Patents by Inventor Kosta S. Selinidis

Kosta S. Selinidis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10124529
    Abstract: Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: November 13, 2018
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Gaddi S. Haase, Kosta S. Selinidis, Zhengmao Ye
  • Publication number: 20170351171
    Abstract: An imprint lithography template including an alignment mark including at least two columns or at least two rows of features spaced apart from one another, and a dummy-fill region, wherein the alignment mark is spaced apart from the dummy-fill region, and wherein a closest distance between the at least two columns or the at least two rows is less than a closest distance between any portion of the at least two columns or the at least two rows and the dummy-fill region. In an embodiment, the at least two columns or the at least two rows are spaced apart by at least 0.5 microns. In a further embodiment, the closest distance between the at least two columns or the at least two rows and the dummy-fill region is at least 2 microns.
    Type: Application
    Filed: June 6, 2016
    Publication date: December 7, 2017
    Inventors: Ecron D. Thompson, Andrew Robert Eckert, Kosta S. Selinidis
  • Patent number: 9778562
    Abstract: An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
    Type: Grant
    Filed: November 21, 2008
    Date of Patent: October 3, 2017
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Frank Y. Xu, Weijun Liu, Edward Brian Fletcher, Sidlgata V. Sreenivasan, Byung Jin Choi, Niyaz Khusnatdinov, Anshuman Cherala, Kosta S. Selinidis
  • Patent number: 9227361
    Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
    Type: Grant
    Filed: September 13, 2013
    Date of Patent: January 5, 2016
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Byung-Jin Choi, Yeong-Jun Choi, Kosta S. Selinidis, Steven C. Shackleton
  • Publication number: 20150165655
    Abstract: Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
    Type: Application
    Filed: February 27, 2015
    Publication date: June 18, 2015
    Inventors: Niyaz Khusnatdinov, Kosta S. Selinidis, Jospeh Michael Imhof, Dwayne L. LaBrake
  • Publication number: 20150158240
    Abstract: Imprint lithography templates having leading and trailing edge borders are provided that achieve zero-gap imprinting between adjacent fields with full-feature height features provided in the pattern exclusion zones (PEZ) located between such fields. The leading edge borders include dummy features, e.g., elongated features directionally oriented parallel to the mesa edge, while the trailing edge border includes a recess extending to the mesa edges. When used in a step-and-repeat process, the trailing edge border overlaps edge portions of an adjacent imprinted field that were previously patterned by the leading edge border of the template, producing full-feature height features in the pattern exclusion zones between such fields, and avoiding gaps or open areas between such fields that otherwise lead to non-uniformity of downstream processes such as etch processes and CMP.
    Type: Application
    Filed: December 10, 2014
    Publication date: June 11, 2015
    Applicant: Canon Nanotechnologies, Inc.
    Inventors: Gaddi S. Haase, Kosta S. Selinidis, Zhengmao Ye
  • Patent number: 8967992
    Abstract: Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
    Type: Grant
    Filed: April 25, 2012
    Date of Patent: March 3, 2015
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Kosta S. Selinidis, Joseph Michael Imhof, Dwayne L. LaBrake
  • Patent number: 8961852
    Abstract: Described are systems and methods for formation of templates having alignment marks with high contrast material. High contrast material may be positioned within recesses of alignment marks.
    Type: Grant
    Filed: February 4, 2011
    Date of Patent: February 24, 2015
    Assignee: Canon Nanotechnologies, Inc.
    Inventor: Kosta S. Selinidis
  • Patent number: 8935981
    Abstract: Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
    Type: Grant
    Filed: September 26, 2011
    Date of Patent: January 20, 2015
    Assignee: Canon Nanotechnologies, Inc.
    Inventors: Joseph Michael Imhof, Kosta S. Selinidis, Dwayne L. LaBrake
  • Publication number: 20140212534
    Abstract: An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (?porous/?fused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
    Type: Application
    Filed: January 30, 2013
    Publication date: July 31, 2014
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Edward B. Fletcher, Frank Y. Xu, Weijun Liu, Fen Wan, Marlon Menezes, Kosta S. Selinidis
  • Publication number: 20140008841
    Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
    Type: Application
    Filed: September 13, 2013
    Publication date: January 9, 2014
    Applicant: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Yeong-Jun Choi, Kosta S. Selinidis, Steven C. Shackleton
  • Publication number: 20120269972
    Abstract: Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
    Type: Application
    Filed: April 25, 2012
    Publication date: October 25, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Kosta S. Selinidis, Joseph Michael Imhof, Dwayne L. LaBrake
  • Publication number: 20120073462
    Abstract: Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
    Type: Application
    Filed: September 26, 2011
    Publication date: March 29, 2012
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Joseph Michael Imhof, Kosta S. Selinidis, Dwayne L. LaBrake
  • Patent number: 8012395
    Abstract: Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.
    Type: Grant
    Filed: May 12, 2009
    Date of Patent: September 6, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Kosta S. Selinidis, Byung-Jin Choi, Gerard M. Schmid, Ecron D. Thompson, Ian Matthew McMackin
  • Publication number: 20110192302
    Abstract: Described are systems and methods for formation of templates having alignment marks with high contrast material. High contrast material may be positioned within recesses of alignment marks.
    Type: Application
    Filed: February 4, 2011
    Publication date: August 11, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventor: Kosta S. Selinidis
  • Publication number: 20110165412
    Abstract: Forming an adhesive layer on a nanoimprint lithography template or a double-sided disk. Forming the adhesive layer on the double-sided disk includes immersing the double-sided disk in a liquid adhesive composition and removing the double-sided disk from the adhesive composition. The outer layer of the double-sided disk is a carbon overcoating or an intermediate layer. The adhesive composition is dried to form a first adhesion layer adhered directly to the carbon overcoating or intermediate layer on a first side of the disk and a second adhesion layer adhered directly to the carbon overcoating or intermediate layer on a second side of the disk. Forming the adhesive layer on the nanoimprint lithography template includes applying an adhesive material to the template, allowing the template to remain motionless, and rinsing a portion of the adhesive material from the template with a solvent, and drying the template.
    Type: Application
    Filed: November 24, 2010
    Publication date: July 7, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Zhengmao Ye, Frank Y. Xu, Dwayne L. LaBrake, Kosta S. Selinidis
  • Publication number: 20110140304
    Abstract: Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
    Type: Application
    Filed: December 9, 2010
    Publication date: June 16, 2011
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Byung-Jin Choi, Yeong-jun Choi, Kosta S. Selinidis, Steven C. Shackleton
  • Patent number: 7874831
    Abstract: An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
    Type: Grant
    Filed: October 26, 2009
    Date of Patent: January 25, 2011
    Assignee: Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Mario Johannes Meissl, Kosta S. Selinidis, Frank Y. Xu
  • Publication number: 20100112310
    Abstract: Systems and methods for providing identification patterns on substrates are described.
    Type: Application
    Filed: October 28, 2009
    Publication date: May 6, 2010
    Applicant: Molecular Imprints, Inc.
    Inventors: Van Nguyen Truskett, Gerard M. Schmid, Michael N. Miller, Douglas J. Resnick, Benjamin G. Eynon, JR., Byung-Jin Choi, Kosta S. Selinidis, Sidlgata V. Sreenivasan, Nicholas A. Stacey
  • Publication number: 20100104852
    Abstract: An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (pporous/pfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
    Type: Application
    Filed: October 22, 2009
    Publication date: April 29, 2010
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Edward B. Fletcher, Frank Y. Xu, Weijun Liu, Fen Wan, Marlon Menezes, Kosta S. Selinidis