Patents by Inventor Kotaro Murakami

Kotaro Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9412587
    Abstract: A method of manufacturing a semiconductor device includes alternately performing supplying a first process gas containing silicon and a halogen element to a substrate having a surface on which monocrystalline silicon and an insulation film are exposed and supplying a second process gas containing silicon and not containing a halogen element to the substrate, and supplying a third process gas containing silicon to the substrate, whereby a first silicon film is homo-epitaxially grown on the monocrystalline silicon and a second silicon film differing in crystal structure from the first silicon film is grown on the insulation film.
    Type: Grant
    Filed: November 2, 2015
    Date of Patent: August 9, 2016
    Assignee: HITACHI KOKUSAI ELECTRIC, INC.
    Inventors: Atsushi Moriya, Naoharu Nakaiso, Yugo Orihashi, Kotaro Murakami
  • Publication number: 20160141173
    Abstract: A method of manufacturing a semiconductor device includes alternately performing supplying a first process gas containing silicon and a halogen element to a substrate having a surface on which monocrystalline silicon and an insulation film are exposed and supplying a second process gas containing silicon and not containing a halogen element to the substrate, and supplying a third process gas containing silicon to the substrate, whereby a first silicon film is homo-epitaxially grown on the monocrystalline silicon and a second silicon film differing in crystal structure from the first silicon film is grown on the insulation film.
    Type: Application
    Filed: November 2, 2015
    Publication date: May 19, 2016
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Atsushi MORIYA, Naoharu NAKAISO, Yugo ORIHASHI, Kotaro MURAKAMI
  • Patent number: 9225288
    Abstract: A signal generation circuit includes a limiter and a mixer. The limiter receives an input signal, allows the input signal to be off a scale at a limit voltage, and generates a phase signal indicating a phase component of the input signal. The mixer receives the input signal and the phase signal, and generates an amplitude signal indicating an amplitude component of the input signal.
    Type: Grant
    Filed: January 29, 2014
    Date of Patent: December 29, 2015
    Assignees: FUJITSU LIMITED, SOCIONEXT INC.
    Inventors: Kazuaki Oishi, Masahiro Kudo, Kotaro Murakami
  • Patent number: 8895457
    Abstract: To provide a method of manufacturing a semiconductor device, including: forming a thin film different from a silicon oxide film on a substrate by supplying a processing gas into a processing vessel in which the substrate is housed; removing a deposit including the thin film adhered to an inside of the processing vessel by supplying a fluorine-containing gas into the processing vessel after executing forming the thin film prescribed number of times; and forming a silicon oxide film having a prescribed film thickness on the inside of the processing vessel by alternately supplying a silicon-containing gas, and an oxygen-containing gas and a hydrogen-containing gas into the heated processing vessel in which a pressure is set to be less than an atmospheric pressure after removing the deposit.
    Type: Grant
    Filed: February 18, 2011
    Date of Patent: November 25, 2014
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Naonori Akae, Kotaro Murakami, Yoshiro Hirose, Kenji Kameda
  • Publication number: 20140285250
    Abstract: A signal generation circuit includes a limiter and a mixer. The limiter receives an input signal, allows the input signal to be off a scale at a limit voltage, and generates a phase signal indicating a phase component of the input signal. The mixer receives the input signal and the phase signal, and generates an amplitude signal indicating an amplitude component of the input signal.
    Type: Application
    Filed: January 29, 2014
    Publication date: September 25, 2014
    Applicants: FUJITSU SEMICONDUCTOR LIMITED, FUJITSU LIMITED
    Inventors: Kazuaki OISHI, Masahiro KUDO, Kotaro MURAKAMI
  • Patent number: 8673790
    Abstract: A method of manufacturing a semiconductor device includes supplying a process gas into a process vessel accommodating a substrate to form a thin film on the substrate and supplying a cleaning gas into the process vessel to clean an inside of the process vessel, after the supplying the process gas to form the thin film is performed a predetermined number of times. When cleaning the inside of the process vessel, a fluorine-containing gas, an oxygen-containing gas and a hydrogen-containing gas are supplied as the cleaning gas into the process vessel heated and kept at a pressure less than an atmospheric pressure to remove a deposit including the thin film adhering to the inside of the process vessel through a thermochemical reaction.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: March 18, 2014
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Naonori Akae, Yoshiro Hirose, Kotaro Murakami
  • Publication number: 20130017685
    Abstract: To provide a method of manufacturing a semiconductor device, including: forming a thin film different from a silicon oxide film on a substrate by supplying a processing gas into a processing vessel in which the substrate is housed; removing a deposit including the thin film adhered to an inside of the processing vessel by supplying a fluorine-containing gas into the processing vessel after executing forming the thin film prescribed number of times; and forming a silicon oxide film having a prescribed film thickness on the inside of the processing vessel by alternately supplying a silicon-containing gas, and an oxygen-containing gas and a hydrogen-containing gas into the heated processing vessel in which a pressure is set to be less than an atmospheric pressure after removing the deposit.
    Type: Application
    Filed: February 18, 2011
    Publication date: January 17, 2013
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Naonori Akae, Kotaro Murakami, Yoshiro Hirose, Kenji Kameda
  • Patent number: 8174310
    Abstract: A quadrature demodulation circuit includes: first to fourth mixers to receive a modulation signal; a phase shifter to supply to the first and third mixers a first local frequency signal, to supply to the second mixer a second local frequency signal having a designated phase difference relative to the first local frequency signal, and to supply to the fourth mixer a third local frequency signal that is an inverse in phase to the second local frequency signal; a first adder to add a signal output from the first mixer and a signal output from the second mixer and to output a first demodulation signal; and a second adder to add a signal output from the third mixer and a signal output from the fourth mixer and to output a second demodulation signal.
    Type: Grant
    Filed: August 23, 2010
    Date of Patent: May 8, 2012
    Assignee: Fujitsu Semiconductor Limited
    Inventors: Shingo Sakamoto, Kotaro Murakami
  • Publication number: 20110318937
    Abstract: A method of manufacturing a semiconductor device includes supplying a process gas into a process vessel accommodating a substrate to form a thin film on the substrate and supplying a cleaning gas into the process vessel to clean an inside of the process vessel, after the supplying the process gas to form the thin film is performed a predetermined number of times. When cleaning the inside of the process vessel, a fluorine-containing gas, an oxygen-containing gas and a hydrogen-containing gas are supplied as the cleaning gas into the process vessel heated and kept at a pressure less than an atmospheric pressure to remove a deposit including the thin film adhering to the inside of the process vessel through a thermochemical reaction.
    Type: Application
    Filed: June 8, 2011
    Publication date: December 29, 2011
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Naonori AKAE, Yoshiro HIROSE, Kotaro MURAKAMI
  • Publication number: 20110243216
    Abstract: A communication apparatus which receives output voltage of a direct current voltage converter, the communication apparatus includes: a modulating/demodulating circuit which demodulates a reception signal from a high-frequency transmitting/receiving circuit, modulates a transmission signal, and outputs the transmission signal to the high-frequency transmitting/receiving circuit; a communication control circuit which inputs reception data and outputs transmission data to and from the modulating/demodulating circuit and performs communication control in accordance with an reception period and a transmission period; and a direct current voltage converter control circuit which switches a direct current voltage converter, which outputs an output voltage to the communication apparatus, to pulse width modulation control in the reception period and transmission period, and switches the direct current voltage converter to pulse frequency modulation control in at least a partial period excluding the reception period and
    Type: Application
    Filed: March 28, 2011
    Publication date: October 6, 2011
    Applicant: FUJITSU SEMICONDUCTOR LIMITED
    Inventors: Shigeyuki YOSHIOKA, Kenta SASAKI, Kotaro MURAKAMI
  • Publication number: 20110043277
    Abstract: A quadrature demodulation circuit includes: first to fourth mixers to receive a modulation signal; a phase shifter to supply to the first and third mixers a first local frequency signal, to supply to the second mixer a second local frequency signal having a designated phase difference relative to the first local frequency signal, and to supply to the fourth mixer a third local frequency signal that is an inverse in phase to the second local frequency signal; a first adder to add a signal output from the first mixer and a signal output from the second mixer and to output a first demodulation signal; and a second adder to add a signal output from the third mixer and a signal output from the fourth mixer and to output a second demodulation signal.
    Type: Application
    Filed: August 23, 2010
    Publication date: February 24, 2011
    Applicant: FUJITSU SEMICONDUCTOR LIMITED
    Inventors: Shingo Sakamoto, Kotaro Murakami
  • Publication number: 20060235076
    Abstract: The invention relates to a therapy of an infection with a drug resistant bacterium wherein a characteristic of multivalent phenol derivatives and/or extracts from “Tara” which enhance the activity of ?-lactam antibiotics on the drug resistant bacteria is utilized. Specifically, the invention relates to an enhancer of ?-lactam antibiotics comprising a multivalent phenol derivative or its pharmaceutically acceptable salt, a pharmaceutical composition comprising a ?-lactam antibiotic and a multivalent phenol derivative and/or extract from “Tara” for the therapy of an infection with a drug resistant bacterium, a disinfectant for the same, and a functional food comprising a multivalent phenol derivative and/or extract from “Tara”.
    Type: Application
    Filed: January 28, 2004
    Publication date: October 19, 2006
    Applicants: ALPS PHARMACEUTICAL IND. CO., LTD., MicroBiotech Inc.
    Inventors: Tomihiko Higuchi, Hirofumi Shibata, Yoichi Sato, Nobuhisa Takaishi, Kazuyoshi Kawazoe, Kotaro Murakami
  • Patent number: 4482706
    Abstract: Novel steroid saponin compounds (XR-1) and (XR-2) are extracted from Solanam aculeatissimum, a plant belonging to the Solanum genus, and 16-dehydropregnenolone is obtained by hydrolyzing the said compounds, subjecting the hydrolyzed product to Marker's degradation, and treating the obtained product with aqueous alkali.
    Type: Grant
    Filed: April 20, 1983
    Date of Patent: November 13, 1984
    Assignee: Tokiwa Yakuhin Kogyo Kabushiki Kaisha
    Inventors: Toshiaki Tomimatsu, Kotaro Murakami