliability under long-term operation whilst ensuring compactness of the device. The result is achieved due to the fact that a focused laser beam is directed into a region of radiating plasma from the bottom upwards: from the lower wall of a chamber to an upper wall of the chamber which is opposite said lower wall, and the region of radiating plasma is arranged close to the upper wall of the chamber. In embodiments of the invention, the focused laser beam is directed along a vertical axis of symmetry of the walls of the chamber, the region of radiating plasma is produced at an optimally small distance away from the upper wall of the chamber and predetermined radiation power is maintained via an automated control system.

Abstract: The invention relates to light sources with laser pumping and to methods for generating radiation with a high luminance in the ultraviolet (UV) and visible spectral ranges. The technical result of the invention includes extending the functional possibilities of a light source with laser pumping by virtue of increasing the luminance, increasing the coefficient of absorption of the laser radiation by a plasma, and significantly reducing the numerical aperture of a divergent laser beam which is to be occluded and which is passing through the plasma. The device comprises a chamber containing a gas, a laser producing a laser beam, an optical element, a region of radiating plasma produced in the chamber by the focused laser beam, an occluder, which is mounted on the axis of the divergent laser beam on the second side of the chamber and an optical system for collecting plasma radiation.

Abstract: A method for generating radiation includes supplying a fuel to a discharge space, creating a discharge in the fuel to form a plasma, and reducing a volume defined by the plasma by controlling radiation emission by the plasma. The reducing includes supplying a substance including at least one of Ga, In, Bi, Pb or Al to the plasma to control the radiation emission.

Abstract: A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.