Patents by Inventor Kouichi Yamaguchi
Kouichi Yamaguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5262557Abstract: A fluorine containing organosilicon compound represented by the following general formula: ##STR1## wherein R represents an alkyl group or an aryl group, a is an integer of 1 to 7, b is an integer of 2 to 8, and c is an integer of 1 to 3. This compound is useful as a surface treating agent for silicas, an adhesive improver for resists, an oil or water-repellent treating agent, and a raw material for synthesis of various silicone compounds.Type: GrantFiled: October 16, 1992Date of Patent: November 16, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hirofumi Kishita, Kouichi Yamaguchi, Shuji Suganuma
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Patent number: 5247101Abstract: Provided are novel cyclic perfluoroketones which are thermally and chemically stable fluids. They are prepared by reacting perfluorodicarboxylic acid difluorides with carbonates in aprotic polar solvents.Type: GrantFiled: April 16, 1992Date of Patent: September 21, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Toshio Takago, Yasuo Tarumi, Kouichi Yamaguchi
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Patent number: 5241096Abstract: A fluorine-containing organosilicon compound according to the present invention is expressed by the general formula: ##STR1## wherein Rf is a perfluoropolyether group having 3 to 17 carbon atoms, R is an alkylene group having 1 to 6 carbon atoms or an ether group expressed by the general formula:--R.sup.1 --O--R.sup.2 --wherein R.sup.1 and R.sup.2 may be the same or different and are each alkylene groups having 1 to 6 carbon atoms. The fluorine-containing organosilicon compound is highly useful as a curing agent for organopolysiloxane compositions that are condensation curable at room temperature.Type: GrantFiled: October 15, 1992Date of Patent: August 31, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hitoshi Kinami, Kouichi Yamaguchi, Hideki Fujii, Shuji Suganuma, Yoshikazu Saito
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Patent number: 5210253Abstract: Fluorine-containing organosilicon compound according to the present invention is expressed by the general formula: ##STR1## wherein Rf is a perfluoropolyether group having 3 to 17 carbon atoms, R is an alkylene group having 1 to 6 carbon atoms or a group of the general formula, --R.sup.2 --O--R.sup.3 --, wherein R.sup.2 and R.sup.3 may be the same or different and are each alkylene groups having 1 to 6 carbon atoms. The present compound is useful as a curing catalyst for organo-polysiloxane compounds that are condensation curable at room temperature. The compositions added with the fluorine-containing organosilicon compound have excellent characteristics such as water and oil repellencies, chemical resistance and contamination resistance and offer a variety of uses such as high performance sealing, coating and electric insulating materials.Type: GrantFiled: October 15, 1992Date of Patent: May 11, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hitoshi Kinami, Kouichi Yamaguchi, Hideki Fujii, Shuji Suganuma
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Patent number: 5204436Abstract: A curable silicone composition comprising:(A) an alkenyl group-containing organopolysiloxane containing silicon-bonded alkenyl groups and a silicon-bonded fluorine-containing substituent having the general formula (1):Rf--O--Y-- (1)wherein Rf is a perfluoroalkenyl group having 5 to 10 carbon atoms, and Y represents a divalent organic group,(B) an organohydrogenpolysiloxane, and(C) a catalyst for addition reaction between components (A) and (B). This composition can form a cured coating which adheres firmly to various substrates and has good release properties, stability in the release properties, water- and oil-repellency, and solvent resistance. The coating exhibits good release properties even against pressure sensitive adhesives comprising a dimetylpolysiloxane.Type: GrantFiled: August 2, 1991Date of Patent: April 20, 1993Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hirofumi Kishita, Kouichi Yamaguchi, Kouji Takano, Shuji Suganuma
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Patent number: 5175793Abstract: A first voice recognition apparatus includes a device for analyzing frequencies of the input voice and a device coupled to the analyzing unit for determining vowel zones and consonant zones of the analyzed input voice. The apparatus further includes a device for determining positions of articulation of an input voice determined from the vowel zones by calculating from frequency components of the input voice in accordance with a predetermined algorithm based on frequency components of monophthongs having known phonation contents and positions of articulation. A second voice recognition apparatus includes a device for analyzing frequencies of the input voice so as to derive acoustic parameters from the input voice. A pattern converting unit is coupled to the analyzing unit and uses a neural network for converting the acoustic parameters to articulartory vectors.Type: GrantFiled: January 31, 1990Date of Patent: December 29, 1992Assignee: Sharp Kabushiki KaishaInventors: Kenji Sakamoto, Kouichi Yamaguchi
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Patent number: 5117026Abstract: The synthesis and use of a fluorine-containing organic silicon compound represented by: ##STR1## wherein each R.sup.1 independently represents a monovalent hydrocarbon group of 1-10 carbon atoms, and each R.sup.2 independently represents a monovalent hydrocarbon group of 1-10 carbon atoms or a CH.sub.2 CH.sub.2 Rf group, such that at least one R.sup.2 is CH.sub.2 CH.sub.2 Rf, wherein Rf is a perfluoroalkyl group of 1-10 carbon atoms; the compounds of formula (I) are useful in the preparation of fluorine-containing polysilethylenesiloxanes having excellent solvent-resisting and surface-lubricating properties.Type: GrantFiled: July 1, 1991Date of Patent: May 26, 1992Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hirofumi Kishita, Kouichi Yamaguchi, Hideki Fujii, Shuji Suganuma, Yoshikazu Saito, Shinichi Sato, Kenichi Fukuda, Nobuyuki Kobayashi
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Patent number: 4985526Abstract: A curable silicone composition comprising;(a) an organopolysiloxane having at least two silicon-bonded C.sub.2 to C.sub.8 alkenyl groups and containing a particular silicon-bonded fluorine-containing substituent;(b) an organohydrogenpolysiloxane having at least three silicon-bonded hydrogen atoms and a particular silicon-bonded fluorine-containing substituent; and(c) a catalyst; the proportion of said silicon-bonded hydrogen atoms in Component (b) to said silicon-bonded alkenyl groups in Component (a) being at least 0.5. This composition can form a film, on various substrates, having good release properties, water repellency and oil repellency.Type: GrantFiled: May 3, 1990Date of Patent: January 15, 1991Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hirofumi Kishita, Kouichi Yamaguchi, Toshio Takago
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Patent number: 4888059Abstract: A cement dispersing agent comprising as an essential component a copolymer obtained by copolymerizing (a) 40 to 90% by weight, calculated as an alpha,beta-ethylenically unsaturated carboxylic acid, of the alpha,beta-ethylenically unsaturated carboxylic acid and/or its salt and (b) 60 to 10% by weight of an acrylic ester and/or a methacrylic ester of an alkyl alcohol having 1 to 4 carbon atoms, or a copolymer obtained by copolymerizing (a) 40 to 89% by weight, calculated as an alpha,beta-ethylenically unsaturated carboxylic acid, of the alpha,beta-ethylenically unsaturated carboxylic acid and/or its salt, (b) 51 to 10% by weight of an acrylic ester and/or a methacrylic ester of an alkyl alcohol having 1 to 4 carbon atoms and (c) 1 to 9% by weight of the other copolymerizable unsaturated monomer.Type: GrantFiled: December 22, 1987Date of Patent: December 19, 1989Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Kouichi Yamaguchi, Tokio Goto
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Patent number: 4804709Abstract: A fluorine-containing coating agent which can be used for forming a fluorocarbon resin coating film on a substrate comprises a polymer which has a fluorine-containing polymer as a main chain and an alkoxysilyl group in the side chain and which is obtained by the reaction of a hydroxyl group of a fluorine-containing polymer having the hydroxyl group in the side chain with an isocyanato group of an alkoxysilane having the isocyanato group. The fluorine-containing polymer having a hydroxyl group in the side chain is a copolymer of a fluoro-olefin and a hydroxyalkyl vinyl ether having a straight or branched alkyl group having 2 to 5 carbon atoms. The alkoxysilane having an isocyanato group is a compound represented by the following formula:OCN(CH.sub.2).sub.3 SiX.sub.n R.sub.(3-n) (I)whereinR is hydrogen or a monovalent hydrocarbon group haviang 1 to 10 carbon atoms,X is an alkoxyl group having 1 to 5 carbon atoms, andn is an integer of 1 to 3.Type: GrantFiled: March 1, 1988Date of Patent: February 14, 1989Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Toshio Takago, Yasushi Yamamoto, Kouichi Yamaguchi
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Patent number: 4777455Abstract: A power supply cord having a noise filter is used for connecting an electronic apparatus to a power source, the noise filter being mounted on the cord within 30 cm from the end thereof connected to the electronic apparatus of the noise generating source. Such a power supply cord is used even with an electronic apparatus that does not have a noise filter so that a countermeasure for noise is easily provided without the especially troublesome application of wiring within a shielding case for the electronic apparatus. Since the noise filter is positioned within 30 cm from the end of the power supply cord to be connected to the noise generating source, the power supply cord does not act as a radiation antenna for the noise band from the noise generating source so that the power supply cord eliminates noise from both ends effectively and has a superior filter characteristic.Type: GrantFiled: June 3, 1987Date of Patent: October 11, 1988Assignee: Murata Manufacturing Co. Ltd.Inventors: Yukio Sakamoto, Kouichi Yamaguchi, Takayuki Hirotuji
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Patent number: 4760357Abstract: The metal case has an opening, which includes a first portion for accommodating an inlet socket, and a second portion of a box-shaped form with a bottom for arranging filter components therein. On a rear side of the metal case, there is provided a printed circuit board which includes a first portion for mounting the inlet socket, and a second portion for mounting the filter components corresponding to the first portion and second portion of the metal case, respectively. An earth portion of the filter components contact the metal case, whereas the other portions of the filter components are mounted to the printed circuit board without contacting the metal case. On the printed circuit board, terminals protruding from the rear side thereof are provided. Surrounding the second portion of the metal case, there is installed a resin case with a bottom in which holes corresponding to the terminals are formed to lead out the terminals therethrough.Type: GrantFiled: October 15, 1986Date of Patent: July 26, 1988Assignee: Murata Manufacturing Co., Ltd.Inventor: Kouichi Yamaguchi
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Patent number: 4757282Abstract: A first bypass-type condenser for normal mode noise is connected between the input terminals of a pair of signal paths and a pair of further bypass-type condensers for common mode noise are each connected between a respective one of the signal paths and ground. The pair of further bypass-type condensers each comprise a three-terminal condenser having a pair of lead terminals each provided with a bead core thereon, whereby noise passing through the line filter can be effectively eliminated, while also eliminating spurious LC resonance effects at ultra-high frequencies.Type: GrantFiled: October 2, 1986Date of Patent: July 12, 1988Assignee: Murata Manufacturing Co., Ltd.Inventors: Yukio Sakamoto, Kouichi Yamaguchi
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Patent number: 4676194Abstract: A method for forming a thin film on a substrate, which comprises aligning an evaporation means for an evaporating material to be deposited on the substrate, a plasma generating zone for dissociating an ion-forming gas into ions and electrons, an ion beam accelerating zone for accelerating the resulting ions and irradiating them onto the substrate, and said substrate on a substantially straight line in the order stated, and depositing a vapor of the evaporating material on the substrate through the plasma generating zone and the ion beam accelerating zone. According to this method, surface irradiation can be carried out uniformly because the ion species and the vapor atoms are irradiated in quite the same direction. Furthermore, the vapor atoms can be activated to a high degree, and the by-product electrons can be effectively utilized for the evaporation of the evaporant.Type: GrantFiled: January 27, 1986Date of Patent: June 30, 1987Assignee: Kyocera CorporationInventors: Mamoru Satou, Kouichi Yamaguchi
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Patent number: 4657774Abstract: A method for forming a thin film on a substrate, which comprises aligning an evaporation means for an evaporating material to be deposited on the substrate, a plasma generating zone for dissociating an ion-forming gas into ions and electrons, an ion beam accelerating zone for accelerating the resulting ions and irradiating them onto the substrate, and said substrate on a substantially straight line in the order stated, and depositing a vapor of the evaporating material on the substrate through the plasma generating zone and the ion beam accelerating zone. According to this method, surface irradiation can be carried out uniformly because the ion species and the vapor atoms are irradiated in quite the same direction. Furthermore, the vapor atoms can be activated to a high degree, and the by-product electrons can be effectively utilized for the evaporation of the evaporant.Type: GrantFiled: April 17, 1985Date of Patent: April 14, 1987Assignees: Agency of Industrial Science & Technology, Kyocera CorporationInventors: Mamoru Satou, Kouichi Yamaguchi
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Patent number: 4035700Abstract: An electronic control apparatus for controlling currents supplied to star-connected multiphase loads.Type: GrantFiled: December 12, 1975Date of Patent: July 12, 1977Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Itaru Kawasaki, Kouichi Yamaguchi, Yoshiaki Igarashi, Kazutsugu Kobayashi