Patents by Inventor Konstantin Nikolaevitch Koshelev
Konstantin Nikolaevitch Koshelev has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8362444Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.Type: GrantFiled: October 19, 2010Date of Patent: January 29, 2013Assignee: ASML Netherlands B.V.Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev
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Patent number: 8317929Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.Type: GrantFiled: March 6, 2006Date of Patent: November 27, 2012Assignee: ASML Netherlands B.V.Inventors: Tatyana Victorovna Rakhimova, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevitch Koshelev, Johannes Hubertus Johannes Moors, Aleksander Sergeevich Kovalev, Dmitriy Victorovich Lopaev
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Patent number: 8018574Abstract: A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.Type: GrantFiled: June 30, 2005Date of Patent: September 13, 2011Assignee: ASML Netherlands B.V.Inventors: Robert Rafilevitch Gayazov, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Konstantin Nikolaevitch Koshelev, Givi Georgievitch Zukavishvili, Yurii Victorovitch Sidelnikov
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Publication number: 20110043777Abstract: A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd.Type: ApplicationFiled: March 20, 2009Publication date: February 24, 2011Applicant: ASML Netherlands B.V.Inventors: Vladimir Mihailovitc Krivtsun, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Johannes Hubertus Josephina Moors, Sergey Churilov, Denis Glushkov
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Publication number: 20110031866Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.Type: ApplicationFiled: October 19, 2010Publication date: February 10, 2011Applicant: ASML Netherlands B.V.Inventors: Vladimir Vitalevitch IVANOV, Vadim Yevgenyevich BANINE, Konstantin Nikolaevitch KOSHELEV
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Patent number: 7838853Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.Type: GrantFiled: December 14, 2006Date of Patent: November 23, 2010Assignee: ASML Netherlands B.V.Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev
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Publication number: 20100141909Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.Type: ApplicationFiled: November 27, 2007Publication date: June 10, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Arnoud Cornelis Wassink, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Theodorus Petrus Maria Cadee, Vladimir Mihailòvitch Krivtsun, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Paul Peter Anna Antonius Brom, Wouter Anthon Soer, Denis Alexandrovich Glushkov
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Patent number: 7696492Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.Type: GrantFiled: December 13, 2006Date of Patent: April 13, 2010Assignee: ASML Netherlands B.V.Inventors: Arnoud Cornelis Wassink, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Theodorus Petrus Maria Cadee, Vladimir Mihailovitch Krivtsun, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Paul Peter Anna Antonius Brom, Wouter Anthon Soer
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Patent number: 7696493Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.Type: GrantFiled: December 13, 2006Date of Patent: April 13, 2010Assignee: ASML Netherlands B.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Derk Jan Wilfred Klunder
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Patent number: 7528395Abstract: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.Type: GrantFiled: September 17, 2003Date of Patent: May 5, 2009Assignee: ASML Netherlands B.V.Inventors: Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine, Vladimir Vital'Evitch Ivanov, Erik René Kieft, Erik Roelof Loopstra, Lucas Henricus Johannes Stevens, Yurii Victorovitch Sidelkov, Vsevolod Grigorevitch Koloshnikov, Vladimir Mihailovitch Krivtsun, Robert Rafilevitch Gayazov, Olav Waldemar Vladimir Frijns
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Patent number: 7518134Abstract: A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.Type: GrantFiled: December 6, 2006Date of Patent: April 14, 2009Assignee: ASML Netherlands B.V.Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev, Vladimir Mihailovitch Krivtsun
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Patent number: 7501642Abstract: A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.Type: GrantFiled: December 29, 2005Date of Patent: March 10, 2009Assignee: ASML Netherlands B.V.Inventors: Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Johannes Christiaan Leonardus Franken, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Alexander Matthijs Struycken
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Patent number: 7462851Abstract: A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.Type: GrantFiled: September 22, 2006Date of Patent: December 9, 2008Assignee: ASML Netherlands B.V.Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Robert Rafilevitch Gayazov, Vladimir Mihailovitch Krivtsun
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Publication number: 20080151205Abstract: A radiation source with an anode and a cathode to create a discharge in a discharge space between the anode and the cathode is disclosed. A plasma is formed in the radiation source which generates electromagnetic radiation, such as EUV radiation. The radiation source includes a first activation source to direct a first energy pulse onto a first spot in the radiation source near the discharge space to create a main plasma channel which triggers the discharge. The radiation source also has a second activation source to direct a second energy pulse onto a second spot in the radiation source near the discharge space to create an additional plasma channel. By directing the second energy pulse during the same discharge, a shortcutting of the main plasma current is realized which in turn may reduce the amount of fast ions produced.Type: ApplicationFiled: December 20, 2006Publication date: June 26, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev
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Publication number: 20080142740Abstract: A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.Type: ApplicationFiled: December 14, 2006Publication date: June 19, 2008Applicant: ASML Netherlands B.V.Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev
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Publication number: 20080142741Abstract: The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.Type: ApplicationFiled: December 13, 2006Publication date: June 19, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Derk Jan Wilfred Klunder
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Publication number: 20080142736Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.Type: ApplicationFiled: December 13, 2006Publication date: June 19, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Arnoud Cornelis Wassink, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Theodorus Petrus Maria Cadee, Vladimir Mihailovitch Krivtsun, Derk Jan Wilfred Klunder, Maarten Marinus Johannes Wilhelmus Van Herpen, Paul Peter Anna Antonius Brom, Wouter Anthon Soer
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Publication number: 20080137050Abstract: A radiation source is disclosed that includes an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between the anode and the cathode and to form a plasma so as to generate electromagnetic radiation, the anode and the cathode being rotatably mounted around an axis of rotation, the cathode being arranged to hold a liquid metal. The radiation source further includes an activation source arranged to direct an energy beam onto the liquid metal so as to vaporize part of the liquid metal and a liquid metal provider arranged to supply additional liquid metal so as to compensate for the vaporized part of the liquid metal.Type: ApplicationFiled: December 6, 2006Publication date: June 12, 2008Applicant: ASML Netherlands B.V.Inventors: Vladimir Vitalevitch Ivanov, Vadim Yevgenyevich Banine, Konstantin Nikolaevitch Koshelev, Vladimir Mihailovitch Krivtsun
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Patent number: 7335900Abstract: A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.Type: GrantFiled: July 12, 2005Date of Patent: February 26, 2008Assignee: ASML Netherlands B.V.Inventors: Konstantin Nikolaevitch Koshelev, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Givi Georgievitch Zukavishvili, Robert Rafilevitch Gayazov, Vladimir Mihailovitch Krivtsun
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Patent number: RE41362Abstract: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.Type: GrantFiled: November 16, 2006Date of Patent: June 1, 2010Assignee: ASML Netherlands B.V.Inventors: Konstantin Nikolaevitch Koshelev, Frederik Bijkerk, Givi Georgievitch Zukavishvili, Evgenii Dmitreevitch Korop, Vladimir Vital'evitch Ivanov